JPWO2013187324A1 - Board sheet and touch panel - Google Patents

Board sheet and touch panel Download PDF

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JPWO2013187324A1
JPWO2013187324A1 JP2014521303A JP2014521303A JPWO2013187324A1 JP WO2013187324 A1 JPWO2013187324 A1 JP WO2013187324A1 JP 2014521303 A JP2014521303 A JP 2014521303A JP 2014521303 A JP2014521303 A JP 2014521303A JP WO2013187324 A1 JPWO2013187324 A1 JP WO2013187324A1
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resist layer
layer
resistant resist
light
metal wiring
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JP6167103B2 (en
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真一 友岡
真一 友岡
草洋子 仁木
草洋子 仁木
中西 豊
豊 中西
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Sekisui Polymatech Co Ltd
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Polymatech Japan Co Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B3/00Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products having particular features of form
    • B32B3/02Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products having particular features of form characterised by features of form at particular places, e.g. in edge regions
    • B32B3/08Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products having particular features of form characterised by features of form at particular places, e.g. in edge regions characterised by added members at particular parts
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/40Layered products comprising a layer of synthetic resin comprising polyurethanes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/42Layered products comprising a layer of synthetic resin comprising condensation resins of aldehydes, e.g. with phenols, ureas or melamines
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0274Optical details, e.g. printed circuits comprising integral optical means
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern
    • H05K1/092Dispersed materials, e.g. conductive pastes or inks
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/20Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
    • B32B2307/202Conductive
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/40Properties of the layers or laminate having particular optical properties
    • B32B2307/414Translucent
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/70Other properties
    • B32B2307/71Resistive to light or to UV
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/70Other properties
    • B32B2307/712Weather resistant
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/20Displays, e.g. liquid crystal displays, plasma displays
    • B32B2457/208Touch screens
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means

Abstract

透光性基材12上に導電性高分子らなる透明電極13と、この透明電極13とコネクタ接続部18とを繋ぐ金属配線14とを有し、透明電極13と金属配線14とを被覆する保護層15が設けられた基板シート11について、透明電極13に対する保護と金属配線14の腐食からの保護とがなされた基板シート11を提供すること。保護層15が金属配線14の硫化を防止する耐硫化性レジスト層17と紫外線を吸収する耐光性レジスト層16とを基材12に積層した積層体でなり、耐硫化性レジスト層17をポリウレタン・ポリウレア系樹脂層で形成した。【選択図】図2A transparent electrode 13 made of a conductive polymer and a metal wiring 14 connecting the transparent electrode 13 and the connector connecting portion 18 are provided on the translucent substrate 12, and the transparent electrode 13 and the metal wiring 14 are covered. Providing the substrate sheet 11 provided with the protection against the transparent electrode 13 and the corrosion of the metal wiring 14 with respect to the substrate sheet 11 provided with the protective layer 15. The protective layer 15 is a laminate in which a sulfur-resistant resist layer 17 that prevents sulfidation of the metal wiring 14 and a light-resistant resist layer 16 that absorbs ultraviolet rays are laminated on the base material 12. It was formed with a polyurea resin layer. [Selection] Figure 2

Description

本発明は、タッチパネルなどの静電センサ等として利用できる基板シートおよびその基板シートを用いたタッチパネルに関する。   The present invention relates to a substrate sheet that can be used as an electrostatic sensor such as a touch panel, and a touch panel using the substrate sheet.

タッチパネルなどの静電センサの電極には透明導電性高分子が用いられている。この透明導電性高分子は光による劣化が著しいことから、紫外線吸収剤を含むレジスト被膜で保護層を形成しこの電極を覆っている。こうした技術については、例えば、特開2011−192150号公報(特許文献1)に記載されている。   A transparent conductive polymer is used for an electrode of an electrostatic sensor such as a touch panel. Since this transparent conductive polymer is significantly deteriorated by light, a protective layer is formed by a resist film containing an ultraviolet absorber to cover this electrode. Such a technique is described in, for example, Japanese Patent Application Laid-Open No. 2011-192150 (Patent Document 1).

特開2011−192150号公報JP 2011-192150 A

一方、電極と外部機器とを接続するための金属配線部分については、導電性高分子に見られる耐光性の問題は無いものの硫黄成分との反応によって導電性を損なう場合がある、といった問題がある。
そこで本発明は、導電性高分子に対する保護だけでなく、金属配線部分の腐食からの保護もなされた基板シートと、その基板シートを用いて形成されるタッチパネルを提供することを目的とする。
On the other hand, the metal wiring part for connecting the electrode and the external device has a problem that although there is no light resistance problem seen in the conductive polymer, the conductivity may be impaired by the reaction with the sulfur component. .
Then, an object of this invention is to provide the touchscreen formed using the board | substrate sheet | seat which not only protected with respect to the conductive polymer but was also protected from the corrosion of the metal wiring part.

上記目的を達成すべく以下のような基板シートを提供する。
透光性基材上に導電性高分子からなる透明電極と、この透明電極とコネクタ接続部とを繋ぐ金属配線とを有し、透明電極と金属配線とを被覆する保護層が設けられた基板シートであって、保護層が金属配線の硫化を防止する耐硫化性レジスト層と紫外線を吸収する耐光性レジスト層とが透光性基材側からこの順に積層した積層体でなり、耐硫化性レジスト層が、ポリウレタン・ポリウレア系樹脂層である基板シートである。
In order to achieve the above object, the following substrate sheet is provided.
A substrate having a transparent electrode made of a conductive polymer and a metal wiring connecting the transparent electrode and the connector connecting portion on a translucent base material, and a protective layer covering the transparent electrode and the metal wiring is provided. It is a sheet, and a protective layer is a laminate in which a sulfur-resistant resist layer that prevents sulfidation of metal wiring and a light-resistant resist layer that absorbs ultraviolet rays are laminated in this order from the translucent substrate side. The resist sheet is a substrate sheet that is a polyurethane-polyurea resin layer.

導電性高分子からなる透明電極と金属配線とを有する基板シートについて、金属配線の硫化を防止する耐硫化性レジスト層と紫外線を吸収する耐光性レジスト層とが透光性基材側からこの順に積層した積層体でなる保護層を設けたため、透明電極の紫外線による劣化と金属配線の硫化を防止することができる。
そして、耐硫化性レジスト層をポリウレタン・ポリウレア系樹脂層としたため、ポリウレア成分の含有によりガスバリア性を向上させることができ、金属配線の硫化を効果的に防止することができる。
For a substrate sheet having a transparent electrode made of a conductive polymer and a metal wiring, a sulfur-resistant resist layer that prevents sulfidation of the metal wiring and a light-resistant resist layer that absorbs ultraviolet rays are arranged in this order from the translucent substrate side. Since the protective layer made of the laminated body is provided, it is possible to prevent the transparent electrode from being deteriorated by ultraviolet rays and the metal wiring from being sulfided.
Since the sulfur-resistant resist layer is a polyurethane / polyurea resin layer, the gas barrier property can be improved by containing the polyurea component, and the sulfidation of the metal wiring can be effectively prevented.

ポリウレタン・ポリウレア系樹脂層を形成するポリウレタン・ポリウレア系樹脂が、ポリオール成分のOH基と反応する当量のNCO基を有するポリイソシアネート成分量の1.2倍〜5.5倍量のポリイソシアネート成分を含有して硬化させてウレタン結合に加えてウレア結合を形成した樹脂である基板シートとすることができる。
ポリウレタン・ポリウレア系樹脂層を形成するポリウレタン・ポリウレア系樹脂を、ポリオール成分のOH基と反応する当量のNCO基を有するポリイソシアネート成分量の1.2倍〜5.5倍量のポリイソシアネート成分を含有して硬化させたウレタン結合とウレア結合とを有する樹脂としたため、硫化から金属配線を保護することができる。
The polyurethane / polyurea resin forming the polyurethane / polyurea resin layer has a polyisocyanate component in an amount 1.2 to 5.5 times the amount of the polyisocyanate component having an NCO group equivalent to the OH group of the polyol component. It can be set as the board | substrate sheet | seat which is resin which contained and hardened and formed the urea bond in addition to the urethane bond.
Polyurethane / polyurea resin forming the polyurethane / polyurea resin layer is 1.2 times to 5.5 times the amount of polyisocyanate component having an equivalent NCO group reacting with the OH group of the polyol component. Since the resin has a urethane bond and a urea bond that are contained and cured, the metal wiring can be protected from sulfurization.

ポリウレタン・ポリウレア系樹脂層を形成するポリウレタン・ポリウレア系樹脂のNCO基/OH基の値が1.2〜5.5となる原料を反応硬化させた樹脂とすることができる。
ポリウレタン・ポリウレア系樹脂層を形成するポリウレタン・ポリウレア系樹脂が、NCO基/OH基の値が1.2〜5.5となる原料を反応硬化させた樹脂であるため、イソシアネート成分が多くなりウレタン結合に加えてウレア結合を有するポリウレタン・ポリウレア系樹脂層を形成する。そのため、ウレア結合が形成されない場合と比較して樹脂の架橋密度を高めることができる。換言すれば、分子鎖どうしの間隔を密にすることができる。そのため、硫黄成分の浸入を防止し易くして硫化劣化から金属配線を保護することができる。よって、耐硫化性に優れた保護層とすることができる。
A polyurethane / polyurea resin layer forming a polyurethane / polyurea resin layer can be a resin obtained by reaction-curing a raw material having an NCO group / OH group value of 1.2 to 5.5.
The polyurethane / polyurea resin forming the polyurethane / polyurea resin layer is a resin obtained by reaction curing of a raw material having an NCO group / OH group value of 1.2 to 5.5. A polyurethane / polyurea resin layer having a urea bond in addition to the bond is formed. Therefore, the crosslink density of the resin can be increased as compared with the case where no urea bond is formed. In other words, the distance between the molecular chains can be made close. Therefore, it is easy to prevent the sulfur component from entering, and the metal wiring can be protected from sulfidation degradation. Therefore, it can be set as the protective layer excellent in sulfidation resistance.

耐硫化性レジスト層が耐光性レジスト層よりも架橋密度が高い樹脂層とすることができる。耐硫化性レジスト層が耐光性レジスト層よりも架橋密度が高いため、耐硫化性を高めることができる。   The sulfur-resistant resist layer can be a resin layer having a higher crosslink density than the light-resistant resist layer. Since the sulfur-resistant resist layer has a higher crosslinking density than the light-resistant resist layer, the sulfur resistance can be improved.

耐光性レジスト層がポリウレタン系樹脂層である基板シートとすることができる。耐光性レジスト層がポリウレタン系樹脂層であるため、耐硫化性レジスト層との密着性を高めることができる。   It can be set as the board | substrate sheet | seat whose light-resistant resist layer is a polyurethane-type resin layer. Since the light-resistant resist layer is a polyurethane-based resin layer, the adhesion with the sulfur-resistant resist layer can be improved.

そして、上記の基板シートを用いてタッチパネルを製造することができる。上記の基板シートを備えたタッチパネルであるため、電極の変性や金属配線の劣化を起こし難いタッチパネルとすることができる。   And a touch panel can be manufactured using said board | substrate sheet | seat. Since it is a touch panel provided with said board | substrate sheet | seat, it can be set as the touch panel which hardly raise | generates the modification | denaturation of an electrode and deterioration of metal wiring.

本発明の基板シートやタッチパネルによれば、導電性高分子からなる透明電極と金属配線とを紫外線や硫黄成分による劣化や硫化から保護することができる。   According to the substrate sheet and the touch panel of the present invention, the transparent electrode made of a conductive polymer and the metal wiring can be protected from deterioration or sulfurization due to ultraviolet rays or sulfur components.

基板シートの平面図である。It is a top view of a substrate sheet. 図1のSA−SA線断面図である。It is the SA-SA sectional view taken on the line of FIG.

本発明について実施形態に基づきさらに詳細に説明する。
本実施形態の基板シート11は、図1、図2で示すように、光透過性の基材12と、その基材12上に形成する透明な導電性高分子からなる透明電極13と、その透明電極13を外部の電気回路に接続するための金属配線14と、透明電極13と金属配線14とを被覆する保護層15と、を少なくとも備えた層構成を有しており、静電容量式のタッチパネルとして用いることができるものである。
The present invention will be described in more detail based on embodiments.
As shown in FIGS. 1 and 2, the substrate sheet 11 of the present embodiment includes a light-transmitting base material 12, a transparent electrode 13 made of a transparent conductive polymer formed on the base material 12, and It has a layer configuration including at least a metal wiring 14 for connecting the transparent electrode 13 to an external electric circuit, and a protective layer 15 covering the transparent electrode 13 and the metal wiring 14, and is a capacitance type. It can be used as a touch panel.

基材12は、透明性の高い樹脂フィルムで形成され、例えば、ポリエチレンテレフタレート(PET)樹脂、ポリエチレンナフタレート(PEN)樹脂、ポリカーボネート(PC)樹脂、メタアクリル(PMMA)樹脂、ポリプロピレン(PP)樹脂、ポリウレタン(PU)樹脂、ポリアミド(PA)樹脂、ポリエーテルサルフォン(PES)樹脂、ポリエーテルエーテルケトン(PEEK)樹脂、トリアセチルセルロース(TAC)樹脂、シクロオレフィンポリマー(COP)等などから形成することができる。
基材12には、導電性高分子との密着性を高めるプライマー層や、表面保護層、帯電防止等を目的とするオーバーコート層などを設けて表面処理を施しても良い。
The substrate 12 is formed of a highly transparent resin film, for example, polyethylene terephthalate (PET) resin, polyethylene naphthalate (PEN) resin, polycarbonate (PC) resin, methacryl (PMMA) resin, polypropylene (PP) resin. , Polyurethane (PU) resin, polyamide (PA) resin, polyethersulfone (PES) resin, polyetheretherketone (PEEK) resin, triacetylcellulose (TAC) resin, cycloolefin polymer (COP), etc. be able to.
The substrate 12 may be subjected to a surface treatment by providing a primer layer that enhances adhesion to the conductive polymer, a surface protective layer, an overcoat layer for the purpose of preventing static charge, or the like.

透明電極13となる導電性高分子の材質には、透明な層を形成できる導電性高分子が用いられる。こうした透明性のある導電性高分子には、ポリパラフェニレンまたはポリアセチレン、PEDOT−PSS(ポリ−3,4−エチレンジオキシチオフェン−ポリスチレンスルホン酸)等が例示できる。   As the material of the conductive polymer that becomes the transparent electrode 13, a conductive polymer that can form a transparent layer is used. Examples of such transparent conductive polymers include polyparaphenylene or polyacetylene, PEDOT-PSS (poly-3,4-ethylenedioxythiophene-polystyrenesulfonic acid), and the like.

耐硫化性レジスト層17および耐光性レジスト層16ともに可視光域での光透過率は高くこれらの層は透明またはほぼ透明である。さらに、耐光性レジスト層17は紫外線を遮断するため、紫外域(波長400nm未満)の光透過率はほぼ0である。   Both the sulfur-resistant resist layer 17 and the light-resistant resist layer 16 have a high light transmittance in the visible light region, and these layers are transparent or almost transparent. Further, since the light-resistant resist layer 17 blocks ultraviolet rays, the light transmittance in the ultraviolet region (wavelength less than 400 nm) is almost zero.

金属配線14は、この基板シート11の外部に設けた情報処理装置(図示せず)などの電気回路に接続するコネクタ接続部18と、透明電極13とを接続するものである。
金属配線14の材料としては、例えば、銅、アルミニウム、銀またはそれらの金属を含む合金等の高導電性金属を含む導電ペーストや導電インキから形成されることが好ましい。また、これらの金属や合金の中でも導電性が高く、銅よりも酸化し難いという理由から銀配線とすることが好ましい。
The metal wiring 14 connects the connector connection portion 18 connected to an electric circuit such as an information processing device (not shown) provided outside the substrate sheet 11 and the transparent electrode 13.
The material of the metal wiring 14 is preferably formed from, for example, a conductive paste or a conductive ink containing a highly conductive metal such as copper, aluminum, silver, or an alloy containing these metals. Further, among these metals and alloys, silver wiring is preferable because it has high conductivity and is less likely to be oxidized than copper.

保護層15は、透明電極13や金属配線14を被覆する層であり、耐光性レジスト層16と耐硫化性レジスト層17を積層して形成した層である。耐硫化性レジスト層17で透明電極13や金属配線14を被覆し、その耐硫化性レジスト層17の上に耐光性レジスト層16を被覆することで形成される。   The protective layer 15 is a layer that covers the transparent electrode 13 and the metal wiring 14, and is a layer formed by laminating a light-resistant resist layer 16 and a sulfide-resistant resist layer 17. The transparent electrode 13 and the metal wiring 14 are covered with a sulfur-resistant resist layer 17, and the light-resistant resist layer 16 is covered on the sulfur-resistant resist layer 17.

耐光性レジスト層16は、引っ掻き等から基板シート11を保護し、また紫外線から透明導電高分子を保護するための層であり、透明樹脂に紫外線吸収剤を含む層である。透明樹脂には、硬質の樹脂が選択され、例えば、アクリル系やウレタン系、エポキシ系、ポリオレフィン系の樹脂、その他の樹脂を用いることができるが、ポリイソシアネート成分とポリオール成分を含んでなる原料組成物を硬化させたポリウレタン系樹脂層とすることが好ましい。硬度調整がし易く、強度が高いからである。   The light-resistant resist layer 16 is a layer for protecting the substrate sheet 11 from scratches and the like, and protecting the transparent conductive polymer from ultraviolet rays, and is a layer containing an ultraviolet absorber in a transparent resin. As the transparent resin, a hard resin is selected. For example, an acrylic resin, a urethane resin, an epoxy resin, a polyolefin resin, or other resins can be used, but a raw material composition comprising a polyisocyanate component and a polyol component. It is preferable to use a polyurethane resin layer obtained by curing the product. This is because the hardness can be easily adjusted and the strength is high.

ポリウレタン系樹脂層とする場合には、原料組成物中のポリイソシアネート成分としては、黄変を含む耐候性を考慮すると、脂肪族ジイソシアネート、脂環族ポリイソシアネート、およびアリール脂肪族ポリイソシアネートを使用することが特に好ましい。より詳細には、脂肪族ジイソシアネートとしては、例えばヘキサメチレンジイソシアネート;脂環族ポリイソシアネートとしては、例えばジシクロヘキシルメタンジイソシアネート、シクロヘキシルジイソシアネート、イソホロンジイソシアネート;アリール脂肪族ポリイソシアネートとしては、例えばキシリレンジイソシアネート;およびこれらのアダクトタイプ、ビュレットタイプ、イソシアヌレートタイプ、ウレタンイミンタイプのポリイソシアネートを使用することができる。   When a polyurethane resin layer is used, aliphatic diisocyanate, alicyclic polyisocyanate, and arylaliphatic polyisocyanate are used as the polyisocyanate component in the raw material composition in consideration of weather resistance including yellowing. It is particularly preferred. More specifically, examples of the aliphatic diisocyanate include hexamethylene diisocyanate; examples of the alicyclic polyisocyanate include dicyclohexylmethane diisocyanate, cyclohexyl diisocyanate, isophorone diisocyanate; examples of the aryl aliphatic polyisocyanate include xylylene diisocyanate; Adduct type, burette type, isocyanurate type, and urethane imine type polyisocyanates can be used.

また、2,4−トリレンジイソシアネート、2,6−トリレンジイソシアネート、4,4’−ジフェニルメタンジイソシアネート、2,4’−ジフェニルメタンジイソシアネート、パラ−フェニレンジイソシアネートなどの芳香族ポリイソシアネート;およびこれらのアダクトタイプ、ビュレットタイプ、イソシアヌレートタイプ、ウレトンイミンタイプのポリイソシアネートなどのイソシアネートを用いることも可能である。   Aromatic polyisocyanates such as 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, 4,4′-diphenylmethane diisocyanate, 2,4′-diphenylmethane diisocyanate, para-phenylene diisocyanate; and their adduct types It is also possible to use isocyanates such as burette type, isocyanurate type and uretonimine type polyisocyanates.

また、ポリオール成分には、例えばエチレングリコール、プロピレングリコール、グリセリンなどの低分子ポリオール類;ポリフェノール類に、ジエチレンオキサイド、プロピレンオキサイド、1,2−ブタジエンオキサイド、スチレンオキサイドなどのアルキレンオキサイドを付加して得られるポリエーテルポリオール;前記低分子ポリオール類とアジピン酸、フタル酸などのジカルボン酸との脱水縮合反応により得られるポリエステルポリオールなどが挙げられる。
さらには、アクリルポリオール、ポリカーボネートポリオール、ポリウレタンポリオール、ポリカプロラクトンポリオールなどを挙げることができる。
耐光性レジスト層16には、紫外線吸収剤を含む。紫外線吸収剤には、サリチル酸系、ベンゾフェノン系、ベンゾトリアゾール系、ヒンダードアミン系等の種々の紫外線吸収剤を用いることができる。
The polyol component is obtained by adding low molecular weight polyols such as ethylene glycol, propylene glycol and glycerin; and polyphenols by adding alkylene oxide such as diethylene oxide, propylene oxide, 1,2-butadiene oxide and styrene oxide. Examples of the polyether polyol include polyester polyols obtained by a dehydration condensation reaction between the low molecular polyols and dicarboxylic acids such as adipic acid and phthalic acid.
Furthermore, acrylic polyol, polycarbonate polyol, polyurethane polyol, polycaprolactone polyol and the like can be mentioned.
The light resistant resist layer 16 contains an ultraviolet absorber. Various ultraviolet absorbers such as salicylic acid, benzophenone, benzotriazole, and hindered amine can be used as the ultraviolet absorber.

可視光域400nm〜800nmにおける耐光性レジスト層16の平均光透過率は、80%以上が好ましく、85%以上がさらに好ましい。
耐光性レジスト層16の厚さは、通常、3μm〜10μmでありであり、好ましくは6μm〜8μmである。その理由は、厚すぎると柔軟性に乏しくなり、薄すぎると耐光性の作用が弱くなるからである。
The average light transmittance of the light-resistant resist layer 16 in the visible light region of 400 nm to 800 nm is preferably 80% or more, and more preferably 85% or more.
The thickness of the light resistant resist layer 16 is usually 3 μm to 10 μm, preferably 6 μm to 8 μm. The reason is that if it is too thick, the flexibility is poor, and if it is too thin, the effect of light resistance is weakened.

耐硫化性レジスト層17は、主に金属配線14の硫化を防止するための層であり、ポリウレタン・ポリウレア系樹脂層で形成される。ポリウレタン・ポリウレア系樹脂層を形成するポリウレタン・ポリウレア系樹脂は、ポリオール成分のOH基と反応する当量のNCO基を有するポリイソシアネート成分量よりも多量のポリイソシアネート成分を含有して硬化させた樹脂である。
ポリオール成分に対してポリイソシアネート成分を当量以上に含む原料を用いたため、ウレタン結合を形成するNCO基とは別の過剰なNCO基が水分と反応しさらに別のNCO基と反応してウレア結合を形成している。したがって、ポリウレタン・ポリウレア系樹脂は、ウレタン結合に加えてウレア結合を有する樹脂であり、単にウレタン結合を有するポリウレタン系樹脂と比較して架橋密度が高い樹脂である。
The sulfidation resistant resist layer 17 is a layer mainly for preventing sulfidation of the metal wiring 14, and is formed of a polyurethane / polyurea resin layer. The polyurethane-polyurea resin forming the polyurethane-polyurea resin layer is a resin containing a polyisocyanate component in an amount larger than the amount of polyisocyanate component having an equivalent NCO group that reacts with the OH group of the polyol component. is there.
Since the raw material containing the polyisocyanate component in an equivalent amount or more with respect to the polyol component was used, an excess NCO group different from the NCO group forming the urethane bond reacts with moisture and further reacts with another NCO group to form a urea bond. Forming. Therefore, the polyurethane-polyurea resin is a resin having a urea bond in addition to a urethane bond, and is a resin having a higher crosslink density than a polyurethane resin having a urethane bond.

ポリオール成分とポリイソシアネート成分を含むポリウレタン・ポリウレア系樹脂の原料には、ポリオール成分のOH基と反応する当量のNCO基を有するポリイソシアネート成分量の1.2倍〜5.5倍量のポリイソシアネート成分が含まれていることが好ましい。1.2倍よりも少ないとウレア結合の割合が減少して耐硫化性が不十分となる。また、5.5倍よりも多いとウレア結合が多くなることで耐硫化レジスト層17が硬く脆くなりやすい。   Polyurethane / polyurea-based resin raw material containing a polyol component and a polyisocyanate component includes 1.2 to 5.5 times the amount of polyisocyanate having an equivalent NCO group that reacts with the OH group of the polyol component. It is preferable that the component is contained. If it is less than 1.2 times, the ratio of urea bonds decreases and the resistance to sulfidation becomes insufficient. On the other hand, if it is more than 5.5 times, the number of urea bonds increases, so that the sulfur-resistant resist layer 17 tends to be hard and brittle.

ポリウレタン・ポリウレア系樹脂には、(a)ポリウレタンポリマーとポリウレアポリマーとが連結している共重合体や、(b)ポリウレタンポリマーとポリウレアポリマーとがそれぞれ独立で存在した混合物、さらには(a)と(b)とが混合した混合物のいずれの状態の樹脂も含むものである。   Polyurethane / polyurea resins include (a) a copolymer in which a polyurethane polymer and a polyurea polymer are linked, (b) a mixture in which the polyurethane polymer and the polyurea polymer exist independently, and (a) The resin in any state of the mixture mixed with (b) is included.

耐光性レジスト層16にポリウレタン系樹脂を用いる場合には、耐光性レジスト層16を形成する原料組成物中のポリイソシアネート成分とポリオール成分と同じ成分を用いることができ、ポリイソシアネート成分の配合割合を変えることで耐硫化性レジスト層17を形成できる。そのため、耐光性レジスト層16と耐硫化性レジスト層17との密着性が高く透明電極13と金属配線14の保護効果が高まる。
また、耐硫化性レジスト層17を金属配線14に直接積層させたため、他層を通じて金属配線14に至るだろうと考えられる硫黄成分の浸入を確実に防止することができる。
When using a polyurethane-based resin for the light-resistant resist layer 16, the same components as the polyisocyanate component and the polyol component in the raw material composition for forming the light-resistant resist layer 16 can be used. By changing it, the sulfidation resistant resist layer 17 can be formed. Therefore, the adhesion between the light-resistant resist layer 16 and the sulfide-resistant resist layer 17 is high, and the protective effect of the transparent electrode 13 and the metal wiring 14 is enhanced.
In addition, since the sulfur-resistant resist layer 17 is directly laminated on the metal wiring 14, it is possible to reliably prevent the intrusion of sulfur components that would reach the metal wiring 14 through other layers.

可視光域400nm〜800nmにおける耐硫化性レジスト層17の平均光透過率は、80%以上が好ましく、85%以上がさらに好ましい。
耐硫化性レジスト層17の厚さは、通常、3μm〜10μmであり、好ましくは6μm〜8μmである。その理由は、10μmより厚いと柔軟性に乏しくなり、3μmより薄いと耐硫化性の作用が弱くなるからであり、6μm〜8μmでは柔軟性があり、かつ耐硫化性が強いからである。
The average light transmittance of the sulfide-resistant resist layer 17 in the visible light region of 400 nm to 800 nm is preferably 80% or more, and more preferably 85% or more.
The thickness of the sulfidation resistant resist layer 17 is usually 3 μm to 10 μm, preferably 6 μm to 8 μm. The reason is that if it is thicker than 10 μm, the flexibility is poor, and if it is thinner than 3 μm, the action of sulfidation resistance is weak, and if it is 6 μm to 8 μm, it is flexible and the sulfidation resistance is strong.

こうして、耐光性レジスト層16と耐硫化性レジスト層17とを積層した保護層15としたため、次のような利点がある。
例えば、保護層15を、耐光性と耐硫化性を備える1層で本願発明の2層の場合と同様の厚さに形成することを考えると、2層の場合に比べてイソシアネート成分の含有量を多くしてウレア結合を多く含有させる必要がある。2層の場合と同量のイソシアネート成分を含有させたのでは保護層の架橋密度が低くなり耐硫化性能が悪くなるからである。即ち、1層の場合は2層の場合よりもポリイソシアネート成分を多くせざるを得ず、保護層が硬くなるといった不都合が生じる。また、原料のコスト高にもなる。
Thus, the protective layer 15 in which the light-resistant resist layer 16 and the sulfide-resistant resist layer 17 are laminated has the following advantages.
For example, considering that the protective layer 15 is formed in one layer having light resistance and sulfidation resistance to the same thickness as in the case of the two layers of the present invention, the content of the isocyanate component compared to the case of the two layers It is necessary to increase the amount of urea bonds. This is because if the same amount of isocyanate component as that in the case of two layers is contained, the crosslink density of the protective layer is lowered, and the sulfidation resistance is deteriorated. That is, in the case of one layer, the polyisocyanate component must be increased more than in the case of two layers, and there arises a disadvantage that the protective layer becomes hard. In addition, the cost of the raw material becomes high.

また、基材12側に耐硫化性レジスト層17を設け外側に耐光性レジスト層16を設ければ、基材12の側面側から浸入する硫黄成分を効果的に遮断することができるため、基材12側に耐光性レジスト層16を設け外側に耐硫化性レジスト層17を設ける場合よりも好ましい。   Further, if the sulfur-resistant resist layer 17 is provided on the substrate 12 side and the light-resistant resist layer 16 is provided on the outside, the sulfur component entering from the side surface side of the substrate 12 can be effectively blocked. This is more preferable than the case where the light-resistant resist layer 16 is provided on the material 12 side and the sulfide-resistant resist layer 17 is provided outside.

必要に応じて上記各層以外の別の層を設けることができる。例えば、全体的に色彩を付与するための着色層や、光の屈折率を変化させたり偏光させるための層などが挙げられる。
なお、基板シート11の構成において、透明電極13や金属配線14は、基材12表面の一部に設けられていれば良く、全面に設けられていても良い。また、必要により基材12の表裏両面に設けられていても良い。
透明電極13や金属配線14等の形状も上記形状に限られるものではない。
Other layers other than the above layers can be provided as necessary. For example, a colored layer for imparting a color as a whole, a layer for changing the refractive index of light or polarizing the light, and the like can be mentioned.
In addition, in the structure of the board | substrate sheet | seat 11, the transparent electrode 13 and the metal wiring 14 should just be provided in a part of base material 12 surface, and may be provided in the whole surface. Moreover, you may provide in the front and back both surfaces of the base material 12 as needed.
The shapes of the transparent electrode 13 and the metal wiring 14 are not limited to the above shapes.

基板シート11の製造は、基材12となる透明樹脂フィルム上の所定の箇所に透明電極13および金属配線14を印刷形成する。そしてその上に耐硫化性レジスト層17、耐光性レジスト層16となるそれぞれの原料組成物を塗布し、硬化させて保護層15を形成する。こうして基板シート11を得ることができる。   In the manufacture of the substrate sheet 11, the transparent electrode 13 and the metal wiring 14 are printed and formed at predetermined locations on the transparent resin film to be the base 12. And the raw material composition used as the sulfur-resistant resist layer 17 and the light-resistant resist layer 16 is apply | coated on it, it is made to harden | cure, and the protective layer 15 is formed. Thus, the substrate sheet 11 can be obtained.

図1、図2に示す層構成の基板シート(11)を作製した。
例1
透明なPET樹脂フィルムからなる基材(12)の上に、透明導電性インキ(オルガコンP3000 AGFA社製)をスクリーン印刷し長方形状の透明電極(13)を得た。また、基材(12)の上に銀インキ(7145 デュポン社製)でスクリーン印刷して金属配線(14)を得た。そして、これらの上にスクリーン印刷で耐硫化性レジスト層(17)と耐光性レジスト層(16)とを順次設けた。
下層になる耐硫化性レジスト層(17)は、水酸基価36mgKOH/gのポリエステルポリオールに、HDI系イソシアネートを混合した原料インキ(NCO/OH=2.2)から形成し、上層になる耐光性レジスト層(16)は、ポリエステルポリオールに、HDI系イソシアネートを混合(NCO/OH=1.1)し、さらにベンゾトリアゾール系紫外線吸収剤を添加した原料インキから形成した。
A substrate sheet (11) having the layer structure shown in FIGS. 1 and 2 was produced.
Example 1 :
On the substrate (12) made of a transparent PET resin film, a transparent conductive ink (manufactured by Olgacon P3000 AGFA) was screen-printed to obtain a rectangular transparent electrode (13). Moreover, it screen-printed with the silver ink (made by 7145 DuPont) on the base material (12), and the metal wiring (14) was obtained. Then, a sulfide-resistant resist layer (17) and a light-resistant resist layer (16) were sequentially provided on these by screen printing.
The lower sulfur-resistant resist layer (17) is formed from a raw material ink (NCO / OH = 2.2) in which an HDI-based isocyanate is mixed with a polyester polyol having a hydroxyl value of 36 mgKOH / g. 16) was formed from a raw material ink in which a polyester polyol was mixed with an HDI isocyanate (NCO / OH = 1.1) and a benzotriazole ultraviolet absorber was further added.

また、金属配線(14)の先端はカーボンインキを印刷して覆うことで、電気回路に接続するコネクタ接続部(18)を形成した。コネクタ接続部(18)はその表面に保護層(15)(耐硫化性レジスト層(17)および耐光性レジスト層(16))で覆われない部分を有している。こうして透明電極(13)と金属配線(14)とが、保護層(15)によって覆われた基板シート(11)を得た。   Further, the tip of the metal wiring (14) was covered with carbon ink by printing to form a connector connecting portion (18) for connecting to an electric circuit. The connector connecting portion (18) has a portion not covered with a protective layer (15) (sulfur resistant resist layer (17) and light resistant resist layer (16)) on its surface. Thus, a substrate sheet (11) in which the transparent electrode (13) and the metal wiring (14) were covered with the protective layer (15) was obtained.

例2〜例7
例1の耐硫化性レジスト層(17)のNCO/OH比率を以下の表1記載の値に変更した以外は例1と同様にして例2〜例7の基板シート(11)を得た。
Examples 2 to 7 :
Substrate sheets (11) of Examples 2 to 7 were obtained in the same manner as in Example 1 except that the NCO / OH ratio of the sulfur-resistant resist layer (17) of Example 1 was changed to the values shown in Table 1 below.

例8
例1とは保護層(15)の積層順が異なる例8の基板シート(11)を作製した。
例8では、下層に耐光性レジスト層(16)、上層に耐硫化性レジスト層(17)を形成した。
Example 8 :
A substrate sheet (11) of Example 8 having a different order of lamination of the protective layer (15) from Example 1 was produced.
In Example 8, a light resistant resist layer (16) was formed in the lower layer, and a sulfide resistant resist layer (17) was formed in the upper layer.

Figure 2013187324
Figure 2013187324

<耐光性の試験方法、評価方法>:
サンシャインウェザーメータを用いてJISK7350−4に準拠した促進耐光性試験(サンシャインカーボンアーク光源、63℃環境下、水の噴射なし)を行った。
例1〜例8で得られた基板シート(11)を白色台紙上に貼り、レジスト面側から300時間照射し、透明電極(13)の抵抗値変化率(%)を評価した。
<Light resistance test method, evaluation method>:
Using a sunshine weather meter, an accelerated light resistance test (Sunshine carbon arc light source in a 63 ° C. environment without water injection) in accordance with JIS K7350-4 was conducted.
The substrate sheets (11) obtained in Examples 1 to 8 were attached on a white mount and irradiated from the resist surface side for 300 hours, and the resistance value change rate (%) of the transparent electrode (13) was evaluated.

<耐硫化性の試験方法、評価方法>:
例1〜例8で得られた基板シート(11)の付近に硫黄の粉を載せ、シャーレで蓋をした85℃の飽和硫黄蒸気雰囲気中に、300時間、および500時間放置し、金属配線(14)の抵抗値変化率(%)を評価した。
なお、表中「(断線)」としたのは、テスター測定値が表示可能値の2MΩを超えたことを示す。
<Sulfuration resistance test method and evaluation method>:
Place sulfur powder near the substrate sheet (11) obtained in Examples 1 to 8 and leave it in a saturated sulfur vapor atmosphere at 85 ° C. covered with a petri dish for 300 hours and 500 hours. The resistance value change rate (%) of 14) was evaluated.
Note that “(disconnected)” in the table indicates that the measured value of the tester exceeded the displayable value of 2 MΩ.

<架橋密度評価(膨潤試験)の方法>:
例1〜例8の基板シート(11)の耐光性レジスト層(16)の形成と同様にして、耐光性レジスト層(16)のみをシート状に塗布成形して例1〜例8に対応する耐光性レジスト層(16)のみからなる試験片を作製した。これらの試験片はトルエンに1時間浸漬し、表1の例1〜例8にそれぞれ対応する箇所に、重量変化率(%)を記載した。
<Method of crosslinking density evaluation (swelling test)>:
In the same manner as the formation of the light-resistant resist layer (16) of the substrate sheet (11) of Examples 1 to 8, only the light-resistant resist layer (16) is applied and formed into a sheet shape, which corresponds to Examples 1 to 8. A test piece consisting only of the light-resistant resist layer (16) was produced. These test pieces were immersed in toluene for 1 hour, and the weight change rate (%) was described in the locations corresponding to Examples 1 to 8 in Table 1, respectively.

例1〜例8は、保護層(15)中の耐光性レジスト層(16)に紫外線吸収剤を含んでおり、透明電極(13)に抵抗値変化があるもののその変化が+320%以下であってタッチパネルとして使用可能な程度には導電性を維持している。
例1〜例5は、保護層(15)の耐硫化性レジスト層(17)を有しており、金属配線(14)は抵抗値変化があるものの導電性を維持している。
例6は、耐硫化性試験で300時間後に金属配線(14)が断線、すなわち所望の導電性が消失した。また、耐硫化性レジスト層(17)の重量変化率が+35%であってトルエンを透過しやすいことがわかった。
In Examples 1 to 8, the light-resistant resist layer (16) in the protective layer (15) contains an ultraviolet absorber, and the transparent electrode (13) has a resistance value change, but the change is + 320% or less. In order to be usable as a touch panel, the conductivity is maintained.
Examples 1 to 5 have a sulfide-resistant resist layer (17) as a protective layer (15), and the metal wiring (14) maintains conductivity although the resistance value changes.
In Example 6, the metal wiring (14) was disconnected after 300 hours in the sulfidation resistance test, that is, the desired conductivity was lost. Moreover, it turned out that the weight change rate of a sulfur-resistant resist layer (17) is + 35%, and it is easy to permeate | transmit toluene.

例7は、(NCO/OH)の値が大きく、耐硫化性レジスト層(17)が硬くなり、得られた基板シート(11)が屈曲し難いものとなった。
例8は、保護層(15)として下層に耐光性レジスト層(16)、上層に耐硫化性レジスト層(17)となるように積層した構成である。耐硫化性試験において300時間後は導電性を保つことができ、一定の耐硫化性が得られているが、500時間後には金属配線(14)が断線、すなわち所望の導電性が消失した。
In Example 7, the value of (NCO / OH) was large, the sulfide-resistant resist layer (17) was hard, and the obtained substrate sheet (11) was difficult to bend.
Example 8 has a configuration in which the protective layer (15) is laminated such that the light-resistant resist layer (16) is formed in the lower layer and the sulfide-resistant resist layer (17) is formed in the upper layer. In the sulfidation resistance test, the conductivity could be maintained after 300 hours and a certain sulfidation resistance was obtained, but after 500 hours, the metal wiring (14) was disconnected, that is, the desired conductivity was lost.

上記実施形態や実施例で説明した形状、層構成、原料等は、本発明の趣旨を逸脱しない範囲で適宜変更すること、例えば上記以外の公知の原料の使用等ができ、こうした変更も本発明の技術的思想の範囲に含まれるものである。   The shapes, layer configurations, raw materials and the like described in the above embodiments and examples can be appropriately changed without departing from the gist of the present invention, for example, other known raw materials other than the above can be used. It is included in the scope of the technical idea.

11 基板シート
12 基材
13 透明電極
14 金属配線
15 保護層
16 耐光性レジスト層
17 耐硫化性レジスト層
18 コネクタ接続部
DESCRIPTION OF SYMBOLS 11 Board sheet 12 Base material 13 Transparent electrode 14 Metal wiring 15 Protective layer 16 Light resistant resist layer 17 Sulfide resistant resist layer 18 Connector connection part

Claims (6)

透光性基材上に導電性高分子からなる透明電極と、この透明電極とコネクタ接続部とを繋ぐ金属配線とを有し、透明電極と金属配線とを被覆する保護層が設けられた基板シートであって、
保護層が金属配線の硫化を防止する耐硫化性レジスト層と紫外線を吸収する耐光性レジスト層とが積層した積層体でなり、耐硫化性レジスト層がポリウレタン・ポリウレア系樹脂層である基板シート。
A substrate having a transparent electrode made of a conductive polymer and a metal wiring connecting the transparent electrode and the connector connecting portion on a translucent base material, and a protective layer covering the transparent electrode and the metal wiring is provided. A sheet,
A substrate sheet in which a protective layer is a laminate in which a sulfur-resistant resist layer that prevents sulfuration of metal wiring and a light-resistant resist layer that absorbs ultraviolet rays are laminated, and the sulfur-resistant resist layer is a polyurethane-polyurea resin layer.
保護層が、透光性基材側から耐硫化性レジスト層と耐光性レジスト層がこの順に積層した積層体である請求項1記載の基板シート。   The substrate sheet according to claim 1, wherein the protective layer is a laminate in which a sulfide-resistant resist layer and a light-resistant resist layer are laminated in this order from the translucent substrate side. ポリウレタン・ポリウレア系樹脂層を形成するポリウレタン・ポリウレア系樹脂が、NCO基/OH基の値が1.2〜5.5となる原料を反応硬化させた樹脂である請求項1または請求項2記載の基板シート   3. The polyurethane / polyurea resin forming the polyurethane / polyurea resin layer is a resin obtained by reaction-curing a raw material having an NCO group / OH group value of 1.2 to 5.5. Board sheet 耐硫化性レジスト層が耐光性レジスト層よりも架橋密度が高い層である請求項1〜請求項3何れか1項記載の基板シート。   The substrate sheet according to any one of claims 1 to 3, wherein the sulfur-resistant resist layer is a layer having a higher crosslinking density than the light-resistant resist layer. 耐光性レジスト層がポリウレタン系樹脂層である請求項1〜請求項4何れか1項記載の基板シート。   The substrate sheet according to any one of claims 1 to 4, wherein the light-resistant resist layer is a polyurethane resin layer. 表示装置と、該表示装置の画面上に装着した請求項1〜請求項5何れか1項記載の基板シートとを備えるタッチパネル。   A touch panel comprising: a display device; and the substrate sheet according to any one of claims 1 to 5 mounted on a screen of the display device.
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