JPS645639U - - Google Patents
Info
- Publication number
- JPS645639U JPS645639U JP9785387U JP9785387U JPS645639U JP S645639 U JPS645639 U JP S645639U JP 9785387 U JP9785387 U JP 9785387U JP 9785387 U JP9785387 U JP 9785387U JP S645639 U JPS645639 U JP S645639U
- Authority
- JP
- Japan
- Prior art keywords
- gas
- inner pipe
- piping
- harmful
- pipe
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007789 gas Substances 0.000 claims description 11
- 231100000614 poison Toxicity 0.000 claims description 3
- 230000007096 poisonous effect Effects 0.000 claims description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 2
- 229910001873 dinitrogen Inorganic materials 0.000 claims description 2
- 238000001514 detection method Methods 0.000 claims 1
- 239000002341 toxic gas Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
Description
第１図は、本考案の実施例の有害・有毒ガス配
管装置の概略の系統図。第２図は従来の同様の図
。
１……真空処理装置、２，３，１０，１１……
バルブ、４…外管、５…内管、６……オートフロ
ーコントローラ、７……ガスボンベボツクス、８
……排出管、９……ガス検出器、１２……ガスボ
ンベ、３０……窒素ガスボンベ。
FIG. 1 is a schematic system diagram of a harmful/poisonous gas piping system according to an embodiment of the present invention. FIG. 2 is a similar conventional diagram. 1... Vacuum processing equipment, 2, 3, 10, 11...
Valve, 4...Outer pipe, 5...Inner pipe, 6...Auto flow controller, 7...Gas cylinder box, 8
...Discharge pipe, 9...Gas detector, 12...Gas cylinder, 30...Nitrogen gas cylinder.
Claims (1)
られる有害・有毒ガス配管装置において、配管を
、相互間を気密に保たれた内管、外管の二重管で
構成し、該内管を正規のガス導入・排出系配管と
して使用するとともに、該内管と該外管に囲まれ
た空間内には、乾燥した窒素ガスを封入し、且つ
、該内管から該空間内に漏洩した有害９・有毒ガ
スを検出するガス検知装置を備えたことを特徴と
する有害・有毒ガス配管装置。 In harmful/poisonous gas piping equipment used for the gas introduction system and gas exhaust system of vacuum processing equipment, the piping is composed of a double pipe consisting of an inner pipe and an outer pipe that are kept airtight between each other, and the inner pipe is In addition to being used as regular gas introduction/exhaust system piping, the space surrounded by the inner pipe and outer pipe is filled with dry nitrogen gas, and any harmful gas that leaks from the inner pipe into the space is sealed. 9. Harmful/poisonous gas piping equipment characterized by being equipped with a gas detection device for detecting toxic gases.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987097853U JPH08980Y2 (en) | 1987-06-25 | 1987-06-25 | Hazardous / toxic gas piping equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987097853U JPH08980Y2 (en) | 1987-06-25 | 1987-06-25 | Hazardous / toxic gas piping equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS645639U true JPS645639U (en) | 1989-01-12 |
| JPH08980Y2 JPH08980Y2 (en) | 1996-01-17 |
Family
ID=31323606
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987097853U Expired - Lifetime JPH08980Y2 (en) | 1987-06-25 | 1987-06-25 | Hazardous / toxic gas piping equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH08980Y2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0647269A (en) * | 1992-07-06 | 1994-02-22 | Ebara Infilco Co Ltd | Vacuum treating device |
| JP2001053066A (en) * | 1999-05-28 | 2001-02-23 | Tokyo Electron Ltd | Ozone processor and ozone processing method |
| JP2004508681A (en) * | 2000-09-05 | 2004-03-18 | アクセリス テクノロジーズ インコーポレーテッド | Mass gas delivery system for ion implanters |
| JP2021044385A (en) * | 2019-09-11 | 2021-03-18 | 東京エレクトロン株式会社 | Heat medium circulation system and substrate processing device |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100801843B1 (en) * | 2006-08-22 | 2008-02-11 | 동부일렉트로닉스 주식회사 | Apparatus for treating exhaust gas |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6286598U (en) * | 1985-11-20 | 1987-06-02 |
-
1987
- 1987-06-25 JP JP1987097853U patent/JPH08980Y2/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6286598U (en) * | 1985-11-20 | 1987-06-02 |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0647269A (en) * | 1992-07-06 | 1994-02-22 | Ebara Infilco Co Ltd | Vacuum treating device |
| JP2001053066A (en) * | 1999-05-28 | 2001-02-23 | Tokyo Electron Ltd | Ozone processor and ozone processing method |
| JP2004508681A (en) * | 2000-09-05 | 2004-03-18 | アクセリス テクノロジーズ インコーポレーテッド | Mass gas delivery system for ion implanters |
| JP2021044385A (en) * | 2019-09-11 | 2021-03-18 | 東京エレクトロン株式会社 | Heat medium circulation system and substrate processing device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH08980Y2 (en) | 1996-01-17 |