JPS6456714A - Fluorine-containing phenolic resin precursor - Google Patents

Fluorine-containing phenolic resin precursor

Info

Publication number
JPS6456714A
JPS6456714A JP11329888A JP11329888A JPS6456714A JP S6456714 A JPS6456714 A JP S6456714A JP 11329888 A JP11329888 A JP 11329888A JP 11329888 A JP11329888 A JP 11329888A JP S6456714 A JPS6456714 A JP S6456714A
Authority
JP
Japan
Prior art keywords
phenolic
group
contg
phenolic resin
fluorine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11329888A
Other languages
Japanese (ja)
Other versions
JP2791357B2 (en
Inventor
Kojiro Ito
Yoshihiro Miura
Hideyuki Tomota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Neos Co Ltd
Original Assignee
Neos Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Neos Co Ltd filed Critical Neos Co Ltd
Publication of JPS6456714A publication Critical patent/JPS6456714A/en
Application granted granted Critical
Publication of JP2791357B2 publication Critical patent/JP2791357B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

PURPOSE:To obtain the titled precursor capable of giving novel functional fluorine-contg. phenolic resin of outstanding water-and-oil repellency, stainproofness and chemical and heat resistances etc., by substituting specific perfluoroalkyl group-contg. group for the phenolic OH in a phenolic resin precursor. CONSTITUTION:A reaction is carried out between (A) a phenolic resin precursor and (B) a perfluoroalkene of formula I [R1-R3 are each -CnF2n+1 (n is integer 1-10) perfluoroalkyl] (pref. hexafluoropropene oligomer) in an organic solvent in the presence of a basic catalyst (pref. tertiary amine such as trimethylamine) to substitute the phenolic OH by trimethylamine) to substitute the phenolic OH by perfluoroalkyl group-contg. group of formula II, III or IV (l is 0-2; m is 1-9), thus obtaining the objective precursor (however, excepting such a case as to substitute the phenolic OH by fluorine-contg. group of formula V).
JP63113298A 1987-05-08 1988-05-09 Fluorine-containing phenolic resin precursor Expired - Fee Related JP2791357B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP11319087 1987-05-08
JP62-113190 1987-05-08

Publications (2)

Publication Number Publication Date
JPS6456714A true JPS6456714A (en) 1989-03-03
JP2791357B2 JP2791357B2 (en) 1998-08-27

Family

ID=14605837

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63113298A Expired - Fee Related JP2791357B2 (en) 1987-05-08 1988-05-09 Fluorine-containing phenolic resin precursor

Country Status (1)

Country Link
JP (1) JP2791357B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01144411A (en) * 1987-12-01 1989-06-06 Neos Co Ltd Fluorine-containing phenolic resin and production thereof
WO1999050069A1 (en) * 1998-03-27 1999-10-07 Kodak Polychrome Graphics Company Ltd. Waterless lithographic plate
WO2008146681A1 (en) * 2007-05-23 2008-12-04 Dic Corporation Fluorine-containing novolac resin, fluorine-containing surfactant, fluorine-containing surfactant composition, and resin composition
JP2017003960A (en) * 2015-06-04 2017-01-05 信越化学工業株式会社 Resist underlay film material and pattern formation method
JP2017034137A (en) * 2015-08-03 2017-02-09 パナソニックＩｐマネジメント株式会社 LED module

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS619420A (en) * 1984-06-08 1986-01-17 ヘキスト・アクチエンゲゼルシヤフト Polymer containing perfluoroalkyl group, manufacture and radiosensitive copying layer
JPS61296350A (en) * 1985-06-26 1986-12-27 Toshiba Corp Photosensitive composition
JPS6357632A (en) * 1986-08-29 1988-03-12 Hitachi Ltd Epoxy resin composition, semiconductor device sealing agent and material for laminate
JPS63273619A (en) * 1987-04-30 1988-11-10 Daikin Ind Ltd Fluorine-containing novolak and derivative thereof
JPS63277219A (en) * 1987-05-08 1988-11-15 Neos Co Ltd Fluorine-containing phenol resin and production thereof

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS619420A (en) * 1984-06-08 1986-01-17 ヘキスト・アクチエンゲゼルシヤフト Polymer containing perfluoroalkyl group, manufacture and radiosensitive copying layer
JPS61296350A (en) * 1985-06-26 1986-12-27 Toshiba Corp Photosensitive composition
JPS6357632A (en) * 1986-08-29 1988-03-12 Hitachi Ltd Epoxy resin composition, semiconductor device sealing agent and material for laminate
JPS63273619A (en) * 1987-04-30 1988-11-10 Daikin Ind Ltd Fluorine-containing novolak and derivative thereof
JPS63277219A (en) * 1987-05-08 1988-11-15 Neos Co Ltd Fluorine-containing phenol resin and production thereof

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01144411A (en) * 1987-12-01 1989-06-06 Neos Co Ltd Fluorine-containing phenolic resin and production thereof
WO1999050069A1 (en) * 1998-03-27 1999-10-07 Kodak Polychrome Graphics Company Ltd. Waterless lithographic plate
US6416932B1 (en) 1998-03-27 2002-07-09 Kodak Polychrome Graphics Llc Waterless lithographic plate
WO2008146681A1 (en) * 2007-05-23 2008-12-04 Dic Corporation Fluorine-containing novolac resin, fluorine-containing surfactant, fluorine-containing surfactant composition, and resin composition
US8410210B2 (en) 2007-05-23 2013-04-02 Dic Corporation Fluorine-containing novolac resin, fluorine-containing surfactant, fluorine-containing surfactant composition, and resin composition
JP2017003960A (en) * 2015-06-04 2017-01-05 信越化学工業株式会社 Resist underlay film material and pattern formation method
JP2017034137A (en) * 2015-08-03 2017-02-09 パナソニックＩｐマネジメント株式会社 LED module

Also Published As

Publication number Publication date
JP2791357B2 (en) 1998-08-27

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