JPS6483124A - Apparatus and method for measuring and controlling temperature of wafer substrate of vacuum apparatus - Google Patents

Apparatus and method for measuring and controlling temperature of wafer substrate of vacuum apparatus

Info

Publication number
JPS6483124A
JPS6483124A JP62238971A JP23897187A JPS6483124A JP S6483124 A JPS6483124 A JP S6483124A JP 62238971 A JP62238971 A JP 62238971A JP 23897187 A JP23897187 A JP 23897187A JP S6483124 A JPS6483124 A JP S6483124A
Authority
JP
Japan
Prior art keywords
filter
light
substrate
thermometer
wafer substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62238971A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0561574B2 (cs
Inventor
Toru Sumiya
Yoshiyuki Ukishima
Masato Shishikura
Masamichi Matsuura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP62238971A priority Critical patent/JPS6483124A/ja
Publication of JPS6483124A publication Critical patent/JPS6483124A/ja
Publication of JPH0561574B2 publication Critical patent/JPH0561574B2/ja
Granted legal-status Critical Current

Links

Classifications

    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10—Energy storage using batteries

Landscapes

  • Radiation Pyrometers (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP62238971A 1987-09-25 1987-09-25 Apparatus and method for measuring and controlling temperature of wafer substrate of vacuum apparatus Granted JPS6483124A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62238971A JPS6483124A (en) 1987-09-25 1987-09-25 Apparatus and method for measuring and controlling temperature of wafer substrate of vacuum apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62238971A JPS6483124A (en) 1987-09-25 1987-09-25 Apparatus and method for measuring and controlling temperature of wafer substrate of vacuum apparatus

Publications (2)

Publication Number Publication Date
JPS6483124A true JPS6483124A (en) 1989-03-28
JPH0561574B2 JPH0561574B2 (cs) 1993-09-06

Family

ID=17038015

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62238971A Granted JPS6483124A (en) 1987-09-25 1987-09-25 Apparatus and method for measuring and controlling temperature of wafer substrate of vacuum apparatus

Country Status (1)

Country Link
JP (1) JPS6483124A (cs)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04174327A (ja) * 1989-12-26 1992-06-22 Hitachi Ltd 赤外線温度画像測定装置及びそれを備えた成膜装置
JP2008285726A (ja) * 2007-05-18 2008-11-27 Sumitomo Metal Mining Co Ltd フィルム温度測定装置及びそれを具備した巻取式真空成膜装置
EP2343609A2 (en) 2009-12-24 2011-07-13 Ricoh Company, Ltd Transfer assembly and image forming apparatus using same
EP2395401A1 (en) 2010-06-10 2011-12-14 Ricoh Company, Ltd. Transfer device and image forming apparatus incorporating transfer device
WO2021200843A1 (ja) * 2020-03-31 2021-10-07 株式会社クリーンプラネット 発熱装置

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04174327A (ja) * 1989-12-26 1992-06-22 Hitachi Ltd 赤外線温度画像測定装置及びそれを備えた成膜装置
JP2008285726A (ja) * 2007-05-18 2008-11-27 Sumitomo Metal Mining Co Ltd フィルム温度測定装置及びそれを具備した巻取式真空成膜装置
EP2343609A2 (en) 2009-12-24 2011-07-13 Ricoh Company, Ltd Transfer assembly and image forming apparatus using same
EP2395401A1 (en) 2010-06-10 2011-12-14 Ricoh Company, Ltd. Transfer device and image forming apparatus incorporating transfer device
WO2021200843A1 (ja) * 2020-03-31 2021-10-07 株式会社クリーンプラネット 発熱装置
JP2021162227A (ja) * 2020-03-31 2021-10-11 株式会社クリーンプラネット 発熱装置
JP2024099805A (ja) * 2020-03-31 2024-07-25 株式会社クリーンプラネット 発熱装置

Also Published As

Publication number Publication date
JPH0561574B2 (cs) 1993-09-06

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