JPWO2020027919A5 - - Google Patents

Claims (20)

A device that processes workpieces using plasma.
A chamber that partially delimits the processing space that receives the processing gas, and a chamber that is under vacuum during the processing of the workpiece using plasma.
A base assembly defining the lower end of the processing space, the workholder having a peripheral edge and configured to receive the work, a baffle plate having an outer peripheral edge, and a side wall. It comprises an electrode coupled to the baffle plate and a chamber base surrounding the outer surface of the sidewall of the electrode, with most of the outer peripheral edge of the baffle plate in close proximity to the inner surface of the sidewall of the electrode. With the base assembly, which does not come into direct contact with
A processing gas supply port in the chamber, which introduces the processing gas into the processing space,
A plasma excitation source capable of operating to provide plasma in the processing space from the processing gas for processing the work, for exhausting the processing space during processing of the work using plasma. A plasma excitation source arranged so as to demarcate a gap between the majority of the outer peripheral edge of the baffle plate and the inner surface of the sidewall of the electrode .
A device equipped with. The device according to claim 1.
A device in which the base assembly defines a flow path, and the processing space is exhausted from the base assembly through the flow path. The device according to claim 2.
The flow path is a device including a first vertical portion that is vertically offset from the second vertical portion. The device according to claim 3.
The first vertical portion is defined by a first vertical passage, the second vertical portion is defined by a second vertical passage, and the second vertical passage is vertically offset from the first vertical passage. Device. The device according to claim 4.
The plasma excitation source includes the electrode, the electrode is positioned vertically between the chamber base and the baffle plate in the base assembly, the first vertical passage is defined by the electrode, and the second. The vertical passage of the device is defined by the chamber base. The device according to claim 5.
The baffle plate and the electrode are coupled to define an internal space between the baffle plate and the electrode, and the internal space between the baffle plate and the electrode is immediately after the exhaust of the processing space. In addition, a device for defining a part of the flow path. The device according to claim 6.
A device comprising a first lateral portion of the flow path defined by the internal space between the baffle plate and the electrode prior to the first vertical passage defined by the electrode. The device according to claim 7.
A device in which the electrodes are coupled to the chamber base and the first vertical passage runs to the chamber base. The device according to claim 8.
The chamber base is a device that defines a circular channel configured to define a second lateral portion of the flow path after the first vertical passage. The device according to claim 9.
A device in which the lateral direction of the first lateral portion of the flow path and the lateral direction of the second lateral portion of the flow path are substantially opposite to each other. The device according to claim 9.
The second vertical passage is a device defined by the floor of the circular channel of the chamber base. The device according to claim 11.
A device having a vacuum plate coupled to the bottom end of the chamber base and defining a vacuum space configured with the coupled chamber base and the vacuum plate having a vacuum port connected to a vacuum source. The device according to claim 12.
The vacuum space defines a third horizontal portion of the flow path, and the third horizontal portion of the flow path extends laterally from the peripheral portion of the vacuum space and the vacuum port. The device according to claim 5.
The electrodes define two or more vertical passages, the chamber base defines two or more vertical passages, and the two or more vertical passages defined by the electrodes are the two or more vertical passages defined by the chamber base. A device that vertically offsets from each of the passages. The device according to claim 14.
The two or more vertical passages defined by the electrodes include four vertical passages, the two or more vertical passages defined by the chamber base include four vertical passages, and the four vertical passages defined by the electrodes. A vertical passage is a device that vertically offsets from each of the four vertical passages defined by the chamber base by at least 30 degrees with respect to the center of at least one of the electrode and the chamber base. The device according to claim 15.
The four vertical passages defined by the electrodes are at least 45 degrees from each of the four vertical passages defined by the chamber base with respect to the center of at least one of the electrodes and the chamber base. A device that vertically offsets. The device according to claim 2.
A device in which the first portion of the flow path is defined by the gap, and the second portion of the flow path includes a horizontal portion immediately after the first portion of the flow path . The device according to claim 17.
A device in which the horizontal portion of the flow path is defined between at least a portion of the baffle plate and at least a portion of the electrode. The device according to claim 17.
A device in which a third vertical portion of the flow path is defined by a vacuum conduit extending from the vacuum space of the base assembly. The device according to claim 1.
A device in which the entire outer peripheral edge of the baffle plate is close to, but not in direct contact with, the inner surface of the side wall of the electrode.