JPS6490270A - Positive photosensitive anionic electrodeposition paint composition - Google Patents

Positive photosensitive anionic electrodeposition paint composition

Info

Publication number
JPS6490270A
JPS6490270A JP24584087A JP24584087A JPS6490270A JP S6490270 A JPS6490270 A JP S6490270A JP 24584087 A JP24584087 A JP 24584087A JP 24584087 A JP24584087 A JP 24584087A JP S6490270 A JPS6490270 A JP S6490270A
Authority
JP
Japan
Prior art keywords
formula
monomer
resin
reacting
hydroxylated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24584087A
Other languages
Japanese (ja)
Other versions
JPH07119375B2 (en
Inventor
Takeshi Akagi
Kenji Seko
Toshio Kondo
Naozumi Iwazawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kansai Paint Co Ltd
Original Assignee
Kansai Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kansai Paint Co Ltd filed Critical Kansai Paint Co Ltd
Priority to JP24584087A priority Critical patent/JPH07119375B2/en
Publication of JPS6490270A publication Critical patent/JPS6490270A/en
Publication of JPH07119375B2 publication Critical patent/JPH07119375B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders

Abstract

PURPOSE:To obtain the title composition excellent in sensitivity to ultraviolet rays and forming a developable uniform paint film of, e.g., through-hole part, by using a specified resin as a principal component. CONSTITUTION:A monomer obtained by reacting a vinyl isocyanate monomer with a hydroxylated quinonediazide compound of formed IV (wherein R1 is formula V or VI), obtained by reacting a quinoneazidosulfonic acid (halide) of formula I or II (wherein X is H or a halogen) with a hydroxylated amine compound of formula III (wherein R2 is H, an alkyl, a cycloalkyl or an alkyl ether, R3 is an alkylene, a cycloalkylene or an alkylene ether) is copolymerized with an unsaturated acid monomer to obtain a resin containing modified quinonediazidosulfone units of formula VII and having an acid value of 10-250 and a number-average MW of 3,000-100,000. This resin is neutralized with an amine or an alkali compound and dispersed or dissolved in water.
JP24584087A 1987-10-01 1987-10-01 Positive photosensitive anion electrodeposition coating composition Expired - Lifetime JPH07119375B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24584087A JPH07119375B2 (en) 1987-10-01 1987-10-01 Positive photosensitive anion electrodeposition coating composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24584087A JPH07119375B2 (en) 1987-10-01 1987-10-01 Positive photosensitive anion electrodeposition coating composition

Publications (2)

Publication Number Publication Date
JPS6490270A true JPS6490270A (en) 1989-04-06
JPH07119375B2 JPH07119375B2 (en) 1995-12-20

Family

ID=17139633

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24584087A Expired - Lifetime JPH07119375B2 (en) 1987-10-01 1987-10-01 Positive photosensitive anion electrodeposition coating composition

Country Status (1)

Country Link
JP (1) JPH07119375B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5236810A (en) * 1989-10-03 1993-08-17 Kansai Paint Co., Ltd. Process for preparing printed-circuit board
US5242780A (en) * 1991-10-18 1993-09-07 Industrial Technology Research Institute Electrophoretic positive working photosensitive composition comprising as the photosensitive ingredient an aliphatic polyester having o-quinone diazide on the side chain and end groups
KR100706520B1 (en) * 2003-10-31 2007-04-13 가부시키가이샤 무라타 세이사쿠쇼 Oscillator circuit including surface acoustic wave sensor, and biosensor apparatus
JP2011088065A (en) * 2009-10-22 2011-05-06 Toppan Printing Co Ltd Filter for removing dust

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5236810A (en) * 1989-10-03 1993-08-17 Kansai Paint Co., Ltd. Process for preparing printed-circuit board
US5242780A (en) * 1991-10-18 1993-09-07 Industrial Technology Research Institute Electrophoretic positive working photosensitive composition comprising as the photosensitive ingredient an aliphatic polyester having o-quinone diazide on the side chain and end groups
KR100706520B1 (en) * 2003-10-31 2007-04-13 가부시키가이샤 무라타 세이사쿠쇼 Oscillator circuit including surface acoustic wave sensor, and biosensor apparatus
JP2011088065A (en) * 2009-10-22 2011-05-06 Toppan Printing Co Ltd Filter for removing dust

Also Published As

Publication number Publication date
JPH07119375B2 (en) 1995-12-20

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