JPS6472154A - Positive type photoresist developing solution - Google Patents

Positive type photoresist developing solution

Info

Publication number
JPS6472154A
JPS6472154A JP22940087A JP22940087A JPS6472154A JP S6472154 A JPS6472154 A JP S6472154A JP 22940087 A JP22940087 A JP 22940087A JP 22940087 A JP22940087 A JP 22940087A JP S6472154 A JPS6472154 A JP S6472154A
Authority
JP
Japan
Prior art keywords
org
soln
resist
quaternary ammonium
ammonium hydroxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22940087A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0455504B2 (cs
Inventor
Shiyunrei Chiyou
Shunpei Shimizu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tama Kagaku Kogyo Co Ltd
Original Assignee
Tama Kagaku Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tama Kagaku Kogyo Co Ltd filed Critical Tama Kagaku Kogyo Co Ltd
Priority to JP22940087A priority Critical patent/JPS6472154A/ja
Publication of JPS6472154A publication Critical patent/JPS6472154A/ja
Publication of JPH0455504B2 publication Critical patent/JPH0455504B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP22940087A 1987-09-12 1987-09-12 Positive type photoresist developing solution Granted JPS6472154A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22940087A JPS6472154A (en) 1987-09-12 1987-09-12 Positive type photoresist developing solution

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22940087A JPS6472154A (en) 1987-09-12 1987-09-12 Positive type photoresist developing solution

Publications (2)

Publication Number Publication Date
JPS6472154A true JPS6472154A (en) 1989-03-17
JPH0455504B2 JPH0455504B2 (cs) 1992-09-03

Family

ID=16891616

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22940087A Granted JPS6472154A (en) 1987-09-12 1987-09-12 Positive type photoresist developing solution

Country Status (1)

Country Link
JP (1) JPS6472154A (cs)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5788227A (en) * 1996-05-21 1998-08-04 Hewlett-Packard Company Beltless cut sheet media feeder and method for feeding and ejecting sheets to and from a scanner apparatus
US7335465B2 (en) 2003-06-13 2008-02-26 Tokyo Ohka Kogyo Co., Ltd. Developer composition for resists and method for formation of resist pattern
US7846640B2 (en) 2003-06-27 2010-12-07 Tokyo Ohka Kogyo Co., Ltd. Developer composition for resists and method for formation of resist pattern

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6012547A (ja) * 1983-06-17 1985-01-22 マイクロシィ・インコーポレーテッド 高コントラストホトレジスト現像剤
JPS6232452A (ja) * 1985-08-06 1987-02-12 Tokyo Ohka Kogyo Co Ltd 改良ポジ型ホトレジスト用現像液
JPS6232451A (ja) * 1985-08-06 1987-02-12 Tokyo Ohka Kogyo Co Ltd 改良ポジ型ホトレジスト用現像液

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6012547A (ja) * 1983-06-17 1985-01-22 マイクロシィ・インコーポレーテッド 高コントラストホトレジスト現像剤
JPS6232452A (ja) * 1985-08-06 1987-02-12 Tokyo Ohka Kogyo Co Ltd 改良ポジ型ホトレジスト用現像液
JPS6232451A (ja) * 1985-08-06 1987-02-12 Tokyo Ohka Kogyo Co Ltd 改良ポジ型ホトレジスト用現像液

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5788227A (en) * 1996-05-21 1998-08-04 Hewlett-Packard Company Beltless cut sheet media feeder and method for feeding and ejecting sheets to and from a scanner apparatus
US7335465B2 (en) 2003-06-13 2008-02-26 Tokyo Ohka Kogyo Co., Ltd. Developer composition for resists and method for formation of resist pattern
US7846640B2 (en) 2003-06-27 2010-12-07 Tokyo Ohka Kogyo Co., Ltd. Developer composition for resists and method for formation of resist pattern

Also Published As

Publication number Publication date
JPH0455504B2 (cs) 1992-09-03

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