JPWO2015053209A1 - Charged particle equipment - Google Patents

Charged particle equipment Download PDF

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JPWO2015053209A1
JPWO2015053209A1 JP2015541563A JP2015541563A JPWO2015053209A1 JP WO2015053209 A1 JPWO2015053209 A1 JP WO2015053209A1 JP 2015541563 A JP2015541563 A JP 2015541563A JP 2015541563 A JP2015541563 A JP 2015541563A JP WO2015053209 A1 JPWO2015053209 A1 JP WO2015053209A1
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lens barrel
vibration
vibration isolation
charged particle
mount
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JP6220887B2 (en
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裕久 榎本
裕久 榎本
長沖 功
功 長沖
秀樹 菊池
秀樹 菊池
鈴木 渡
渡 鈴木
勝則 小貫
勝則 小貫
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Hitachi High Tech Corp
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02Details
    • H01J2237/0216Means for avoiding or correcting vibration effects

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Vibration Prevention Devices (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

荷電粒子装置において、装置外周から鏡筒までの距離を短くして、試料ステージに試料交換のためのホルダを抜き差しすることや、蛍光板覗き窓から観察像を観察することを容易にする荷電粒子装置を提供することを目的とする。荷電粒子装置において、鏡筒(101)と、鏡筒(101)の内部に設けられた荷電粒子線光学系と、鏡筒(101)に設けられた試料ステージ(102)と、鏡筒(101)を支持する荷重板(14)と、荷重板(14)を支持する除振マウント(15)と、架台(16)とを有し、荷重板(14)が3ヶ所の除振マウント(15)で支持され、荷重板(14)上の鏡筒(101)が除振マウント(15)近傍に設置される。In a charged particle device, the distance from the outer periphery of the device to the lens barrel is shortened, and a charged particle device that makes it easy to insert and remove a holder for sample replacement in the sample stage and to observe an observation image from a fluorescent screen viewing window The purpose is to provide. In the charged particle apparatus, a lens barrel (101), a charged particle beam optical system provided inside the lens barrel (101), a sample stage (102) provided in the lens barrel (101), and a lens barrel (101) ) Supporting a load plate (14), a vibration isolation mount (15) supporting the load plate (14), and a gantry (16). The load plate (14) has three vibration isolation mounts (15). ) And the lens barrel (101) on the load plate (14) is installed in the vicinity of the vibration isolation mount (15).

Description

本発明は荷電粒子装置に関する。  The present invention relates to a charged particle device.

荷電粒子装置は、例えば、特許文献1(特開2011−124145号公報)のように、鏡筒内に荷電粒子線光学系が収納されており、鏡筒には試料ステージや観察室が設置されている。さらに、鏡筒は架台などの支持構造物で支持されており、支持構造物は外部からの振動を伝達することを抑制する除振装置が設けられている。  The charged particle apparatus has a charged particle beam optical system housed in a lens barrel as in Patent Document 1 (Japanese Patent Laid-Open No. 2011-124145), for example, and a sample stage and an observation chamber are installed in the lens barrel. ing. Furthermore, the lens barrel is supported by a support structure such as a gantry, and a vibration isolation device that suppresses transmission of external vibration is provided in the support structure.

特開2011−124145号公報JP 2011-124145 A

近年、荷電粒子装置の高機能化により鏡筒の軸長が増大する傾向にある。鏡筒の軸長が増大すると、安定支持のために支持幅を増大させる必要がある。そのため、特許文献1のように、装置の四隅を四つの除振装置で支持し、さらに鏡筒を架台の中央に配置させる荷電粒子装置では、装置外周つまり、荷重板外周から鏡筒までの距離が遠くなる。装置外周から鏡筒までの距離が遠い場合、鏡筒に設置されている試料ステージに試料交換のためのホルダを挿入することや、透過型電子顕微鏡であれば、鏡筒に設置されている蛍光板覗き窓から観察像を観察するなどの装置の操作性が悪化する。  In recent years, the axial length of the lens barrel tends to increase due to the higher functionality of charged particle devices. As the axial length of the lens barrel increases, it is necessary to increase the support width for stable support. Therefore, as in Patent Document 1, in the charged particle device in which the four corners of the device are supported by four vibration isolation devices and the lens barrel is arranged at the center of the gantry, the distance from the device outer periphery, that is, the load plate outer periphery to the lens barrel Will be far away. When the distance from the outer circumference of the device to the lens barrel is long, a holder for exchanging the sample is inserted into the sample stage installed in the lens barrel, and if it is a transmission electron microscope, the fluorescent screen installed in the lens barrel The operability of the apparatus, such as observing the observation image from the viewing window, is deteriorated.

そこで、本発明の目的は、荷電粒子装置において、装置外周から鏡筒までの距離を短くして、試料ステージに試料交換のためのホルダを抜き差しすることや、蛍光板覗き窓から観察像を観察することを容易にする荷電粒子装置を提供することにある。  Accordingly, an object of the present invention is to shorten the distance from the outer periphery of the device to the lens barrel in a charged particle device, and to insert and remove a holder for exchanging the sample on the sample stage, or to observe an observation image from the fluorescent screen viewing window. An object of the present invention is to provide a charged particle device that facilitates this.

本発明は、鏡筒と鏡筒の内部に設けられた荷電粒子線光学系と、鏡筒に設けられた試料ステージと、鏡筒を支持する荷重板と、荷重板を支持する除振マウントと、架台を有し、荷重板が3ヶ所の除振マウントで支持され、荷重板上の鏡筒が除振マウント近傍に設置される荷電粒子装置である。  The present invention relates to a lens barrel, a charged particle beam optical system provided inside the lens barrel, a sample stage provided in the lens barrel, a load plate that supports the lens barrel, and a vibration isolation mount that supports the load plate, The charged particle device has a gantry, a load plate is supported by three vibration isolation mounts, and a lens barrel on the load plate is installed in the vicinity of the vibration isolation mount.

本発明によると、荷電粒子装置において、装置外周から鏡筒までの距離を短くして、試料ステージに試料交換のためのホルダを抜き差しすることや、蛍光板覗き窓から観察像を観察することが容易になる。  According to the present invention, in a charged particle device, it is easy to shorten the distance from the outer periphery of the device to the lens barrel, to insert / remove a holder for exchanging the sample to / from the sample stage, and to observe the observation image from the viewing window of the fluorescent screen. become.

従来の荷電粒子装置の説明図である。It is explanatory drawing of the conventional charged particle apparatus. 本発明の実施例1における荷電粒子装置の斜視図である。It is a perspective view of the charged particle apparatus in Example 1 of this invention. 本発明の実施例1における3ヶ所の除振マウントで支持される装置の簡易モデルである。It is a simple model of the apparatus supported by the three anti-vibration mounts in Example 1 of this invention. 本発明の実施例1における簡易モデルにおける重心位置と観察点の振動量の関係を示す図である。It is a figure which shows the relationship between the gravity center position in the simple model in Example 1 of this invention, and the amount of vibrations of an observation point. 本発明の実施例1における3ヶ所の除振マウントで支持した場合の床振動起因の振動応答を示す図である。It is a figure which shows the vibration response resulting from floor vibration at the time of supporting with the three vibration isolator mounts in Example 1 of this invention. 本発明の実施例1における4ヶ所の除振マウントで支持した場合の床振動起因の振動応答を示す図である。It is a figure which shows the vibration response resulting from a floor vibration at the time of supporting with the four vibration isolating mounts in Example 1 of this invention. 本発明の実施例1における3ヶ所及び4ヶ所の除振マウントで支持される装置の応答比較である。It is the response comparison of the apparatus supported by the vibration isolating mount of 3 places and 4 places in Example 1 of this invention. 本発明の実施例1における3ヶ所の除振マウントで支持される装置の簡易モデルである。It is a simple model of the apparatus supported by the three anti-vibration mounts in Example 1 of this invention. 本発明の実施例2における荷電粒子装置の斜視図である。It is a perspective view of the charged particle apparatus in Example 2 of this invention. 本発明の実施例2における試料ステージを設置する位置を示す図である。It is a figure which shows the position which installs the sample stage in Example 2 of this invention. 本発明の実施例2におけるカラムが振動しにくい方向を示す図である。It is a figure which shows the direction where the column in Example 2 of this invention does not vibrate easily.

図1を参照して荷電粒子装置の概略を示す。本発明は荷電粒子装置に関する発明であるが、荷電粒子装置の一つである透過型電子顕微鏡の構造を用いて説明する。荷電粒子装置は本体10、本体を支持する荷重板14、荷重板14を支持する架台16、荷重板と架台の間に設けられた除振マウント15、制御装置11、モニタ12、操作卓13を有する。本体10は鏡筒101を有している。鏡筒101は円筒で軸方向に長い構造をしている。鏡筒101には電子銃111や、エミッタ112、コンデンサレンズ113や対物レンズ114、中間レンズ115、投影レンズ116、検出器117、蛍光板118、カメラフィルム119が設けられている。また、図示しないが、蛍光板覗き窓が鏡筒下方に設置されている。  An outline of a charged particle apparatus is shown with reference to FIG. The present invention relates to a charged particle device, and will be described using the structure of a transmission electron microscope which is one of charged particle devices. The charged particle device includes a main body 10, a load plate 14 that supports the main body, a gantry 16 that supports the load plate 14, a vibration isolation mount 15 provided between the load plate and the gantry, a control device 11, a monitor 12, and a console 13. Have. The main body 10 has a lens barrel 101. The lens barrel 101 is a cylinder and has a structure that is long in the axial direction. The lens barrel 101 is provided with an electron gun 111, an emitter 112, a condenser lens 113, an objective lens 114, an intermediate lens 115, a projection lens 116, a detector 117, a fluorescent plate 118, and a camera film 119. Although not shown, a fluorescent screen viewing window is provided below the lens barrel.

鏡筒101の側面には試料ステージ102が固定されており、試料ステージ先端の観察点に観察試料を設置できる。また、観察点は水平方向や垂直方向への移動、傾斜が可能になっている。試料の出し入れには、観察者が直接、棒状のホルダを抜き差しする。イオンポンプ103は鏡筒側面に固定されており、これによって鏡筒内部の真空排気が可能になっている。  A sample stage 102 is fixed to the side surface of the lens barrel 101, and an observation sample can be placed at an observation point at the tip of the sample stage. The observation point can be moved and tilted in the horizontal direction and the vertical direction. An observer directly inserts and removes the rod-shaped holder to put in and out the sample. The ion pump 103 is fixed to the side surface of the lens barrel, so that the inside of the lens barrel can be evacuated.

透過型電子顕微鏡の撮像時には電子銃111のエミッタ112で発生した電子ビームをコンデンサレンズ113や対物レンズ114を通して、観察点に向けて照射する。試料を透過した電子ビームを対物レンズ114、中間レンズ115、投影レンズ116で拡大し、検出器117で検出し、蛍光板118及びカメラフィルム119に結像させる。以上の過程を得て観察像が得られる。操作卓13は透過型電子顕微鏡を制御する制御装置11及び観察像を示すモニタ12を備えている。また、蛍光板上の観察像を蛍光板覗き窓から観察することも行う。制御装置11は操作卓13からの信号を透過型電子顕微鏡の各要素に伝える。  At the time of imaging with a transmission electron microscope, the electron beam generated by the emitter 112 of the electron gun 111 is irradiated toward the observation point through the condenser lens 113 and the objective lens 114. The electron beam that has passed through the sample is magnified by the objective lens 114, the intermediate lens 115, and the projection lens 116, detected by the detector 117, and imaged on the fluorescent screen 118 and the camera film 119. An observation image is obtained through the above process. The console 13 includes a control device 11 that controls the transmission electron microscope and a monitor 12 that displays an observation image. Further, the observation image on the fluorescent screen is also observed from the fluorescent screen viewing window. The control device 11 transmits a signal from the console 13 to each element of the transmission electron microscope.

(実施例1)
図2は本発明の実施例1を示したものである。鏡筒101は円筒で軸長の長い構造をしており、観察のため電子銃や各種レンズ、検出器などを備えている。一般に装置重量に対して鏡筒重量の占める割合が大きいので、水平面内の重心位置と鏡筒位置は概ね一致している。荷重板14は3ヶ所の除振マウントで支持され、鏡筒101は3ヶ所の除振マウントのうち、これらの除振マウントを直線で結んで構成される三角形の角で、最も鋭角となる角の頂点にある除振マウントの近傍に設置するか、そうでなければ鏡筒101を設置する箇所はいずれの除振マウントの近傍でもよい。鏡筒を設置する範囲は、鏡筒に最も近い除振マウントを中心に、この除振マウントと他の除振マウントを直線で結んだときに、短い方の直線の1/4の長さを半径とする円弧内とする。さらに、除振マウント15は下方から架台16で支持されている。
Example 1
FIG. 2 shows Example 1 of the present invention. The lens barrel 101 is a cylinder having a long axial structure, and includes an electron gun, various lenses, a detector, and the like for observation. In general, since the ratio of the weight of the lens barrel to the weight of the apparatus is large, the position of the center of gravity in the horizontal plane and the position of the lens barrel substantially coincide. The load plate 14 is supported by three anti-vibration mounts, and the lens barrel 101 is a triangular corner formed by connecting these anti-vibration mounts in a straight line among the three anti-vibration mounts. It may be installed in the vicinity of the anti-vibration mount at the top of the lens, or the part where the lens barrel 101 is installed may be in the vicinity of any anti-vibration mount. The range in which the lens barrel is installed is about 1/4 of the shorter straight line when this anti-vibration mount and another anti-vibration mount are connected with a straight line centering on the anti-vibration mount closest to the lens barrel. Within a circular arc with radius. Further, the vibration isolation mount 15 is supported by the mount 16 from below.

以上のような構成により、従来よりも鏡筒位置が装置外周部に近くに配置される。図3(a)に示すように、重心位置つまり鏡筒位置を除振マウント3から除振マウント1に向かって移動させると、重心位置と観察点の振動量の関係は図3(b)に示すように、除振マウントに近づくにつれて振動量が下がり、除振マウントから最も遠ざかる2つの除振マウントの中央で振動量が最も大きくなる。特に、除振マウントから、2つの除振マウント間の1/4の距離の範囲内に重心があると、除振マウント間の中央にある場合と比べ、振動量が低減しているので、この領域内に鏡筒を設置すると振動の小さい装置になる。  With the configuration as described above, the lens barrel position is arranged closer to the outer periphery of the apparatus than in the past. As shown in FIG. 3A, when the position of the center of gravity, that is, the lens barrel position is moved from the vibration isolation mount 3 toward the vibration isolation mount 1, the relationship between the position of the center of gravity and the amount of vibration at the observation point is shown in FIG. As shown, the vibration amount decreases as the vibration isolation mount is approached, and the vibration amount becomes the largest at the center of the two vibration isolation mounts farthest from the vibration isolation mount. In particular, if the center of gravity is within the range of 1/4 distance between the two vibration isolation mounts from the vibration isolation mount, the amount of vibration is reduced compared to the case where the center of gravity is between the vibration isolation mounts. If a lens barrel is installed in the area, the device will have less vibration.

さらに、実施例1の振動特性に関する効果を、装置が4ヶ所の除振マウントで支持される従来技術の荷電粒子装置と比較するため、図4(a)、(b)に示すモデルを用いて、3ヶ所の除振マウントで支持した場合と4ヶ所の除振マウントで支持した場合の床振動起因の振動応答を求める。床振動により振動が励起される場合には、本体が一体となって振動するため、本モデルでは本体を剛体として考え、本体の質量を集中質量で模擬して、この質量を重心位置に設置している。さらに、除振マウントが設置される位置にばね要素を設置している。  Furthermore, in order to compare the effects relating to the vibration characteristics of Example 1 with a charged particle device of the prior art in which the device is supported by four vibration isolation mounts, the models shown in FIGS. 4A and 4B are used. Determine the vibration response due to floor vibration when supported by 3 vibration isolation mounts and when supported by 4 vibration isolation mounts. When vibration is excited by floor vibration, the main body vibrates as a whole, so this model considers the main body as a rigid body, simulates the mass of the main body with a concentrated mass, and installs this mass at the center of gravity. ing. Further, a spring element is installed at a position where the vibration isolation mount is installed.

図5から、振動応答は従来の4ヶ所の除振マウントで支持した場合に比べると、振動量が大きいが励起される振動モードの数が少ないことが分かる。これは、振動しやすい方向が従来の4ヶ所の除振マウントで支持した場合に比べて少なく、設計時に考慮すべき振動モードの数が少なくて済む。  From FIG. 5, it can be seen that the vibration response has a large vibration amount but a small number of vibration modes to be excited as compared with the case where the vibration response is supported by the conventional four vibration isolation mounts. This is because the direction in which vibration is likely to occur is smaller than the case where it is supported by the conventional four vibration isolation mounts, and the number of vibration modes to be considered at the time of design is small.

除振マウントの設計は一般に剛性や支持位置から多数の振動モードを予測し、これらの振動モードが励起されたときの振動が大きくならないようにする。図4に示したモデルをさらに簡略化した図6のモデルを用いて、除振マウントの剛性や支持位置の設計方法について示す。説明を簡易にするため、図6のモデルはこの装置が振動しやすい前後左右に傾斜する振動現象を表現することに限定した。さらに、重心は観察点の下方にあるため一般には両者の位置は一致しないが、重心と観察点の位置が一致していると仮定し、重心位置と支持位置が同一高さであると仮定している。このように簡易化したモデルの運動方程式を式1に示す。  The design of the anti-vibration mount generally predicts a large number of vibration modes from the rigidity and the support position, and prevents vibrations when these vibration modes are excited. A method for designing the rigidity and support position of the vibration isolation mount will be described using the model shown in FIG. 6, which is a simplified version of the model shown in FIG. 4. In order to simplify the explanation, the model of FIG. 6 is limited to expressing a vibration phenomenon in which the device is likely to vibrate and tilts forward, backward, left and right. Furthermore, since the center of gravity is below the observation point, the positions of both are generally not the same, but it is assumed that the center of gravity and the position of the observation point are the same, and the center of gravity and the support position are the same height. ing. Equation 1 shows the equation of motion of the simplified model.

ここで、[M]は質量マトリックス、[K]は剛性マトリックスを表し、zは重心(観察点)のZ方向の変位、θはX軸まわりの重心(観察点)の回転角、φはY軸まわりの重心(観察点)の回転角を表す。[M]は式2で、[K]は式3で表される。  Where [M] is the mass matrix, [K] is the stiffness matrix, z is the displacement of the center of gravity (observation point) in the Z direction, θ is the rotation angle of the center of gravity (observation point) around the X axis, and φ is Y Represents the rotation angle of the center of gravity (observation point) around the axis. [M] is expressed by Equation 2, and [K] is expressed by Equation 3.

ここで、Mは装置質量を表し、IxxはX軸周りの装置慣性モーメント、IyyはY軸周りの装置慣性モーメント、kzは除振マウントのZ方向のばね剛性を表す。さらに、lxiは重心(観察点)と除振マウントのX方向の距離を表し、lyiは重心(観察点)と除振マウントのY方向の距離を表し、添え字iは図6に示す除振マウントの識別番号を示す。Here, M represents a device mass, I xx represents a device inertia moment about the X axis, I yy represents a device inertia moment about the Y axis, and k z represents a spring stiffness in the Z direction of the vibration isolation mount. Further, l xi represents the center of gravity (observation point) and the distance in the X direction of the vibration isolation mount, l yi represents the center of gravity (observation point) and the distance in the Y direction of the vibration isolation mount, and the suffix i is shown in FIG. Indicates the identification number of the vibration isolation mount.

式3の非対角項が0であれば、各方向の振動は独立であるが、非対角項がある場合には、各方向の振動が他の方向の振動と連成し、振動方向が複雑になる。本発明のように図6の除振マウント3に重心がある場合には、式3は式4のようになる。  If the off-diagonal term in Equation 3 is 0, the vibration in each direction is independent, but if there is an off-diagonal term, the vibration in each direction is coupled with the vibration in the other direction, and the vibration direction Becomes complicated. When the vibration isolator mount 3 of FIG. 6 has a center of gravity as in the present invention, Equation 3 becomes Equation 4.

除振マウントの剛性が同じであるとすると、非連成項を決定する変数は重心から鏡筒が設置されていない他の2ヶ所の除振マウントまでのX方向の距離lx1 、lx2及びY方向の距離ly1 、ly2である。つまり、3ヶ所の除振マウントで装置を支持し、さらに除振マウント近傍に鏡筒を設置する場合、2ヶ所の除振マウントの位置関係によって振動モードが決まる。一方、4ヶ所の除振マウントで装置を支持する場合、4ヶ所の除振マウントの位置関係によって振動モードが決まる。一般に床振動により励起された振動を低減させるために、除振マウントの位置や剛性を考慮した設計を行うが、除振マウントが多数ある場合には、装置の剛体モードを所望の振動モードにすることは容易ではない。The rigidity of the anti-vibration mount is to be the same, the distance in the X direction of variables that determine the Hiren Naruko until anti-vibration mount other two places not barrel is installed from the center of gravity l x1, l x2 and The distances in the Y direction are l y1 and l y2 . That is, when the apparatus is supported by three vibration isolation mounts and a lens barrel is installed in the vicinity of the vibration isolation mount, the vibration mode is determined by the positional relationship between the two vibration isolation mounts. On the other hand, when the device is supported by four vibration isolation mounts, the vibration mode is determined by the positional relationship of the four vibration isolation mounts. In general, in order to reduce the vibration excited by floor vibration, the design is performed in consideration of the position and rigidity of the vibration isolation mount. If there are a large number of vibration isolation mounts, the rigid body mode of the device is changed to the desired vibration mode. It is not easy.

以上のようにして、3ヶ所の除振マウントで装置を支持し、除振マウント近傍に重心が設置された場合には、4ヶ所の除振マウントで装置を支持した場合に比べ、振動モードを決定する変数が少ないことから、所望の振動モードとなる除振マウントの設計が容易になる。  As described above, when the device is supported by three anti-vibration mounts and the center of gravity is installed in the vicinity of the anti-vibration mount, the vibration mode is set as compared with the case where the device is supported by four anti-vibration mounts. Since there are few variables to be determined, it is easy to design a vibration isolation mount that achieves a desired vibration mode.

(実施例2)
本発明の実施例2について説明する。図7は荷電粒子装置の実施例2を示したものである。実施例2においては、図8(a)に示すように、試料ステージは、鏡筒に最も近い除振マウントと他の除振マウントを結ぶ2つの直線である直線2及び直線3と、鏡筒に最も近い除振マウント以外の2つの除振マウントを結ぶ直線1と平行で鏡筒中心を通る直線1’との間に挟まれた領域に設置される。
(Example 2)
A second embodiment of the present invention will be described. FIG. 7 shows a charged particle device according to a second embodiment. In the second embodiment, as shown in FIG. 8A, the sample stage includes two straight lines 2 and 3 that are two straight lines connecting the vibration isolation mount closest to the lens barrel and another vibration isolation mount, and the lens barrel. It is installed in a region sandwiched between a straight line 1 connecting two vibration isolation mounts other than the vibration isolation mount closest to and a straight line 1 ′ passing through the center of the lens barrel in parallel.

本体が傾斜する振動モードは除振マウントの位置と重心位置の関係により求まるが、除振マウント付近に鏡筒が設置された場合、図8(b)に示すように、除振マウント間を結ぶ直線に平行な軸を傾斜軸として本体が傾斜する。図8(b)の扇形の破線で示した部分が、鏡筒中心が最も振動しにくい方向である。この部分は図8(b)で示すように、鏡筒に最も近い除振マウントと他の除振マウントを結ぶ2つの直線である直線2及び直線3と、直線1と平行で鏡筒中心を通る直線1’との間に挟まれた領域にあるので、この方向に試料ステージを設置すると、観察位置の振動量が低減する。  The vibration mode in which the main body tilts can be obtained from the relationship between the position of the vibration isolation mount and the position of the center of gravity. However, when a lens barrel is installed in the vicinity of the vibration isolation mount, as shown in FIG. The body tilts with the axis parallel to the straight line as the tilt axis. The portion shown by the fan-shaped broken line in FIG. 8B is the direction in which the center of the lens barrel is most difficult to vibrate. As shown in FIG. 8B, this portion includes two straight lines 2 and 3 that connect the vibration isolation mount closest to the lens barrel and the other vibration isolation mounts, and the center of the lens barrel parallel to the straight line 1. Since it is in the region sandwiched between the passing straight line 1 ', the amount of vibration at the observation position is reduced when the sample stage is placed in this direction.

10 本体
11 制御装置
12 モニタ
13 操作卓
14 荷重板
15 除振マウント
16 架台
101 鏡筒
102 試料ステージ
103 イオンポンプ
111 電子銃
112 エミッタ
113 コンデンサレンズ
114 対物レンズ
115 中間レンズ
116 投影レンズ
117 検出器
118 蛍光板
119 カメラフィルム
DESCRIPTION OF SYMBOLS 10 Main body 11 Control apparatus 12 Monitor 13 Operation desk 14 Load board 15 Anti-vibration mount 16 Base 101 Lens tube 102 Sample stage 103 Ion pump 111 Electron gun 112 Emitter 113 Condenser lens 114 Objective lens 115 Intermediate lens 116 Projection lens 117 Detector 118 Fluorescent screen 119 Camera film

Claims (3)

鏡筒と、
前記鏡筒の内部に設けられた荷電粒子線光学系と、
前記鏡筒に設けられた試料ステージと、
前記鏡筒を支持する荷重板と、
前記荷重板を支持する除振マウントと、
架台と、
を有する荷電粒子装置であって、
前記荷重板は3ヶ所の除振マウントで支持され、
前記鏡筒の位置は、前記除振マウントのいずれかの近傍に設置され、
前記鏡筒の設置範囲が前記鏡筒に最も近い除振マウントを中心に、この除振マウントと他の除振マウントを直線で結んだときに、短い方の直線の1/4の長さを半径とする円弧内である、荷電粒子装置。
A lens barrel,
A charged particle beam optical system provided inside the lens barrel;
A sample stage provided in the lens barrel;
A load plate for supporting the lens barrel;
An anti-vibration mount that supports the load plate;
A frame,
A charged particle device comprising:
The load plate is supported by three anti-vibration mounts,
The position of the lens barrel is installed in the vicinity of any one of the vibration isolation mounts,
Centering on the vibration isolation mount that is closest to the lens barrel, the installation range of the lens barrel is 1/4 of the shorter straight line when this vibration isolation mount and another vibration isolation mount are connected by a straight line. A charged particle device within an arc of radius.
請求項1に記載の荷電粒子装置において、
前記試料ステージは、前記鏡筒に最も近い除振マウントと他の除振マウントを結ぶ2つの直線と、前記鏡筒に最も近い除振マウント以外の2つの除振マウントを結ぶ直線と平行で鏡筒中心を通る直線の間に挟まれた領域に設置される、荷電粒子装置。
The charged particle device according to claim 1,
The sample stage is mirrored in parallel with two straight lines connecting the vibration isolation mount closest to the lens barrel and another vibration isolation mount and a straight line connecting two vibration isolation mounts other than the vibration isolation mount closest to the lens barrel. A charged particle device installed in a region sandwiched between straight lines passing through the center of a cylinder.
試料ステージを内部に設けた鏡筒と、
前記鏡筒を支持する荷重板と、
前記荷重板を3ヶ所で支持する除振マウントと、
を備え、
前記鏡筒は、前記荷重板上で、前記除振マウントの3ヶ所の重心よりもいずれか1ヶ所に近づいて設置される、荷電粒子装置。
A lens barrel provided with a sample stage;
A load plate for supporting the lens barrel;
An anti-vibration mount that supports the load plate at three locations;
With
The charged particle device, wherein the lens barrel is installed closer to one of the three gravity centers of the vibration isolation mount on the load plate.
JP2015541563A 2013-10-07 2014-10-06 Charged particle equipment Expired - Fee Related JP6220887B2 (en)

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JP2013209794 2013-10-07
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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002221251A (en) * 2001-01-25 2002-08-09 Jeol Ltd Damping apparatus
JP2002310229A (en) * 2001-04-10 2002-10-23 Jeol Ltd Vibration isolation mechanism and radiation beam device
JP2004221251A (en) * 2003-01-14 2004-08-05 Canon Inc Aligner
JP2005223232A (en) * 2004-02-09 2005-08-18 Nikon Corp Charged particle beam exposure apparatus

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002221251A (en) * 2001-01-25 2002-08-09 Jeol Ltd Damping apparatus
JP2002310229A (en) * 2001-04-10 2002-10-23 Jeol Ltd Vibration isolation mechanism and radiation beam device
JP2004221251A (en) * 2003-01-14 2004-08-05 Canon Inc Aligner
JP2005223232A (en) * 2004-02-09 2005-08-18 Nikon Corp Charged particle beam exposure apparatus

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