JPS6479748A - Eraser for photomechanical process - Google Patents
Eraser for photomechanical processInfo
- Publication number
- JPS6479748A JPS6479748A JP23766587A JP23766587A JPS6479748A JP S6479748 A JPS6479748 A JP S6479748A JP 23766587 A JP23766587 A JP 23766587A JP 23766587 A JP23766587 A JP 23766587A JP S6479748 A JPS6479748 A JP S6479748A
- Authority
- JP
- Japan
- Prior art keywords
- eraser
- copolymer
- acrylate
- polymer
- pigment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Paints Or Removers (AREA)
Abstract
PURPOSE:To obtain the title eraser with the excellent light shielding property by composing the titled eraser of a polymer which is soluble in alcohol or a hydrous alcohol, and has a good sticking property to a hydrophilic synthetic resin and an appropriate flexibility, a pigment and a solvent selected from ethanol or a mixed solvent of ethanol and water. CONSTITUTION:The polymer is exemplified by a copolymer of acrylate-maleic anhydride, a copolymer of acrylate-acrylic acid, a copolymer of acrylate- methacrylic acid, a copolymer of vinyl pyrolidone-vinyl acetate, polyvinyl pyrolidone or a copolymer of styrene-maleic anhydride. The eraser contains 5-20wt.% of the alkaline neutralizate of said polymer or the mixture of said polymers, 5-20wt.% the pigment and the solvent containing <=60wt.% water. And, said eraser contains 5-15wt.% silicic acid anhydride to improve matting effect, and 0.1-1wt.% acethylene glycol type antifoamer to prevent the generation of a pinhole, thus obtaining the good eraser.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23766587A JPH06100818B2 (en) | 1987-09-22 | 1987-09-22 | Correction fluid for photoengraving |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23766587A JPH06100818B2 (en) | 1987-09-22 | 1987-09-22 | Correction fluid for photoengraving |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6479748A true JPS6479748A (en) | 1989-03-24 |
JPH06100818B2 JPH06100818B2 (en) | 1994-12-12 |
Family
ID=17018692
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP23766587A Expired - Lifetime JPH06100818B2 (en) | 1987-09-22 | 1987-09-22 | Correction fluid for photoengraving |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH06100818B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0443302A (en) * | 1990-06-11 | 1992-02-13 | Toppan Printing Co Ltd | Retouching liquid for repairing fine colored pattern |
JPH08503983A (en) * | 1992-11-25 | 1996-04-30 | ヘキスト、セラニーズ、コーポレーション | Reduction of metal ions in bottom antireflective coatings for photoresists |
JP2010196039A (en) * | 2009-01-27 | 2010-09-09 | Du Pont Mitsui Fluorochem Co Ltd | Aqueous coating material |
-
1987
- 1987-09-22 JP JP23766587A patent/JPH06100818B2/en not_active Expired - Lifetime
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0443302A (en) * | 1990-06-11 | 1992-02-13 | Toppan Printing Co Ltd | Retouching liquid for repairing fine colored pattern |
JPH08503983A (en) * | 1992-11-25 | 1996-04-30 | ヘキスト、セラニーズ、コーポレーション | Reduction of metal ions in bottom antireflective coatings for photoresists |
JP2010196039A (en) * | 2009-01-27 | 2010-09-09 | Du Pont Mitsui Fluorochem Co Ltd | Aqueous coating material |
Also Published As
Publication number | Publication date |
---|---|
JPH06100818B2 (en) | 1994-12-12 |
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