JPS6459821A - Method and apparatus for removing organic polymer film - Google Patents

Method and apparatus for removing organic polymer film

Info

Publication number
JPS6459821A
JPS6459821A JP21508087A JP21508087A JPS6459821A JP S6459821 A JPS6459821 A JP S6459821A JP 21508087 A JP21508087 A JP 21508087A JP 21508087 A JP21508087 A JP 21508087A JP S6459821 A JPS6459821 A JP S6459821A
Authority
JP
Japan
Prior art keywords
organic polymer
mask layer
processed
substrate structure
polymer film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21508087A
Other languages
Japanese (ja)
Inventor
Masakatsu Kimizuka
Akifumi Somatani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP21508087A priority Critical patent/JPS6459821A/en
Publication of JPS6459821A publication Critical patent/JPS6459821A/en
Pending legal-status Critical Current

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  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE:To remove a substance adhered to the surface or on a side wall of a mask layer by a method wherein the organic polymer material mask layer is formed on an object to be processed, the object to be processed is processed by making use of an organic polymer material as a mask and a plasma treatment is executed while the surface of a substrate structure containing the organic polymer mask layer is faced downward. CONSTITUTION:While the surface of a substrate structure containing an organic polymer mask layer 3 is faced downward, the substrate structure 4 is mounted on a supporting structure 5. Then, a plasma treatment using oxygen gas is executed; a foreign substance 6 adhered to the organic high-polymer mask layer 3 falls due to gravity combined with its lift-off effect; it can be removed without coming into contact with the surface of a material 2 to be processed and discharged to the outside through an exhaust port of a chamber.
JP21508087A 1987-08-31 1987-08-31 Method and apparatus for removing organic polymer film Pending JPS6459821A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21508087A JPS6459821A (en) 1987-08-31 1987-08-31 Method and apparatus for removing organic polymer film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21508087A JPS6459821A (en) 1987-08-31 1987-08-31 Method and apparatus for removing organic polymer film

Publications (1)

Publication Number Publication Date
JPS6459821A true JPS6459821A (en) 1989-03-07

Family

ID=16666421

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21508087A Pending JPS6459821A (en) 1987-08-31 1987-08-31 Method and apparatus for removing organic polymer film

Country Status (1)

Country Link
JP (1) JPS6459821A (en)

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