JP2001093456A - Charged particle beam device - Google Patents

Charged particle beam device

Info

Publication number
JP2001093456A
JP2001093456A JP27282899A JP27282899A JP2001093456A JP 2001093456 A JP2001093456 A JP 2001093456A JP 27282899 A JP27282899 A JP 27282899A JP 27282899 A JP27282899 A JP 27282899A JP 2001093456 A JP2001093456 A JP 2001093456A
Authority
JP
Japan
Prior art keywords
charged particle
particle beam
gantry
reinforcing member
vibration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP27282899A
Other languages
Japanese (ja)
Inventor
Eisuke Kamimura
村 英 助 上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd filed Critical Jeol Ltd
Priority to JP27282899A priority Critical patent/JP2001093456A/en
Publication of JP2001093456A publication Critical patent/JP2001093456A/en
Withdrawn legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To suppress the vibration of a lens-barrel. SOLUTION: In a body of a microscope which is placed on a fixed position on a floor 3, attachment plates 12A and 12B for legs 10A and 10B of a reinforcement material 10 are fixed at an upper end and a lower end of a rear part of one side of a stage 4 using screws so as to fix the reinforcement material 10 to the stage 4, on the other hand, attachment, plates for legs 11A and 11B of a reinforcement material 11 are fixed at an upper end and a lower end of a rear part of an opposite side of the stage 4 using screws so as to fix the reinforcement material 11 to the stage 4. Attachment plates 16 and 15 for a boom member 13 are respectively fixed to a rear side of an attachment ring 17 at an upper portion of a lens-barrel and to the reinforcement material 10 using screws, on the other hand, attachment plates 19 and 18 for a boom member 14 are respectively fixed to the rear side of the attachment ring 17 at the upper portion of the lens-barrel and to the reinforcement material 11 using screws.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する分野】本発明は、除振機構を備えた荷電
粒子ビーム装置に関する。
The present invention relates to a charged particle beam device provided with a vibration isolation mechanism.

【0002】[0002]

【従来の技術】図1は透過型電子顕微鏡の1概略例を示
したものである。
2. Description of the Related Art FIG. 1 shows a schematic example of a transmission electron microscope.

【0003】図中1は鏡筒で、電子銃,集束系レンズ,
偏向系レンズ,非点補正等の補正系レンズ等の電子光学
系,観察すべき試料を保持した試料保持体等を備えてい
る。2は像観察室で、蛍光板を備え、試料を透過した電
子ビームに基づく試料像が該蛍光板上に結像される様に
成っている。
In FIG. 1, reference numeral 1 denotes a lens barrel, which includes an electron gun, a focusing lens,
An electron optical system such as a deflection system lens, a correction system lens for astigmatism correction, and the like, a sample holder for holding a sample to be observed, and the like are provided. Reference numeral 2 denotes an image observation room, which is provided with a fluorescent plate so that a sample image based on the electron beam transmitted through the sample is formed on the fluorescent plate.

【0004】床3上には架台4が設置されており、該架
台上に設置されたベースプレート5上に前記前記鏡筒1
と像観察室2とから成る顕微鏡基本体が設置されてい
る。
A gantry 4 is installed on the floor 3, and the lens barrel 1 is placed on a base plate 5 installed on the gantry.
A basic microscope body comprising an image observation room 2 and the image observation room 2 is provided.

【0005】尚、この様な構成の透過型電子顕微鏡にお
いては、架台を含めた顕微鏡本体を重心の高さの所で支
えたいという要求があるが、その要求に十分応えること
が難しい。従って、一般的に、透過型電子顕微鏡におい
ては、その除振機構(例えば、バネ等から成る除振台6
A,6B,6C,6D(6C,6Dは図示せず))を図
1に示す様に、前記床3の上に設置し、前記架台4の下
部を支える構造を採用している。
In the transmission electron microscope having such a configuration, there is a demand that the microscope main body including the gantry should be supported at the height of the center of gravity, but it is difficult to sufficiently meet the demand. Therefore, generally, in a transmission electron microscope, a vibration isolation mechanism (for example, a vibration isolation table 6 composed of a spring or the like) is used.
A, 6B, 6C, 6D (6C, 6D not shown)) are installed on the floor 3 as shown in FIG. 1, and a structure for supporting a lower portion of the gantry 4 is adopted.

【0006】[0006]

【発明が解決しようとする課題】さて、最近の透過型電
子顕微鏡は極めて多くの部品より構成されており、その
内部は極めて低い圧力に排気されて高真空の状態に保た
れているため、通常、工場で完成した姿のまま設置すべ
き場所に搬入される。又、この様な搬入において、例え
ば、研究室等の設置場所への搬入の際、片開きのドアを
通さねばならないことが少なくないことから、架台を含
めた顕微鏡本体の幅が、例えば、800mm程度以下に
なるように製作される。その為に、顕微鏡本体が、自ず
と幅が狭く、背の高いものとなってしまう。
Now, recent transmission electron microscopes are composed of an extremely large number of parts, and the inside thereof is evacuated to an extremely low pressure and kept in a high vacuum state. It will be delivered to the place where it should be installed as it is completed at the factory. In addition, in such a loading, for example, when loading into a setting place such as a laboratory, it is often necessary to pass through a one-sided door, so that the width of the microscope main body including the stand is, for example, 800 mm. It is manufactured to be less than about. For this reason, the microscope body naturally becomes narrow and tall.

【0007】所で、図1の様に、架台4の下部を4隅に
設置された除振マウント6A,6B,6C,6D(6
C,6Dは図示せず))で支える構造の場合、顕微鏡本
体の重心が高く、しかも該本体の幅が狭いことから各除
振マウント間の間隔が狭くならざるを得ず、その為に、
除振系の一次の振動モードは図2の様になる。又、除振
系の二次の振動モードは図3の様になる。さて、床3か
ら入ってくる振動を低い周波数まで除振するには、除振
マウントとしてエアーマウントの如き共振周波数の低い
マウントを採用するのが良い。しかし、前記構造では、
動作が不安定になったり、顕微鏡本体の転倒の危険性が
あり、エアーマウントの如きマウントの採用には問題が
ある。そこで、垂直方向(図1における上下方向)の振
動は水平方向(図1における上下方向に垂直な面の方
向)の振動に比べて電子顕微鏡像への影響が少ないこと
を利用して、除振台のバネ定数や減衰係数を水平方向に
比べ垂直方向に高めに設定することにより、前記除振系
の一次振動モードは及び二次振動モードにおけるロッキ
ングを抑える方法が考えられるが、反面、除振性能をあ
る程度犠牲にすることになってしまう。
Here, as shown in FIG. 1, anti-vibration mounts 6A, 6B, 6C, 6D (6
In the case of the structure supported by C) and 6D), the center of gravity of the microscope main body is high and the width of the main body is narrow, so that the interval between the respective vibration isolation mounts must be narrowed.
The primary vibration mode of the vibration isolation system is as shown in FIG. The secondary vibration mode of the vibration isolation system is as shown in FIG. Now, in order to vibrate the vibration coming from the floor 3 to a low frequency, a mount having a low resonance frequency such as an air mount is preferably used as the anti-vibration mount. However, in the above structure,
There is a risk of unstable operation and a risk of the microscope body tipping over, and there is a problem in using a mount such as an air mount. Therefore, the vibration in the vertical direction (vertical direction in FIG. 1) has a smaller effect on the electron microscope image than the vibration in the horizontal direction (direction of the plane perpendicular to the vertical direction in FIG. 1), and is used for vibration isolation. By setting the spring constant and damping coefficient of the table to be higher in the vertical direction than in the horizontal direction, a method of suppressing rocking in the primary vibration mode and the secondary vibration mode of the vibration isolation system can be considered. Performance will be sacrificed to some extent.

【0008】一方、除振系の共振周波数を除く本体の一
次の振動モードは、図4に示す様に、先ず、鏡筒1の付
け根付近から曲がり始め、鏡筒上端が最も大きく曲がる
形になり、本体の一次振動モードの周波数は低くなる傾
向にある。その為に、この一次モードと一致する周波数
の振動が外部から伝わってくると、他の周波数の振動の
場合と違って、共振により鏡筒部が大きく揺れることに
なる。即ち、鏡筒本体の一次の振動モードの周波数が低
いと、床3からの振動に対して共振を起こしやすくな
る。従って、床振動が該一次モードと一致する周波数成
分を一定以上のパワーで持つと、譬え、前記除振マウン
ト6A,6B,6C,6Dにより床3から伝わってくる
振動の振幅を小さく出来たとしても、該除振マウントよ
り上部にある架台4等の共振によって前記一次モードと
一致する周波数成分だけは振幅が大きくなり、許容値を
超えてしまう。その結果、電子顕微鏡の観察像に鏡筒振
動の影響が入り、像観察に支障を来したり、撮影した像
がぼけてしまう。
On the other hand, as shown in FIG. 4, the primary vibration mode of the main body excluding the resonance frequency of the vibration isolation system begins to bend near the base of the lens barrel 1 and the upper end of the lens barrel bends most. The frequency of the primary vibration mode of the main body tends to decrease. Therefore, when vibration of a frequency that matches this primary mode is transmitted from the outside, the lens barrel will shake greatly due to resonance, unlike vibrations of other frequencies. That is, when the frequency of the primary vibration mode of the lens barrel main body is low, resonance is likely to occur with respect to vibration from the floor 3. Therefore, if the floor vibration has a frequency component equal to the first-order mode with a power equal to or higher than a certain level, it can be said that the amplitude of the vibration transmitted from the floor 3 can be reduced by the vibration isolation mounts 6A, 6B, 6C, and 6D. Also, due to the resonance of the gantry 4 above the anti-vibration mount, only the frequency components that match the first-order mode have large amplitudes, exceeding the allowable value. As a result, the observation image of the electron microscope is affected by the lens barrel vibration, which hinders the image observation and blurs the captured image.

【0009】本発明は、この様な問題を解決するもの
で、新規な荷電粒子ビーム装置を提供するものである。
The present invention solves such a problem and provides a novel charged particle beam device.

【0010】[0010]

【課題を解決するための手段】 本発明の荷電粒子ビー
ム装置は、床の上に架台を介して荷電粒子ビーム装置本
体が設置されている荷電粒子ビーム装置において、架台
の反操作側近くに、該架台に取り外し可能に取り付けら
れる補強部材が、前記架台の両側面より外側に延びる様
に取り付けられる様に成し、荷電粒子ビーム装置本体上
部と各補強部材の間に、張り出し部材が懸架出来るよう
に成し、少なくとも架台の操作側近くの底面部に2カ
所、及び、前記補強部材の張り出し部との取り付け部近
くの底面部にそれぞれ除振マウントを設けるようにした
ことを特徴としている。
Means for Solving the Problems A charged particle beam device of the present invention is a charged particle beam device in which a charged particle beam device main body is installed on a floor via a gantry, A reinforcing member detachably attached to the gantry is attached so as to extend outward from both side surfaces of the gantry, so that an overhang member can be suspended between the upper portion of the charged particle beam device main body and each reinforcing member. The vibration damping mounts are provided at least at two locations on the bottom surface near the operation side of the gantry and at the bottom surface near the attachment portion of the reinforcing member to the overhanging portion.

【0011】[0011]

【発明の実施の形態】以下、図面を参照して本発明の実
施の形態を詳細に説明する。
Embodiments of the present invention will be described below in detail with reference to the drawings.

【0012】図5は本発明の荷電粒子ビーム装置の一例
として電子顕微鏡の一概略例を示したもので、図中前記
図1にて使用した記号と同一記号の付されたものは同一
構成要素である。図中10,11は、架台4に取り付け
られる様になっている金属製の補強部材である。該補強
部材はカタカナのトの字状の形状に形成されており、例
えば補強部材10の二本の足10A,10Bが架台4の
側面の後ろ側(オペレータが観察する側を前側とした)
上下端部にそれぞれ取り付けられるように、各足の一方
の底面には、複数のネジ穴が開けられた取り付け板12
A,12Bが溶接などで取りで付けられている。尚、当
然のことながら、補強部材10が架台4に取り付けられ
る時に該各取り付け板12A,12Bが当てられる架台
4の対応部分には複数のネジ穴が開けられている。他方
の補強部材11の二本の足11A,11Bにも同様な取
り付け板が取り付けられており、該板を架台4に取り付
け時に該取り付け板が当てられる架台4の対応部分にも
前記と同様に複数のネジ穴が開けられている。
FIG. 5 shows a schematic example of an electron microscope as an example of the charged particle beam apparatus of the present invention. In the figure, the same reference numerals as those used in FIG. It is. Reference numerals 10 and 11 in the figure denote metal reinforcing members that can be attached to the gantry 4. The reinforcing member is formed in a katakana-shaped shape. For example, the two legs 10A and 10B of the reinforcing member 10 are behind the side surface of the gantry 4 (the side observed by the operator is the front side).
A mounting plate 12 having a plurality of screw holes is provided on one bottom surface of each leg so that the mounting plate 12 can be mounted on the upper and lower ends, respectively.
A and 12B are attached by welding or the like. It should be noted that a plurality of screw holes are formed in a corresponding portion of the gantry 4 to which the mounting plates 12A and 12B are applied when the reinforcing member 10 is attached to the gantry 4. A similar mounting plate is also attached to the two legs 11A and 11B of the other reinforcing member 11, and a corresponding portion of the mounting base 4 to which the mounting plate is applied when the plate is mounted on the mounting base 4 in the same manner as described above. Multiple screw holes are drilled.

【0013】13,14は前記補強部材10,11の他
端部と鏡筒1上部の間に懸架されるようになっている張
り出し部材である。該張り出し部材13は、その一方の
端部が補強部材10の他端部に取り付けられるように、
一方の端部の底面には、複数のネジ穴が開けられた取り
付け板15が溶接などで取りで付けられており、その他
方の端部が鏡筒1上部に取り付けられるように、該他方
の底面には、複数のネジ穴が開けられた取り付け板16
が溶接などで取りで付けられている。尚、当然のことな
がら、張り出し部材13が補強部材10に取り付けられ
る時に該取り付け板15が当てられる補強部材10の対
応部分には複数のネジ穴が開けられている。又、鏡筒上
部には取り付け環17が設けられており、前記張り出し
部材13が該鏡筒1上部に取り付けられる時に取り付け
板16が当てられる取り付け環19の対応部分には複数
のネジ穴が開けられている。同様に、前記張り出し部材
14は、その一方の端部が補強部材11の他端部に取り
付けられるように、一方の端部の底面には、複数のネジ
穴が開けられた取り付け板18が溶接などで取りで付け
られており、その他方の端部が鏡筒1上部に取り付けら
れるように、該他方の底面には、複数のネジ穴が開けら
れた取り付け板18が溶接などで取りで付けられてい
る。又、張り出し部材14が補強部材11に取り付けら
れる時に前記取り付け板18が当てられる補強部材11
の対応部分には複数のネジ穴が開けられており、鏡筒1
上部に取り付けられる時に取り付け板19が当てられる
取り付け環17の対応部分には複数のネジ穴が開けられ
ている。
Reference numerals 13 and 14 denote projecting members which are suspended between the other ends of the reinforcing members 10 and 11 and the upper part of the lens barrel 1. The overhanging member 13 has one end attached to the other end of the reinforcing member 10,
A mounting plate 15 having a plurality of screw holes is attached to the bottom surface of one end by welding or the like, and the other end is attached to the upper part of the lens barrel 1 so that the other end is attached to the top of the lens barrel 1. On the bottom surface, a mounting plate 16 having a plurality of screw holes is provided.
Is attached by welding or the like. It is needless to say that a plurality of screw holes are formed in a corresponding portion of the reinforcing member 10 to which the mounting plate 15 is applied when the projecting member 13 is mounted on the reinforcing member 10. A mounting ring 17 is provided on the upper part of the lens barrel, and a plurality of screw holes are formed in a corresponding portion of the mounting ring 19 to which the mounting plate 16 is applied when the overhang member 13 is mounted on the upper part of the lens barrel 1. Have been. Similarly, a mounting plate 18 having a plurality of screw holes is welded to the bottom surface of one end of the projecting member 14 so that one end of the projecting member 14 is attached to the other end of the reinforcing member 11. On the other bottom surface, a mounting plate 18 having a plurality of screw holes is mounted by welding or the like so that the other end is mounted on the upper part of the lens barrel 1. Have been. Further, when the overhang member 14 is attached to the reinforcing member 11, the reinforcing member 11
A plurality of screw holes are drilled in the corresponding part of
A plurality of screw holes are formed in a corresponding portion of the mounting ring 17 to which the mounting plate 19 is applied when mounted on the upper portion.

【0014】前記各補強部材10,11の足10A,1
1Aの底部の両端部には、コイルバネ,空気バネ,或い
は除振ゴムの如き除振マウント21,22,23,24
が取り付けられている。尚、架台4の前側(オペレータ
が観察する側)の両端部にも除振マウント(図せず)が
取り付けられている。
The legs 10A, 1 of the reinforcing members 10, 11
At both ends of the bottom of 1A, vibration isolation mounts 21, 22, 23, 24 such as coil springs, air springs or vibration isolation rubbers are provided.
Is attached. Note that anti-vibration mounts (not shown) are also attached to both ends on the front side (the side observed by the operator) of the gantry 4.

【0015】しかして、工場にて組み立てた顕微鏡本体
(鏡筒1及び架台4等)を設置すべき部屋の床3上の所
定位置に設置する。そして、補強部材10の各足10
A,10Bの取り付け板12A,12Bを架台4の一方
の側面後側の上下端にそれぞれネジで固定することによ
り、補強部材10を架台4に固定し、同様に、補強部材
11の各足11A,11Bの取り付け板(図示せず)を
架台4の他方の側面後側の上下端にそれぞれネジで固定
することにより、補強部材11を架台4に固定する。こ
の様な固定により、架台4は、該架台の前側で二カ所、
後ろ側で四カ所、除振マウントを介して床3上に設置さ
れることになる。
Thus, the microscope main body (the lens barrel 1 and the gantry 4 etc.) assembled in the factory is installed at a predetermined position on the floor 3 of the room to be installed. And each leg 10 of the reinforcing member 10
The reinforcing members 10 are fixed to the gantry 4 by fixing the mounting plates 12A and 12B of the gantry 4 to the upper and lower ends on the rear side of one side of the gantry 4, respectively. , 11B are fixed to the upper and lower ends of the rear side of the other side surface of the gantry 4 by screws, whereby the reinforcing member 11 is fixed to the gantry 4. With such fixation, the gantry 4 is located at two places in front of the gantry,
It is installed on the floor 3 via four anti-vibration mounts on the rear side.

【0016】次に、張り出し部材13の各取り付け板1
6,15をそれぞれ鏡筒上部の取り付け環17の後ろ側
と前記補強部材10にネジで固定し、同様に、張り出し
部材14の各取り付け板19,18をそれぞれ鏡筒上部
の取り付け環17の後ろ側と前記補強部材11にネジで
固定する。
Next, each mounting plate 1 of the projecting member 13
6, 15 are fixed to the rear side of the mounting ring 17 at the upper part of the lens barrel and the reinforcing member 10 by screws. It is fixed to the side and the reinforcing member 11 with screws.

【0017】この様に、架台4の両側面の後ろ側におい
て、各補強部材を架台に取り付け、張り出し部材を鏡筒
上部と補強部材間に取り付けたのは、電子顕微鏡の前側
(オペレータの観察側)の左右側には、通常、操作部コ
ンソール等が備えられており、補強部材や張り出し部材
を取り付ける空間が少ないからである。
As described above, the reinforcing members are attached to the pedestal and the projecting members are attached between the upper part of the lens barrel and the reinforcing members behind the both side surfaces of the gantry 4 on the front side of the electron microscope (observation side of the operator). This is because an operation unit console and the like are usually provided on the left and right sides of the parentheses, and there is little space for attaching a reinforcing member or a projecting member.

【0018】この様にして、架台4に取り付けた補強部
材と鏡筒上部間に張り出し部材を懸架することにより、
鏡筒部の剛性を飛躍的に高めることが出来る。しかも、
鏡筒上部二カ所各々から架台後部のそれぞれ離れた箇所
に張り出し部材を懸架するように成したので、鏡筒の左
右方向だけではなく、前後方向の剛性を高めることが出
来る。その為、鏡筒1の一次の振動モードの周波数が大
幅に引き上げられることになり、床3からの振動に対し
共振を起こしにくくなる。即ち、床3からの振動の影響
を受けにくくなり、その振幅も著しく小さく抑えること
が出来る。その結果、床振動による顕微鏡像への影響が
大幅に低減される。
In this way, by suspending the projecting member between the reinforcing member attached to the gantry 4 and the upper part of the lens barrel,
The rigidity of the lens barrel can be dramatically increased. Moreover,
Since the projecting members are suspended from the two upper positions of the lens barrel at positions separated from the rear of the gantry, the rigidity of the lens barrel not only in the left-right direction but also in the front-rear direction can be increased. For this reason, the frequency of the primary vibration mode of the lens barrel 1 is greatly increased, and resonance with respect to vibration from the floor 3 is less likely to occur. That is, it is hard to be affected by the vibration from the floor 3, and the amplitude can be suppressed to be extremely small. As a result, the influence of the floor vibration on the microscope image is significantly reduced.

【0019】又、補強部材及び張り出し部材を付けずに
鏡筒本体を設置場所に搬入させ、搬入後に、補強部材及
び張り出し部材を鏡筒本体に取り付けることが出来るよ
うに成したので、研究室等の設置箇所への搬入が容易に
なるばかりか、補強部材の長さを大きくでき、末広がり
取り付けられる張り出し部材の広がり角度も大きくでき
るので、エアーマウントの如き高性能除振部材を補強部
材に取り付けることが出来る。又、長い補強部材の両端
部に除振部材を取り付けれるので、鏡筒のロッキングの
振幅を抑えることが出来、鏡筒の転倒の恐れが全くな
く、エアーマウントの如き除振マウントを安定に働かせ
ることが出来る。その結果、鏡筒本体への床振動の伝達
を低く抑えることが出来、その結果、床振動による顕微
鏡像への影響が大幅に低減される。
Further, since the lens barrel main body is carried into the installation place without attaching the reinforcing member and the overhanging member, and the reinforcement member and the overhanging member can be attached to the lens barrel main body after the carrying in, the laboratory and the like are provided. In addition to making it easier to carry in the installation location, the length of the reinforcing member can be increased, and the divergent angle of the overhanging flared member can be increased, so a high-performance vibration isolation member such as an air mount must be attached to the reinforcing member. Can be done. In addition, since the vibration isolating members can be attached to both ends of the long reinforcing member, the amplitude of the locking of the lens barrel can be suppressed, and there is no possibility of the lens barrel tipping over, so that a vibration isolating mount such as an air mount works stably. I can do it. As a result, transmission of floor vibration to the lens barrel main body can be suppressed low, and as a result, the influence of floor vibration on a microscope image is significantly reduced.

【0020】又、前記パッシブな除振マウントは、床か
らの振動の中で、鏡筒本体の振動の周波数と一致する周
波数を抑えることが出来ないことから、最近そのような
問題を解決するためにアクティブ除振系が適用されてい
るが、鏡筒部の剛性を飛躍的に高めることが出来ること
により、このアクティブ除振系の効果が更に向上する。
尚、前記例では2本の張り出し部材を設けるように成
したが、3本以上の張り出し部材を設けるように成して
も良い。
In addition, the passive anti-vibration mount cannot suppress a frequency corresponding to the frequency of vibration of the lens barrel main body among vibrations from the floor. Although the active vibration isolation system is applied to the system, the rigidity of the lens barrel can be significantly increased, so that the effect of the active vibration isolation system is further improved.
In the above example, two projecting members are provided, but three or more projecting members may be provided.

【0021】又、補強部材は前記例に限定されない。例
えば、図5の20に示す如き構造のものでも良い。この
場合には、架台4側にそれぞれネジ穴が開けられた取り
付け板25A,25B,25C,25Dを取り付けてお
く。そして、各取り付け板に開けられたネジ穴を通して
補強部材20をネジをねじ込み、補強部材20を架台4
に取り付ける。
Further, the reinforcing member is not limited to the above example. For example, a structure as shown in FIG. In this case, mounting plates 25A, 25B, 25C, and 25D each having a screw hole are mounted on the gantry 4 side. Then, a screw is screwed into the reinforcing member 20 through a screw hole formed in each mounting plate, and the reinforcing member 20 is attached to the base 4.
Attach to

【0022】又、前記例では、補強部材の底面部に4つ
の除振マウントを設けるように成したが、架台からより
離れた端部の除振マウント(両端部のマウント)を主の
マウントとし、架台に近い側の2つのマウント(中間部
のマウント)を補助マウントとした場合には、後者の補
助マウントは取り除いても良い。尚、中間部のマウント
を架台の底面に設けず、架台の底面に設けても良い。
又、前記例では電子顕微鏡を例に上げたが、本発明は、
走査電子顕微鏡,電子ビーム描画装置,イオンビーム加
工装置等の荷電粒子ビーム装置にも応用可能であること
はいうまでもない。尚、電子顕微鏡の像観察室の部分
が、電子ビーム描画装置やイオンビーム加工装置におい
ては、描画(加工)すべきターゲットがセットされた描
画(加工)室に当たり、走査電子顕微鏡においては観察
すべ試料室が当たると考えら、これら描画(加工)室や
試料室を便宜上、ターゲツト室と称すことにする。
In the above example, four anti-vibration mounts are provided on the bottom surface of the reinforcing member, but the anti-vibration mounts at the ends farther from the gantry (mounts at both ends) are used as main mounts. When two mounts (mounts in the middle) on the side close to the gantry are used as auxiliary mounts, the latter auxiliary mount may be omitted. The mount at the intermediate portion may not be provided on the bottom of the gantry, but may be provided on the bottom of the gantry.
Also, in the above example, an electron microscope was taken as an example, but the present invention
Needless to say, the present invention can be applied to a charged particle beam device such as a scanning electron microscope, an electron beam drawing device, and an ion beam processing device. In an electron microscope, an image observation room corresponds to a drawing (processing) room in which a target to be drawn (processed) is set in an electron beam drawing apparatus or an ion beam processing apparatus. The drawing (processing) room and the sample room are referred to as a target room for convenience.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 電子顕微鏡の1概略例を示したものである。FIG. 1 shows a schematic example of an electron microscope.

【図2】 除振系の一次の振動モードを示したものであ
る。
FIG. 2 shows a primary vibration mode of a vibration isolation system.

【図3】 除振系の二次の振動モードを示したものであ
る。
FIG. 3 shows a secondary vibration mode of the vibration isolation system.

【図4】 除振系の共振周波数を除く鏡筒本体の一次の
振動モードを示したものである。
FIG. 4 shows a primary vibration mode of the lens barrel main body excluding the resonance frequency of the vibration isolation system.

【図5】 本発明の荷電粒子ビーム装置の一例として電
子顕微鏡の一概略例を示したものである。
FIG. 5 shows a schematic example of an electron microscope as an example of the charged particle beam device of the present invention.

【図6】 補強部材の他の例を示したものである。FIG. 6 shows another example of a reinforcing member.

【符号の説明】[Explanation of symbols]

1…鏡筒 2…像観察室 3…床 4…架台 5…ベースプレート 6A,6B,6C,6D、21,22,23,24…除
振マウント 10,11,20…補強部材 10A,10B,11A,11B…足 12A,12B,15,16,18,19…取り付け板 17…取り付け環
DESCRIPTION OF SYMBOLS 1 ... Barrel 2 ... Image observation room 3 ... Floor 4 ... Stand 5 ... Base plate 6A, 6B, 6C, 6D, 21, 22, 23, 24 ... Anti-vibration mount 10, 11, 20 ... Reinforcement member 10A, 10B, 11A , 11B ... feet 12A, 12B, 15, 16, 18, 19 ... mounting plate 17 ... mounting ring

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 床の上に架台を介して荷電粒子ビーム装
置本体が設置されている荷電粒子ビーム装置において、
架台の反操作側近くに、該架台に取り外し可能に取り付
けられる補強部材が、前記架台の両側面より外側に延び
る様に取り付けられる様に成し、荷電粒子ビーム装置本
体上部と各補強部材の間に、張り出し部材が懸架出来る
ように成し、少なくとも架台の操作側近くの底面部に2
カ所、及び、前記補強部材の張り出し部との取り付け部
近くの底面部にそれぞれ除振マウントを設けるようにし
た荷電粒子ビーム装置。
1. A charged particle beam apparatus in which a charged particle beam apparatus main body is installed on a floor via a gantry,
A reinforcing member detachably attached to the gantry is mounted near the non-operating side of the gantry so as to extend outward from both side surfaces of the gantry, and is provided between the upper portion of the charged particle beam device main body and each reinforcing member. In addition, the overhanging member can be suspended, and at least the bottom surface near the operation side of the gantry should be
A charged particle beam apparatus wherein vibration isolation mounts are respectively provided at a position and a bottom portion near a portion where the reinforcing member is attached to a projecting portion.
【請求項2】 荷電粒子ビーム本体は電子光学系鏡筒及
び、像観察室若しくはターゲット室を備えている請求項
1記載の荷電粒子ビーム装置。
2. The charged particle beam apparatus according to claim 1, wherein the charged particle beam main body includes an electron optical system lens barrel and an image observation room or a target room.
【請求項3】 前記張り出し部材が2本以上懸架される
ように成した請求項1記載の荷電粒子ビーム装置。
3. The charged particle beam device according to claim 1, wherein two or more projecting members are suspended.
【請求項4】 少なくとも、前記補強部材の張り出し部
当接近くの底面部に設ける除振マウントはエアーマウン
トである請求項1記載の荷電粒子ビーム装置。
4. The charged particle beam device according to claim 1, wherein at least the vibration isolation mount provided on the bottom surface near the overhang portion of the reinforcing member is an air mount.
【請求項5】 荷電粒子ビーム本体上部の反操作側と補
強部材間に張り出し部材が懸架される請求項1記載の荷
電粒子ビーム装置。
5. The charged particle beam apparatus according to claim 1, wherein a projecting member is suspended between the counter-operation side of the upper portion of the charged particle beam main body and the reinforcing member.
【請求項6】 架台の反操作側近くの少なくとも上下端
部で補強部材が取り付けられるように成した請求項1記
載の荷電粒子ビーム装置。
6. The charged particle beam apparatus according to claim 1, wherein a reinforcing member is attached at least at upper and lower ends near the non-operation side of the gantry.
JP27282899A 1999-09-27 1999-09-27 Charged particle beam device Withdrawn JP2001093456A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27282899A JP2001093456A (en) 1999-09-27 1999-09-27 Charged particle beam device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27282899A JP2001093456A (en) 1999-09-27 1999-09-27 Charged particle beam device

Publications (1)

Publication Number Publication Date
JP2001093456A true JP2001093456A (en) 2001-04-06

Family

ID=17519343

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27282899A Withdrawn JP2001093456A (en) 1999-09-27 1999-09-27 Charged particle beam device

Country Status (1)

Country Link
JP (1) JP2001093456A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010113810A (en) * 2008-11-04 2010-05-20 Jeol Ltd Transmission electron microscope
JP2010219373A (en) * 2009-03-18 2010-09-30 Nuflare Technology Inc Lithography apparatus
WO2011043391A1 (en) * 2009-10-07 2011-04-14 株式会社日立ハイテクノロジーズ Charged particle radiation device
WO2013015019A1 (en) * 2011-07-25 2013-01-31 株式会社日立ハイテクノロジーズ Charged particle device

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010113810A (en) * 2008-11-04 2010-05-20 Jeol Ltd Transmission electron microscope
JP2010219373A (en) * 2009-03-18 2010-09-30 Nuflare Technology Inc Lithography apparatus
WO2011043391A1 (en) * 2009-10-07 2011-04-14 株式会社日立ハイテクノロジーズ Charged particle radiation device
JPWO2011043391A1 (en) * 2009-10-07 2013-03-04 株式会社日立ハイテクノロジーズ Charged particle beam equipment
US8729467B2 (en) 2009-10-07 2014-05-20 Hitachi High-Technologies Corporation Charged particle radiation device
JP5524229B2 (en) * 2009-10-07 2014-06-18 株式会社日立ハイテクノロジーズ Charged particle beam equipment
WO2013015019A1 (en) * 2011-07-25 2013-01-31 株式会社日立ハイテクノロジーズ Charged particle device
JP2013026150A (en) * 2011-07-25 2013-02-04 Hitachi High-Technologies Corp Charged particle device
CN103597571A (en) * 2011-07-25 2014-02-19 株式会社日立高新技术 Charged particle device
US8927930B2 (en) 2011-07-25 2015-01-06 Hitachi High-Technologies Corporation Charged particle device

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