JPS649614B2 - - Google Patents

Info

Publication number
JPS649614B2
JPS649614B2 JP12051180A JP12051180A JPS649614B2 JP S649614 B2 JPS649614 B2 JP S649614B2 JP 12051180 A JP12051180 A JP 12051180A JP 12051180 A JP12051180 A JP 12051180A JP S649614 B2 JPS649614 B2 JP S649614B2
Authority
JP
Japan
Prior art keywords
radiation
copolymer
butyl
sensitivity
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP12051180A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5744145A (en
Inventor
Hideo Saeki
Kazunori Saito
Tadao Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP12051180A priority Critical patent/JPS5744145A/ja
Publication of JPS5744145A publication Critical patent/JPS5744145A/ja
Publication of JPS649614B2 publication Critical patent/JPS649614B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP12051180A 1980-08-29 1980-08-29 Radiaton sensitive positive type resist composition and its solution Granted JPS5744145A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12051180A JPS5744145A (en) 1980-08-29 1980-08-29 Radiaton sensitive positive type resist composition and its solution

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12051180A JPS5744145A (en) 1980-08-29 1980-08-29 Radiaton sensitive positive type resist composition and its solution

Publications (2)

Publication Number Publication Date
JPS5744145A JPS5744145A (en) 1982-03-12
JPS649614B2 true JPS649614B2 (enExample) 1989-02-17

Family

ID=14788017

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12051180A Granted JPS5744145A (en) 1980-08-29 1980-08-29 Radiaton sensitive positive type resist composition and its solution

Country Status (1)

Country Link
JP (1) JPS5744145A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5968264U (ja) * 1982-10-30 1984-05-09 大崎電気工業株式会社 アナログ−電流変換回路
JPS60117244A (ja) * 1983-11-30 1985-06-24 Fujitsu Ltd パタ−ン形成方法

Also Published As

Publication number Publication date
JPS5744145A (en) 1982-03-12

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