JPWO2019222599A5 - - Google Patents
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- JPWO2019222599A5 JPWO2019222599A5 JP2020564435A JP2020564435A JPWO2019222599A5 JP WO2019222599 A5 JPWO2019222599 A5 JP WO2019222599A5 JP 2020564435 A JP2020564435 A JP 2020564435A JP 2020564435 A JP2020564435 A JP 2020564435A JP WO2019222599 A5 JPWO2019222599 A5 JP WO2019222599A5
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- -1 Polysiloxane group Polymers 0.000 claims 13
- 125000004435 hydrogen atoms Chemical group [H]* 0.000 claims 13
- 150000001875 compounds Chemical class 0.000 claims 12
- 125000003118 aryl group Chemical group 0.000 claims 11
- 125000000217 alkyl group Chemical group 0.000 claims 10
- 229910052717 sulfur Inorganic materials 0.000 claims 8
- 239000002978 dental impression material Substances 0.000 claims 7
- 125000005647 linker group Chemical group 0.000 claims 7
- 239000000203 mixture Substances 0.000 claims 7
- 125000004400 (C1-C12) alkyl group Chemical group 0.000 claims 6
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 claims 5
- 125000004430 oxygen atoms Chemical group O* 0.000 claims 5
- 125000004434 sulfur atoms Chemical group 0.000 claims 5
- 239000011358 absorbing material Substances 0.000 claims 4
- 125000004432 carbon atoms Chemical group C* 0.000 claims 4
- 229920001296 polysiloxane Polymers 0.000 claims 4
- 239000011347 resin Substances 0.000 claims 4
- 229920005989 resin Polymers 0.000 claims 4
- 239000011973 solid acid Substances 0.000 claims 4
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims 3
- 239000004215 Carbon black (E152) Substances 0.000 claims 3
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 3
- 229910052760 oxygen Inorganic materials 0.000 claims 3
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims 2
- 125000002947 alkylene group Chemical group 0.000 claims 2
- 239000012535 impurity Substances 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 230000003647 oxidation Effects 0.000 claims 2
- 238000007254 oxidation reaction Methods 0.000 claims 2
- 229920005862 polyol Polymers 0.000 claims 2
- KWYUFKZDYYNOTN-UHFFFAOYSA-M potassium hydroxide Inorganic materials [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N Allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 claims 1
- 125000006549 C4-C10 aryl group Chemical group 0.000 claims 1
- 210000001138 Tears Anatomy 0.000 claims 1
- 239000002253 acid Substances 0.000 claims 1
- 239000000945 filler Substances 0.000 claims 1
- 239000010419 fine particle Substances 0.000 claims 1
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 239000003211 photoinitiator Substances 0.000 claims 1
Claims (6)
A.以下の:
(a)式(Xa)
HO-L4(OH)l
(Xa)
(式中、L4は、式(VIIIa)
R1#は、1~8つの炭素原子を有するアルキレンであり、
R2#は、1~4つの炭素原子を有するアルキルであり、
y#は、5~20の整数である)
の純粋でないジオール化合物を固体酸吸収材料で処理して精製された式(Xa)の化合物を得るステップであって、ここで前記精製された式(Xa)の化合物は、0.02~0.06 mg KOH/gの全酸化を有することを特徴とする、前記精製された式(Xa)の化合物を得るステップと、
(b)以下の:
(i)x等量の前記精製された式(Xa)の化合物および以下の式
HO-L4’’(OH)l’’
(Xa’)
(式中、
L4’’は、(l’’+1)価のリンカー基であり、
l’’は、1~5の整数である)
の1つ以上のジ-またはポリオール化合物と、
(ii)y等量の以下の式(XI):
OCN-L3NCO
(XI)
(式中、L3は、式(VI)
同じであるかまたは異なっていてよいRa1およびRa2は、独立して、水素原子、C1~6線状または分岐アルキル基、C4~10アリール基、重合性二重結合含有有機残基、以下の式[-X’’L’’]mRa3(式中、X’’はO、S、もしくはNRa4(式中、Ra4は、水素原子、重合性二重結合を含有する有機残基、線状もしくは分岐C1~6アルキル基、もしくはC4~10アリール基を表す)を表し、L’’は、C1~6線状もしくは分岐アルキル基、C4~10アリール基、もしくはSiRa5 2基(式中、同じであるかもしくは異なっていてよいRa5は、独立して、重合性二重結合を含有する有機残基、もしくはC1~4アルキル基を表す)を表し、mは、1~20の整数であり、Ra3は、重合性二重結合を含有する有機残基、C1~4アルキル基、もしくはC4~10アリール基である)の基を表す)
の1つ以上の化合物と、
(iii)z等量の以下の式(XII):
R1は、水素原子またはC1~12アルキル基を表し、
X3は、酸素原子、硫黄原子または基NR2(式中、R2は、水素原子、C1~12アルキル基、もしくはアリル基である)を表し、
L5は、二価の炭化水素リンカー基であり、
X4は、酸素原子、硫黄原子または基NR3(式中、R3は、水素原子、もしくはC1~12アルキル基である)を表し、
aは、1~20の整数を表し、
0.05≦x/y≦0.66である)
の1つ以上の化合物、
を含む混合物を反応させて重合性ポリシロキサン樹脂混合物を形成するステップ、
を含むプロセスにより得られる重合性ポリシロキサン樹脂混合物と、
B.微粒子フィラーと、
C.光開始剤
を含む、光硬化性歯科用印象材。 A photocurable dental impression material with improved shore hardness and improved tear strength, said impression material.
A. or below:
(A) Equation (Xa)
HO-L 4 (OH) l
(Xa)
(In the formula, L 4 is the formula (VIIIa).
R 1 # is an alkylene having 1 to 8 carbon atoms.
R 2 # is an alkyl having 1 to 4 carbon atoms.
y # is an integer from 5 to 20)
The step of treating the impure diol compound of No. 1 with a solid acid absorbing material to obtain a purified compound of the formula (Xa), wherein the purified compound of the formula (Xa) is 0.02 to 0. To obtain the purified compound of formula (Xa), characterized by having a total oxidation of 06 mg KOH / g.
(B) Below:
(I) x equal amounts of the purified compound of formula (Xa) and the following formula HO-L 4'' (OH) l''.
(Xa')
(During the ceremony,
L 4'' is a (l '' + 1) -valent linker group.
l '' is an integer from 1 to 5)
With one or more di- or polyol compounds of
(Ii) The following equation (XI) of y equal amount:
OCN-L 3 NCO
(XI)
(In the formula, L 3 is the formula (VI).
Ra 1 and Ra 2 which may be the same or different are independently hydrogen atoms, C 1-6 linear or branched alkyl groups, C 4-10 aryl groups, polymerizable double bond containing organic residues. , The following formula [-X''L''] m R a3 (in the formula, X'' is O, S, or NR a4 (in the formula, R a4 contains a hydrogen atom, a polymerizable double bond. Represents an organic residue, linear or branched C 1-6 alkyl group, or C 4-10 aryl group), where L'' represents a C 1-6 linear or branched alkyl group, C 4-10 aryl group. , Or two SiR a5 groups (in the formula, R a5 , which may be the same or different, independently represents an organic residue containing a polymerizable double bond, or a C1-4 alkyl group ). Represented, m is an integer of 1 to 20, and Ra3 represents an organic residue containing a polymerizable double bond, a C1 to 4 alkyl group, or a C4 to 10 aryl group). )
With one or more compounds of
(Iii) The following equation (XII) of z equal quantity:
R 1 represents a hydrogen atom or a C 1-12 alkyl group.
X 3 represents an oxygen atom, a sulfur atom or a group NR 2 (in the formula, R 2 is a hydrogen atom, a C1-12 alkyl group, or an allyl group).
L 5 is a divalent hydrocarbon linker group .
X 4 represents an oxygen atom, a sulfur atom or a group NR 3 (in the formula, R 3 is a hydrogen atom or a C 1-12 alkyl group).
a represents an integer from 1 to 20 and represents
0.05 ≤ x / y ≤ 0.66)
One or more compounds of
To form a polymerizable polysiloxane resin mixture by reacting the mixture containing
With the polymerizable polysiloxane resin mixture obtained by the process containing
B. With fine particle filler,
C. Photocurable dental impression material containing photoinitiator.
同じであるかまたは異なるRb1、Rb2、Rb3およびRb4は、独立して、水素原子、C1~6線状または分岐アルキル基、C4~10アリール基、重合性二重結合含有有機残基、以下の式[-X’’’L’’’]mRb5(式中、X’’’はO、S、もしくはNRb6(式中、Rb6は、水素原子、重合性二重結合を含有する有機残基、線状もしくは分岐C1~6アルキル基、もしくはC4~10アリール基を表す)を表し、L’’’は、C1~6線状もしくは分岐アルキル基、C4~10アリール基、もしくはSiRb7 2基(式中、同じであるかもしくは異なるRb7は、独立して、重合性二重結合を含有する有機残基もしくはC1~4アルキル基を表す)を表し、mは、1~20の整数であり、Rb5は、重合性二重結合を含有する有機残基、C1~4アルキル基、もしくはC4~10アリール基である)の基を表し、
X5およびX6は、同じであるかまたは異なり、かつ2つ以上のX5またはX6が存在する場合、X5およびX6は、同じであるかまたは異なり、独立して、酸素原子、硫黄原子および基NRN(式中、RNは、水素原子もしくはC1~4アルキル基である)を表し、
L6は、二価の炭化水素リンカー基であり、
eは、1~10の整数であり、
fは、1~100の整数であり、
gは、0または1である、
請求項1に記載の光硬化性歯科用印象材。 L 4'' is the formula (VII):
The same or different R b1 , R b2 , R b3 and R b4 independently contain a hydrogen atom, a C 1-6 linear or branched alkyl group, a C 4-10 aryl group and a polymerizable double bond. Organic residue, the following formula [-X'''L'''] m R b5 (in the formula, X''' is O, S, or NR b6 (in the formula, R b6 is a hydrogen atom, polymerizable. Represents an organic residue containing a double bond, a linear or branched C 1-6 alkyl group, or a C 4-10 aryl group), where L'''represents a C 1-6 linear or branched alkyl group. , C 4-10 aryl groups, or SiR b7 2 groups (in the formula, the same or different R b7s independently contain organic residues or C 1-4 alkyl groups containing polymerizable double bonds. Represents), where m is an integer of 1 to 20 and R b5 is an organic residue containing a polymerizable double bond, a C 1-4 alkyl group, or a C4-10 aryl group). Represents the group
If X 5 and X 6 are the same or different, and more than one X 5 or X 6 is present, then X 5 and X 6 are the same or different, independently of the oxygen atom. Represents a sulfur atom and a group NRN (where RN is a hydrogen atom or a C1-4 alkyl group).
L 6 is a divalent hydrocarbon linker group and
e is an integer from 1 to 10 and
f is an integer from 1 to 100 and
g is 0 or 1,
The photocurable dental impression material according to claim 1.
HO-L4(OH)l
(Xa)
(式中、L4は、式(VIIIa)
R1#は、1~8つの炭素原子を有するアルキレンであり、
R2#は、1~4つの炭素原子を有するアルキルであり、
y#は、5~20の整数である)
の純粋でないジオール化合物を固体酸吸収材料で処理して精製された式(Xa)の化合物を得るステップであって、ここで前記精製された式(Xa)の化合物は、0.02~0.06 mg KOH/gの全酸化を有することを特徴とする、前記精製された式(Xa)の化合物を得るステップと、
(b)以下の:
(i)x等量の前記精製された式(Xa)の化合物および以下の式
HO-L4’’(OH)l’’
(X)
(式中、
L4’’は、(l’’+1)価のリンカー基であり、
l’’は、1~5の整数である)
の1つ以上のジ-またはポリオール化合物と、
(ii)y等量の以下の式(XI):
OCN-L3NCO
(XI)
(式中、L3は、式(VI)
同じであるかまたは異なっていてよいRa1およびRa2は、独立して、水素原子、C1~6線状または分岐アルキル基、C4~10アリール基、重合性二重結合含有有機残基、以下の式[-X’’L’’]mRa3(式中、X’’はO、S、もしくはNRa4(式中、Ra4は、水素原子、重合性二重結合を含有する有機残基、線状もしくは分岐C1~6アルキル基、もしくはC4~10アリール基を表す)を表し、L’’は、C1~6線状もしくは分岐アルキル基、C4~10アリール基、もしくはSiRa5 2基(式中、同じであるかもしくは異なっていてよいRa5は、独立して、重合性二重結合を含有する有機残基、もしくはC1~4アルキル基を表す)を表し、mは、1~20の整数であり、Ra3は、重合性二重結合を含有する有機残基、C1~4アルキル基、もしくはC4~10アリール基である)の基を表す)
の1つ以上の化合物と、
(iii)z等量の以下の式(XII):
R1は、水素原子またはC1~12アルキル基を表し、
X3は、酸素原子、硫黄原子または基NR2(式中、R2は、水素原子、C1~12アルキル基、もしくはアリル基である)を表し、
L5は、二価の炭化水素リンカー基であり、
X4は、酸素原子、硫黄原子または基NR3(式中、R3は、水素原子、もしくはC1~12アルキル基である)を表し、
aは、1~20の整数を表し、
0.05≦x/y≦0.66である)
の1つ以上の化合物、
を含む混合物を反応させて光硬化性歯科用印象材に使用する用の重合性ポリシロキサン樹脂混合物を形成するステップ、
を含むプロセスにより得られる重合性ポリシロキサン樹脂混合物。 (A) Equation (Xa)
HO-L 4 (OH) l
(Xa)
(In the formula, L 4 is the formula (VIIIa).
R 1 # is an alkylene having 1 to 8 carbon atoms.
R 2 # is an alkyl having 1 to 4 carbon atoms.
y # is an integer from 5 to 20)
The step of treating the impure diol compound of No. 1 with a solid acid absorbing material to obtain a purified compound of the formula (Xa), wherein the purified compound of the formula (Xa) is 0.02 to 0. To obtain the purified compound of formula (Xa), characterized by having a total oxidation of 06 mg KOH / g.
(B) Below:
(I) x equal amounts of the purified compound of formula (Xa) and the following formula HO-L 4'' (OH) l''.
(X)
(During the ceremony,
L 4'' is a (l '' + 1) -valent linker group.
l '' is an integer from 1 to 5)
With one or more di- or polyol compounds of
(Ii) The following equation (XI) of y equal amount:
OCN-L 3 NCO
(XI)
(In the formula, L 3 is the formula (VI).
Ra 1 and Ra 2 which may be the same or different are independently hydrogen atoms, C 1-6 linear or branched alkyl groups, C 4-10 aryl groups, polymerizable double bond containing organic residues. , The following formula [-X''L''] m R a3 (in the formula, X'' is O, S, or NR a4 (in the formula, R a4 contains a hydrogen atom, a polymerizable double bond. Represents an organic residue, linear or branched C 1-6 alkyl group, or C 4-10 aryl group), where L'' represents a C 1-6 linear or branched alkyl group, C 4-10 aryl group. , Or two SiR a5 groups (in the formula, R a5 , which may be the same or different, independently represents an organic residue containing a polymerizable double bond, or a C1-4 alkyl group ). Represented, m is an integer of 1 to 20, and Ra3 represents an organic residue containing a polymerizable double bond, a C1 to 4 alkyl group, or a C4 to 10 aryl group). )
With one or more compounds of
(Iii) The following equation (XII) of z equal quantity:
R 1 represents a hydrogen atom or a C 1-12 alkyl group.
X 3 represents an oxygen atom, a sulfur atom or a group NR 2 (in the formula, R 2 is a hydrogen atom, a C1-12 alkyl group, or an allyl group).
L 5 is a divalent hydrocarbon linker group and
X 4 represents an oxygen atom, a sulfur atom or a group NR 3 (in the formula, R 3 is a hydrogen atom or a C 1-12 alkyl group).
a represents an integer from 1 to 20 and represents
0.05 ≤ x / y ≤ 0.66)
One or more compounds of
To form a polymerizable polysiloxane resin mixture for use in photocurable dental impression materials by reacting a mixture containing
A polymerizable polysiloxane resin mixture obtained by a process comprising.
Applications Claiming Priority (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201862673187P | 2018-05-18 | 2018-05-18 | |
US62/673,187 | 2018-05-18 | ||
US201862736772P | 2018-09-26 | 2018-09-26 | |
US62/736,772 | 2018-09-26 | ||
EP18198048.3A EP3632401A1 (en) | 2018-10-01 | 2018-10-01 | Macromonomer based light-curable dental impression material |
EP18198048.3 | 2018-10-01 | ||
PCT/US2019/032825 WO2019222599A1 (en) | 2018-05-18 | 2019-05-17 | Macromonomer based light-curable dental impression material |
Publications (2)
Publication Number | Publication Date |
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JP2021524441A JP2021524441A (en) | 2021-09-13 |
JPWO2019222599A5 true JPWO2019222599A5 (en) | 2022-05-18 |
Family
ID=63720617
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020564435A Pending JP2021524441A (en) | 2018-05-18 | 2019-05-17 | Macromonomer photocurable dental impression material |
Country Status (5)
Country | Link |
---|---|
EP (3) | EP3632401A1 (en) |
JP (1) | JP2021524441A (en) |
CN (2) | CN112166159B (en) |
AU (2) | AU2019269643A1 (en) |
CA (2) | CA3099159A1 (en) |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2909994A1 (en) | 1979-03-14 | 1980-10-02 | Basf Ag | ACYLPHOSPHINOXIDE COMPOUNDS, THEIR PRODUCTION AND USE |
DE2830927A1 (en) | 1978-07-14 | 1980-01-31 | Basf Ag | ACYLPHOSPHINOXIDE COMPOUNDS AND THEIR USE |
DE2909992A1 (en) | 1979-03-14 | 1980-10-02 | Basf Ag | PHOTOPOLYMERIZABLE RECORDING MEASURES, IN PARTICULAR FOR THE PRODUCTION OF PRINTING PLATES AND RELIEF FORMS |
US5177120A (en) * | 1984-07-31 | 1993-01-05 | Dentsply Research & Development Corp. | Chain extended urethane diacrylate and dental impression formation |
US5137448A (en) | 1984-07-31 | 1992-08-11 | Dentsply Research & Development Corp. | Dental impression method with photocuring of impression material in light transmissive tray |
US4813875A (en) * | 1984-07-31 | 1989-03-21 | Dentsply Research & Development Corp. | Chain extended urethane diacrylate and dental impression formation |
CA1312402C (en) * | 1984-07-31 | 1993-01-05 | Dentsply International Inc. | Chain extended urethane diacrylate and dental impression formation |
GR852068B (en) | 1984-08-30 | 1985-12-24 | Johnson & Johnson Dental Prod | |
CA1323949C (en) | 1987-04-02 | 1993-11-02 | Michael C. Palazzotto | Ternary photoinitiator system for addition polymerization |
JP2711456B2 (en) * | 1988-08-08 | 1998-02-10 | 鐘淵化学工業株式会社 | Curable resin and method for producing the same |
DE19719438C5 (en) | 1996-05-09 | 2014-05-08 | 3M Deutschland Gmbh | Use of addition-crosslinking polyether impression material for the production of dimensionally stable jaw impressions |
US6201038B1 (en) * | 1999-02-18 | 2001-03-13 | Kerr Corporation | Hydrophilically modified curable silicone impression material |
US20100304338A1 (en) * | 2007-09-19 | 2010-12-02 | The Regents Of The University Of Colorado | Polymer impression materials |
CN102964974A (en) * | 2011-04-25 | 2013-03-13 | 陶氏环球技术有限公司 | Moisture-curable antifouling coating composition |
EP3153150A1 (en) | 2015-10-08 | 2017-04-12 | Dentsply DeTrey GmbH | Dental composition |
EP3231413A1 (en) | 2016-04-11 | 2017-10-18 | DENTSPLY DETREY GmbH | Dental composition |
JP2021527630A (en) * | 2018-05-18 | 2021-10-14 | デンツプライ シロナ インコーポレイテッド | Macromonomer photocurable dental impression material |
-
2018
- 2018-10-01 EP EP18198048.3A patent/EP3632401A1/en active Pending
-
2019
- 2019-05-17 CN CN201980033281.1A patent/CN112166159B/en active Active
- 2019-05-17 JP JP2020564435A patent/JP2021524441A/en active Pending
- 2019-05-17 CA CA3099159A patent/CA3099159A1/en active Pending
- 2019-05-17 CA CA3099048A patent/CA3099048A1/en active Pending
- 2019-05-17 CN CN201980033397.5A patent/CN112135598B/en active Active
- 2019-05-17 AU AU2019269643A patent/AU2019269643A1/en active Pending
- 2019-05-17 EP EP19727271.9A patent/EP3793506A1/en active Pending
- 2019-05-17 AU AU2019271385A patent/AU2019271385A1/en active Pending
- 2019-05-17 EP EP19727272.7A patent/EP3794075B1/en active Active
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