JPS649446A - Pattern forming process - Google Patents

Pattern forming process

Info

Publication number
JPS649446A
JPS649446A JP16391887A JP16391887A JPS649446A JP S649446 A JPS649446 A JP S649446A JP 16391887 A JP16391887 A JP 16391887A JP 16391887 A JP16391887 A JP 16391887A JP S649446 A JPS649446 A JP S649446A
Authority
JP
Japan
Prior art keywords
layer
pattern
irradiating
ultraviolet rays
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16391887A
Other languages
Japanese (ja)
Inventor
Masaichi Uchino
Minoru Chokai
Takao Iwayagi
Michiaki Hashimoto
Hajime Morishita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Hitachi Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP16391887A priority Critical patent/JPS649446A/en
Publication of JPS649446A publication Critical patent/JPS649446A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To improve resolution of a pattern and to obtain sufficiently high contrast by using a photosensitive layer contg. an aromatic diazonium salt and a high molecular compd. CONSTITUTION:A photosensitive layer (A) which is discolored by exposure is formed on a photoresist layer after forming the photoresist layer on a substrate (e.g. silicon wafer). Then, an exposed part of the layer (A) is made transparent by irradiating the layer (A) with far ultraviolet rays through a specified pattern. Then, the resist layer is exposed by irradiating the whole surface of the resist layer with light having longer wavelength than said far ultraviolet rays using the unexposed part of the above described photosensitive layer (A) as mask. The layer (A) is removed and the resist layer is developed, and a pattern is formed. In this process, it is preferred that a water-soluble aromatic diazonium salt (e.g. compds. expressed by the formula) and a water-soluble high molecular compd. [e.g., poly(N-vinyl pyrrolidone)] are used for the layer (A). In the formula, each R1-R4 is H, alkyl, etc.; X is Cl, BF4, etc.
JP16391887A 1987-07-02 1987-07-02 Pattern forming process Pending JPS649446A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16391887A JPS649446A (en) 1987-07-02 1987-07-02 Pattern forming process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16391887A JPS649446A (en) 1987-07-02 1987-07-02 Pattern forming process

Publications (1)

Publication Number Publication Date
JPS649446A true JPS649446A (en) 1989-01-12

Family

ID=15783297

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16391887A Pending JPS649446A (en) 1987-07-02 1987-07-02 Pattern forming process

Country Status (1)

Country Link
JP (1) JPS649446A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02872A (en) * 1987-11-27 1990-01-05 Tosoh Corp Photosensitive resin composition and pattern forming method by using said composition
JPH02262150A (en) * 1989-03-31 1990-10-24 Toshiba Corp Photosensitive composition and pattern forming method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02872A (en) * 1987-11-27 1990-01-05 Tosoh Corp Photosensitive resin composition and pattern forming method by using said composition
JPH02262150A (en) * 1989-03-31 1990-10-24 Toshiba Corp Photosensitive composition and pattern forming method

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