JPWO2014199991A1 - Cover member, display device, and method of manufacturing cover member - Google Patents

Abstract

Provided is a cover member in which an antifouling film is difficult to peel off. The cover member 1 includes a base material 10 and an antifouling film 20. The substrate 10 includes a substrate body 11 and a silicon oxide layer 12L1. The silicon oxide layer 12L1 is disposed on the base body 11. The silicon oxide layer 12L1 constitutes the outermost layer of the base material 10. The antifouling film 20 is disposed on the silicon oxide layer 12L1. The antifouling film 20 contains a fluorine-containing polymer. The fluorine-containing polymer contains silicon in the main chain. The surface roughness of the surface of the silicon oxide layer 12L1 is 0.5 nm or less in terms of arithmetic average roughness (Ra) defined by JIS B0601-2001.

Description

  The present invention relates to a cover member, a display device including the same, and a method for manufacturing the cover member.

  Conventionally, a display device is provided with a cover member that protects the display surface. The cover member is required to be resistant to contamination in addition to high mechanical strength. For this reason, for example, Patent Document 1 proposes to provide an antifouling film on the outermost surface of the cover member.

International Publication No. 2011-066496

  When the antifouling film peels off due to the antifouling film coming into contact with fingers or other members, the antifouling properties are deteriorated. For this reason, there is a demand for suppressing peeling of the antifouling film.

  A main object of the present invention is to provide a cover member from which an antifouling film is difficult to peel off.

  The first cover member according to the present invention includes a base material and an antifouling film. The substrate has a substrate body and a silicon oxide layer. The silicon oxide layer is disposed on the substrate body. The silicon oxide layer constitutes the outermost layer of the substrate. The antifouling film is disposed on the silicon oxide layer. The antifouling film contains a fluoropolymer. The fluorine-containing polymer contains silicon in the main chain. The surface roughness of the surface of the silicon oxide layer is 0.5 nm or less in terms of arithmetic average roughness (Ra) defined by JIS B0601-2001.

  In the first cover member according to the present invention, the surface roughness of the antifouling film is preferably 0.5 nm or less in terms of arithmetic average roughness (Ra) defined by JIS B0601-2001.

  The second cover member according to the present invention includes a base material and an antifouling film. The substrate has a substrate body and a silicon oxide layer. The silicon oxide layer is disposed on the substrate body. The silicon oxide layer constitutes the outermost layer of the substrate. The antifouling film is disposed on the silicon oxide layer. The antifouling film contains a fluoropolymer. The fluorine-containing polymer contains silicon in the main chain. The surface roughness of the surface of the antifouling film is 0.5 nm or less in terms of arithmetic average roughness (Ra) defined by JIS B0601-2001.

  The 3rd cover member concerning the present invention is provided with a substrate. The substrate has a substrate body and a silicon oxide layer. The silicon oxide layer is disposed on the substrate body. The silicon oxide layer constitutes the outermost layer of the substrate. The surface roughness of the surface of the silicon oxide layer is 0.5 nm or less in terms of arithmetic average roughness (Ra) defined by JIS B0601-2001.

  In the first, second, or third cover member according to the present invention, the base material is disposed on the base body, and has a silicon oxide layer and a high refractive index having a higher refractive index than the silicon oxide layer. A multilayer film including a layer may be included. In that case, the surface roughness of each layer constituting the multilayer film is preferably 0.5 nm or less in terms of arithmetic average roughness (Ra) defined by JIS B0601-2001.

  The multilayer film is disposed between a low refractive index layer having a relatively low refractive index, including a silicon oxide layer, a high refractive index layer, and a high refractive index layer and a low refractive index layer. It is preferable to include a middle refractive index layer having a refractive index located between the refractive index of the refractive index layer and the refractive index of the low refractive index layer.

  The middle refractive index layer preferably includes both cations contained in the low refractive index layer adjacent to the middle refractive index layer and cations contained in the high refractive index layer adjacent to the middle refractive index layer.

  It is preferable that the surface roughness of the base body is 0.5 nm or less in terms of arithmetic average roughness (Ra) defined by JIS B0601-2001.

  The surface of the substrate body is preferably an unpolished surface.

  The base body may be made of glass. The base body may be made of tempered glass.

  It is preferable that the base body is composed of a glass plate formed by an overflow downdraw method.

  The silicon molar ratio ((silicon) / (cation)) in the cation contained in the silicon oxide layer is preferably 0.9 or more.

  The silicon oxide layer may contain aluminum.

  A display device according to the present invention includes the first, second, or third cover member according to the present invention, and a display device body. The display device body has a display surface. The display surface is covered with a cover member.

  The manufacturing method of the cover member which concerns on this invention is related with the method of manufacturing the 1st, 2nd or 3rd cover member which concerns on this invention. In the method for manufacturing a cover member according to the present invention, the silicon oxide layer is formed by a sputtering method in a chamber having a pressure of 0.15 Pa or less.

  ADVANTAGE OF THE INVENTION According to this invention, the cover member from which an antifouling film | membrane cannot peel easily can be provided.

It is a schematic sectional drawing of the cover member which concerns on 1st Embodiment. 1 is a schematic cross-sectional view of a multilayer film according to a first embodiment. It is a schematic sectional drawing of the base material in 1st Embodiment. It is a schematic sectional drawing of the multilayer film in 2nd Embodiment. FIG. 6 is a schematic exploded perspective view of a display device according to a third embodiment. It is a typical side view for demonstrating the 1st adhesion strength evaluation performed in Example 1,2. It is a graph showing the relationship between the number of reciprocations and the contact angle of water in Examples 1 and 2 and Comparative Examples 1 and 2 (first adhesion strength evaluation). It is a graph showing the relationship between the number of reciprocations and the contact angle of water in Examples 1 and 2 and Comparative Examples 1 and 2 (second adhesion strength evaluation).

  Hereinafter, an example of the preferable form which implemented this invention is demonstrated. However, the following embodiment is merely an example. The present invention is not limited to the following embodiments.

  Moreover, in each drawing referred in embodiment etc., the member which has a substantially the same function shall be referred with the same code | symbol. The drawings referred to in the embodiments and the like are schematically described. A ratio of dimensions of an object drawn in a drawing may be different from a ratio of dimensions of an actual object. The dimensional ratio of the object may be different between the drawings. The specific dimensional ratio of the object should be determined in consideration of the following description.

(First embodiment)
FIG. 1 is a schematic cross-sectional view of a cover member according to the first embodiment. The cover member 1 shown in FIG. 1 is used, for example, to protect the surfaces of various devices such as display devices, display objects, and buildings.

  The cover member 1 has a base material 10 and an antifouling film 20.

  The substrate 10 includes a substrate main body 11 and a multilayer film 12. The substrate body 11 is not particularly limited as long as it can support the multilayer film 12 and the antifouling film 20. The substrate body 11 may be a plate. In that case, the thickness of the base body 11 is preferably about 0.1 mm to 0.7 mm.

  When the cover member 1 is required to have translucency, the substrate body 11 preferably has translucency. But when the translucency is not requested | required of the cover member 1, the base-material main body 11 does not necessarily need to have translucency.

The base body 11 can be made of, for example, glass, single crystal, resin, or the like. From the viewpoint of realizing the base body 11 having high mechanical strength, high light transmittance, and low cost, the base body 11 is made of glass such as tempered glass, alkali-free glass, or soda glass. It is preferable. Especially, it is preferable that the base-material main body 11 is comprised with the tempered glass. As a specific example of the tempered glass preferably used for the substrate main body 11, for example, as a glass composition, by mass%, SiO ₂ 50 to 80%, Al ₂ O ₃ 5 to 25%, B ₂ O _{3 0 to} 15%. And tempered glass containing Na ₂ O 1-20% and K ₂ O 0-10% and having a compressive stress layer by ion exchange on the surface.

  FIG. 2 is a schematic cross-sectional view of the multilayer film according to the first embodiment.

  The multilayer film 12 is disposed on the base body 11. The multilayer film 12 includes a high refractive index layer 12H and a low refractive index layer 12L. The high refractive index layer 12H has a relatively high refractive index, and the low refractive index layer 12L has a relatively low refractive index. In the multilayer film 12, high refractive index layers 12H and low refractive index layers 12L are alternately arranged. For this reason, the multilayer film 12 has a function of suppressing surface reflection. Therefore, the multilayer film 12 constitutes an anti-reflection film (AR (Anti-reflection) film).

  The high refractive index layer 12H includes, for example, niobium oxide, titanium oxide, lanthanum oxide, yttrium oxide, tantalum oxide, tungsten oxide, silicon nitride, aluminum nitride, niobium nitride, titanium nitride, lanthanum nitride, yttrium nitride, tantalum nitride, tungsten nitride. Etc. can be configured. The low refractive index layer 12L can be made of, for example, silicon oxide, aluminum oxide, or the like.

  The number of layers of the high refractive index layer 12H and the low refractive index layer 12L constituting the multilayer film 12 and the thickness of each layer depend on, for example, the wavelength range in which reflection is to be suppressed, the required reflectance, and the like. It can be set appropriately. The number of high refractive index layers 12H and low refractive index layers 12L constituting the multilayer film 12 is, for example, preferably about 2 to 18, and more preferably about 4 to 10. The thickness of each layer constituting the multilayer film 12 can be, for example, about 5 nm to 200 nm. The thickness of the entire multilayer film 12 can be set to, for example, about 300 nm to 400 nm.

  The outermost surface of the multilayer film 12 is composed of a low refractive index layer 12L. The low refractive index layer 12L constituting the outermost surface of the multilayer film 12 is composed of a silicon oxide layer 12L1. Note that the silicon oxide layer 12L1 only needs to contain silicon oxide. Silicon oxide layer 12L1 may contain other atoms such as aluminum in addition to silicon oxide. The silicon oxide layer 12L1 may be made of silicon oxide doped with atoms other than silicon, such as aluminum. That is, the silicon oxide layer 12L1 is not necessarily made of only silicon oxide. When the silicon oxide layer 12L1 contains a cation other than silicon, the molar ratio of silicon in the cation contained in the silicon oxide layer 12L1 ((silicon) / (cation)) is preferably 0.9 or more.

  An antifouling film 20 is provided on the silicon oxide layer 12L1. The antifouling film 20 is a film for preventing the surface of the cover member 1 from being contaminated. The antifouling film 20 contains a fluorine-containing polymer containing silicon in the main chain. For this reason, the antifouling film 20 has water repellency. The antifouling film 20 preferably has water repellency and oil repellency. The fluorine-containing polymer contained in the antifouling film 20 has, for example, a siloxane bond (—Si—O—Si—) in the main chain and a water-repellent functional group containing fluorine in the side chain. It may be a polymer. The fluorine-containing polymer can be synthesized, for example, by dehydrating condensation of silanol.

  The thickness of the antifouling film 20 is, for example, preferably about 1 nm to 30 nm, and more preferably 4 nm to 20 nm.

  Next, an example of a method for manufacturing the cover member 1 will be described. First, as shown in FIG. 3, the multilayer film 12 is formed on the base body 11. The multilayer film 12 can be formed by, for example, a sputtering method, a vapor deposition method, or the like.

  Next, as shown in FIG. 2, an antifouling film 20 is formed on the silicon oxide layer 12 </ b> L <b> 1 constituting the outermost layer of the multilayer film 12. The antifouling film 20 can be formed, for example, by applying a silanol or a liquid containing silanol having a hydroxyl group substituted with an alkoxyl group on the silicon oxide layer 12L1 and dehydrating and condensing it.

  In addition, the glass plate for comprising the base-material main body 11 can be manufactured using the overflow down draw method, for example. It is preferable to leave the surface of the produced glass plate unpolished and leave it as an unpolished surface, because the surface roughness of the substrate body can be 0.5 nm or less in terms of arithmetic average roughness (Ra). Moreover, it is good also as a tempered glass board by carrying out the tempering process by ion-exchange the manufactured glass board.

  By forming the glass plate by the overflow down draw method, it is possible to produce flat glass having a good surface quality without being polished. The reason is that, in the case of the overflow downdraw method, the surface to be the surface of the glass plate is not in contact with the bowl-like refractory and is molded in a free surface state. Here, the overflow down draw method is a flat plate shape in which molten glass is overflowed from both sides of a heat-resistant bowl-shaped structure, and the molten glass overflowed is joined at the lower end of the bowl-shaped structure and stretched downward. It is a method of manufacturing the glass. The structure and material of the bowl-shaped structure are not particularly limited as long as the dimensions and surface accuracy of the glass are in a desired state and a desired quality can be realized. Further, a force may be applied to the glass by any method in order to perform downward stretching. For example, a method may be adopted in which a heat-resistant roll having a sufficiently large width is rotated and stretched in contact with glass, or a plurality of pairs of heat-resistant rolls are contacted only near the end face of the glass. It is also possible to adopt a method of stretching by stretching.

  Moreover, the glass plate for comprising the base-material main body 11 can also be manufactured by methods other than the overflow downdraw method, for example. The glass plate for constituting the base body 11 can be manufactured by, for example, a downdraw method such as a slot down method or a redraw method.

  By the way, the cover member is required to have high adhesion strength between the base material and the antifouling film. Generally, it is considered that the adhesion strength between the base material and the antifouling film increases as the surface roughness (Ra) of the surface of the base material, that is, the surface of the silicon oxide layer increases. This is because the surface area of the interface between the base material and the antifouling film increases, and the acting anchor effect becomes stronger.

  However, as a result of intensive studies by the present inventors, it has been found that the adhesion strength between the substrate 10 and the antifouling film 20 is improved when the surface roughness (Ra) of the surface of the silicon oxide layer 12L1 is reduced. It was. Therefore, in this embodiment, the surface roughness of the surface of the silicon oxide layer 12L1 is 0.5 nm or less in terms of arithmetic average roughness (Ra) defined by JIS B0601-2001. For this reason, the adhesion strength between the silicon oxide layer 12L1 and the antifouling film 20 is high. Therefore, the antifouling film 20 is difficult to peel off. As a result, the antifouling property of the cover member 1 is unlikely to deteriorate. From the viewpoint of more effectively suppressing peeling of the antifouling film 20, the surface roughness of the silicon oxide layer 12L1 is 0.3 nm or less in terms of arithmetic average roughness (Ra) defined by JIS B0601-2001. More preferably.

  Usually, since the antifouling film 20 is thin, the surface roughness of the surface of the silicon oxide layer 12L1 correlates with the surface roughness of the surface of the antifouling film 20. For this reason, when the surface roughness of the antifouling film 20 is 0.5 nm or less in arithmetic average roughness (Ra) defined by JIS B0601-2001, the surface roughness of the surface of the silicon oxide layer 12L1 is also The arithmetic average roughness (Ra) defined in JIS B0601-2001 is considered to be 0.5 nm or less. Therefore, when the surface roughness of the antifouling film 20 is 0.5 nm or less in arithmetic average roughness (Ra) defined by JIS B0601-2001, peeling of the antifouling film 20 is suppressed. From the viewpoint of more effectively suppressing the peeling of the antifouling film 20, the surface roughness of the antifouling film 20 is 0.3 nm or less in terms of arithmetic average roughness (Ra) defined by JIS B0601-2001. More preferably.

  The reason why the adhesion strength between the substrate 10 and the antifouling film 20 is improved by reducing the surface roughness (Ra) of the surface of the silicon oxide layer 12L1 is not clear, but the following reasons are conceivable. .

  As described above, a dehydration condensation reaction occurs when the antifouling film 20 is formed. Since there are hydroxyl groups bonded to silicon on the surface of the silicon oxide layer 12L1, not only dehydration condensation occurs between silanols, but also hydroxyl groups present on the surface of the silicon oxide layer 12L1 and silanols. Alternatively, a dehydration condensation reaction occurs with the hydroxyl group of the silanol polymer. Accordingly, the adhesion strength between the silicon oxide layer 12L1 and the antifouling film 20 is determined by the dehydration condensation reaction generated between the hydroxyl group present on the surface of the silicon oxide layer 12L1 and the hydroxyl group of silanol or a polymer of silanol. This is considered to depend on the quantity per unit area of Si—O—Si bonds formed by the above. Here, when the surface roughness of the silicon oxide layer 12L1 is as small as 0.5 nm or less in arithmetic average roughness (Ra) defined by JIS B0601-2001, hydroxyl of silanol or a polymer of silanol is used. The quantity per unit area of hydroxyl groups on the surface of the silicon oxide layer 12L1 that can react with the groups is large. Therefore, when the surface roughness of the surface of the silicon oxide layer 12L1 is as small as 0.5 nm or less in arithmetic average roughness (Ra) defined by JIS B0601-2001, the silicon oxide layer 12L1 and the antifouling film It is considered that the adhesion strength with 20 is improved.

  The surface roughness of the surface of the silicon oxide layer 12L1 correlates with the surface roughness of the surface of the base body 11 and the surface roughness of the surfaces of the layers constituting the multilayer film 12. For this reason, the surface roughness of the surface of the substrate body 11 and the surface roughness of the surface of each layer constituting the multilayer film 12 are arithmetic average roughness (Ra) defined in JIS B0601-2001, respectively. The thickness is preferably 0.5 nm or less, and more preferably 0.3 nm or less. From the viewpoint of reducing the surface roughness of the surface of the substrate body 11, the surface of the substrate body 11 is preferably an unpolished surface, and the substrate body 11 is composed of a glass plate formed by the overflow downdraw method. It is preferable that

  As described above, from the viewpoint of increasing the adhesion strength between adjacent layers in the multilayer film 12, it is common to form each layer so that the surface roughness of the surface of each layer constituting the multilayer film 12 is increased. is there. For example, when the film is formed by sputtering, the surface roughness of the layer increases as the pressure in the chamber is increased. Therefore, when the film is formed by the sputtering method, the pressure of the chamber is usually set as high as about 0.3 Pa to 0.6 Pa.

  On the other hand, in this embodiment, in order to reduce the surface roughness of the silicon oxide layer 12L1, the multilayer film 12 is formed by sputtering in a chamber having a pressure of 0.15 Pa or less, more preferably 0.1 Pa or less. Each constituent layer is formed. If the pressure in the chamber is too low, it is difficult to stably form a layer. Therefore, the pressure in the chamber during sputtering is not usually reduced to 0.03 Pa or less. The pressure of the chamber when forming each layer constituting the multilayer film 12 by sputtering is preferably 0.05 Pa or more.

  The silicon oxide layer 12L1 preferably contains aluminum in order to improve chemical durability. The molar ratio of aluminum in the cation contained in the silicon oxide layer 12L1 ((aluminum) / (cation)) is preferably about 0.02 to 0.1, and is preferably about 0.04 to 0.06. More preferred.

  In the present embodiment, an example in which the multilayer film 12 is provided on the base body 11 in order to provide the cover member 1 with a reflection suppressing function has been described. However, the present invention is not limited to this configuration. For example, only the silicon oxide layer may be formed on the base body 11.

  Hereinafter, other examples of preferred embodiments of the present invention will be described. In the following description, members having substantially the same functions as those of the first embodiment are referred to by the same reference numerals, and description thereof is omitted.

(Second Embodiment)
FIG. 4 is a schematic cross-sectional view of the multilayer film according to the second embodiment.

  The cover member according to the present embodiment is different from the cover member 1 according to the first embodiment in that the multilayer film 12 includes a medium refractive index layer 12M.

  In the present embodiment, in the multilayer film 12, an intermediate refractive index layer 12M is provided between the high refractive index layer 12H and the low refractive index layer 12L. The refractive index of the medium refractive index layer 12M is lower than the refractive index of the high refractive index layer 12H adjacent to the medium refractive index layer 12M, and is higher than the refractive index of the low refractive index layer 12L adjacent to the medium refractive index layer 12M. high. The medium refractive index layer 12M includes both cations included in the high refractive index layer 12H adjacent to the medium refractive index layer 12M and cations included in the low refractive index layer 12L adjacent to the medium refractive index layer 12M. . By providing such a medium refractive index layer 12M, the adhesion strength between the high refractive index layer 12H and the low refractive index layer 12L can be improved.

  Specifically, for example, when the low refractive index layer 12L is made of silicon oxide and the high refractive index layer 12H is made of niobium oxide, the middle refractive index layer 12M made of a composite oxide of silicon and niobium is provided. Is preferred.

(Third embodiment)
FIG. 5 is a schematic exploded perspective view of a display device according to the third embodiment. As shown in FIG. 5, the display device 2 includes a device main body 30 and a cover member 1. The apparatus main body 30 has a display surface 31 on one main surface. The cover member 1 is disposed on one main surface on which the display surface 31 of the apparatus main body 30 is provided. The display surface 31 is covered with the cover member 1.

  As described above, in the cover member 1, the antifouling film 20 is difficult to peel off. For this reason, the antifouling property of the cover member 1 is unlikely to deteriorate. Therefore, the visibility of the display device 2 is unlikely to decrease.

  The display device 2 may be, for example, a mobile terminal such as a mobile phone, a smartphone, or a tablet personal computer, or may be a display device that is used in a fixed manner.

  Hereinafter, the present invention will be described in more detail on the basis of specific examples. However, the present invention is not limited to the following examples, and may be appropriately modified and implemented without departing from the scope of the present invention. Is possible.

(Example)
On the surface consisting of the unpolished surface of a tempered glass plate (T2X-1 manufactured by Nippon Electric Glass Co., Ltd.) produced by ion-exchange of alkali aluminosilicate glass produced by the overflow method, the multilayer structure shown in Table 1 The film was formed by sputtering at a pressure in the chamber of 0.056 Pa.

  Next, a fluorine-based coating agent (Optool (registered trademark) manufactured by Daikin) is applied on the multilayer film and dried to form an antifouling film containing a fluorine-containing polymer containing silicon in the main chain. A cover member sample was prepared. The surface roughness (Ra) of the surface of the multilayer film was 0.2 nm. The surface roughness (Ra) of the surface of the tempered glass plate was 0.2 nm.

(Example 2)
On the surface consisting of the unpolished surface of a non-alkali glass plate manufactured by the overflow method (OA-10G manufactured by Nippon Electric Glass Co., Ltd.), a multilayer film having a layer structure shown in Table 2 is set to a pressure in the chamber of 0.056 Pa. And formed by sputtering.

  Next, a fluorine-based coating agent (Optool (registered trademark) manufactured by Daikin) is applied on the multilayer film and dried to form an antifouling film containing a fluorine-containing polymer containing silicon in the main chain. A cover member sample was prepared. The surface roughness (Ra) of the surface of the multilayer film was 0.22 nm. The surface roughness (Ra) of the surface of the alkali-free glass plate was 0.2 nm.

(Comparative Example 1)
A cover member sample was produced in the same manner as in Example 1 except that the pressure in the chamber when forming the multilayer film was 0.3 Pa. The surface roughness (Ra) of the surface of the multilayer film was 0.8 nm.

(Comparative Example 2)
A cover member sample was prepared in the same manner as in Example 1 except that the multilayer film was not formed and the antifouling film was directly formed on the tempered glass plate.

(First adhesion strength evaluation)
As shown in FIG. 6, an eraser (RubberEraser manufactured by Minoan) 102 was placed on the antifouling film of the sample 101 produced in each of the examples and comparative examples 1 and 2. The eraser 102 had a cylindrical shape with a diameter of 6 mm and a height of 6 mm. With the 1000 g weight 103 placed on the eraser 102, the eraser 102 was moved in the front-rear direction at a speed of 40 reciprocations / minute with a stroke of 40 mm.

  Every time the eraser 102 was reciprocated 500 times, 0.1 ml of water droplets were dropped from a dropper on the antifouling film of each sample 101, and the contact angle between the antifouling film and the water droplets was measured. The contact angle was measured based on the Atan 1 / 2θ method based on the Young formula. The results are shown in FIG. In FIG. 7, the results of Example 1 are indicated by circles. The results of Example 2 are indicated by triangles. The results of Comparative Example 1 are indicated by diamonds. The results of Comparative Example 2 are indicated by squares.

  From the results shown in FIG. 7, the water repellency of the antifouling film is less likely to be reduced by reducing the surface roughness (Ra) of the surface of the silicon oxide film constituting the outermost surface of the multilayer film. I understand. From this result, it can be seen that the adhesion strength of the antifouling layer can be improved by reducing the surface roughness (Ra) of the surface of the silicon oxide film constituting the outermost surface of the multilayer film.

(Second adhesion strength evaluation)
On the antifouling film of the sample produced in each of Examples 1 and 2 and Comparative Examples 1 and 2, 10 mm □ Bonster steel wool (# 0000) was placed. With a 1000 g weight placed on steel wool (# 0000), steel wool (# 0000) was moved back and forth at a speed of 60 reciprocations per minute with a stroke of 40 mm.

  Every time the steel wool (# 0000) was reciprocated 500 times, 0.3 μl of a water droplet was dropped on the antifouling membrane of each sample from a dropper, and the contact angle between the antifouling membrane and the water droplet was measured. The contact angle was measured based on the Atan 1 / 2θ method based on the Young formula. The results are shown in FIG. In FIG. 8, the results of Example 1 are indicated by circles. The results of Example 2 are indicated by triangles. The results of Comparative Example 1 are indicated by diamonds. The results of Comparative Example 2 are indicated by squares.

  From the results shown in FIG. 8, it is difficult to reduce the water repellency of the antifouling film by reducing the surface roughness (Ra) of the surface of the silicon oxide film constituting the outermost surface of the multilayer film. I understand. From this result, it can be seen that the adhesion strength of the antifouling layer can be improved by reducing the surface roughness (Ra) of the surface of the silicon oxide film constituting the outermost surface of the multilayer film.

DESCRIPTION OF SYMBOLS 1 ... Cover member 2 ... Display apparatus 10 ... Base material 11 ... Base material main body 12 ... Multilayer film 12H ... High refractive index layer 12M ... Middle refractive index layer 12L ... Low refractive index layer 12L1 ... Silicon oxide layer 20 ... Antifouling film 30 ... Device body 31 ... Display surface

Claims (17)

A substrate having a substrate body and a silicon oxide layer disposed on the substrate body and constituting an outermost layer;
An antifouling film which is disposed on the silicon oxide layer and contains a fluoropolymer containing silicon in the main chain;
With
The cover member whose surface roughness of the surface of the said silicon oxide layer is 0.5 nm or less by arithmetic mean roughness (Ra) prescribed | regulated by JISB0601-2001.   The cover member according to claim 1, wherein the surface roughness of the antifouling film is 0.5 nm or less in terms of arithmetic average roughness (Ra) defined by JIS B0601-2001. A substrate having a substrate body and a silicon oxide layer disposed on the substrate body and constituting an outermost layer;
An antifouling film which is disposed on the silicon oxide layer and contains a fluoropolymer containing silicon in the main chain;
With
The cover member whose surface roughness of the surface of said antifouling film is 0.5 nm or less in arithmetic mean roughness (Ra) prescribed | regulated by JISB0601-2001. A base material body, and a base material having a silicon oxide layer disposed on the base material body and constituting an outermost layer;
The cover member whose surface roughness of the surface of the said silicon oxide layer is 0.5 nm or less by arithmetic mean roughness (Ra) prescribed | regulated by JISB0601-2001.   The substrate is disposed on the substrate body, and has a multilayer film including the silicon oxide layer and a high refractive index layer having a higher refractive index than the silicon oxide layer. The cover member according to any one of 4.   The cover member according to claim 5, wherein the surface roughness of each layer constituting the multilayer film is 0.5 nm or less in terms of arithmetic average roughness (Ra) defined by JIS B0601-2001. The multilayer film is
A low refractive index layer having a relatively low refractive index comprising the silicon oxide layer;
The high refractive index layer;
A medium refractive index disposed between the high refractive index layer and the low refractive index layer and having a refractive index located between the refractive index of the high refractive index layer and the refractive index of the low refractive index layer. Layers,
The cover member according to claim 6, comprising:   The medium refractive index layer includes both cations included in the low refractive index layer adjacent to the medium refractive index layer and cations included in the high refractive index layer adjacent to the medium refractive index layer. Item 8. The cover member according to Item 7.   The cover member as described in any one of Claims 1-8 whose surface roughness of the said base-material main body is 0.5 nm or less in arithmetic mean roughness (Ra) prescribed | regulated by JISB0601-2001.   The cover member as described in any one of Claims 1-9 whose surface of the said base-material main body is an unpolished surface.   The cover member according to claim 1, wherein the base body is made of glass.   The cover member according to claim 11, wherein the base body is made of tempered glass.   The cover member according to claim 11 or 12, wherein the base body is made of a glass plate formed by an overflow downdraw method.   The cover member as described in any one of Claims 1-13 whose molar ratio ((silicon) / (cation)) of the silicon in the cation contained in the said silicon oxide layer is 0.9 or more.   The cover member according to claim 1, wherein the silicon oxide layer contains aluminum. The cover member according to any one of claims 1 to 15,
A display device body having a display surface covered by the cover member;
A display device comprising: It is a manufacturing method of the cover member according to any one of claims 1 to 15,
The method for manufacturing a cover member, wherein the silicon oxide layer is formed by a sputtering method in a chamber having a pressure of 0.15 Pa or less.

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