JPS6465758A - Electron source - Google Patents

Electron source

Info

Publication number
JPS6465758A
JPS6465758A JP62221907A JP22190787A JPS6465758A JP S6465758 A JPS6465758 A JP S6465758A JP 62221907 A JP62221907 A JP 62221907A JP 22190787 A JP22190787 A JP 22190787A JP S6465758 A JPS6465758 A JP S6465758A
Authority
JP
Japan
Prior art keywords
filament
shall
parallelly
filaments
series
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62221907A
Other languages
Japanese (ja)
Inventor
Katsuhiko Sakai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP62221907A priority Critical patent/JPS6465758A/en
Publication of JPS6465758A publication Critical patent/JPS6465758A/en
Pending legal-status Critical Current

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  • Electron Sources, Ion Sources (AREA)

Abstract

PURPOSE:To have emission of a great quantity of electrons by low electric power and prolong the life of a filament by making the filament in the form of film ribbon having a specific thickness, and by connecting two or more of them either parallelly or in series. CONSTITUTION:A filament is made in the form of film ribbon with a thickness less than 100mum, and two or more of them 1 are connected either parallelly or in series. The width of this ribbon shall be as small as 1/5 of its longitudinal dimension or less. Current shall flow in these filaments 1 in the longitudinal direction. The spacing between the filaments 1 shall be as large as twice the filament width or more in order to lessen influence upon one another.
JP62221907A 1987-09-07 1987-09-07 Electron source Pending JPS6465758A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62221907A JPS6465758A (en) 1987-09-07 1987-09-07 Electron source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62221907A JPS6465758A (en) 1987-09-07 1987-09-07 Electron source

Publications (1)

Publication Number Publication Date
JPS6465758A true JPS6465758A (en) 1989-03-13

Family

ID=16774026

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62221907A Pending JPS6465758A (en) 1987-09-07 1987-09-07 Electron source

Country Status (1)

Country Link
JP (1) JPS6465758A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014224285A (en) * 2013-05-15 2014-12-04 Hoya株式会社 Thin film formation device, and thin film formation method

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4835300A (en) * 1971-09-10 1973-05-24
JPS547853A (en) * 1977-06-20 1979-01-20 Matsushita Electric Ind Co Ltd Flat electron source
JPS60235336A (en) * 1984-05-07 1985-11-22 Nec Corp Electron beam generation device
JPS6210850A (en) * 1985-07-08 1987-01-19 Matsushita Electric Ind Co Ltd Electron beam static lens
JPS6271155A (en) * 1985-09-24 1987-04-01 Nec Corp Cathode for electron beam device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4835300A (en) * 1971-09-10 1973-05-24
JPS547853A (en) * 1977-06-20 1979-01-20 Matsushita Electric Ind Co Ltd Flat electron source
JPS60235336A (en) * 1984-05-07 1985-11-22 Nec Corp Electron beam generation device
JPS6210850A (en) * 1985-07-08 1987-01-19 Matsushita Electric Ind Co Ltd Electron beam static lens
JPS6271155A (en) * 1985-09-24 1987-04-01 Nec Corp Cathode for electron beam device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014224285A (en) * 2013-05-15 2014-12-04 Hoya株式会社 Thin film formation device, and thin film formation method

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