JPS6462470A - Vapor synthesis method for high-pressure phase boron nitride - Google Patents

Vapor synthesis method for high-pressure phase boron nitride

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Publication number
JPS6462470A
JPS6462470A JP21796987A JP21796987A JPS6462470A JP S6462470 A JPS6462470 A JP S6462470A JP 21796987 A JP21796987 A JP 21796987A JP 21796987 A JP21796987 A JP 21796987A JP S6462470 A JPS6462470 A JP S6462470A
Authority
JP
Japan
Prior art keywords
raw material
atom
substrate
gaseous
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21796987A
Other languages
Japanese (ja)
Other versions
JPH0814023B2 (en
Inventor
Kazuaki Kurihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP21796987A priority Critical patent/JPH0814023B2/en
Publication of JPS6462470A publication Critical patent/JPS6462470A/en
Publication of JPH0814023B2 publication Critical patent/JPH0814023B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:To continuously synthesize high-pressure phase BN in a vapor phase at a high film forming speed by projecting the hot plasma obtd. by light arc discharge from raw materials contg. a B atom and N atom as gas constituting components as a plasma jet onto a substrate and rapidly cooling the substrate. CONSTITUTION:The gas contg. the B atom such as the hydride of B such as B2H6 and the halide of B such as BCl3 and the gas which includes the N atom such as NH3 and N2 and is the raw material for BN are introduced 4. The gases are then heated to a high temp. of >=10,000 deg.C by a laser beam 2 condensed at the front end part of a condensing cone 12 and the high-temp. hot plasma having chemically high activity is obtd. by the light arc discharge. The gaseous raw material flow is made into the plasma jet 7 by the rapid thermal expansion of this time and is injected from a water-cooled plasma jet nozzle 6. In this plasma jet 7, the gaseous BN raw material in the gaseous raw material is decomposed and activated at a high density. A large amt. of the gaseous BN raw material is highly activated by the rapid cooling effect of the hot plasma when this jet collides against the substrate 8 kept at 500-1,200 deg.C. The high-pressure phase BN is thus synthesized in the vapor phase on the substrate 8 at the high film forming speed.
JP21796987A 1987-09-02 1987-09-02 High-pressure phase boron nitride vapor phase synthesis method Expired - Lifetime JPH0814023B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21796987A JPH0814023B2 (en) 1987-09-02 1987-09-02 High-pressure phase boron nitride vapor phase synthesis method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21796987A JPH0814023B2 (en) 1987-09-02 1987-09-02 High-pressure phase boron nitride vapor phase synthesis method

Publications (2)

Publication Number Publication Date
JPS6462470A true JPS6462470A (en) 1989-03-08
JPH0814023B2 JPH0814023B2 (en) 1996-02-14

Family

ID=16712571

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21796987A Expired - Lifetime JPH0814023B2 (en) 1987-09-02 1987-09-02 High-pressure phase boron nitride vapor phase synthesis method

Country Status (1)

Country Link
JP (1) JPH0814023B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02250969A (en) * 1989-03-24 1990-10-08 Yukio Ichinose Production of boron nitride
JPH03111573A (en) * 1989-09-26 1991-05-13 Olympus Optical Co Ltd Method for synthesizing cubic boron nitride
JP2014504446A (en) * 2010-12-03 2014-02-20 エボニック デグサ ゲーエムベーハー Method for hydrogen passivation of multiple semiconductor layers

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02250969A (en) * 1989-03-24 1990-10-08 Yukio Ichinose Production of boron nitride
JPH03111573A (en) * 1989-09-26 1991-05-13 Olympus Optical Co Ltd Method for synthesizing cubic boron nitride
JP2014504446A (en) * 2010-12-03 2014-02-20 エボニック デグサ ゲーエムベーハー Method for hydrogen passivation of multiple semiconductor layers

Also Published As

Publication number Publication date
JPH0814023B2 (en) 1996-02-14

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