JPWO2014163035A1 - Coated glass substrate and method for producing the same - Google Patents
Coated glass substrate and method for producing the same Download PDFInfo
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- JPWO2014163035A1 JPWO2014163035A1 JP2015510074A JP2015510074A JPWO2014163035A1 JP WO2014163035 A1 JPWO2014163035 A1 JP WO2014163035A1 JP 2015510074 A JP2015510074 A JP 2015510074A JP 2015510074 A JP2015510074 A JP 2015510074A JP WO2014163035 A1 JPWO2014163035 A1 JP WO2014163035A1
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- 239000011521 glass Substances 0.000 title claims abstract description 94
- 239000000758 substrate Substances 0.000 title claims abstract description 89
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 19
- 239000003093 cationic surfactant Substances 0.000 claims abstract description 28
- 239000011347 resin Substances 0.000 claims abstract description 25
- 229920005989 resin Polymers 0.000 claims abstract description 25
- 229920006317 cationic polymer Polymers 0.000 claims abstract description 23
- 238000000576 coating method Methods 0.000 claims abstract description 22
- 239000011248 coating agent Substances 0.000 claims abstract description 20
- 238000000034 method Methods 0.000 claims abstract description 16
- 125000001165 hydrophobic group Chemical group 0.000 claims abstract description 14
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 11
- 239000000243 solution Substances 0.000 claims description 47
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 20
- 239000004973 liquid crystal related substance Substances 0.000 claims description 13
- 125000002091 cationic group Chemical group 0.000 claims description 11
- 239000007864 aqueous solution Substances 0.000 claims description 2
- 239000011159 matrix material Substances 0.000 abstract description 19
- 239000000463 material Substances 0.000 abstract description 11
- 238000000206 photolithography Methods 0.000 abstract description 2
- 230000015572 biosynthetic process Effects 0.000 description 23
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 18
- 230000000052 comparative effect Effects 0.000 description 11
- 239000010410 layer Substances 0.000 description 10
- 229910021529 ammonia Inorganic materials 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- 229920000371 poly(diallyldimethylammonium chloride) polymer Polymers 0.000 description 6
- 238000000059 patterning Methods 0.000 description 4
- 150000003839 salts Chemical group 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 235000012239 silicon dioxide Nutrition 0.000 description 4
- 238000003618 dip coating Methods 0.000 description 3
- 125000001453 quaternary ammonium group Chemical group 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- VBIIFPGSPJYLRR-UHFFFAOYSA-M Stearyltrimethylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[N+](C)(C)C VBIIFPGSPJYLRR-UHFFFAOYSA-M 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 229910052810 boron oxide Inorganic materials 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- YMKDRGPMQRFJGP-UHFFFAOYSA-M cetylpyridinium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[N+]1=CC=CC=C1 YMKDRGPMQRFJGP-UHFFFAOYSA-M 0.000 description 2
- WOWHHFRSBJGXCM-UHFFFAOYSA-M cetyltrimethylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[N+](C)(C)C WOWHHFRSBJGXCM-UHFFFAOYSA-M 0.000 description 2
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000009719 polyimide resin Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 150000003141 primary amines Chemical class 0.000 description 2
- 150000003335 secondary amines Chemical class 0.000 description 2
- 125000005372 silanol group Chemical group 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- CEYYIKYYFSTQRU-UHFFFAOYSA-M trimethyl(tetradecyl)azanium;chloride Chemical compound [Cl-].CCCCCCCCCCCCCC[N+](C)(C)C CEYYIKYYFSTQRU-UHFFFAOYSA-M 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical class CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- MFMBELVKZWEQOM-UHFFFAOYSA-N 1-decylpyridin-1-ium Chemical compound CCCCCCCCCC[N+]1=CC=CC=C1 MFMBELVKZWEQOM-UHFFFAOYSA-N 0.000 description 1
- WJDJWDHXZBNQNE-UHFFFAOYSA-M 1-octadecylpyridin-1-ium;chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[N+]1=CC=CC=C1 WJDJWDHXZBNQNE-UHFFFAOYSA-M 0.000 description 1
- 238000012935 Averaging Methods 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 229920002873 Polyethylenimine Polymers 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical class C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 1
- 229910008051 Si-OH Inorganic materials 0.000 description 1
- 229910006358 Si—OH Inorganic materials 0.000 description 1
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 1
- 239000013504 Triton X-100 Substances 0.000 description 1
- 229920004890 Triton X-100 Polymers 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- -1 amine salt Chemical class 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- BHDFTVNXJDZMQK-UHFFFAOYSA-N chloromethane;2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound ClC.CN(C)CCOC(=O)C(C)=C BHDFTVNXJDZMQK-UHFFFAOYSA-N 0.000 description 1
- WQHCGPGATAYRLN-UHFFFAOYSA-N chloromethane;2-(dimethylamino)ethyl prop-2-enoate Chemical compound ClC.CN(C)CCOC(=O)C=C WQHCGPGATAYRLN-UHFFFAOYSA-N 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- HXWGXXDEYMNGCT-UHFFFAOYSA-M decyl(trimethyl)azanium;chloride Chemical compound [Cl-].CCCCCCCCCC[N+](C)(C)C HXWGXXDEYMNGCT-UHFFFAOYSA-M 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- DDXLVDQZPFLQMZ-UHFFFAOYSA-M dodecyl(trimethyl)azanium;chloride Chemical compound [Cl-].CCCCCCCCCCCC[N+](C)(C)C DDXLVDQZPFLQMZ-UHFFFAOYSA-M 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- ZPIRTVJRHUMMOI-UHFFFAOYSA-N octoxybenzene Chemical compound CCCCCCCCOC1=CC=CC=C1 ZPIRTVJRHUMMOI-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920000083 poly(allylamine) Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 235000019333 sodium laurylsulphate Nutrition 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- 229910001948 sodium oxide Inorganic materials 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000012086 standard solution Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- AQZSPJRLCJSOED-UHFFFAOYSA-M trimethyl(octyl)azanium;chloride Chemical compound [Cl-].CCCCCCCC[N+](C)(C)C AQZSPJRLCJSOED-UHFFFAOYSA-M 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
- C03C17/32—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with synthetic or natural resins
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
- C03C17/32—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with synthetic or natural resins
- C03C17/324—Polyesters
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
- C03C17/32—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with synthetic or natural resins
- C03C17/328—Polyolefins
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/76—Hydrophobic and oleophobic coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/90—Other aspects of coatings
- C03C2217/94—Transparent conductive oxide layers [TCO] being part of a multilayer coating
- C03C2217/948—Layers comprising indium tin oxide [ITO]
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/111—Deposition methods from solutions or suspensions by dipping, immersion
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
- G02F2201/50—Protective arrangements
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Liquid Crystal (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Surface Treatment Of Glass (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Laminated Bodies (AREA)
- Optical Filters (AREA)
Abstract
ブラックマトリックス材料である樹脂との密着性が良好で、解像性も高く、かつ、製造管理やコストの負担を軽減できるガラス基板の提供を目的とする。ガラス基板2の表面に、炭素数が14以上の疎水性基を有する陽イオン界面活性剤又は平均分子量が500〜1000万のカチオンポリマーからなる被膜3を有する被膜付きガラス基板1。この被膜を設けることで、ガラス基板と樹脂材料との密着性を改善でき、さらに、フォトリソグラフィープロセスによる解像性も向上できる。An object of the present invention is to provide a glass substrate that has good adhesion to a resin that is a black matrix material, has high resolution, and can reduce manufacturing control and cost burden. A coated glass substrate 1 having a coating 3 made of a cationic surfactant having a hydrophobic group having 14 or more carbon atoms or a cationic polymer having an average molecular weight of 5 to 10 million on the surface of the glass substrate 2. By providing this film, the adhesion between the glass substrate and the resin material can be improved, and the resolution by the photolithography process can also be improved.
Description
本発明は被膜付きガラス基板およびその製造方法に係り、特に、ガラス基板表面の樹脂密着力を改善する被膜を有してなる被膜付きガラス基板およびその製造方法に関する。 The present invention relates to a glass substrate with a coating and a method for producing the same, and more particularly to a glass substrate with a coating having a coating for improving the resin adhesion on the surface of the glass substrate and a method for producing the same.
カラー液晶ディスプレイに用いる基板は、通常、透明ガラス板上に画素の間から光が漏洩するのを防止するために、遮光層をマトリックス状としたブラックマトリックスを形成している。さらに、画素となる領域に、カラーフィルター層を設け、カラーフィルター層の上にさらに表面を平坦化するためのオーバーコート(通常有機樹脂が用いられる)層が設けられる。そしてこのオーバーコート層の表面に、ITO透明導電膜が設けられて形成される。ブラックマトリックスは、画素有効領域以外から漏れる光を抑制して、表示特性を向上させる役割をもつ。 A substrate used for a color liquid crystal display usually forms a black matrix having a light shielding layer in a matrix form on a transparent glass plate in order to prevent light from leaking from between pixels. Further, a color filter layer is provided in a region to be a pixel, and an overcoat layer (usually using an organic resin) for further planarizing the surface is provided on the color filter layer. An ITO transparent conductive film is provided on the surface of the overcoat layer. The black matrix has a role of improving display characteristics by suppressing light leaking from outside the pixel effective area.
近年では、このブラックマトリックスとして樹脂材料が使われるようになってきており、この場合、一般にフォトリソグラフィー技術によるパターニングにより形成される。ところが、この樹脂製のブラックマトリックスとブラックマトリックスを形成する透明ガラス基板との相互作用が小さいために密着性が不十分となることがあり、パターニングプロセスにおいて、局部的にブラックマトリックスの剥離が生じることがあった。したがって、液晶ディスプレイの生産歩留まりが低下してしまったり、この剥離を抑制しようと、生産工程の条件を厳格に管理して、管理の手間や製造コストが増大してしまったり、していた。 In recent years, resin materials have come to be used as the black matrix, and in this case, the black matrix is generally formed by patterning using a photolithography technique. However, due to the small interaction between the resin black matrix and the transparent glass substrate forming the black matrix, the adhesion may be insufficient, and the black matrix may be locally peeled off during the patterning process. was there. Therefore, the production yield of the liquid crystal display is reduced, or the production process conditions are strictly controlled to increase the labor and the manufacturing cost in order to suppress the peeling.
このような問題を解消するため、例えば、樹脂材料とガラス基板との相互作用を改善して密着性を向上するために、ガラス基板に有機官能基を付与したり、二酸化ケイ素膜を形成したりするなどの方法が知られている(特許文献1〜3参照)。 In order to solve such problems, for example, in order to improve the interaction between the resin material and the glass substrate to improve the adhesion, an organic functional group is added to the glass substrate, or a silicon dioxide film is formed. The method of doing is known (refer patent documents 1-3).
しかしながら、カラー液晶ディスプレイが高精細化されるに伴い、ブラックマトリックスにより微細なパターン形成が要求されるようになってきている。すなわち、ブラックマトリックスのパターニング時の剥離をより効果的に抑制でき、さらに製造時の管理やコストの負担をも抑制できるようなガラス基板が求められてきている。 However, as the color liquid crystal display becomes higher in definition, a fine pattern is required to be formed by a black matrix. That is, there has been a demand for a glass substrate that can more effectively suppress peeling at the time of patterning the black matrix and that can also suppress the management and cost burden during manufacturing.
そこで、本発明は、従来のカラー液晶ディスプレイ用基板における上記問題点を解決すべく、ブラックマトリックス原料である樹脂との密着性が良好で、解像性も高く、かつ、製造管理やコストの負担を軽減できるガラス基板の提供を目的とする。 Therefore, in order to solve the above-mentioned problems in conventional color liquid crystal display substrates, the present invention has good adhesion to the resin that is the black matrix raw material, high resolution, and the burden of manufacturing management and cost. It aims at providing the glass substrate which can reduce.
本発明の被膜付きガラス基板は、基板上に樹脂領域が形成されるガラス基板であって、前記ガラス基板の表面に、炭素数が14以上の疎水性基を有する陽イオン界面活性剤又は平均分子量が500〜1000万のカチオンポリマーからなる被膜を有することを特徴とする。 The coated glass substrate of the present invention is a glass substrate in which a resin region is formed on the substrate, and a cationic surfactant or an average molecular weight having a hydrophobic group having 14 or more carbon atoms on the surface of the glass substrate. Has a film made of 5 to 10 million cationic polymers.
また、本発明の被膜付きガラス基板の製造方法は、ガラス基板の表面に、炭素数が14以上の疎水性基を有する陽イオン界面活性剤又は平均分子量が500〜1000万のカチオンポリマーを含有する溶液を接触、乾燥させて、前記陽イオン界面活性剤又は前記カチオンポリマーからなる被膜を形成する工程を有することを特徴とする。 Moreover, the manufacturing method of the glass substrate with a film of this invention contains the cationic surfactant which has a C14 or more hydrophobic group on the surface of a glass substrate, or a cationic polymer with an average molecular weight of 5-10 million. It has a step of forming a film made of the cationic surfactant or the cationic polymer by contacting and drying the solution.
本発明の被膜付きガラス基板及びその製造方法によれば、ガラス基板の表面に、樹脂材料との密着性を改善する被膜が設けられており、樹脂材料をガラス表面に安定して形成できる。特に、カラー液晶ディスプレイの製造時に安定してブラックマトリックスを形成できる。また、この被膜を設けたガラス基板は、ブラックマトリックス形成の解像性も改善でき、高精細な液晶ディスプレイを安定して製造できる。 According to the glass substrate with a film and the method for producing the same of the present invention, a film that improves adhesion to the resin material is provided on the surface of the glass substrate, and the resin material can be stably formed on the glass surface. In particular, a black matrix can be formed stably during the manufacture of a color liquid crystal display. In addition, the glass substrate provided with this coating can improve the resolution of black matrix formation, and can stably produce a high-definition liquid crystal display.
本発明の被膜付きガラス基板について、以下、図面を参照しながら説明する。なお、図1は、本発明の被膜付きガラス基板の概略構成を示す断面図であり、本発明の被膜付きガラス基板1は、ガラス基板2と、その表面に形成された被膜3で構成される。
The coated glass substrate of the present invention will be described below with reference to the drawings. FIG. 1 is a cross-sectional view showing a schematic configuration of a glass substrate with a coating according to the present invention. A glass substrate 1 with a coating according to the present invention is composed of a
ここで用いられるガラス基板2は、その表面に樹脂領域を形成するガラス基板であれば特に限定されずに挙げられる。このガラス基板2としては、透明で平坦な表面を有するものが好ましく、例えば、樹脂製のブラックマトリックス等を表面に形成するカラー液晶ディスプレイ用のガラス基板が好ましいものとして挙げられる。
The
このガラス基板2の素材としては、二酸化ケイ素、酸化アルミニウム、酸化ホウ素、アルカリ金属酸化物、アルカリ土類金属酸化物等が挙げられ、特に、二酸化ケイ素および酸化ホウ素を主成分とするボロシリケート系の無アルカリガラスや、二酸化ケイ素と酸化ナトリウムと酸化カルシウムを主成分とするソーダライムシリカ系のガラス等が好ましく挙げられる。
Examples of the material of the
本発明に用いられる被膜3は、ガラス基板2の表面に設けられた単層構造の膜である。ここで、被膜3は、炭素数が14以上の疎水性基を有する陽イオン界面活性剤又は平均分子量が500〜1000万のカチオンポリマーから構成される膜である。
The
ここで使用する陽イオン界面活性剤としては、炭素数が14以上の疎水性基を有する陽イオン界面活性剤であれば特に限定されずに使用できる。この陽イオン界面活性剤としては、アミン塩型または第4級アンモニウム塩型のいずれでもよく、例えば、塩化テトラデシルトリメチルアンモニウム、塩化ヘキサデシルトリメチルアンモニウム、塩化オクタデシルトリメチルアンモニウム等のトリメチルアンモニウム塩;塩化テトラデシルピリジニウム、塩化ヘキサデシルピリジニウム、塩化オクタデシルピリジニウム等のピリジニウム塩;等が挙げられる。この陽イオン界面活性剤により、樹脂材料とガラス基板との密着性を改善させることができる。 The cationic surfactant used here is not particularly limited as long as it is a cationic surfactant having a hydrophobic group having 14 or more carbon atoms. The cationic surfactant may be either an amine salt type or a quaternary ammonium salt type. For example, a trimethylammonium salt such as tetradecyltrimethylammonium chloride, hexadecyltrimethylammonium chloride, octadecyltrimethylammonium chloride; And pyridinium salts such as decylpyridinium, hexadecylpyridinium chloride, and octadecylpyridinium chloride. With this cationic surfactant, the adhesion between the resin material and the glass substrate can be improved.
また、ここで使用されるカチオンポリマーとしては、平均分子量が500〜1000万であって分子中にカチオン性基を有するポリマーであればよい。なお、本明細書において平均分子量は、重量平均分子量を意味する。 The cationic polymer used here may be a polymer having an average molecular weight of 500 to 10,000,000 and having a cationic group in the molecule. In addition, in this specification, an average molecular weight means a weight average molecular weight.
ここで使用するカチオンポリマーとしては、例えば、ポリジアリルジメチルアンモニウムクロライド(PDACまたはPDADMAC)、ポリ(ジメチルアミノエチルアクリレートメチルクロライド4級塩)、ポリ(ジメチルアミノエチルメタクリレートメチルクロライド4級塩)、トリメチルアンモニウムアルキルアクリルアミド重合体塩、ジメチルアミンエピクロルヒドリン縮合体塩、ポリアリルアミン、ポリエチレンイミン等が挙げられる。 Examples of the cationic polymer used here include polydiallyldimethylammonium chloride (PDAC or PDADMAC), poly (dimethylaminoethyl acrylate methyl chloride quaternary salt), poly (dimethylaminoethyl methacrylate methyl chloride quaternary salt), trimethylammonium. Examples include alkyl acrylamide polymer salts, dimethylamine epichlorohydrin condensate salts, polyallylamine, polyethyleneimine, and the like.
カチオンポリマーとしては、カチオン性基の個数が分子量1000当たり4〜25個を持つことが好ましい。カチオン性基とは、水等の溶媒に溶解させたときにカチオンとなる基であり、例えば、アミノ基、4級アンモニウム基等が挙げられる。このとき、アミノ基はアンモニア、1級アミン、2級アミンから水素を除去した1価の官能基であり、それぞれ1級アミン、2級アミン、3級アミンを形成する。また、4級アンモニウム基は4級アンモニウムカチオンを形成する。 The cationic polymer preferably has 4 to 25 cationic groups per 1000 molecular weight. The cationic group is a group that becomes a cation when dissolved in a solvent such as water, and examples thereof include an amino group and a quaternary ammonium group. At this time, the amino group is a monovalent functional group obtained by removing hydrogen from ammonia, primary amine, or secondary amine, and forms a primary amine, secondary amine, or tertiary amine, respectively. The quaternary ammonium group forms a quaternary ammonium cation.
上記の被膜3は単層構造の被膜であり、その製造操作が簡便で構造も簡素でありながら、ガラス表面の樹脂材料との密着性を改善する機能を有する。また、ここで形成される被膜3は界面活性剤からなり、ガラス基板の表面とは静電結合により結合されており、純水やアルカリ洗剤を使用した洗浄で容易に除去できる。
The
次に、被膜付きガラス基板の製造方法について説明する。
本発明における被膜3を形成する方法としては、ガラス基板2の表面に、炭素数が14以上の疎水性基を有する陽イオン界面活性剤又は平均分子量が500〜1000万のカチオンポリマーを含有する溶液を接触、乾燥させて、陽イオン界面活性剤又はカチオンポリマーからなる被膜を形成すればよい。Next, the manufacturing method of the glass substrate with a film is demonstrated.
As a method for forming the
このとき、陽イオン界面活性剤又はカチオンポリマーは、溶媒として純水又はエタノール等の水溶性有機溶剤の水溶液を用いて、これに溶解して溶液とする。このとき、カチオン性基の濃度(当量)は0.01meq/L〜100meq/Lが好ましく、ガラス製品表面を適度に覆いながら過剰とならないようにするため0.1〜10meq/Lがより好ましい。ちなみに、溶液1L中にカチオン性基を1mol有する場合に、その濃度を1eq/Lと表す。また、溶液のpHは酸性〜アルカリ性(例えば、pH4〜12程度)で使用が可能であるが、ガラス表面のシラノール基の電離を促進しマイナス帯電させることで静電的な結合力をより強固にしつつ付着量を増加できる点で、溶液のpHは8〜12が好ましく、10〜11がより好ましい。 At this time, the cationic surfactant or the cationic polymer is dissolved in a pure water or an aqueous solution of a water-soluble organic solvent such as ethanol as a solvent to obtain a solution. At this time, the concentration (equivalent) of the cationic group is preferably from 0.01 meq / L to 100 meq / L, and more preferably from 0.1 to 10 meq / L so as not to become excessive while appropriately covering the glass product surface. Incidentally, when 1 mol of a cationic group is contained in 1 L of the solution, the concentration is expressed as 1 eq / L. The pH of the solution can be used from acidic to alkaline (for example, about pH 4 to 12), but the electrostatic bond strength is further strengthened by promoting the ionization of the silanol group on the glass surface and negatively charging it. However, the pH of the solution is preferably 8 to 12 and more preferably 10 to 11 in terms of increasing the adhesion amount.
このようにして得られた溶液を、被膜を形成するガラス基板表面に接触させて塗布する。このとき、塗布方法は、ディップコート、スプレーコート、スポンジ等による塗布の公知の膜形成方法に使用される塗布方法が挙げられる。また、この工程では、溶液中に含まれる陽イオン界面活性剤又はカチオンポリマーが、接触させるだけで陽イオン界面活性剤の親水性基又はカチオンポリマーのカチオン部分がガラス基板の表面側に、陽イオン界面活性剤の疎水性基又はカチオンポリマーのカチオン部分を繋ぐポリマーの主鎖部分がその反対側である雰囲気中に向かって、整列する。これは、ガラス基板の表面に存在するシラノール基(−Si−OH)が−電荷に帯電しやすいため、接触させるだけで+電荷を帯びている陽イオン界面活性剤の親水性基又はカチオンポリマーのカチオン部分がガラス基板の表面側に静電的にひきつけられるためである。 The solution thus obtained is applied in contact with the surface of the glass substrate on which the film is to be formed. At this time, the coating method includes a coating method used in a known film forming method of coating by dip coating, spray coating, sponge or the like. Further, in this step, the cationic surfactant or cationic polymer contained in the solution can be brought into contact with the cationic group so that the hydrophilic group of the cationic surfactant or the cationic portion of the cationic polymer is placed on the surface side of the glass substrate. Alignment is toward an atmosphere in which the main chain portion of the polymer that connects the hydrophobic group of the surfactant or the cationic portion of the cationic polymer is on the opposite side. This is because the silanol group (-Si-OH) present on the surface of the glass substrate is easily charged to -charge, so that the hydrophilic group or cationic polymer of the cationic surfactant charged with + charge only by contact is obtained. This is because the cationic portion is electrostatically attracted to the surface side of the glass substrate.
このように陽イオン界面活性剤又はカチオンポリマーを整列させた状態で、加熱やエアブロー等により溶媒を除去すると、均質な第1の膜を容易に形成できる。このとき、加熱乾燥では、50〜90℃に加熱することが好ましく、エアブローでは15〜30℃のエアーを吹き付けることが好ましい。 When the solvent is removed by heating, air blowing or the like in the state where the cationic surfactants or the cationic polymers are aligned in this way, a homogeneous first film can be easily formed. At this time, in heat drying, it is preferable to heat to 50-90 degreeC, and in air blow, it is preferable to spray 15-30 degreeC air.
また、この被膜を形成する場合、溶液を室温で塗布する簡便な操作で達成でき、さらに、排水規制に抵触することもなく、環境負荷を増大させることのないガラス基板の表面改質を達成できる。 Moreover, when forming this film, it can be achieved by a simple operation of applying the solution at room temperature, and further, surface modification of the glass substrate can be achieved without compromising drainage regulations and without increasing the environmental load. .
そして、このようにして得られた被膜付きガラス基板は、その表面に被膜を介して樹脂領域を安定して形成できる。そのため、基板表面に樹脂領域を形成する場合に、樹脂領域の精度が高く、かつ、歩留まりが良好な製品が製造できる。 And the glass substrate with a film obtained in this way can form the resin area | region stably through the film on the surface. Therefore, when the resin region is formed on the substrate surface, a product with high accuracy of the resin region and good yield can be manufactured.
例えば、カラー液晶ディスプレイを製造する場合には、ボロシリケート系の無アルカリガラスやソーダライムシリカ系のガラスの透明ガラス基板を用意し、その表面に上記被膜を形成して被膜付きのガラス基板を形成し、次いで、上記ガラス基板上に、上記被膜を介して樹脂製ブラックマトリックス、カラーフィルター層、オーバーコート層、ITO透明導電膜を順次設ければよい。 For example, when manufacturing a color liquid crystal display, prepare a transparent glass substrate of borosilicate non-alkali glass or soda lime silica glass, and form the above film on the surface to form a glass substrate with a film Then, a resin black matrix, a color filter layer, an overcoat layer, and an ITO transparent conductive film may be sequentially provided on the glass substrate via the coating film.
ここで、樹脂製ブラックマトリックスとしては、寸法精度良くパターン形成できるアクリル樹脂、エポキシ樹脂、ポリイミド樹脂、ポリエステル樹脂等に微粉カーボン等の黒色物質を分散混合されてなる樹脂を用い、公知のパターン形成によりブラックマトリックスを形成する。また、カラーフィルター層も、カラー液晶ディスプレイに使用される公知の材料を、公知の方法、例えば、顔料分散法、フィルム転写法、染色法、印刷法、電着法等により形成すればよい。 Here, as the resin black matrix, a resin in which a black substance such as fine carbon is dispersed and mixed in an acrylic resin, an epoxy resin, a polyimide resin, a polyester resin or the like that can form a pattern with high dimensional accuracy is used. Form a black matrix. The color filter layer may also be formed of a known material used for a color liquid crystal display by a known method such as a pigment dispersion method, a film transfer method, a dyeing method, a printing method, or an electrodeposition method.
また、オーバーコート層は、樹脂製のブラックマトリックスの上に設けられるカラーフィルター層のR,G,Bがその境界で生じる凹凸を平坦化するために設けられ、アクリル樹脂、エポキシ樹脂、ポリイミド樹脂等の公知のものを公知の方法で形成すればよい。さらに、公知の方法でITO透明電極膜を形成すればよい。 Further, the overcoat layer is provided to flatten the unevenness generated at the boundary of R, G, B of the color filter layer provided on the resin black matrix, such as acrylic resin, epoxy resin, polyimide resin, etc. These may be formed by a known method. Furthermore, an ITO transparent electrode film may be formed by a known method.
このようにして得られたカラー液晶ディスプレイは、上記本発明の被膜付きガラス基板を使用しているため、製造時、使用時におけるブラックマトリックス等の樹脂剥がれが生じにくく、製品歩留まりが良好で、性能の安定したものとなる。 Since the color liquid crystal display thus obtained uses the glass substrate with a film of the present invention, the resin such as a black matrix is hardly peeled off during production and use, the product yield is good, and the performance It will be stable.
以下、実施例及び比較例に基づいてさらに本発明を詳細に説明する。 Hereinafter, the present invention will be described in more detail based on examples and comparative examples.
[各種溶液の調製]
<被膜形成用の溶液1>
陽イオン性界面活性剤である塩化オクチルトリメチルアンモニウムが2mmol/L及びアンモニアが10mmol/Lの濃度となるように、各成分を純水に溶解して、被膜形成用の溶液1を調製した。この溶液のpHは約10.5である。
<被膜形成用の溶液2>
陽イオン性界面活性剤である塩化デシルトリメチルアンモニウムが2mmol/L及びアンモニアが10mmol/Lの濃度となるように、各成分を純水に溶解して、被膜形成用の溶液2を調製した。この溶液のpHは約10.5である。[Preparation of various solutions]
<Solution 1 for film formation>
Each component was dissolved in pure water so that the concentration of octyltrimethylammonium chloride, which is a cationic surfactant, was 2 mmol / L and ammonia was 10 mmol / L to prepare a solution 1 for film formation. The pH of this solution is about 10.5.
<
Each component was dissolved in pure water so that the concentration of decyltrimethylammonium chloride as a cationic surfactant was 2 mmol / L and ammonia was 10 mmol / L to prepare a
<被膜形成用の溶液3>
陽イオン性界面活性剤である塩化ドデシルトリメチルアンモニウムが2mmol/L及びアンモニアが10mmol/Lの濃度となるように、各成分を純水に溶解して、被膜形成用の溶液3を調製した。この溶液のpHは約10.5である。
<被膜形成用の溶液4>
陽イオン性界面活性剤である塩化テトラデシルトリメチルアンモニウムが2mmol/L及びアンモニアが10mmol/Lの濃度となるように、各成分を純水に溶解して、被膜形成用の溶液4を調製した。この溶液のpHは約10.5である。<
Each component was dissolved in pure water so that the concentration of dodecyltrimethylammonium chloride, which is a cationic surfactant, was 2 mmol / L and ammonia was 10 mmol / L, thereby preparing a
<Solution 4 for film formation>
Each component was dissolved in pure water so that the concentration of tetradecyltrimethylammonium chloride as a cationic surfactant was 2 mmol / L and ammonia was 10 mmol / L to prepare a solution 4 for film formation. The pH of this solution is about 10.5.
<被膜形成用の溶液5>
陽イオン性界面活性剤である塩化ヘキサデシルトリメチルアンモニウムが2mmol/L及びアンモニアが10mmol/Lの濃度となるように、各成分を純水に溶解して、被膜形成用の溶液5を調製した。この溶液のpHは約10.5である。
<被膜形成用の溶液6>
陽イオン性界面活性剤である塩化オクタデシルトリメチルアンモニウムが2mmol/L及びアンモニアが10mmol/Lの濃度となるように、各成分を純水に溶解して、被膜形成用の溶液6を調製した。この溶液のpHは約10.5である。<
Each component was dissolved in pure water so that the concentration of hexadecyltrimethylammonium chloride, which is a cationic surfactant, was 2 mmol / L and ammonia was 10 mmol / L, thereby preparing a
<Solution 6 for film formation>
Each component was dissolved in pure water so that the concentration of octadecyltrimethylammonium chloride as a cationic surfactant was 2 mmol / L and ammonia was 10 mmol / L to prepare a solution 6 for film formation. The pH of this solution is about 10.5.
<被膜形成用の溶液7>
陽イオン性界面活性剤である塩化ヘキサデシルピリジニウム(CPC)が2mmol/LM及びアンモニアが10mmol/Lの濃度となるように、各成分を純水に溶解して、被膜形成用の溶液7を調製した。この溶液のpHは約10.5である。<Solution 7 for film formation>
Each component was dissolved in pure water so that the concentration of hexadecylpyridinium chloride (CPC), which is a cationic surfactant, was 2 mmol / LM and ammonia was 10 mmol / L to prepare a solution 7 for film formation. did. The pH of this solution is about 10.5.
<被膜形成用の溶液8>
カチオンポリマーであるポリジアリルジメチルアンモニウムクロライド(PDACまたはPDADMAC;和光純薬工業社製コロイド滴定用標準液、分子量6万〜11万)が2meq/L及びアンモニアが10mmol/Lの濃度となるように、各成分を純水に溶解して、被膜形成用の溶液8を調製した。この溶液のpHは約10.5である。<Solution 8 for film formation>
The polydiallyldimethylammonium chloride cationic polymer (PDAC or PDADMAC; colloid titration standard solution manufactured by Wako Pure Chemical Industries, Ltd., molecular weight 60,000 to 110,000) is 2 meq / L and ammonia is 10 mmol / L. Each component was dissolved in pure water to prepare a solution 8 for film formation. The pH of this solution is about 10.5.
(比較例1)
表面研磨をした、縦50mm×横50mm×厚さ0.7mmの無アルカリボロシリケートガラス製のガラス板を、上記被膜形成用の溶液1中に10秒間浸漬して引き上げた後、表面の溶液をエアブローで乾燥するディップコート法により、ガラス板の表面に被膜を形成し、被膜付きのガラス基板とした。(Comparative Example 1)
A surface-polished glass plate made of non-alkali borosilicate glass having a length of 50 mm, a width of 50 mm, and a thickness of 0.7 mm was dipped in the solution 1 for film formation for 10 seconds and then pulled up. A film was formed on the surface of the glass plate by a dip coating method that was dried by air blow to obtain a glass substrate with a film.
(比較例2〜3)
被膜形成用の溶液1の代わりに、被膜形成用の溶液2(比較例2)又は被膜形成用の溶液3(比較例3)を使用した以外は、比較例1と同様の操作により被膜付きガラス基板を製造した。(Comparative Examples 2-3)
A glass with a coating is prepared in the same manner as in Comparative Example 1 except that the
(実施例1)
表面研磨をした、縦50mm×横50mm×厚さ0.7mmの無アルカリボロシリケートガラス製のガラス板を、上記被膜形成用の溶液4中に10秒間浸漬して引き上げた後、表面の溶液をエアブローで乾燥するディップコート法により、ガラス板の表面に被膜を形成し、被膜付きのガラス基板とした。Example 1
A surface-polished glass plate made of alkali-free borosilicate glass having a length of 50 mm, a width of 50 mm, and a thickness of 0.7 mm was dipped in the solution 4 for film formation for 10 seconds and then pulled up. A film was formed on the surface of the glass plate by a dip coating method that was dried by air blow to obtain a glass substrate with a film.
(実施例2〜5)
被膜形成用の溶液4の代わりに、被膜形成用の溶液5(実施例2)、被膜形成用の溶液6(実施例3)、被膜形成用の溶液7(実施例4)又は被膜形成用の溶液8(実施例5)を使用した以外は、実施例1と同様の操作により被膜付きガラス基板を製造した。(Examples 2 to 5)
Instead of the film forming solution 4, the film forming solution 5 (Example 2), the film forming solution 6 (Example 3), the film forming solution 7 (Example 4), or the film forming solution A coated glass substrate was produced in the same manner as in Example 1 except that Solution 8 (Example 5) was used.
(試験例)
被膜を形成していないガラス基板、実施例1〜5及び比較例1〜3のガラス基板の表面の水の接触角を測定し、その結果を図2に示した。この結果から、形成された被膜の疎水性基の炭素数が長くなることで撥水性が向上することがわかった。カチオンポリマーを塗布した場合は、一部のカチオン基がガラスの反対側に向いているため、接触角はやや小さくなる。
また、被膜を形成していないガラス基板、実施例1〜5及び比較例3のガラス基板の表面に、それぞれ所定のフォトレジストのパターニングを形成し、残し解像度試験を行い、その結果を図3に示した。この結果から、疎水基の炭素数が14以上となる陽イオン界面活性剤およびカチオンポリマーを用いた実施例においては残し解像性が向上し、ガラス基板への樹脂の密着力が向上し、安定した樹脂パターンが形成でき、より高精細なカラー液晶ディスプレイを製造できることがわかった。なお、比較例3の疎水性基の炭素数が12のものは、被膜なしのガラス基板と同程度の解像性であり、解像性の向上効果がほとんどなかった。(Test example)
The contact angle of water on the surface of the glass substrate on which the film was not formed, the glass substrates of Examples 1 to 5 and Comparative Examples 1 to 3 was measured, and the results are shown in FIG. From this result, it was found that the water repellency is improved by increasing the number of carbon atoms of the hydrophobic group of the formed film. When a cationic polymer is applied, the contact angle is slightly reduced because some cationic groups are directed to the opposite side of the glass.
In addition, a predetermined photoresist patterning was formed on the surface of the glass substrate on which the film was not formed, the glass substrates of Examples 1 to 5 and Comparative Example 3, respectively, and the remaining resolution test was performed. The result is shown in FIG. Indicated. From this result, in Examples using a cationic surfactant and a cationic polymer in which the number of carbon atoms of the hydrophobic group is 14 or more, the remaining resolution is improved, the adhesion of the resin to the glass substrate is improved, and the stability is improved. As a result, it was found that a high-definition color liquid crystal display can be manufactured. In addition, when the number of carbon atoms of the hydrophobic group of Comparative Example 3 was 12, the resolution was comparable to that of a glass substrate without a film, and there was almost no improvement in resolution.
また、陰イオン界面活性剤としてラウリル硫酸ナトリウム、非イオン界面活性剤としてTriton X−100(ポリエチレングリコールpオクチルフェニルエーテル)についても、上記と同様にガラス基板上への被膜形成処理を行い、残し解像度試験を行ったが、被膜を形成しないガラス基板と同様の残し解像度であった。 In addition, sodium lauryl sulfate as an anionic surfactant and Triton X-100 (polyethylene glycol p octyl phenyl ether) as a nonionic surfactant are subjected to a film formation treatment on a glass substrate in the same manner as described above, and the remaining resolution is obtained. Although the test was conducted, the remaining resolution was the same as that of the glass substrate on which no film was formed.
[接触角]
測定対象のガラス基板の表面に純水を1滴滴下し、その表面の水滴を基板側面から撮像したデータに基づいて、5点の測定結果を平均して各基板における純水との接触角を算出した。[Contact angle]
One drop of pure water is dropped on the surface of the glass substrate to be measured, and the contact angle with the pure water on each substrate is averaged by averaging the five measurement results based on data obtained by imaging the water droplets on the surface from the side of the substrate. Calculated.
[残し解像度]
測定対象のガラス基板の表面に、ネガ型フォトレジストを塗布し、レジスト幅が2μm、5μm、7μm、9μm、10μm、13μm、15μm、20μmの線幅となるようにフォトリソグラフィー工程により水酸化カリウム(KOH)で現像を行い、剥離せずガラス基板上に残ったレジストの最小線幅を残し解像度とした。[Remaining resolution]
A negative photoresist is applied on the surface of the glass substrate to be measured, and potassium hydroxide (photolithographic process is used so that the resist width becomes 2 μm, 5 μm, 7 μm, 9 μm, 10 μm, 13 μm, 15 μm, and 20 μm). The development was performed with KOH), and the resolution was determined by leaving the minimum line width of the resist that remained on the glass substrate without peeling.
これらの結果から、本発明の被膜付きガラス基板は、ガラス基板への撥水性を調整し、樹脂のガラス基板への密着力を改善でき、また、残し解像度も良好で、微細なパターンの形成も可能であることがわかった。 From these results, the coated glass substrate of the present invention can adjust the water repellency to the glass substrate, improve the adhesion of the resin to the glass substrate, and the remaining resolution is good, and a fine pattern can be formed. I found it possible.
本発明の被膜付きガラス基板及びその製造方法は、広くガラス基板に適用でき、使用する疎水性基の炭素数に応じてその特性の大小を調整でき、使用目的に応じて適宜材料を選択することで最適な被膜付きのガラス基板を製造できる。本発明は、特に、カラー液晶ディスプレイに使用されるガラス基板に好適である。 The coated glass substrate of the present invention and the method for producing the same can be widely applied to a glass substrate, the size of the characteristics can be adjusted according to the number of carbons of the hydrophobic group to be used, and the material can be appropriately selected according to the purpose of use. Can produce a glass substrate with an optimum coating. The present invention is particularly suitable for a glass substrate used for a color liquid crystal display.
Claims (7)
前記ガラス基板の表面に、炭素数が14以上の疎水性基を有する陽イオン界面活性剤又は平均分子量が500〜1000万のカチオンポリマーからなる被膜を有することを特徴とする被膜付きガラス基板。A glass substrate in which a resin region is formed on a substrate,
A glass substrate with a coating, characterized by having a coating made of a cationic surfactant having a hydrophobic group having 14 or more carbon atoms or a cationic polymer having an average molecular weight of 5 to 10 million on the surface of the glass substrate.
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US10046542B2 (en) | 2014-01-27 | 2018-08-14 | Corning Incorporated | Articles and methods for controlled bonding of thin sheets with carriers |
KR20160144406A (en) * | 2014-04-04 | 2016-12-16 | 코닝 인코포레이티드 | Treatment of glass surfaces for improved adhesion |
JP6260503B2 (en) * | 2014-09-18 | 2018-01-17 | 旭硝子株式会社 | Glass substrate with antistatic film and method for producing glass substrate with antistatic film |
JP6256279B2 (en) * | 2014-09-25 | 2018-01-10 | 旭硝子株式会社 | Glass plate with smoothness improving film, method for producing the same, glass plate package, and method for packing glass plate |
KR102573207B1 (en) | 2015-05-19 | 2023-08-31 | 코닝 인코포레이티드 | Articles and methods for bonding sheets and carriers |
CN107810168A (en) | 2015-06-26 | 2018-03-16 | 康宁股份有限公司 | Method and product comprising sheet material and carrier |
WO2017058969A1 (en) * | 2015-10-02 | 2017-04-06 | Corning Incorporated | Removable glass surface treatments and methods for reducing particle adhesion |
TW201825623A (en) | 2016-08-30 | 2018-07-16 | 美商康寧公司 | Siloxane plasma polymers for sheet bonding |
TWI810161B (en) | 2016-08-31 | 2023-08-01 | 美商康寧公司 | Articles of controllably bonded sheets and methods for making same |
US20200171799A1 (en) * | 2017-08-18 | 2020-06-04 | Corning Incorporated | Temporary bonding using polycationic polymers |
WO2019118660A1 (en) | 2017-12-15 | 2019-06-20 | Corning Incorporated | Method for treating a substrate and method for making articles comprising bonded sheets |
US11471993B2 (en) * | 2018-03-09 | 2022-10-18 | Hoya Corporation | Spacer, laminate of substrates, method for manufacturing substrate, and method for manufacturing substrate for magnetic disk |
CN116282905A (en) | 2018-09-18 | 2023-06-23 | Agc株式会社 | Glass substrate, black matrix substrate and display panel |
CN115244334A (en) | 2020-02-07 | 2022-10-25 | 康宁公司 | Method of treating glass surface and treated glass article |
WO2021173372A1 (en) * | 2020-02-26 | 2021-09-02 | Corning Incorporated | Temporary bonding of substrates with large roughness using multilayers of polyelectrolytes |
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JPS5547249A (en) * | 1978-08-17 | 1980-04-03 | Pilkington Brothers Ltd | Plane glass treating method and device |
JP2000319038A (en) * | 1999-02-02 | 2000-11-21 | Corning Inc | Method for temporarily protecting glass product |
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