JPWO2011086931A1 - 3次元構造体およびその製造方法 - Google Patents
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- 238000004519 manufacturing process Methods 0.000 title claims description 27
- 229910021645 metal ion Inorganic materials 0.000 claims abstract description 95
- 239000000758 substrate Substances 0.000 claims abstract description 50
- 150000004032 porphyrins Chemical class 0.000 claims abstract description 44
- 125000000524 functional group Chemical group 0.000 claims abstract description 18
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical group C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 46
- 238000000034 method Methods 0.000 claims description 29
- -1 porphyrin metal complex Chemical class 0.000 claims description 26
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 22
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 21
- 239000000463 material Substances 0.000 claims description 14
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 claims description 13
- 229910001431 copper ion Inorganic materials 0.000 claims description 13
- 238000000151 deposition Methods 0.000 claims description 13
- JZRYQZJSTWVBBD-UHFFFAOYSA-N pentaporphyrin i Chemical group N1C(C=C2NC(=CC3=NC(=C4)C=C3)C=C2)=CC=C1C=C1C=CC4=N1 JZRYQZJSTWVBBD-UHFFFAOYSA-N 0.000 claims description 12
- 239000007788 liquid Substances 0.000 claims description 11
- 229910001429 cobalt ion Inorganic materials 0.000 claims description 9
- XLJKHNWPARRRJB-UHFFFAOYSA-N cobalt(2+) Chemical compound [Co+2] XLJKHNWPARRRJB-UHFFFAOYSA-N 0.000 claims description 9
- 239000002904 solvent Substances 0.000 claims description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 8
- 229910001453 nickel ion Inorganic materials 0.000 claims description 7
- 125000003118 aryl group Chemical group 0.000 claims description 5
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims description 5
- 239000000243 solution Substances 0.000 description 33
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 22
- 229910052751 metal Inorganic materials 0.000 description 15
- 239000002184 metal Substances 0.000 description 15
- 238000002441 X-ray diffraction Methods 0.000 description 14
- 229960003280 cupric chloride Drugs 0.000 description 11
- 150000003839 salts Chemical class 0.000 description 11
- 238000000862 absorption spectrum Methods 0.000 description 10
- 239000007864 aqueous solution Substances 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 238000005259 measurement Methods 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 8
- 230000008021 deposition Effects 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- 239000012528 membrane Substances 0.000 description 7
- VQGHOUODWALEFC-UHFFFAOYSA-N 2-phenylpyridine Chemical compound C1=CC=CC=C1C1=CC=CC=N1 VQGHOUODWALEFC-UHFFFAOYSA-N 0.000 description 6
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 6
- 230000003993 interaction Effects 0.000 description 6
- 229910001428 transition metal ion Inorganic materials 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 230000004888 barrier function Effects 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- JVZRCNQLWOELDU-UHFFFAOYSA-N gamma-Phenylpyridine Natural products C1=CC=CC=C1C1=CC=NC=C1 JVZRCNQLWOELDU-UHFFFAOYSA-N 0.000 description 3
- 125000002524 organometallic group Chemical group 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000002216 synchrotron radiation X-ray diffraction Methods 0.000 description 3
- 125000001391 thioamide group Chemical group 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000013256 coordination polymer Substances 0.000 description 2
- 229920001795 coordination polymer Polymers 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 150000004687 hexahydrates Chemical class 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000012621 metal-organic framework Substances 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 150000003222 pyridines Chemical class 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 1
- RMHQDKYZXJVCME-UHFFFAOYSA-N 2-pyridin-4-ylpyridine Chemical compound N1=CC=CC=C1C1=CC=NC=C1 RMHQDKYZXJVCME-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 150000004696 coordination complex Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000001341 grazing-angle X-ray diffraction Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- KBJMLQFLOWQJNF-UHFFFAOYSA-N nickel(ii) nitrate Chemical compound [Ni+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O KBJMLQFLOWQJNF-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 1
- MUJIDPITZJWBSW-UHFFFAOYSA-N palladium(2+) Chemical compound [Pd+2] MUJIDPITZJWBSW-UHFFFAOYSA-N 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
- C07D487/22—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains four or more hetero rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
- C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
- C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D213/06—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom containing only hydrogen and carbon atoms in addition to the ring nitrogen atom
- C07D213/16—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom containing only hydrogen and carbon atoms in addition to the ring nitrogen atom containing only one pyridine ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
- C07B2200/00—Indexing scheme relating to specific properties of organic compounds
- C07B2200/11—Compounds covalently bound to a solid support
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Laminated Bodies (AREA)
- Catalysts (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
- Pyridine Compounds (AREA)
Abstract
Description
本発明の方法は、3次元構造体の製造方法である。この製造方法によれば、基材上に形成された3次元構造体が得られる。この製造方法は、以下の工程(i)、(ii)および(iii)を含む。
本発明の3次元構造体は、上記本発明の製造方法で製造できる。本発明の製造方法について説明した事項は、本発明の3次元構造体に適用できるため、重複する説明を省略する場合がある。また、本発明の3次元構造体について説明した事項は、本発明の製造方法に適用できる。
実施例1では、構成要素(A)として、CoTCPP(Porphyrin Systems製)を用いた。第1の金属イオンを含む化合物として、塩化第二銅2水和物(CuCl2・2H2O)を用いた。ピラー分子としてピリジンを用いた。X線回折測定(XRD)および原子間力顕微鏡(AFM)の測定では、シリコン単結晶基板((100)表面)を基板として用いた。紫外−可視吸収スペクトル測定では、石英基板を基板として用いた。これらの基板は、2次元構造体を積層する前に、クロロホルム、アセトン、およびエタノールのそれぞれの中で、30分間ずつ超音波洗浄した。
比較例1では、塩化第二銅2水和物の水溶液の代わりに純水を用いることを除いて、実施例1と同様の操作を行った。具体的には、トラフに純水を入れ、その純水の表面に、160μLのCoTCPP/ピリジン溶液を展開した。その他の操作は、実施例1と同様に行った。
2次元構造体の積層数と、吸収スペクトルの変化を図4Aに示す。また、440nm近傍の吸収ピーク(ソーレー帯:Soret band)の高さの変化を、図4Bに示す。なお、これらの図において、サイクル数が1(1サイクル)とは、基材上に2次元構造体が1層だけ形成されていることを示す。
シンクロトロンX線回折のデータは、スプリングエイト(Spring-8)において、ビーム線BL13XU(波長1.554オングストローム)を用いて室温で取得された。測定の間、測定セルにヘリウムガスを供給した。
工程(i)において用いられる、金属塩を溶解させた第1の溶液について検討した。具体的には、第1の溶液に溶解させる金属塩の種類および濃度を変えて、2次元構造体を形成した。第1の溶液中に金属塩を溶解させることによって、第1の金属イオンが供給される。
Claims (13)
- 基材上に形成された3次元構造体であって、
積層された複数の2次元構造体を含み、
前記2次元構造体は、ポルフィリン、第1の金属イオン、および特定の有機分子のそれぞれを複数個ずつ含み、
前記ポルフィリンは2つ以上の官能基を含み、
前記第1の金属イオンは、異なる前記ポルフィリンの前記官能基同士を結合させる金属イオンであり、
前記特定の有機分子は、前記2次元構造体に含まれる金属イオンに配位結合する有機分子であって、且つ、前記金属イオンに配位する部分を1つのみ含む有機分子である、3次元構造体。 - 前記ポルフィリンは、4つのカルボキシル基を含みポルフィン環に配位した中心金属イオンを含まないポルフィリン、または、4つのカルボキシル基とポルフィン環に配位した中心金属イオンとを含むポルフィリン金属錯体である、請求項1に記載の3次元構造体。
- 前記第1の金属イオンが2価の銅イオンまたは2価のニッケルイオンであり、
前記特定の有機分子が含窒素芳香環を含む分子である、請求項2に記載の3次元構造体。 - 前記特定の有機分子がピリジンである、請求項3に記載の3次元構造体。
- 前記ポルフィリンは、4つのカルボキシル基とポルフィン環に配位したコバルトイオンとを含むポルフィリン金属錯体である、請求項1に記載の3次元構造体。
- 3次元構造体の製造方法であって、
(i)2次元構造体を液体の表面に形成する工程と、
(ii)前記2次元構造体を基材上に堆積させる工程と、
(iii)前記(i)の工程と前記(ii)の工程とを含むサイクルを1回以上繰り返す工程とを含み、
前記2次元構造体は、ポルフィリン、第1の金属イオン、および特定の有機分子のそれぞれを複数個ずつ含み、
前記ポルフィリンは2つ以上の官能基を含み、
前記第1の金属イオンは、異なる前記ポルフィリンの前記官能基同士を結合させる金属イオンであり、
前記特定の有機分子は、前記2次元構造体に含まれる金属イオンに配位結合する有機分子であって、且つ、前記金属イオンに配位する部分を1つのみ含む有機分子である、製造方法。 - 前記(ii)の工程の後に、(x)前記2次元構造体が堆積した前記基材を溶媒中に浸漬する工程を含み、
前記(iii)の工程は、前記(i)の工程と前記(ii)の工程と前記(x)の工程とを含むサイクルを1回以上繰り返す工程である、請求項6に記載の製造方法。 - 前記ポルフィリンは、4つのカルボキシル基を含みポルフィン環に配位した中心金属イオンを含まないポルフィリン、または、4つのカルボキシル基とポルフィン環に配位した中心金属イオンとを含むポルフィリン金属錯体である、請求項6または7に記載の製造方法。
- 前記第1の金属イオンが2価の銅イオンまたは2価のニッケルイオンであり、
前記特定の有機分子が含窒素芳香環を含む分子である、請求項8に記載の製造方法。 - 前記特定の有機分子がピリジンである、請求項9に記載の製造方法。
- 前記ポルフィリンは、4つのカルボキシル基とポルフィン環に配位したコバルトイオンとを含むポルフィリン金属錯体である、請求項6または7に記載の製造方法。
- 前記(i)の工程は、前記第1の金属イオンを含む第1の溶液に、前記ポルフィリンと前記特定の有機分子とを含む第2の溶液を添加することによって、前記液体の表面に前記2次元構造体を形成する工程である、請求項6に記載の製造方法。
- 前記(ii)の工程は、前記基材の表面が前記液体の表面に対して平行となっている状態で、前記基材を前記2次元構造体に接近させ、これによって、前記2次元構造体を前記基材上に堆積させる工程である、請求項12に記載の製造方法。
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CN (1) | CN102712588B (ja) |
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JP2010059111A (ja) * | 2008-09-04 | 2010-03-18 | Kyushu Univ | 有機金属錯体、3次元構造体、およびそれらの製造方法 |
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