JPWO2018163883A1 - Polyethylene film for vapor deposition base material and vapor deposition film using the same - Google Patents

Abstract

An object of the present invention is to provide a polyethylene-based film for a deposition base material having excellent barrier properties even when the film is deposited using a large-scale deposition machine. A polyethylene-based film for use as a base material of the vapor-deposited layer, wherein the polyethylene-based film has at least a laminate layer that is a surface on the vapor-deposited layer side and a seal layer that is the other surface, and the seal layer is Wherein the Mohs hardness of the inorganic particles contained in the seal layer is 3 or less, and which satisfies at least one of the following (i) and (ii): It is a polyethylene film for a base material. (I) the average particle diameter of the inorganic particles contained in the seal layer is 5 μm or more and 15 μm or less (ii) the three-dimensional surface roughness SRa of the seal layer surface is 0.2 μm or less, and the seal layer The maximum peak height SRmax of the surface is 6 μm or less

Description

  The present invention relates to a polyethylene-based film for a deposition substrate using a polyethylene-based resin, and a deposited film in which a deposited layer is deposited on the polyethylene-based film.

  Evaporated polyethylene films are widely used for packaging materials such as food packaging and clothing packaging, gold and silver threads, labels, stickers, and reflective sheets.Several raw materials for evaporation have been proposed. ing.

  For example, Patent Literature 1 improves the slipperiness by using an inorganic antiblocking agent having a particle size of 2 to 5 μm while adding no organic lubricant, but the type of the antiblocking agent is not particularly limited. However, when zeolite is used as the anti-blocking agent as in the examples, when vapor deposition is performed on a long film containing zeolite, the barrier properties of the vapor-deposited film become insufficient.

  In recent years, vapor deposition machines have also been increasing in size. Therefore, even when a long and widened raw material for vapor deposition is subjected to vapor deposition using a large vapor deposition machine, the vapor deposition film is required to have a barrier property.

JP 2001-225409 A

  Even if the vapor deposition film, which has been subjected to vapor deposition using a large vapor deposition machine on a long and wide raw material for vapor deposition, has increased the tension to increase the adhesion to the cooling drum, An object of the present invention is to provide a polyethylene-based film for a vapor-deposited base material having excellent barrier properties even at a location where the winding is hard or at a location where the winding is hard at a core portion of a long winding. Another object is to provide a vapor deposition film using the polyethylene film for a vapor deposition substrate.

  The present inventors have conducted intensive studies and found that, in a polyethylene-based film for use as a base material for a vapor-deposited layer, the surface on the vapor-deposited layer side was a laminate layer, the other surface was a seal layer, and the seal layer had a predetermined hardness. (I) the average particle size of the inorganic particles is within a predetermined range and / or (ii) the sealing layer has a predetermined surface shape, so that the surface of the laminate layer is smooth. The inventors have found that a film can be obtained and that the above-mentioned problems can be solved, and the present invention has been completed.

Specifically, the present invention is a polyethylene-based film for use as a base material of a vapor-deposited layer, wherein the polyethylene-based film includes a laminate layer serving as a surface on the vapor-deposited layer side and a seal layer serving as the other surface. At least, the seal layer contains inorganic particles, and the Mohs hardness of the inorganic particles contained in the seal layer is 3 or less, and at least one of the following (i) and (ii): Characterized in that it is a polyethylene film for a vapor deposition base material characterized by satisfying the following.
(I) The average particle diameter of the inorganic particles contained in the seal layer is 5 μm or more and 15 μm or less. (Ii) The three-dimensional surface roughness SRa of the surface of the seal layer is 0.2 μm or less, and the seal layer The maximum peak height SRmax of the surface is 6 μm or less

The density of the polyethylene resin used for the laminate layer is 0.91~0.95g / cm ^3, the density of the polyethylene resin used in the sealing layer is 0.90~0.94g / cm ³ Is preferred.

  The content of the inorganic particles in the seal layer is preferably 0.5 to 3.0% by mass.

  Preferably, the three-dimensional surface roughness SRa of the surface of the seal layer is 0.2 μm or less, and the maximum peak height SRmax of the surface of the seal layer is 5 μm or less.

  It is preferable that the density of the polyethylene resin used for the laminate layer is higher than the density of the polyethylene resin used for the seal layer.

  The content of the inorganic particles in the laminate layer is preferably less than 0.1% by mass.

  It is preferable to have an intermediate layer interposed between the laminate layer and the seal layer.

  The present invention also includes a vapor-deposited film in which a vapor-deposited layer is vapor-deposited on the surface of a laminate layer of a polyethylene-based film for a vapor-deposited substrate.

  The polyethylene film of the present invention has excellent barrier properties over the entire length and the entire width even when the film is deposited at a high speed using a large-sized deposition machine.

  The film of the present invention is a polyethylene film to be used as a base material of a vapor deposition layer. The polyethylene-based film has at least a laminate layer (hereinafter, sometimes referred to as A layer) on the surface on the side of the vapor deposition layer and a seal layer (hereinafter, sometimes referred to as B layer) on the other surface. I have. It is preferable to have an intermediate layer interposed between the laminate layer and the seal layer. At least the laminate layer (A layer) and the seal layer (B layer) are formed from a polyethylene resin, and preferably, the intermediate layer is also formed from a polyethylene resin. The B layer contains predetermined inorganic particles described later. The thickness of the polyethylene film is preferably 300 μm or less, more preferably 10 μm or more and 200 μm or less, further preferably 20 μm or more and 100 μm or less, and particularly preferably 30 μm or more and 50 μm or less.

<Seal layer (B layer)>
(Polyethylene resin)
The polyethylene resin is a resin mainly composed of polyethylene, specifically, a resin in which the ethylene-derived component is more than 50% by mass and 100% by mass or less in 100% by mass of the polyethylene resin. The content of the ethylene-derived component is preferably from 60% by mass to 100% by mass, more preferably from 70% by mass to 100% by mass, and even more preferably from 80% by mass to 100% by mass. The polyethylene resin of the seal layer (B layer) is preferably low density polyethylene (LDPE), and more preferably linear low density polyethylene (LLDPE).

  The polyethylene resin may be a polyethylene obtained by polymerizing ethylene alone, or may be an ethylene / α-olefin copolymer obtained by copolymerizing ethylene and an α-olefin other than ethylene. Is preferably an ethylene / α-olefin copolymer. The ethylene / α-olefin copolymer is, specifically, an ethylene / α-olefin having one or two or more structural units derived from α-olefins other than ethylene as a main component and a structural unit derived from ethylene. It is a copolymer. The ethylene / α-olefin copolymer is preferably a linear ethylene / α-olefin copolymer.

The α-olefin other than ethylene which forms the linear ethylene / α-olefin copolymer used in the B layer is represented by the general formula R-CH = CH ₂ (wherein R represents an alkyl group having 1 to 14 carbon atoms). ), For example, propylene, 1-butene, 1-pentene, 1-hexene, 1-heptene, 1-octene, 1-nonene, 1-decene, 4-methyl-1-pentene, 4-methyl -1-hexene and the like. The α-olefin other than ethylene is preferably an α-olefin having 3 to 10 carbon atoms, and more preferably an α-olefin having 3 to 8 carbon atoms. The α-olefin other than ethylene may be one kind or two or more kinds.

  The polyethylene resin used in the layer B is preferably polyethylene (metallocene-catalyzed polyethylene) polymerized using a metallocene catalyst. Metallocene-catalyzed polyethylene has a narrower molecular weight distribution than polyethylene produced by other manufacturing methods such as polyethylene polymerized using a Ziegler-Natta catalyst, so it is necessary to suppress the transfer of low molecular weight components to the A layer. And a film having a smooth surface is obtained.

  The metallocene catalyst is not particularly limited, and includes a metallocene, that is, a transition metal component comprising a complex composed of two substituted or unsubstituted cyclopentadienyl rings and various transition metals, and an organoaluminum component, particularly an aluminoxane. And a known metallocene catalyst can be used.

Preferably the density of the polyethylene resin used in the layer B is 0.94 g / cm ³ or less, more preferably 0.90~0.94g / cm ^3, 0.90~0.93g / cm ³ , more preferably 0.90 to 0.92 g / cm ³ . By using a low-density polyethylene having a density of 0.94 g / cm ³ or less, the polyethylene-based film becomes a film excellent in vapor deposition workability in which wrinkles and bumps are hardly generated during vapor deposition. Further, by using low-density polyethylene, a low-temperature heat-sealing property (hereinafter, simply referred to as a laminate film) of a laminated film in which another film such as a polyethylene terephthalate film or a nylon film is further laminated on the deposited film (hereinafter, simply referred to as a laminate film). Simply referred to as low-temperature heat sealability). Furthermore, by using low-density polyethylene, adhesion (blocking) does not occur between films even when polyethylene films are stacked, and even if they occur, they can be easily peeled off (that is, excellent in anti-blocking properties). When the density of the polyethylene resin is less than 0.90 g / cm ³ , there is a possibility that the vapor deposition workability is reduced or the blocking resistance is reduced. If the density of the polyethylene resin exceeds 0.94 g / cm ³ , the low-temperature heat sealability may be insufficient.

  The polyethylene-based resin used for the layer B preferably has a melt flow rate (MFR) of 1 to 10 g / 10 min, more preferably 2 to 8 g / 10 min, and 3.5 to 6 g / 10 min. Is more preferred. If the MFR is less than 1 g / 10 min, the extrudability of the resin during film production is poor, and the film-forming properties may be poor. Further, when the MFR exceeds 10 g / 10 min, there is a possibility that the vapor deposition workability is reduced or the blocking resistance is reduced. In addition, in this specification, MFR is measured based on JISK7210.

  The melting point of the polyethylene resin used for the layer B is preferably 80 ° C. or higher, more preferably 100 ° C. or higher, further preferably 105 ° C. or higher, and particularly preferably 110 ° C. or higher. . When the melting point is lower than 80 ° C., blocking is easily caused. Although the upper limit of the melting point of the polyethylene resin is not particularly limited, it is, for example, 150 ° C. or lower, preferably 130 ° C. or lower. When the melting point is 150 ° C. or less, the film has excellent film-forming properties. When there are two or more melting point peaks, the highest temperature is determined as the melting point.

  Commercial products can also be used as the polyethylene resin used for the layer B, and examples thereof include Ube Maruzen Polyethylene Co., Ltd. Yumerit (registered trademark) 2040FC, 0540F, and Prime Polymer Co., Ltd. Evolue (registered trademark) SP2040. Can be

(Inorganic particles)
The Mohs hardness of the inorganic particles used in the layer B is 3 or less, preferably 2 or less. Projections are formed on the surface of the B layer with inorganic particles in order to impart slipperiness to the film, but when the hardness of the inorganic particles exceeds 3, when the vapor-deposited film is wound up on a roll, the protrusions are formed on the vapor-deposited layer. The transferred layer is likely to be deficient in the deposited layer, and the barrier property is reduced. Although the lower limit of the Mohs hardness of the inorganic particles is not particularly limited, it is, for example, 0.1 or more, and preferably 0.5 or more. Further, it is preferable that the Mohs hardness of the inorganic particles be equal to or less than the Mohs hardness of the vapor deposition material.
The Mohs hardness of the inorganic particles is 3 or less, the lower the Mohs hardness of the inorganic particles, the lower the protrusions formed on the B layer by the inorganic particles, even when strongly contacting the vapor deposition layer provided on the A layer side The protrusions are not easily penetrated through the vapor deposition layer, but are pushed into the vapor deposition layer so as to pierce the vapor deposition layer slowly. Therefore, a crack may be slightly generated in a portion where the vapor deposition layer is extended. However, even if a depression is formed in the vapor deposition layer due to the protrusion, the vapor deposition layer is likely to remain in a portion other than the portion where the crack occurs. Further, when another film such as a polyethylene terephthalate film or a polyamide film is laminated on the vapor deposition layer, a slight crack in the vapor deposition layer is closed, so that a high barrier property is obtained.
On the other hand, when the Mohs hardness of the inorganic particles exceeds 3, the projections penetrate the vapor deposition layer instantaneously, and the vapor deposition layer is pushed to the periphery of the hole formed by the projections, thereby deteriorating the barrier property. Laminating the other film on the layer does not restore the barrier properties.

  Examples of the inorganic particles include talc and calcium carbonate, and are not particularly limited as long as the inorganic particles have a Mohs hardness of 3 or less.

By satisfying at least one of the following (i) and (ii), the appearance and barrier properties of the film can be improved.
(I) The average particle diameter of the inorganic particles contained in the seal layer is 5 μm or more and 15 μm or less. (Ii) The three-dimensional surface roughness SRa of the surface of the seal layer is 0.2 μm or less, and the seal layer The maximum peak height SRmax of the surface is 6 μm or less

  By setting the average particle size of the inorganic particles used in the B layer to 5 μm or more and 15 μm or less, not only the appearance and barrier properties of the film but also the slipperiness and blocking resistance can be improved. The average particle size of the inorganic particles is preferably from 6 μm to 12 μm, and more preferably from 7 μm to 10 μm.

  Further, when the three-dimensional surface roughness SRa of the surface of the B layer is 0.2 μm or less and the maximum peak height SRmax of the surface of the B layer is 6 μm or less, both the appearance and the barrier properties of the film can be compatible. From the viewpoint of improving the barrier property, the three-dimensional surface roughness SRa is more preferably 0.05 to 0.17 μm, and further preferably 0.10 to 0.15 μm. Further, from the viewpoint of improving barrier properties and slipperiness, the maximum peak height SRmax is more preferably 5 μm or less, further preferably 1 to 5 μm, and particularly preferably 1 to 4.5 μm, Most preferably, it is 2 to 4.5 μm. The three-dimensional surface roughness SRa and the maximum peak height SRma can be adjusted by the average particle size of the inorganic particles and the amount added. The three-dimensional surface roughness SRa is a difference between the roughness surface and the center surface of the roughness surface in the height direction, and is an average value of the absolute values. The maximum peak height SRmax is the maximum of the roughness surface. The difference between the value and the minimum value.

  In order to satisfy the above surface roughness, the content of the inorganic particles in the B layer is preferably from 0.5 to 3.0% by mass. If the amount is less than 0.5% by mass, the barrier properties may be reduced, the blocking resistance may be reduced, and the processability for vapor deposition may be reduced. If the amount is more than 3.0% by mass, the appearance of the film may be deteriorated, or the polyester may be clogged when the polyester supplied to the extruder is melted and filtered by the filter. More preferably, the content of the inorganic particles is 1.0 to 2.0% by mass.

  The content of the organic lubricant in the B layer is preferably 0.2% by mass or less, and more preferably less than 0.1% by mass. When the content of the organic lubricant exceeds 0.2% by mass, the adhesiveness may be reduced when the laminate film is formed. Examples of the organic lubricant include unsaturated fatty acid amides such as oleic acid amide, erucic acid amide, stearic acid amide, behenic acid amide, ethylenebisoleic acid amide, ethylenebiserucic acid amide, and polymer wax. Further, in the layer B, the content of the organic lubricant is more preferably 0.05% by mass or less, and further preferably 0% by mass (the layer B contains no organic lubricant).

  In the polyethylene film of the present invention, the layer B can be used as a sealing layer of a packaging material. That is, a packaging material can be obtained by sealing the B layers. Therefore, the polyethylene film of the present invention preferably has low-temperature heat sealability.

<Laminate layer (layer A)>
(Polyethylene resin)
The polyethylene resin forming the laminate layer (layer A) is composed of the same monomer (polyethylene, α-olefin, etc.) as the polyethylene resin forming the seal layer (layer B), and the proportion of polyethylene is also the seal layer. It can be selected from the range equivalent to the range shown in (B layer).

  Further, similarly to the case of the layer B, the polyethylene resin of the layer A may be a polyethylene obtained by polymerizing only ethylene, and an ethylene obtained by copolymerizing ethylene and an α-olefin other than ethylene. -It may be an α-olefin copolymer, and preferably an ethylene-α-olefin copolymer. Specific examples of the α-olefin are the same as those of the B layer.

On the other hand, the density of the polyethylene resin used for the A layer can be selected from a range different from that of the B layer, and specifically, it is preferably 0.91 to 0.95 g / cm ³ , and the bleed out of the low molecular weight component is reduced. more preferably 0.92~0.95g / cm ³ from the viewpoint of, further preferably 0.925~0.94g / cm ^3, is 0.93~0.935g / cm ³ Is particularly preferred. When the density is out of the above range, there is a possibility that the metallic gloss (hereinafter, simply referred to as gloss) of the vapor-deposited layer may be reduced or the film may be curled. The density of the polyethylene used for the layer A is preferably higher than the density of the polyethylene used for the layer B, and the density of the polyethylene used for the layer A is 0.01 g / cm higher than the density of the polyethylene used for the layer B. It is more preferable that the height be ³ or more.

  The polyethylene resin used for the layer A preferably has a melt flow rate (MFR) of 1 to 10 g / 10 min, more preferably 2 to 8 g / 10 min, and more preferably 3.5 to 6 g / 10 min. Is more preferred. If the MFR is less than 1 g / 10 min, the extrudability of the resin during film production is poor, and the film-forming properties may be poor. Further, when the MFR exceeds 10 g / 10 min, the blocking resistance of the film may be reduced.

  The melting point of the polyethylene resin used for the layer A is preferably 110 ° C. or higher, more preferably 115 ° C. or higher, and even more preferably 120 ° C. or higher. When the melting point is lower than 110 ° C., the surface of the layer A is softened when forming the vapor deposition layer, and the glossiness of the vapor deposition layer may be reduced. Although the upper limit of the melting point of the polyethylene resin is not particularly limited, it is, for example, 160 ° C. or less, and preferably 140 ° C. or less. When the melting point is 160 ° C. or less, the film is excellent in film forming properties. When there are two or more melting point peaks, the highest temperature is determined as the melting point.

  The polyethylene resin used in the layer A is preferably a polyethylene polymerized using a metallocene catalyst (a metallocene catalyst-based polyethylene). Metallocene-catalyzed polyethylene has a narrower molecular weight distribution than polyethylene produced by other production methods such as polyethylene polymerized using a Ziegler-Natta catalyst, so that bleed-out of low molecular weight components can be reduced. The definition of the polyethylene resin is the same as that of the layer B.

  The content of the inorganic particles in the A layer is preferably less than 0.1% by mass. Further, the content of the organic lubricant in the A layer is preferably less than 0.1% by mass. Specific examples of the organic lubricant and the inorganic particles include the same as those described for the layer B. Further, in the A layer, the content of the organic lubricant and the inorganic particles is more preferably 0.05% by mass or less, respectively, and 0% (the A layer does not contain the organic lubricant and the inorganic particles). Is more preferred.

  As the polyethylene resin used for the A layer, a commercially available product can be used, and for example, Ube Maruzen Polyethylene Co., Ltd. Yumerit (registered trademark) 3540F, 4040FC and the like can be mentioned.

<Intermediate layer>
The polyethylene film of the present invention may have an intermediate layer between the A layer and the B layer if necessary, and preferably has one or more intermediate layers. The resin used for the intermediate layer is not particularly limited, but is preferably a polyethylene resin.
The polyethylene resin forming the intermediate layer is composed of the same monomer (polyethylene, α-olefin, etc.) as the polyethylene resin forming the sealing layer (B layer), and the ratio of polyethylene is also the sealing layer (B layer). Can be selected from the range equivalent to the range indicated by.

  As in the case of the layer B, the polyethylene resin of the intermediate layer may also be a polyethylene obtained by polymerizing ethylene alone, or an ethylene obtained by copolymerizing ethylene and an α-olefin other than ethylene. -It may be an α-olefin copolymer, and preferably an ethylene-α-olefin copolymer. Specific examples of the α-olefin are the same as those of the B layer. Further, the method for producing the polyethylene resin is the same as that for the B layer.

Preferably the density of the polyethylene resin is 0.94 g / cm ³ or less, it is more preferably 0.90~0.94g / cm ^3, a 0.90~0.93g / cm ³ More preferably, it is particularly preferably 0.90 to 0.92 g / cm ³ . The MFR, melting point and the like of the polyethylene resin in the intermediate layer can be set in the same range as in the B layer.

  The content of the organic lubricant and the content of the inorganic particles in the intermediate layer is preferably less than 0.1% by mass. Specific examples of the organic lubricant and the inorganic particles include the same as those described for the layer B. Further, the content of the organic lubricant and the inorganic particles in the intermediate layer is more preferably 0.05% by mass or less, respectively, and is 0% by mass (the intermediate layer does not contain the organic lubricant and the inorganic particles). Is more preferable.

<Film manufacturing method>
The polyethylene film of the present invention can be produced by, for example, forming a film by a melt extrusion molding method such as a T-die method or an inflation method, a cast molding method, a press molding method, or the like. In order to form a wide film, it is preferable to use a T-die method.

  As a method for laminating two or more layers, a coextrusion method is advantageous from the viewpoint of productivity, but the lamination method is not particularly limited as long as the performance can be maintained. In addition, a recovered raw material may be used to increase the smoothness of the layer A and to reduce the production cost.

  In the polyethylene film of the present invention, an antioxidant, a heat stabilizer, an ultraviolet ray inhibitor, an ultraviolet ray absorber, and a An agent may be added. However, when the above addition is performed to the composition for the layer A, the content of the inorganic particles in the layer A is controlled so as not to be 0.1% by mass or more.

  In order to increase the adhesion strength between the vapor deposited layer and the layer A, a known surface treatment may be performed before vapor deposition on the surface of the layer A of the film, for example, corona discharge treatment, flame treatment, plasma treatment, ozone treatment, etc. May be applied to the surface of the layer A. In the case of the above-mentioned surface treatment, the treatment is preferably performed so that the wetting tension measured according to JIS K 6768 after discharge is 37 mN / m or more, and more preferably 39 mN / m or more.

<Evaporation layer>
When a vapor deposition material is vapor-deposited on the surface of the layer A of the polyethylene film of the present invention, the surface of the layer A containing little or no inorganic particles is flat, so that a vapor deposition film having a dense vapor deposition layer is obtained. On the other hand, although there are protrusions due to the inorganic particles on the surface of the layer B, they are not steep protrusions but smooth protrusions. Therefore, even if the above-mentioned protrusions are transferred to the vapor deposition layer when the vapor deposition film is wound on a roll, the hardness of the inorganic particles is lower than the hardness of the vapor deposition material. can do. In addition, since the projections are provided on the surface of the layer B, the blocking between the layer B and the layer A hardly occurs. That is, since the blocking resistance is improved, the film is fed out from a film roll made of a film for a deposition base material. Thus, the vapor deposition processing can be performed smoothly, and wrinkles and bumps are less likely to occur on the obtained vapor deposition film.

  The method of depositing a deposition material on the polyethylene film of the present invention is not particularly limited, and may be performed using a known means.For example, by a continuous or batch vacuum deposition machine, electrothermal heating, sputtering, It can be performed by ion plating, ion beam or the like. The thickness of the vapor-deposited layer of the vapor-deposited film thus obtained is not particularly limited, but is generally several hundred angstroms or about 2 to 4 in terms of optical density (OD value) in terms of adhesiveness, durability, and economy. is there.

  The deposition material to be deposited on the surface of the layer A is preferably a metal. The metal is not particularly limited, and examples thereof include aluminum, gold, silver, copper, zinc, nickel, chromium, titanium, selenium, germanium, and tin, and include workability, gloss, safety, and cost. From the viewpoint, aluminum is preferred.

  This application claims the benefit of priority based on Japanese Patent Application No. 2017-043096 filed on March 7, 2017. The entire contents of the specification of Japanese Patent Application No. 2017-043096 filed on March 7, 2017 are incorporated herein by reference.

  Hereinafter, the present invention will be described in more detail with reference to Examples. However, the following Examples do not limit the present invention, and all modifications and changes within the scope of the present invention are included in the present invention.

  First, the measurement and evaluation methods used in the examples will be described below.

<Mohs hardness>
The Mohs hardness of the mineral before grinding as inorganic particles was determined from the Mohs hardness table. Specifically, the hardness of the measured object was determined by rubbing the mineral before grinding with a standard material having a lower hardness in order, and visually checking whether or not the measured object was damaged.

  The Mohs hardness was also measured by a method different from the above-mentioned judgment method. After the residue or film obtained by ashing the film was melted in a hot solvent, the Raman spectrum of the residue filtered with a filter was measured by the measurement method described below. Then, the corresponding Mohs hardness of the mineral was determined from the Mohs hardness table by Raman spectroscopy. The Mohs hardness determined by Raman spectroscopy was the same as the Mohs hardness of the mineral before grinding.

Microscopic Raman scattering measurement was performed using a laser Raman microscope, RAMAN-11 manufactured by Nanophoton, to obtain a Raman spectrum. The measurement conditions of the Raman scattering measurement were as follows, and the measurement was performed by adjusting the laser intensity with a filter so as to obtain an appropriate Raman scattering intensity.
<Measurement conditions for Raman scattering measurement>
Irradiation light wavelength: 532 nm
Aperture: 50μmΦ
Magnification of objective lens: 50 times Numerical aperture of objective lens: 0.6
Exposure time: 30 seconds Number of exposures (total number of times): 2

<Average particle size>
The average particle diameter of the inorganic particles was measured by a wet method using a laser diffraction particle size distribution analyzer (SALD-3100 manufactured by Shimadzu Corporation) on a volume distribution basis.

<Density>
The density of the polyethylene resin was measured with a melt indexer extrudate according to JIS K 6922-1.

<Surface roughness>
Based on JIS B 0601, using a three-dimensional surface roughness meter (Surforder ET4000A manufactured by Kosaka Laboratories Co., Ltd.), cutoff 0.08 mm, 1 μm length, 100 measurements at 2 μm pitch, B layer surface Was determined for the three-dimensional surface roughness SRa and the maximum height SRmax.

<Blocking resistance>
A polyethylene-based film having a size of 12 cm × 10 cm was superposed on the surface of the layer B and the surface of the layer A, and a sheet of paper having a size of 10 cm × 10 cm was placed as one set. I sandwiched it between glass plates. A 50 kg load was applied on this glass plate and left at 40 ° C. for 48 hours. After returning to room temperature, the laminate was cut to a width of 25 mm. Using an Autograph (registered trademark) manufactured by Shimadzu Corporation, the peel strength (unit: N / 25 mm) when the cut laminate was peeled at 180 ° at a tensile speed of 200 mm / min was measured, and according to the following criteria. evaluated.
◎: 0.2 N / 25 mm or less ○: More than 0.2 N / 25 mm or less 0.5 N / 25 mm or less Δ: More than 0.5 N / 25 mm or less 1 N / 25 mm ×: More than 1 N / 25 mm

<Glossiness of vapor deposition layer>
Using a gloss meter (Model VG2000 manufactured by Nippon Denshoku Industries Co., Ltd.), the metal glossiness of the deposited layer in the deposited film was measured in accordance with JIS K5600-4-7, and evaluated according to the following criteria.
◎: 1000% or more ○: 700% or more and less than 1000% Δ: 500% or more and less than 700% ×: less than 500%

<Peel strength of laminate film (adhesion)>
TM569 / CAT10L, an adhesive manufactured by Toy Morton Co., Ltd. was applied to a 15 μm-thick nylon film (“N1100” manufactured by Toyobo Co., Ltd.) at a solid content of 3 g / m ² . Next, after laminating the vapor-deposited surface of the vapor-deposited film on the adhesive to form a laminate film, aging was performed at 40 ° C. for 48 hours. Using a tensile tester (Autograph (registered trademark) AGS-J 100NJ manufactured by Shimadzu Corporation), the aging was performed at a tensile speed of 200 mm / min. The peel strength (unit: N / 15 mm) was measured.

<Evaporation processability>
Using a vapor-deposited film, a roll of 500 m was produced. The state of the vapor-deposited film of the obtained roll was observed and evaluated as follows.
◎: Wrinkles and bumps were hardly generated. ○: Wrinkles and bumps were slightly generated. △: Many wrinkles and bumps were generated. X: Wrinkles and bumps were extremely generated.

<Oxygen permeability of evaporated film>
Using a vapor-deposited film, a roll of 500 m was produced. Next, the roll hardness was measured at a pitch of 2 cm in the width direction of the roll having a length of 500 m using a Palo tester manufactured by Prosec. Subsequently, a sample was taken out from a portion where the roll hardness was 600 to 650. Finally, according to JIS K 7126-2A method, the oxygen permeability of the above sample was measured at a temperature of 23 ° C. and a humidity of 65% using an oxygen permeability measuring device (OX-TRAN 2/21 manufactured by MOCON). A measurement was made. At the time of measuring the oxygen permeability, the layer B, which was the non-deposited surface, was mounted so as to be on the humidity control side.

<Water vapor permeability of vapor deposited film>
Using a vapor-deposited film, a roll of 500 m was produced. Next, the roll hardness was measured at a pitch of 2 cm in the width direction of the roll having a length of 500 m using a Palo tester manufactured by Prosec. Subsequently, a sample was taken out from a portion where the roll hardness was 600 to 650. Finally, using a water vapor permeability measuring device (PERMATRAN-W3 / 33 manufactured by MOCON) according to JIS K 7129B method, measuring the water vapor permeability of the deposited film at a temperature of 37.8 ° C. and a humidity of 90%. Was done. At the time of measuring the water vapor transmission rate, the layer B, which is the non-evaporated surface, was mounted on the high humidity side.

<Low temperature heat sealability of laminated film after aging>
Using a vapor-deposited film, a roll of 500 m was prepared, and then left for one month in a 30 ° C. environment. Next, TM569 / CAT10L, an adhesive manufactured by Toy Morton Co., Ltd., was applied to a 15 μm-thick nylon film (“N1100” manufactured by Toyobo Co., Ltd.) at a solid content of 3 g / m ² . Subsequently, after laminating the vapor-deposited surface of the vapor-deposited film left for one month on the adhesive to form a laminate film, the film was aged at 40 ° C. for 48 hours. Finally, the layer A of the aged laminated film was heat-sealed at a sealing temperature of 150 ° C., a sealing pressure of 0.2 MPa and a sealing time of 1 second, and then the laminated film was cut into a 15 mm width. The peel strength between the vapor deposited layer and the A layer when the cut laminate film was peeled at 180 ° at a tensile speed of 200 mm / min with a tensile tester (Autograph (registered trademark) AGS-J 100NJ manufactured by Shimadzu Corporation). The unit was N / 15 mm).

(Example 1)
[Composition for Layer B]
Sumitomo Chemical Sumikasen (registered trademark) EFV402 (metallocene catalyst-based LLDPE, density: 0.913 g / cm ³ , MFR: 3.8 g / 10 min, melting point: 116 ° C.), talc having a Mohs hardness of 1 and an average particle size of 8 μm. Were mixed to prepare a master batch containing 15% by mass of talc. Next, 90% by mass of Umerit (registered trademark) 2040FC (metallocene catalyst-based LLDPE, density: 0.918 g / cm ³ , MFR: 4.0 g / 10 min, melting point: 116 ° C.) manufactured by Ube Maruzen Polyethylene Co., Ltd. A composition for layer B was prepared using a composition obtained by mixing 10% by mass. Although talc was contained in 1.5% by mass in 100% by mass of the composition for B layer, no organic lubricant was added to the composition for B layer.
[Composition for Layer A]
A composition for layer A was prepared using only Umerit (registered trademark) 3540FC (metallocene catalyst-based LLDPE, density: 0.931 g / cm ³ , MFR: 4.0 g / 10 min, melting point: 123 ° C.) manufactured by Ube Maruzen Polyethylene Co., Ltd. did. In addition, no inorganic particles and no organic lubricant were added to the composition for layer A.
[Composition for intermediate layer]
A composition for an intermediate layer was prepared using only Umerit (registered trademark) 2040FC (metallocene catalyst-based LLDPE, density: 0.931 g / cm ³ , MFR: 4.0 g / 10 min, melting point: 123 ° C.) manufactured by Ube Maruzen Polyethylene Co., Ltd. did. In addition, the inorganic particles and the organic lubricant were not added to the composition for the intermediate layer.

  The composition for the A layer, the composition for the intermediate layer, and the composition for the B layer, using an extruder having a T die, in order of the composition for the A layer, the composition for the intermediate layer, and the composition for the B layer. The mixture was melt-extruded at 240 ° C. so that the thickness ratio of the layer A, the intermediate layer and the layer B was 1: 1: 2. Thereafter, the surface of the layer A was subjected to a corona discharge treatment. Subsequently, the film was wound on a roll at a speed of 150 m / min to obtain a laminated film having a thickness of 40 μm and a wet tension of the treated surface of 45 mN / m.

Next, the roll of the obtained laminated film was set in a vacuum vapor deposition machine, aluminum was vapor-deposited on the corona-treated surface of the laminated film at a degree of vacuum of 10 ⁻⁴ torr or less, and the roll was wound up to have an aluminum vapor-deposited layer. A vapor-deposited film was obtained. The thickness of the aluminum vapor-deposited layer was adjusted so that the optical density (OD value) became 3. The Mohs hardness of aluminum is 2.75.

The evaluation results of this film are shown in Table 1. The three-dimensional surface roughness SRa was 0.12 μm, and the maximum height SRmax was 4.3 μm. The deposited film of Example 1 has an increased perforation of the deposited layer due to the transfer of the inorganic particles even at a portion where the winding hardness is high (where the hardness is 600 to 650 as measured by a Palo tester) (a surface layer and a winding hardness using a high-brightness LED light). The defect status was compared with that of the low-density part), and the barrier property was excellent. Further, the vapor-deposited film of Example 1 exhibited a value equivalent to the oxygen barrier property of a film obtained by vapor-depositing aluminum on a biaxially stretched nylon film.
Furthermore, the laminated film of Example 1 was excellent in blocking resistance, and the vapor-deposited film of Example 1 was excellent in vapor-depositing processability and gloss. Moreover, the laminated film produced using the vapor-deposited film of Example 1 was excellent in adhesion and low-temperature heat sealability.

(Example 2)
A laminated film and a vapor-deposited film were obtained in the same manner as in Example 1, except that the amount of talc added in the composition for layer B was 0.5% by mass. Although the blocking resistance and the vapor deposition workability were slightly inferior to those in Example 1, the performance was sufficiently high. Further, it had excellent barrier properties, glossiness, adhesion, and low-temperature heat sealability.

(Example 3)
A laminated film was produced in the same manner as in Example 1, except that the inorganic particles contained in the composition for layer B were changed from talc to CUBE-80KAS (calcium carbonate particles having a Mohs hardness of 3 and an average particle size of 8 μm) manufactured by Maruo Calcium Co., Ltd. A vapor-deposited film was obtained. Also in Example 3, the barrier properties, the blocking resistance, the vapor deposition processability, the gloss, the adhesion, and the low-temperature heat sealability were excellent.

(Example 4)
The resin contained in the composition for layer B was changed from Ube Maruzen Polyethylene Co., Ltd. Yumerit (registered trademark) 2040FC to Ube Maruzen Polyethylene Co., Ltd. Yumerit (registered trademark) 0540F (density: 0.904 g / cm ³ , MFR: 4.0 g / 10 min). , Melting point: 111 ° C) to obtain a laminated film and a vapor-deposited film in the same manner as in Example 1. Also in Example 4, the barrier properties, the blocking resistance, the vapor deposition processability, the gloss, the adhesion, and the low-temperature heat sealability were excellent.

(Example 5)
The resin contained in the composition for the layer A is changed from Ube Maruzen Polyethylene Co., Ltd. Yumerit (registered trademark) 3540FC to Ube Maruzen Polyethylene Co., Ltd. Yumerit (registered trademark) 4040FC (density: 0.938 g / cm ³ , MFR: 3.5 g / 10 min). , Melting point: 126 ° C) to obtain a laminated film and a vapor-deposited film in the same manner as in Example 1. The gloss was inferior to that of Example 1, but the performance was sufficiently high. Further, it had excellent barrier properties, blocking resistance, vapor deposition workability, adhesion, and low-temperature heat sealability.

(Example 6)
Composition for layer B using a composition obtained by mixing 89.9% by mass of Umerit (registered trademark) 2040FC manufactured by Ube Maruzen Polyethylene Co., 0.1% by mass of erucamide as an organic lubricant, and 10% by mass of the above master batch. A laminated film and a vapor-deposited film were obtained in the same manner as in Example 1 except that a product was produced. Also in Example 6, the barrier properties, blocking resistance, vapor deposition processability, glossiness, and low-temperature heat sealability were excellent.

(Example 7)
The resin contained in the composition for layer B was converted from Ube Maruzen Polyethylene Co., Ltd. Yumerit (registered trademark) 2040FC to Sumitomo Chemical Co., Ltd. Exelen (registered trademark) FX307 (density: 0.89 g / cm ³ , MFR: 3.2 g / 10 min, (Melting point: 83 ° C.) A laminated film and a vapor-deposited film were obtained in the same manner as in Example 1 except that the temperature was changed to 83 ° C.). The gloss was inferior to that of Example 1, but the performance was sufficiently high. Further, it had excellent barrier properties, adhesion properties, and low-temperature heat sealability.

(Example 8)
A laminated film was obtained in the same manner as in Example 1. High adhesion aluminum vapor deposition was performed on the laminated film obtained in Example 1 to obtain a vapor deposited film. Specifically, without performing corona treatment on the surface of the layer A, introducing argon into a low-temperature plasma treatment device in a vacuum evaporation machine, performing plasma discharge treatment, and then performing a laminated film at a degree of vacuum of 10 ⁻⁴ torr or less. A vapor-deposited film having an aluminum vapor-deposited layer was obtained in the same manner as in Example 1 except that aluminum was vapor-deposited on the plasma-treated surface of Example 1. Also in Example 8, the barrier properties, the blocking resistance, the vapor deposition processability, the gloss, the adhesion, and the low-temperature heat sealability were excellent, and the barrier properties and the adhesion were more excellent than those in Example 1.

(Comparative Example 1)
A laminated film and a vapor-deposited film were obtained in the same manner as in Example 1 except that the inorganic particles contained in the composition for layer B were changed from talc to zeolite having a Mohs hardness of 4 and an average particle size of 5 μm. The three-dimensional surface roughness SRa and the maximum height SRmax were almost the same as those in Example 1, but a significant decrease in the barrier properties of a vapor-deposited film having a roll hardness of 600 or more and 650 or less was observed.

(Comparative Example 2)
A laminated film and a vapor-deposited film were obtained in the same manner as in Example 1 except that the inorganic particles contained in the composition for layer B were changed from talc to amorphous silica having a Mohs hardness of 7 and an average particle size of 5 μm. The three-dimensional surface roughness SRa and the maximum height SRmax were almost the same as those in Example 1, but a significant decrease in the barrier properties of a vapor-deposited film having a roll hardness of 600 or more and 650 or less was observed.

(Comparative Example 3)
A laminated film and a vapor-deposited film were obtained in the same manner as in Example 1, except that the average particle size of talc contained in the composition for layer B was changed to 20 μm. The oxygen barrier properties of the deposited film having a roll hardness of 600 or more and 650 or less were significantly reduced, and the gloss of the deposited layer was also low.

  Table 1 shows the structures and various physical properties of Examples and Comparative Examples.

  The polyethylene film for a vapor deposition base material of the present invention has excellent barrier properties over the entire length and width even when vapor-deposited at a high speed using a large vapor deposition machine having a winding length exceeding 10,000 m. It is also highly industrial and highly useful. Therefore, it can be used as an industrial material in addition to packaging materials for foods, medicines, miscellaneous goods, and the like.

Claims (10)

A polyethylene film for use as a base material for the vapor deposition layer,
The polyethylene film has at least a laminate layer serving as a surface on the side of the vapor deposition layer and a seal layer serving as the other surface,
The seal layer contains inorganic particles, and the Mohs hardness of the inorganic particles contained in the seal layer is 3 or less, and satisfies at least one of the following (i) and (ii): Characteristic polyethylene film for vapor deposition substrate.
(I) The average particle diameter of the inorganic particles contained in the seal layer is 5 μm or more and 15 μm or less. (Ii) The three-dimensional surface roughness SRa of the surface of the seal layer is 0.2 μm or less, and the seal layer The maximum peak height SRmax of the surface is 6 μm or less A polyethylene film for use as a base material for the vapor deposition layer,
The polyethylene film has at least a laminate layer serving as a surface on the side of the vapor deposition layer and a seal layer serving as the other surface,
The seal layer contains inorganic particles, Mohs hardness of the inorganic particles contained in the seal layer is 3 or less, and the average particle size of the inorganic particles contained in the seal layer is A polyethylene film for a deposition base material having a thickness of 5 μm or more and 15 μm or less. A polyethylene film for use as a base material for the vapor deposition layer,
The polyethylene film has at least a laminate layer serving as a surface on the side of the vapor deposition layer and a seal layer serving as the other surface,
The seal layer contains inorganic particles, the Mohs hardness of the inorganic particles contained in the seal layer is 3 or less, and the three-dimensional surface roughness SRa of the seal layer surface is 0.2 μm or less. Wherein the maximum peak height SRmax of the surface of the seal layer is 6 μm or less. Claims density polyethylene resin used in the laminate layer is 0.91~0.95g / cm ^3, the density of the polyethylene resin used in the sealing layer is 0.90~0.94g / cm ³ Item 4. The polyethylene film for a deposition substrate according to any one of Items 1 to 3.   The polyethylene film for a vapor deposition substrate according to any one of claims 1 to 4, wherein the content of the inorganic particles in the seal layer is 0.5 to 3.0% by mass.   The three-dimensional surface roughness SRa of the surface of the seal layer is 0.2 μm or less, and the maximum peak height SRmax of the surface of the seal layer is 5 μm or less, for a deposition substrate according to any one of claims 1 to 5. Polyethylene film.   The polyethylene film for a vapor deposition substrate according to any one of claims 1 to 6, wherein the density of the polyethylene resin used for the laminate layer is higher than the density of the polyethylene resin used for the seal layer.   The polyethylene film for a deposition substrate according to any one of claims 1 to 7, wherein the content of the inorganic particles in the laminate layer is less than 0.1% by mass.   The polyethylene film for a deposition substrate according to any one of claims 1 to 8, further comprising an intermediate layer interposed between the laminate layer and the seal layer.   A vapor-deposited film in which a vapor-deposited layer is vapor-deposited on the surface of a laminate layer of the polyethylene film for a vapor-deposited substrate according to any one of claims 1 to 9.