JPS6490271A - Resin composition for electrodeposition - Google Patents

Resin composition for electrodeposition

Info

Publication number
JPS6490271A
JPS6490271A JP24894887A JP24894887A JPS6490271A JP S6490271 A JPS6490271 A JP S6490271A JP 24894887 A JP24894887 A JP 24894887A JP 24894887 A JP24894887 A JP 24894887A JP S6490271 A JPS6490271 A JP S6490271A
Authority
JP
Japan
Prior art keywords
resin
beta
alpha
ethylenically unsaturated
unsaturated carboxylic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24894887A
Other languages
Japanese (ja)
Other versions
JPH0639577B2 (en
Inventor
Kazuji Kageishi
Kenji Takakuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
HONNY CHEMICAL IND
Honny Chemicals Co Ltd
Original Assignee
HONNY CHEMICAL IND
Honny Chemicals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by HONNY CHEMICAL IND, Honny Chemicals Co Ltd filed Critical HONNY CHEMICAL IND
Priority to JP62248948A priority Critical patent/JPH0639577B2/en
Publication of JPS6490271A publication Critical patent/JPS6490271A/en
Publication of JPH0639577B2 publication Critical patent/JPH0639577B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

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  • Paints Or Removers (AREA)

Abstract

PURPOSE:To obtain the title composition excellent in weathering resistance, water resistance, chemical resistance, scratch resistance and rust-preventive property, by mixing a specified polycarboxylic acid resin with a specified linear polysiloxane and an amino resin. CONSTITUTION:An alpha,beta-ethylenically unsaturated carboxylic acid is reacted with an alpha,beta-ethylenically unsaturated carboxylic acid alkyl ester and a hydroxyalkyl ester or amide (derivative) or an alpha,beta-ethylenically unsaturated carboxylic acid to obtain a polycarboxylic acid resin (A) of an acid value of 5-100mg KOH and a hydroxyl value of 10-150mg KOH. A mixture of 35-99.95wt.% component A with 65-0.05wt.% linear polysiloxane (B) having a main chain terminated with hydroxyl groups or carboxyl groups is mixed with 10-50wt.% amino resin (C) (e.g., methylolmelamine resin) and agitated in an organic solvent.
JP62248948A 1987-09-30 1987-09-30 Resin composition for electrodeposition coating Expired - Fee Related JPH0639577B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62248948A JPH0639577B2 (en) 1987-09-30 1987-09-30 Resin composition for electrodeposition coating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62248948A JPH0639577B2 (en) 1987-09-30 1987-09-30 Resin composition for electrodeposition coating

Publications (2)

Publication Number Publication Date
JPS6490271A true JPS6490271A (en) 1989-04-06
JPH0639577B2 JPH0639577B2 (en) 1994-05-25

Family

ID=17185797

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62248948A Expired - Fee Related JPH0639577B2 (en) 1987-09-30 1987-09-30 Resin composition for electrodeposition coating

Country Status (1)

Country Link
JP (1) JPH0639577B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0255776A (en) * 1988-08-23 1990-02-26 Asahi Glass Co Ltd Electrodeposition coating composition
JP2004204215A (en) * 2002-10-30 2004-07-22 Honny Chem Ind Co Ltd Anionic flat electrodeposition coating resin composition
JP2005002217A (en) * 2003-06-12 2005-01-06 Honny Chem Ind Co Ltd Resin composition for anionic-type delustering electrodeposition liquid
JP2006111687A (en) * 2004-10-13 2006-04-27 Honny Chem Ind Co Ltd Anionic electrodeposition coating composition
JP2008138111A (en) * 2006-12-04 2008-06-19 Shinto Paint Co Ltd Highly scratch-resistant anionic electrodeposition coating

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0255776A (en) * 1988-08-23 1990-02-26 Asahi Glass Co Ltd Electrodeposition coating composition
JP2004204215A (en) * 2002-10-30 2004-07-22 Honny Chem Ind Co Ltd Anionic flat electrodeposition coating resin composition
JP2005002217A (en) * 2003-06-12 2005-01-06 Honny Chem Ind Co Ltd Resin composition for anionic-type delustering electrodeposition liquid
JP2006111687A (en) * 2004-10-13 2006-04-27 Honny Chem Ind Co Ltd Anionic electrodeposition coating composition
JP2008138111A (en) * 2006-12-04 2008-06-19 Shinto Paint Co Ltd Highly scratch-resistant anionic electrodeposition coating

Also Published As

Publication number Publication date
JPH0639577B2 (en) 1994-05-25

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees