JPS646014A - Curable composition - Google Patents

Curable composition

Info

Publication number
JPS646014A
JPS646014A JP16293887A JP16293887A JPS646014A JP S646014 A JPS646014 A JP S646014A JP 16293887 A JP16293887 A JP 16293887A JP 16293887 A JP16293887 A JP 16293887A JP S646014 A JPS646014 A JP S646014A
Authority
JP
Japan
Prior art keywords
component
meth
photo
reaction product
polymerization initiator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16293887A
Other languages
Japanese (ja)
Inventor
Ryuichi Fujii
Takashi Shimizu
Masao Kawashima
Rihei Nagase
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Somar Corp
Original Assignee
Somar Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Somar Corp filed Critical Somar Corp
Priority to JP16293887A priority Critical patent/JPS646014A/en
Publication of JPS646014A publication Critical patent/JPS646014A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Abstract

PURPOSE:To obtain the titled composition containing a specific reaction product, an ethylenic unsaturated compound and a photo-polymerization initiator, curable with ultraviolet radiation to give a cured article having various excellent properties and suitable for the production of a printed circuit board. CONSTITUTION:The objective composition contains (A) a reaction product of (i) an epoxy(meth)acrylate having >=2 (meth)acryloyl groups in a molecule with (ii) an acid anhydride, (B) an ethylenic unsaturated compound having >=1 (meth) acryl group and (C) a photo-polymerization initiator. The ratio of the hydroxyl group of the component (i) to the acid anhydride of the component (ii) in the component A is preferably 1:(0.9-1.1). The amounts of the components B and C are preferably 20-60pts.wt. and 5-15pts.wt. per 100pts.wt. of the component A, respectively.
JP16293887A 1987-06-30 1987-06-30 Curable composition Pending JPS646014A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16293887A JPS646014A (en) 1987-06-30 1987-06-30 Curable composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16293887A JPS646014A (en) 1987-06-30 1987-06-30 Curable composition

Publications (1)

Publication Number Publication Date
JPS646014A true JPS646014A (en) 1989-01-10

Family

ID=15764099

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16293887A Pending JPS646014A (en) 1987-06-30 1987-06-30 Curable composition

Country Status (1)

Country Link
JP (1) JPS646014A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0243551A (en) * 1988-08-04 1990-02-14 Fuji Photo Film Co Ltd Liquid photosensitive resin composition
CN101950128A (en) * 2010-10-11 2011-01-19 绵阳信利电子有限公司 Photosensitive resin for plasma display screen

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0243551A (en) * 1988-08-04 1990-02-14 Fuji Photo Film Co Ltd Liquid photosensitive resin composition
CN101950128A (en) * 2010-10-11 2011-01-19 绵阳信利电子有限公司 Photosensitive resin for plasma display screen

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