JPWO2019160781A5 - - Google Patents
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- JPWO2019160781A5 JPWO2019160781A5 JP2020543377A JP2020543377A JPWO2019160781A5 JP WO2019160781 A5 JPWO2019160781 A5 JP WO2019160781A5 JP 2020543377 A JP2020543377 A JP 2020543377A JP 2020543377 A JP2020543377 A JP 2020543377A JP WO2019160781 A5 JPWO2019160781 A5 JP WO2019160781A5
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- light beam
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- doe
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- 230000000051 modifying Effects 0.000 claims description 12
- 230000003287 optical Effects 0.000 claims description 10
- 238000007493 shaping process Methods 0.000 claims 18
- 238000007689 inspection Methods 0.000 claims 4
- 239000004065 semiconductor Substances 0.000 claims 2
- 241001270131 Agaricus moelleri Species 0.000 claims 1
- 230000000875 corresponding Effects 0.000 claims 1
- 238000004088 simulation Methods 0.000 description 1
Description
ターゲット108の平面内での非対称DOEのビームプロファイルはこの場合、対称位相項と非対称位相項の畳み込みの結果得られる:
光ビームは(例えば位相変調器104を使用して)位相変調される(704)。いくつかの実施形態では、位相変調は、DOE、非球面レンズ、ロッドレンズ、またはパウエルレンズを使用して行われる(706)。例えば、対称位相項300と非対称位相項302の畳み込みの実例(インスタンス化)となることでターゲットの平面内で実質的に対称なビームプロファイル304(図3)を生成するDOEが使用される(708)。DOEは、光ビームの入射平面に対して垂直な(例えば図5に従う)DOEの個別のスライスに対して、個別の位相を有するそれぞれのビームプロファイルが得られるように成形されてもよい(710)。個別の位相同士を組み合わせることによってビームのトップのスパイクが平滑化される。 The light beam is phase-modulated (eg, using the phase modulator 104) (704). In some embodiments, phase modulation is performed using a DOE, aspherical lens, rod lens, or Powell lens (706). For example, a DOE is used that produces a substantially symmetric beam profile 304 (FIG. 3) in the plane of the target by being an example (instantiation) of the convolution of the symmetric phase term 300 and the asymmetric phase term 302 (708). ). The DOE may be shaped to obtain a beam profile with a different phase for each slice of the DOE perpendicular to the plane of incidence of the light beam (eg according to FIG. 5) (710). .. The combination of the individual phases smoothes the spikes at the top of the beam.
Claims (15)
前記光ビームが前記ターゲット上に前記斜入射角で収束されるときに、前記ターゲットの平面内での前記光ビームのトップを実質的にフラットにするための位相変調器であって、対称位相項と非対称位相項との畳み込みをインスタンス化して、前記光ビームが前記ターゲット上に前記斜入射角で収束されるときに前記ターゲットの前記平面内で実質的に対称なビームプロファイルを生成する回折光学素子(DOE)を備える、位相変調器と、
を備えることを特徴とする、光学検査器具用のビーム整形装置。 A focal lens for converging the light beam on the target at an oblique angle of incidence,
A phase modulator for substantially flattening the top of the light beam in the plane of the target when the light beam converges on the target at the oblique incident angle, the symmetric phase term. Diffractive optical element that instantiates a convolution of and an asymmetric phase term to generate a substantially symmetric beam profile in the plane of the target when the light beam converges on the target at the oblique angle of incidence. With a phase modulator equipped with (DOE) ,
A beam shaping device for an optical inspection instrument, characterized in that it is provided with.
前記ターゲットは半導体ウエハであり、
前記位相変調器は、前記光ビームが収束される前記半導体ウエハの表面に対応する平面内での前記光ビームの前記トップを実質的にフラットにするように構成されていることを特徴とするビーム整形装置。 The beam shaping apparatus according to claim 1, wherein the beam shaping apparatus is used.
The target is a semiconductor wafer,
The phase modulator is configured to substantially flatten the top of the light beam in a plane corresponding to the surface of the semiconductor wafer to which the light beam is converged. Shaping device.
前記光ビームが前記ターゲット上に前記斜入射角で収束されるときに、前記ターゲットの平面内での前記光ビームのトップを実質的にフラットにするための回折光学素子(DOE)であって、対称位相項と非対称位相項との畳み込みをインスタンス化して、前記ターゲットの前記平面内で実質的に対称なビームプロファイルを生成するDOEと、
前記ターゲットが装着されることになるチャックと、を備え、
前記焦点レンズは、前記光ビームの光経路内で前記DOEと前記チャックの間に配置されており、
前記DOEに入射する前記光ビームは実質的にガウシアンであり、
前記光ビームの半径方向軸に対して垂直な前記DOEの断面は実質的にくさび形状となっている
ことを特徴とする、光学検査器具用のビーム整形装置。 A focal lens for converging the light beam on the target at an oblique angle of incidence,
A diffractive optical element ( DOE ) for substantially flattening the top of the light beam in the plane of the target when the light beam converges on the target at the oblique incident angle. A DOE that instantiates the diffraction of a symmetric phase term and an asymmetric phase term to generate a substantially symmetric beam profile in said plane of the target .
With a chuck to which the target will be mounted,
The focal lens is arranged between the DOE and the chuck in the optical path of the light beam.
The light beam incident on the DOE is substantially Gaussian and is
A beam shaping device for an optical inspection instrument, characterized in that the cross section of the DOE perpendicular to the radial axis of the light beam is substantially wedge-shaped.
前記光ビームを前記ターゲット上に斜入射角で収束させることと、を含み、
位相変調され前記ターゲット上に前記斜入射角で収束された前記光ビームは、前記ターゲットの平面内で実質的にフラットになったトップを有する、
ことを特徴とする、ビーム整形方法。 Phase-modulating a light beam with a diffractive optic (DOE) that produces a substantially symmetric beam profile in the plane of the target by instantiating the convolution of the symmetric phase term and the asymmetric phase term .
Containing the light beam on the target at an oblique angle of incidence, including
The light beam phase-modulated and focused on the target at the oblique angle of incidence has a substantially flat top in the plane of the target.
A beam shaping method characterized by that.
前記位相変調は前記収束の前に前記DOEを使用して行われ、
前記方法は前記光ビームを前記DOEに提供することを更に含み、前記DOEに提供される前記光ビームは実質的にガウシアンであることを特徴とする方法。 The method according to claim 10 .
The phase modulation is performed using the DOE prior to the convergence.
The method further comprises providing the light beam to the DOE, wherein the light beam provided to the DOE is substantially Gaussian.
前記DOEは、前記DOEの個別のスライスに対して個別の位相を有するそれぞれのビームプロファイルを生成するように成形されており、前記個別のスライスは前記光ビームの入射平面に対して垂直であり、
前記個別の位相同士を組み合わせることによって前記ビームの前記トップのスパイクが平滑化されることを特徴とする方法。 The method according to claim 10 .
The DOE is shaped to generate a beam profile with a separate phase for each individual slice of the DOE, the individual slice being perpendicular to the plane of incidence of the light beam.
A method characterized in that the spikes at the top of the beam are smoothed by combining the individual phases.
光軸に対して偏心して位置付けられ、前記光ビームが前記ターゲット上に前記斜入射角で収束されるときに、前記ターゲットの平面内での前記光ビームのトップを実質的にフラットにするための位相変調器と、 To substantially flatten the top of the light beam in the plane of the target when it is positioned eccentrically with respect to the optical axis and the light beam converges on the target at the oblique angle of incidence. With a phase modulator,
備え、 Prepare,
前記位相変調器が、非球面レンズとロッドレンズとパウエルレンズとから成る群から選択される要素を備えることを特徴とする、光学検査器具用のビーム整形装置。 A beam shaping device for an optical inspection instrument, wherein the phase modulator comprises an element selected from the group consisting of an aspherical lens, a rod lens, and a Powell lens.
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201862631128P | 2018-02-15 | 2018-02-15 | |
US62/631,128 | 2018-02-15 | ||
US16/258,543 | 2019-01-26 | ||
US16/258,543 US10732424B2 (en) | 2018-02-15 | 2019-01-26 | Inspection-beam shaping on a sample surface at an oblique angle of incidence |
PCT/US2019/017406 WO2019160781A1 (en) | 2018-02-15 | 2019-02-11 | Inspection-beam shaping on a sample surface at an oblique angle of incidence |
Publications (3)
Publication Number | Publication Date |
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JP2021514057A JP2021514057A (en) | 2021-06-03 |
JPWO2019160781A5 true JPWO2019160781A5 (en) | 2022-02-18 |
JP7138182B2 JP7138182B2 (en) | 2022-09-15 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2020543377A Active JP7138182B2 (en) | 2018-02-15 | 2019-02-11 | Inspection light shaping at oblique incidence on the sample surface |
Country Status (8)
Country | Link |
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US (1) | US10732424B2 (en) |
JP (1) | JP7138182B2 (en) |
KR (1) | KR102466580B1 (en) |
CN (1) | CN111699431B (en) |
IL (1) | IL276460B2 (en) |
SG (1) | SG11202007299WA (en) |
TW (1) | TWI780303B (en) |
WO (1) | WO2019160781A1 (en) |
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US6731432B1 (en) * | 2000-06-16 | 2004-05-04 | Mem Optical, Inc. | Off-axis diffractive beam shapers and splitters for reducing sensitivity to manufacturing tolerances |
US7295356B2 (en) * | 2001-06-08 | 2007-11-13 | Inphase Technologies, Inc. | Method for improved holographic recording using beam apodization |
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KR20070039110A (en) * | 2004-07-30 | 2007-04-11 | 노바룩스 인코포레이티드 | Apparatus, system, and method for junction isolation of arrays of surface emitting lasers |
WO2006067495A2 (en) * | 2004-12-23 | 2006-06-29 | Micromass Uk Limited | Mass spectrometer |
JP4332855B2 (en) * | 2005-06-07 | 2009-09-16 | 住友電気工業株式会社 | Diffraction beam homogenizer optical system using wedges. |
US7385688B1 (en) * | 2005-06-22 | 2008-06-10 | Kla-Tencor Technologies Corp. | Multi-spot illumination and collection optics for highly tilted wafer planes |
JP2008140484A (en) * | 2006-12-04 | 2008-06-19 | Funai Electric Co Ltd | Optical pickup device |
JP4333760B2 (en) * | 2007-03-23 | 2009-09-16 | セイコーエプソン株式会社 | Hologram element, illumination device and projector |
JP4826558B2 (en) * | 2007-07-30 | 2011-11-30 | ソニー株式会社 | Laser equipment |
US9068952B2 (en) | 2009-09-02 | 2015-06-30 | Kla-Tencor Corporation | Method and apparatus for producing and measuring dynamically focussed, steered, and shaped oblique laser illumination for spinning wafer inspection system |
US9279774B2 (en) * | 2011-07-12 | 2016-03-08 | Kla-Tencor Corp. | Wafer inspection |
US9255891B2 (en) * | 2012-11-20 | 2016-02-09 | Kla-Tencor Corporation | Inspection beam shaping for improved detection sensitivity |
DE102013012727B3 (en) * | 2013-08-01 | 2014-07-17 | Jenoptik Optical Systems Gmbh | Method for optimizing intensity of utilizable light distribution at inclined plane, involves moving beam focusing optics along y-axis such that difference between intensities is within predetermined limit |
WO2015021411A1 (en) * | 2013-08-09 | 2015-02-12 | Kla-Tencor Corporation | Multi-spot illumination for improved detection sensitivity |
US9625380B2 (en) | 2013-09-04 | 2017-04-18 | Hitachi, Ltd. | Optical coherence tomography with homodyne-phase diversity detection |
US9749513B2 (en) * | 2014-04-29 | 2017-08-29 | Facebook, Inc. | System and method for generating a light pattern for object illumination |
CN104503101B (en) * | 2015-01-12 | 2017-01-18 | 清华大学 | Flow cytometry light beam forming system based on diffraction optics shaping device |
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US20160377878A1 (en) * | 2015-06-26 | 2016-12-29 | Osela Inc. | Composite laser line projector to reduce speckle |
-
2019
- 2019-01-26 US US16/258,543 patent/US10732424B2/en active Active
- 2019-02-11 SG SG11202007299WA patent/SG11202007299WA/en unknown
- 2019-02-11 JP JP2020543377A patent/JP7138182B2/en active Active
- 2019-02-11 IL IL276460A patent/IL276460B2/en unknown
- 2019-02-11 CN CN201980011635.2A patent/CN111699431B/en active Active
- 2019-02-11 WO PCT/US2019/017406 patent/WO2019160781A1/en active Application Filing
- 2019-02-11 KR KR1020207026469A patent/KR102466580B1/en active IP Right Grant
- 2019-02-12 TW TW108104581A patent/TWI780303B/en active
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