JPS645878Y2 - - Google Patents

Info

Publication number
JPS645878Y2
JPS645878Y2 JP5950683U JP5950683U JPS645878Y2 JP S645878 Y2 JPS645878 Y2 JP S645878Y2 JP 5950683 U JP5950683 U JP 5950683U JP 5950683 U JP5950683 U JP 5950683U JP S645878 Y2 JPS645878 Y2 JP S645878Y2
Authority
JP
Japan
Prior art keywords
flash discharge
discharge lamp
parallel
bundle
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP5950683U
Other languages
Japanese (ja)
Other versions
JPS59166442U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP5950683U priority Critical patent/JPS59166442U/en
Publication of JPS59166442U publication Critical patent/JPS59166442U/en
Application granted granted Critical
Publication of JPS645878Y2 publication Critical patent/JPS645878Y2/ja
Granted legal-status Critical Current

Links

Description

【考案の詳細な説明】 本考案は光照射装置のランプ結線構造に関する
ものである。
[Detailed Description of the Invention] The present invention relates to a lamp connection structure for a light irradiation device.

半導体のSiウエハーにイオンを注入する際に生
じた結晶損傷を回復したり、Siの蒸着層をエピタ
キシアル成長させるなどのためにアニーリング処
理が行われるが、従来は電気炉内で窒素ガスを流
しながら加熱処理することが一般的であつた。し
かし、この電気炉によるアニール法は加熱時間が
長く、広い面積のウエハーを均一に加熱するのが
困難であり、ウエハーに「反り」が生じたり、表
面が汚染され易いなどの欠点があつた。そこで最
近はこれらの欠点を解消できる優れたアニーリン
グ装置として光照射装置のうちでも閃光放電灯を
利用した閃光照射装置が注目されている。
Annealing is performed to recover crystal damage caused when ions are implanted into semiconductor Si wafers, or to epitaxially grow a deposited Si layer, but conventionally it is performed by flowing nitrogen gas in an electric furnace. However, it was common to heat-process the material. However, this annealing method using an electric furnace has drawbacks such as long heating time, difficulty in uniformly heating a wide area of the wafer, and wafer warping and surface contamination. Therefore, among light irradiation devices, a flash irradiation device using a flash discharge lamp has recently been attracting attention as an excellent annealing device that can eliminate these drawbacks.

ところで光照射装置、例えばこの閃光照射装置
は光源を面状光源とするために、多数の直管状の
閃光放電灯が並列に密接配置されるが、これらの
閃光放電灯はその電極方向を揃えて配置され、そ
れぞれの両端の導線は閃光放電灯の両側に設けら
れた端子台に接続され、両端子台からの導線束が
電源部に接続されていた。従つて、この導線束は
装置箱内でループ状をなすが、この導線束には大
電流が流れるため磁界が発生する。このため鉄板
製の装置箱が磁化される不具合があり、更には、
磁界に垂直方向の装置箱に誘導起電力が生じ、ス
パークが発生することがあつた。そして、この磁
界の影響で閃光放電灯のパルス巾が変動し、この
ため照射特性が悪化する不具合があつた。
By the way, a light irradiation device, such as this flash irradiation device, uses a planar light source as a light source, so a large number of straight tube-shaped flash discharge lamps are closely arranged in parallel. The conductive wires at both ends of each were connected to terminal blocks provided on both sides of the flash discharge lamp, and the conductive wire bundles from both terminal blocks were connected to the power source. Therefore, this conducting wire bundle forms a loop inside the device box, and a large current flows through this conducting wire bundle, so that a magnetic field is generated. For this reason, there is a problem that the equipment box made of iron plate becomes magnetized, and furthermore,
Induced electromotive force was generated in the equipment box perpendicular to the magnetic field, and sparks were sometimes generated. Furthermore, the pulse width of the flash discharge lamp fluctuates due to the influence of this magnetic field, resulting in a problem that the irradiation characteristics deteriorate.

そこで本考案は、ループ状の導線束による磁界
の発生を防止して、これに起因する前述の不具合
を解消することが可能な光照射装置のランプ結線
構造を提供することを目的とし、その構成は、鉄
板製の装置箱内に並列に密接配置されて面状光源
を構成する多数本の直管状放電灯のうちの2本づ
つを1組とし、この2本を相互に電極方向が逆向
きになるように配置して直列に結線し、陽極と陰
極の両端子台を放電灯に対して同一側に設けこの
端子台から導線束を平行状態で導出したことを特
徴とするものである。
Therefore, the present invention aims to provide a lamp connection structure for a light irradiation device that can prevent the generation of a magnetic field due to a loop-shaped conducting wire bundle and eliminate the above-mentioned problems caused by this. In this method, each set consists of two of the many straight tube discharge lamps that are closely arranged in parallel in a steel plate device box to form a planar light source, and these two lamps are arranged in opposite directions to each other. The terminal blocks of the anode and cathode are provided on the same side with respect to the discharge lamp, and the bundle of conductive wires is led out in parallel from this terminal block.

以下に図面に示す実施例に基いて本考案を具体
的に説明する。
The present invention will be specifically described below based on embodiments shown in the drawings.

第1図において鉄板製の装置箱1の左方上部が
開閉扉1aであり、この開閉扉1aを開けて試料
であるウエハー2が出し入れされる。そして装置
箱1の右方上部には、管径が10mmでアーク長が80
mmの閃光放電灯5が2段に密接して並列配置され
ており、この閃光放電灯5群により構成される光
源面の広さは80mm×80mmとなつている。この閃光
放電灯5から2mm上方に離間してミラー6が配設
されており、発光は下方に向けて照射される。次
に、試料台8の表面は石英ガラス製であり、ここ
にウエハー2が載置されるが、この試料台8の内
部には予備加熱炉が内蔵されており、ウエハー2
が予備加熱される。そして試料台8は駆動装置に
より往復運動するようになつており、発光照射さ
れるときのみ閃光放電灯5の下部に位置し、照射
が完了すると直ちに開閉扉1aの方に戻る。試料
台8が閃光放電灯5の下部に位置するときはウエ
ハー2と閃光放電灯ウエハー5との距離は約10mm
であり、面状光源の照度の80%以上がウエハー2
に照射され、更にはウエハー2表面が鏡面加工さ
れているので、かなりの入射光が反射されるが、
この反射光がミラー6により再反射され、この繰
り返しによる多重反射効果が生じて、面状光源か
らの放射光は極めて効率よく利用できるようにな
つている。
In FIG. 1, the upper left side of an apparatus box 1 made of iron plate is an opening/closing door 1a, and by opening this opening/closing door 1a, a wafer 2, which is a sample, is taken in and taken out. At the top right of equipment box 1, there is a pipe with a diameter of 10 mm and an arc length of 80 mm.
The flash discharge lamps 5 of 5 mm in diameter are arranged closely in parallel in two stages, and the light source surface formed by the group of 5 flash discharge lamps has a width of 80 mm x 80 mm. A mirror 6 is disposed 2 mm above the flash discharge lamp 5, and the light is emitted downward. Next, the surface of the sample stage 8 is made of quartz glass, and the wafer 2 is placed thereon.
is preheated. The sample stage 8 is reciprocated by a drive device, and is positioned below the flash discharge lamp 5 only when it is irradiated with light, and immediately returns to the opening/closing door 1a when the irradiation is completed. When the sample stage 8 is located below the flash discharge lamp 5, the distance between the wafer 2 and the flash discharge lamp wafer 5 is approximately 10 mm.
Therefore, more than 80% of the illuminance of the planar light source is on the wafer 2.
Furthermore, since the surface of the wafer 2 is mirror-finished, a considerable amount of the incident light is reflected.
This reflected light is re-reflected by the mirror 6, and this repetition produces a multiple reflection effect, so that the emitted light from the planar light source can be used extremely efficiently.

次に第2図、第3図により閃光放電灯5の結線
構造を説明すると、閃光放電灯5は2段に配列さ
れているが、これらは2個のランプホルダー3に
よつてその両端を挾圧保持されている。ここで、
多数の閃光放電灯5のうちで斜上下の2本が1組
とされ、そしてこの2本は相互に電極方向が逆向
きとなつており、即ち1本の閃光放電灯5の陽極
と陰極とがそれぞれ他の閃光放電灯5の陰極と陽
極とに隣接しており、一端の陽極と陰極とが導線
11により接続された直列に結線されている。端
子台7は陽極用と陰極用とが一体になつたもので
あり、1組となつた一方の閃光放電灯5の陽極と
他方の閃光放電灯5の陰極がこの端子台7に接続
され、そして陽極用導線同志および陰極用導線同
志が束ねられて2本の導線束12が平行状態で電
源部に接続されている。このとき、2本の導線束
12は相互に接近しているのが好ましい。なお、
図例では閃光放電灯5は偶数本であるが、もしこ
れが奇数本であれば1本が余るが、このときはダ
ミーを設けてこれを余つた1本と組にすればよ
い。なお、以上の実施例は閃光放電灯について説
明したがこれに限られるものではない。
Next, the wiring structure of the flash discharge lamps 5 will be explained with reference to FIGS. Pressure is maintained. here,
Among the large number of flash discharge lamps 5, two diagonally upper and lower ones are considered as one set, and the electrode directions of these two lamps are opposite to each other, that is, the anode and cathode of one flash discharge lamp 5 are are adjacent to the cathodes and anodes of other flash discharge lamps 5, respectively, and the anodes and cathodes at one end are connected in series by a conducting wire 11. The terminal block 7 is a combination of an anode and a cathode, and the anode of one flash discharge lamp 5 and the cathode of the other flash discharge lamp 5 in a set are connected to this terminal block 7, The anode conducting wires and the cathode conducting wires are bundled together, and the two conducting wire bundles 12 are connected in parallel to the power source section. At this time, it is preferable that the two conducting wire bundles 12 are close to each other. In addition,
In the illustrated example, there is an even number of flash discharge lamps 5, but if this is an odd number, one will be left over, but in this case, a dummy may be provided and paired with the remaining one. Note that although the above embodiments have been described with respect to flash discharge lamps, the present invention is not limited to this.

以上説明したように本考案は放電灯の一方の側
に設けられた端子台から2本の導線束が電源部に
接続されているので、この導線束が装置箱でルー
プ状となることがない。従つて通電されて大電流
がこの導線束に流れても磁界がほとんど生じず、
装置箱を磁性体である鉄板で製作しても、装置箱
が磁化されることがない。そして誘導起電力も生
じないのでスパークが発生することがなく、更に
閃光放電灯の場合はそのパルス巾に悪影響を与え
ないので、照射特性が悪化することがない。
As explained above, in the present invention, two bundles of conductor wires are connected to the power supply unit from the terminal block provided on one side of the discharge lamp, so that the bundle of conductor wires does not form a loop in the equipment box. . Therefore, even if a large current flows through this conductor bundle when it is energized, almost no magnetic field is generated.
Even if the device box is made of iron plate, which is a magnetic material, the device box will not become magnetized. Since no induced electromotive force is generated, sparks are not generated, and in the case of a flash discharge lamp, the pulse width is not adversely affected, so the irradiation characteristics are not deteriorated.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は断面図、第2図は要部の平面図、第3
図は要部の断面図である。 1……装置箱、2……試料(ウエハー)、5…
…閃光放電灯、6……ミラー、7……端子台、1
1……導線、12……導線束。
Figure 1 is a sectional view, Figure 2 is a plan view of the main parts, Figure 3
The figure is a sectional view of the main part. 1...Equipment box, 2...Sample (wafer), 5...
...Flash discharge lamp, 6...Mirror, 7...Terminal block, 1
1...Conductor wire, 12...Conductor bundle.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 鉄板製の装置箱内に並列に密接配置されて面状
光源を構成する多数本の直管状放電灯のうちの2
本づつを一組とし、この2本を相互に電極方向が
逆向きになるように配置して直列に結線し、陽極
と陰極の両端子台を放電灯に対して同一側に設
け、この端子台から導線束を平行状態で導出した
ことを特徴とする光照射装置のランプ結線構造。
Two of the many straight tube discharge lamps that are closely arranged in parallel in a steel plate equipment box to form a planar light source.
Each set is made up of a set, and these two are arranged so that the electrode directions are opposite to each other and connected in series. Both the anode and cathode terminal blocks are installed on the same side with respect to the discharge lamp, and the terminals are connected in series. A lamp connection structure for a light irradiation device, characterized in that a bundle of conducting wires is led out in parallel from a base.
JP5950683U 1983-04-22 1983-04-22 Lamp connection structure of light irradiation device Granted JPS59166442U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5950683U JPS59166442U (en) 1983-04-22 1983-04-22 Lamp connection structure of light irradiation device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5950683U JPS59166442U (en) 1983-04-22 1983-04-22 Lamp connection structure of light irradiation device

Publications (2)

Publication Number Publication Date
JPS59166442U JPS59166442U (en) 1984-11-08
JPS645878Y2 true JPS645878Y2 (en) 1989-02-14

Family

ID=30189754

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5950683U Granted JPS59166442U (en) 1983-04-22 1983-04-22 Lamp connection structure of light irradiation device

Country Status (1)

Country Link
JP (1) JPS59166442U (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010247576A (en) * 2009-04-13 2010-11-04 Nec Lighting Ltd Flash light system and wiring method therefor
JP2012068002A (en) * 2010-09-27 2012-04-05 Ulvac-Riko Inc Heating device

Also Published As

Publication number Publication date
JPS59166442U (en) 1984-11-08

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