JPS6463108A - Method and apparatus for dressing internal peripheral blade - Google Patents

Method and apparatus for dressing internal peripheral blade

Info

Publication number
JPS6463108A
JPS6463108A JP22126787A JP22126787A JPS6463108A JP S6463108 A JPS6463108 A JP S6463108A JP 22126787 A JP22126787 A JP 22126787A JP 22126787 A JP22126787 A JP 22126787A JP S6463108 A JPS6463108 A JP S6463108A
Authority
JP
Japan
Prior art keywords
internal peripheral
peripheral blade
cut
face
dressing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22126787A
Other languages
Japanese (ja)
Other versions
JPH0829495B2 (en
Inventor
Takashi Miyatani
Nobuyasu Kunihara
Hiroyuki Terauchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Coorstek KK
Original Assignee
Toshiba Ceramics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Ceramics Co Ltd filed Critical Toshiba Ceramics Co Ltd
Priority to JP62221267A priority Critical patent/JPH0829495B2/en
Publication of JPS6463108A publication Critical patent/JPS6463108A/en
Publication of JPH0829495B2 publication Critical patent/JPH0829495B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28D—WORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/02—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
    • B28D5/022—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
    • B28D5/028—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels with a ring blade having an inside cutting edge

Abstract

PURPOSE:To eliminate the difference between the griding capabilities at both end faces of an internal peripheral blade by a method wherein the curve of the cut-off surface by the internal peripheral blade is detected and one end face of the internal peripheral blade and the internal peripheral surface of a grindstone part are dressed in response to the detection result. CONSTITUTION:During the cutting of silicon wafer 31, the cut-off surface 31a of a silicon block 30 or the bows of the cut-off surfaces 32 and 31a are intermittently checked. If the bow is detected, the grindstone part 21 of an internal peripheral blade 20 is dressed in accordance with the curvature. If the cut-off surfaces 32 or 31a of the silicon block 30 or of the silicon wafer 31 bows upwards or the cut-off surface 30, which is ground by the end face 21a of the grindstone part 21 of the internal peripheral blade 20, bends projectedly, dressing is done by abutting the peripheral surface 11a of a dressing tool 11 against the end face 21a of the internal peripheral blade 20.
JP62221267A 1987-09-04 1987-09-04 Inner peripheral blade dressing method and inner peripheral blade dressing device Expired - Lifetime JPH0829495B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62221267A JPH0829495B2 (en) 1987-09-04 1987-09-04 Inner peripheral blade dressing method and inner peripheral blade dressing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62221267A JPH0829495B2 (en) 1987-09-04 1987-09-04 Inner peripheral blade dressing method and inner peripheral blade dressing device

Publications (2)

Publication Number Publication Date
JPS6463108A true JPS6463108A (en) 1989-03-09
JPH0829495B2 JPH0829495B2 (en) 1996-03-27

Family

ID=16764098

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62221267A Expired - Lifetime JPH0829495B2 (en) 1987-09-04 1987-09-04 Inner peripheral blade dressing method and inner peripheral blade dressing device

Country Status (1)

Country Link
JP (1) JPH0829495B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998007065A1 (en) * 1996-08-08 1998-02-19 Seiko Epson Corporation Method for coating semiconductor element with resin, coating resin, and liquid crystal display device
CN107971876A (en) * 2017-11-09 2018-05-01 中国航发北京航科发动机控制系统科技有限责任公司 A kind of end face reticulate pattern processing method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5930667A (en) * 1982-08-06 1984-02-18 Tokyo Seimitsu Co Ltd Dressing device for slicer

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5930667A (en) * 1982-08-06 1984-02-18 Tokyo Seimitsu Co Ltd Dressing device for slicer

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998007065A1 (en) * 1996-08-08 1998-02-19 Seiko Epson Corporation Method for coating semiconductor element with resin, coating resin, and liquid crystal display device
CN107971876A (en) * 2017-11-09 2018-05-01 中国航发北京航科发动机控制系统科技有限责任公司 A kind of end face reticulate pattern processing method

Also Published As

Publication number Publication date
JPH0829495B2 (en) 1996-03-27

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