JPS6458375A - Method for applying resist - Google Patents
Method for applying resistInfo
- Publication number
- JPS6458375A JPS6458375A JP21566387A JP21566387A JPS6458375A JP S6458375 A JPS6458375 A JP S6458375A JP 21566387 A JP21566387 A JP 21566387A JP 21566387 A JP21566387 A JP 21566387A JP S6458375 A JPS6458375 A JP S6458375A
- Authority
- JP
- Japan
- Prior art keywords
- resist
- substrate
- solvent
- components
- butoxy ethanol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE:To apply resist uniformly to a substrate, by dropping resist on the substrate after solvent, which is employed as one or the components of resist, has been applied, while rotating the base material so as to be coated therewith. CONSTITUTION:When resist (e.g. novolak resin + diazo photosensitive agent + 2-butoxy ethanol) is applied to substrate (e.g. barium silicic acid glass), resist is dropped on the substrate to be applied thereto while said substrate is rotated. Before applying the resist, solvent (e.g. 2-butoxy ethanol), which is one of the components of the resist, is applied to the substrate. As a result, uniform film thickness is obtained without using such a large quantity of resist as conventionally required. Further, uniform thickness is obtained even on the periphery of the substrate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62215663A JPH0824892B2 (en) | 1987-08-28 | 1987-08-28 | Resist coating method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62215663A JPH0824892B2 (en) | 1987-08-28 | 1987-08-28 | Resist coating method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6458375A true JPS6458375A (en) | 1989-03-06 |
JPH0824892B2 JPH0824892B2 (en) | 1996-03-13 |
Family
ID=16676114
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62215663A Expired - Lifetime JPH0824892B2 (en) | 1987-08-28 | 1987-08-28 | Resist coating method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0824892B2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5066616A (en) * | 1989-06-14 | 1991-11-19 | Hewlett-Packard Company | Method for improving photoresist on wafers by applying fluid layer of liquid solvent |
US6033728A (en) * | 1993-05-13 | 2000-03-07 | Fujitsu Limited | Apparatus for spin coating, a method for spin coating and a method for manufacturing semiconductor device |
WO2008123049A1 (en) * | 2007-03-30 | 2008-10-16 | Jsr Corporation | Method for film formation, resin composition for use in the method, structure having insulating film, process for producing the structure, and electronic component |
JP2009133924A (en) * | 2007-11-28 | 2009-06-18 | Jsr Corp | Method for film formation and positive photosensitive resin composition for use in the same |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6085524A (en) * | 1983-10-17 | 1985-05-15 | Fujitsu Ltd | Resist applying method |
JPS61150332A (en) * | 1984-12-25 | 1986-07-09 | Toshiba Corp | Method of applying semiconductor resist |
-
1987
- 1987-08-28 JP JP62215663A patent/JPH0824892B2/en not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6085524A (en) * | 1983-10-17 | 1985-05-15 | Fujitsu Ltd | Resist applying method |
JPS61150332A (en) * | 1984-12-25 | 1986-07-09 | Toshiba Corp | Method of applying semiconductor resist |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5066616A (en) * | 1989-06-14 | 1991-11-19 | Hewlett-Packard Company | Method for improving photoresist on wafers by applying fluid layer of liquid solvent |
US6033728A (en) * | 1993-05-13 | 2000-03-07 | Fujitsu Limited | Apparatus for spin coating, a method for spin coating and a method for manufacturing semiconductor device |
WO2008123049A1 (en) * | 2007-03-30 | 2008-10-16 | Jsr Corporation | Method for film formation, resin composition for use in the method, structure having insulating film, process for producing the structure, and electronic component |
JP2009133924A (en) * | 2007-11-28 | 2009-06-18 | Jsr Corp | Method for film formation and positive photosensitive resin composition for use in the same |
Also Published As
Publication number | Publication date |
---|---|
JPH0824892B2 (en) | 1996-03-13 |
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