JPWO2017150382A1 - 面発光レーザ - Google Patents
面発光レーザ Download PDFInfo
- Publication number
- JPWO2017150382A1 JPWO2017150382A1 JP2018503106A JP2018503106A JPWO2017150382A1 JP WO2017150382 A1 JPWO2017150382 A1 JP WO2017150382A1 JP 2018503106 A JP2018503106 A JP 2018503106A JP 2018503106 A JP2018503106 A JP 2018503106A JP WO2017150382 A1 JPWO2017150382 A1 JP WO2017150382A1
- Authority
- JP
- Japan
- Prior art keywords
- emitting laser
- surface emitting
- seed light
- output unit
- vcsel structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000010355 oscillation Effects 0.000 claims abstract description 25
- 230000001427 coherent effect Effects 0.000 claims abstract description 6
- 230000003287 optical effect Effects 0.000 claims description 17
- 239000002131 composite material Substances 0.000 claims description 5
- 230000008878 coupling Effects 0.000 abstract description 8
- 238000010168 coupling process Methods 0.000 abstract description 8
- 238000005859 coupling reaction Methods 0.000 abstract description 8
- 230000000644 propagated effect Effects 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 description 10
- 230000003321 amplification Effects 0.000 description 9
- 238000010586 diagram Methods 0.000 description 9
- 238000003199 nucleic acid amplification method Methods 0.000 description 9
- 239000000758 substrate Substances 0.000 description 8
- 238000004088 simulation Methods 0.000 description 7
- 238000002474 experimental method Methods 0.000 description 4
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- 230000002269 spontaneous effect Effects 0.000 description 4
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000003595 spectral effect Effects 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 229910000980 Aluminium gallium arsenide Inorganic materials 0.000 description 2
- FTWRSWRBSVXQPI-UHFFFAOYSA-N alumanylidynearsane;gallanylidynearsane Chemical compound [As]#[Al].[As]#[Ga] FTWRSWRBSVXQPI-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000012014 optical coherence tomography Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 1
- KXNLCSXBJCPWGL-UHFFFAOYSA-N [Ga].[As].[In] Chemical compound [Ga].[As].[In] KXNLCSXBJCPWGL-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000004038 photonic crystal Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 238000003325 tomography Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18358—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] containing spacer layers to adjust the phase of the light wave in the cavity
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34313—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer having only As as V-compound, e.g. AlGaAs, InGaAs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4006—Injection locking
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/42—Arrays of surface emitting lasers
- H01S5/423—Arrays of surface emitting lasers having a vertical cavity
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/50—Amplifier structures not provided for in groups H01S5/02 - H01S5/30
- H01S5/5063—Amplifier structures not provided for in groups H01S5/02 - H01S5/30 operating above threshold
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
- H01S5/0265—Intensity modulators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18344—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] characterized by the mesa, e.g. dimensions or shape of the mesa
- H01S5/1835—Non-circular mesa
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18361—Structure of the reflectors, e.g. hybrid mirrors
- H01S5/18363—Structure of the reflectors, e.g. hybrid mirrors comprising air layers
- H01S5/18366—Membrane DBR, i.e. a movable DBR on top of the VCSEL
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18361—Structure of the reflectors, e.g. hybrid mirrors
- H01S5/18375—Structure of the reflectors, e.g. hybrid mirrors based on metal reflectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18361—Structure of the reflectors, e.g. hybrid mirrors
- H01S5/18377—Structure of the reflectors, e.g. hybrid mirrors comprising layers of different kind of materials, e.g. combinations of semiconducting with dielectric or metallic layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/50—Amplifier structures not provided for in groups H01S5/02 - H01S5/30
- H01S5/5045—Amplifier structures not provided for in groups H01S5/02 - H01S5/30 the arrangement having a frequency filtering function
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Abstract
Description
なお、本明細書における上下、横方向、水平方向、垂直方向は、実動作時における方向とは無関係な便宜的なものである。
はじめに実施の形態に係る面発光レーザの概要を説明する。この面発光レーザは、横長のVCSEL(垂直共振器面発光レーザ)構造の出力部を備える。出力部は、発振しきい値より大きな電流が注入された発振状態で動作する。出力部は、VCSEL構造の長手方向の一端にコヒーレントなシード光を受け、シード光をVCSEL構造内で垂直方向に多重反射させながら、VCSEL構造の長手方向にスローライト伝搬させ、VCSEL構造の上面から出力光を取り出す。
図1は、実施の形態に係る面発光レーザ1の断面図である。この面発光レーザ1は、第1の面発光レーザ(以下、シード光源2と称する)と第2の面発光レーザ(以下、出力部4と称する)を、同一半導体基板上に、横方向に形成したものである。概要で述べたように出力部4は、横長のVCSEL(垂直共振器面発光レーザ)構造40を有している。出力部4の長さは、シード光源2の長さの1000倍程度としてもよい。VCSEL構造40は、半導体基板10上に形成された下部DBR(Distributed Bragg Reflector)26、活性層42、上部DBR44を備える。
図6は、第1実施例に係る面発光レーザ1aの断面図である。この面発光レーザ1aにおいて、シード光源2aおよび出力部4aのVCSEL構造20,40は、エアギャップ層28,48を有し、マイクロマシン構造、いわゆるMEMS(Micro Electro Mechanical Systems)構造により、シード光源2a側のエアギャップ層28の厚みが可変に構成される。エアギャップ層28の厚みを変化させることで、高反射ミラー30の位置を制御でき、これによりシード光源2aのキャビティ長が変化し、発振波長λ1を短くできる。なお以降の図では、駆動回路5を省略する。
図7は、第2実施例に係る面発光レーザ1bの断面図である。この面発光レーザ1bにおいて、出力部4bのVCSEL構造40の上部DBR44は、シード光源2bのVCSEL構造の上部DBR24よりも層数が多くてもよい。上部DBR44と上部DBR24の差分は、位相制御層52として示されている。位相制御層52は、選択成長によって形成することができる。第2実施例によれば、出力部4bのキャビティ長を長くすることにより、λ1<λ2を実現できる。
図8は、第3実施例に係る面発光レーザ1cの断面図である。この面発光レーザ1cにおいて、シード光源2cのVCSEL構造20は、低屈折率層54を含む。低屈折率層54は、上部DBR24の一部であり、選択酸化により形成することができる。上部DBR24の一部の層の屈折率を低く形成することにより、シード光源2cの実効的なキャビティ長を短くでき、λ1<λ2を実現できる。
図9は、第4実施例に係る面発光レーザ1dの平面図である。この面発光レーザ1dにおいて、シード光源2dは複合共振器構造を有する。複合共振器は、酸化開口56の形状によって設計できる。複合共振器の干渉状態を制御することにより、具体的には、2個の共振器のFSR(自由スペクトル間隔)を異ならしめることによって、シード光源2dの波長を変調し(バーニア効果)、λ1<λ2とすることができる。
図5に示したように、出力部4の横方向の長さLを長くするほど、高出力を取り出すことが可能である。図10は、第5実施例に係る面発光レーザ1eのレイアウト図である。出力部4eは、2次元的にレイアウトされる。たとえば出力部4eは、ジグザグに折り曲げられており、これにより長さLが伸ばされている。図4(c)に示したように、出力部4eからは、広がり角のきわめて小さな出力光L2を得ることができ、したがって出力部4eを2次元的に配置することで、2次元的狭出射で高出力なビームを生成できる。このようなビームは、レンズやミラー等の光学系8で集光することにより、回折限界近くまで絞ることも可能であり、多くの用途が期待される。
図11は、第6実施例に係る面発光レーザ1fの断面構造を示す図である。この実施例では、活性層42を構成する光閉じ込め層の屈折率が、上部DBR層44、下部DBR層46の平均屈折率よりも小さくなっている。これにより、全反射による導波モードをカットオフにすることができる。導波モードをカットオフにすることで、導波モードによる横方向の寄生発振、あるいは増幅自然放出光L4の成長によるエネルギーの消費を抑制することができる。その結果、当該面発光レーザの長さを長くすることで、面発光レーザからの出力光を増大できる。
シード光源2と出力部4は必ずしも集積化される必要はなく、図3に示したように、それらは分離していてもよい。
Claims (10)
- 横長のVCSEL(垂直共振器面発光レーザ)構造の出力部と、
前記VCSEL構造に、発振しきい値より大きな電流を注入し、発振状態を維持する駆動回路と、
を備え、
前記出力部は、前記VCSEL構造の長手方向の一端にコヒーレントなシード光を受け、前記シード光を前記VCSEL構造内で垂直方向に多重反射させながら、前記VCSEL構造の長手方向にスローライト伝搬させ、前記VCSEL構造の上面から出力光を取り出すことを特徴とする面発光レーザ。 - 前記シード光の波長λ1と前記出力部のVCSEL構造の発振波長λ2は、λ1≠λ2を満たすことを特徴とする請求項1に記載の面発光レーザ。
- 前記シード光を生成するシード光源は、前記出力部と前記VCSEL構造を共有して前記長手方向に隣接して集積化されることを特徴とする請求項1に記載の面発光レーザ。
- 前記シード光の波長λ1と前記出力部のVCSEL構造の発振波長λ2は、λ1<λ2を満たすことを特徴とする請求項3に記載の面発光レーザ。
- 前記シード光源および前記出力部の前記VCSEL構造は、エアギャップ層を有し、マイクロマシン構造により、前記シード光源側の前記エアギャップ層の厚みが可変に構成されることを特徴とする請求項3または4に記載の面発光レーザ。
- 前記出力部の前記VCSEL構造の上部DBR(Distributed Bragg Reflector)は、前記シード光源の前記VCSEL構造の上部DBRよりも層数が多いことを特徴とする請求項3または4に記載の面発光レーザ。
- 前記シード光源の前記VCSEL構造は、低屈折率層を含むことを特徴とする請求項3または4に記載の面発光レーザ。
- 前記シード光源は、複合共振器構造を有することを特徴とする請求項3または4に記載の面発光レーザ。
- 前記出力部は、ジグザグに折り曲げられていることを特徴とする請求項1から8のいずれかに記載の面発光レーザ。
- 前記活性層VCSEL構造を構成する光閉じ込め層の屈折率は、前記上部DBR、前記下部DBRの平均屈折率よりも小さく、全反射による導波モードをカットオフにすることを特徴とする請求項1に記載の面発光レーザ。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016037272 | 2016-02-29 | ||
JP2016037272 | 2016-02-29 | ||
PCT/JP2017/007164 WO2017150382A1 (ja) | 2016-02-29 | 2017-02-24 | 面発光レーザ |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2017150382A1 true JPWO2017150382A1 (ja) | 2018-12-20 |
JP6716142B2 JP6716142B2 (ja) | 2020-07-01 |
Family
ID=59743006
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018503106A Active JP6716142B2 (ja) | 2016-02-29 | 2017-02-24 | 面発光レーザ |
Country Status (4)
Country | Link |
---|---|
US (1) | US20210194205A1 (ja) |
EP (1) | EP3425755B1 (ja) |
JP (1) | JP6716142B2 (ja) |
WO (1) | WO2017150382A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019046880A (ja) * | 2017-08-30 | 2019-03-22 | 国立大学法人東京工業大学 | 面発光レーザ |
JP7011290B2 (ja) * | 2017-10-13 | 2022-01-26 | 国立大学法人東京工業大学 | 3次元計測用プロジェクタおよび3次元計測装置 |
JP7408924B2 (ja) * | 2018-06-19 | 2024-01-09 | 富士フイルムビジネスイノベーション株式会社 | 半導体光増幅器、光出力装置、および距離計測装置 |
JP7239920B2 (ja) * | 2019-03-01 | 2023-03-15 | 富士フイルムビジネスイノベーション株式会社 | 半導体光増幅素子、半導体光増幅器、光出力装置、および距離計測装置 |
CN111478180B (zh) * | 2020-04-23 | 2022-06-10 | 西安电子科技大学 | 片上集成慢光波导的半导体激光器 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040012845A1 (en) * | 2002-07-19 | 2004-01-22 | Gazillion Bits, Inc. | Semiconductor optical amplifier using energy from single-transverse-mode VCSELs to amplify optical signal |
JP2012049180A (ja) * | 2010-08-24 | 2012-03-08 | Tokyo Institute Of Technology | 面発光型半導体レーザおよび光伝送装置 |
JP2013045803A (ja) * | 2011-08-22 | 2013-03-04 | Fuji Xerox Co Ltd | 半導体レーザおよび光伝送装置 |
JP2015032801A (ja) * | 2013-08-07 | 2015-02-16 | 国立大学法人東京工業大学 | 面発光型半導体レーザおよび光伝送装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6175436B1 (en) * | 1996-07-30 | 2001-01-16 | Tellium, Inc. | Automatic feedback gain control for multiple channels in a doped optical fiber amplifier |
US7453629B2 (en) * | 2005-12-29 | 2008-11-18 | Lucent Technologies Inc. | Semiconductor optical amplifier pulse reshaper |
JP7031856B2 (ja) * | 2018-02-14 | 2022-03-08 | 国立大学法人東京工業大学 | ビーム偏向デバイス |
JP7147356B2 (ja) * | 2018-08-14 | 2022-10-05 | 富士フイルムビジネスイノベーション株式会社 | 半導体光増幅器 |
-
2017
- 2017-02-24 JP JP2018503106A patent/JP6716142B2/ja active Active
- 2017-02-24 US US16/080,805 patent/US20210194205A1/en active Pending
- 2017-02-24 WO PCT/JP2017/007164 patent/WO2017150382A1/ja active Application Filing
- 2017-02-24 EP EP17759848.9A patent/EP3425755B1/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040012845A1 (en) * | 2002-07-19 | 2004-01-22 | Gazillion Bits, Inc. | Semiconductor optical amplifier using energy from single-transverse-mode VCSELs to amplify optical signal |
JP2012049180A (ja) * | 2010-08-24 | 2012-03-08 | Tokyo Institute Of Technology | 面発光型半導体レーザおよび光伝送装置 |
JP2013045803A (ja) * | 2011-08-22 | 2013-03-04 | Fuji Xerox Co Ltd | 半導体レーザおよび光伝送装置 |
JP2015032801A (ja) * | 2013-08-07 | 2015-02-16 | 国立大学法人東京工業大学 | 面発光型半導体レーザおよび光伝送装置 |
Also Published As
Publication number | Publication date |
---|---|
EP3425755A4 (en) | 2019-10-23 |
WO2017150382A1 (ja) | 2017-09-08 |
US20210194205A1 (en) | 2021-06-24 |
EP3425755C0 (en) | 2023-08-09 |
EP3425755A1 (en) | 2019-01-09 |
EP3425755B1 (en) | 2023-08-09 |
JP6716142B2 (ja) | 2020-07-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6716142B2 (ja) | 面発光レーザ | |
Spott et al. | Heterogeneous integration for mid-infrared silicon photonics | |
Kuznetsov et al. | Design and characteristics of high-power (> 0.5-W CW) diode-pumped vertical-external-cavity surface-emitting semiconductor lasers with circular TEM/sub 00/beams | |
US6424669B1 (en) | Integrated optically pumped vertical cavity surface emitting laser | |
TWI559067B (zh) | 展開式雷射振盪波導 | |
US6611544B1 (en) | Method and apparatus for narrow bandwidth distributed bragg reflector semiconductor lasers | |
EP3259812B1 (en) | Chip-scale power scalable ultraviolet optical source | |
JP2012517705A (ja) | ハイブリッド垂直キャビティレーザー | |
US9337615B2 (en) | Vertical cavity surface emitting laser cavity with low thermal impedance | |
US6600765B2 (en) | High-power coherent arrays of vertical cavity surface-emitting semiconducting lasers | |
Nakahama et al. | Slow light VCSEL amplifier for high-resolution beam steering and high-power operations | |
Zhou et al. | Progress on high-power high-brightness VCSELs and applications | |
JP6662790B2 (ja) | 光増幅器 | |
US10283937B2 (en) | Optoelectronic device with enhanced lateral leakage of high order transverse optical modes into alloy-intermixed regions and method of making same | |
Ogrodowski et al. | Tapered amplifiers for high-power MOPA setups between 750 nm and 2000 nm | |
US9373936B1 (en) | Resonant active grating mirror for surface emitting lasers | |
US10581222B2 (en) | Tunable laser and control method for same | |
JP2022062516A (ja) | 半導体光増幅器 | |
JP2022002300A (ja) | 面発光レーザ | |
Hu et al. | Surface grating loaded VCSEL with single mode power of over 80 mW | |
JP2019046880A (ja) | 面発光レーザ | |
Hassan et al. | 4 W Single-Mode Operation of Surface Grating VCSELs | |
Ho et al. | High resolution active beam scanner based on VCSEL amplifier | |
Hattori et al. | Optically pumped in-plane photonic crystal microcavity laser arrays coupled to waveguides | |
Ren et al. | An integrated tunable laser using nano-silicon-photonic circuits |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20190823 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20200526 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20200603 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6716142 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |