JPS644592B2 - - Google Patents
Info
- Publication number
- JPS644592B2 JPS644592B2 JP61155811A JP15581186A JPS644592B2 JP S644592 B2 JPS644592 B2 JP S644592B2 JP 61155811 A JP61155811 A JP 61155811A JP 15581186 A JP15581186 A JP 15581186A JP S644592 B2 JPS644592 B2 JP S644592B2
- Authority
- JP
- Japan
- Prior art keywords
- hard carbon
- carbon film
- guide member
- high frequency
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910021385 hard carbon Inorganic materials 0.000 claims description 39
- 239000007789 gas Substances 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 20
- 239000000758 substrate Substances 0.000 claims description 20
- 239000012495 reaction gas Substances 0.000 claims description 18
- 238000004519 manufacturing process Methods 0.000 claims description 16
- 239000012212 insulator Substances 0.000 claims description 6
- 239000000376 reactant Substances 0.000 claims description 6
- 238000000354 decomposition reaction Methods 0.000 claims description 5
- 230000014509 gene expression Effects 0.000 claims description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 3
- -1 argon ions Chemical class 0.000 description 3
- 229910002804 graphite Inorganic materials 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 2
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 2
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000009396 hybridization Methods 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000002861 polymer material Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
- Photoreceptors In Electrophotography (AREA)
- Carbon And Carbon Compounds (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61155811A JPS6311671A (ja) | 1986-07-02 | 1986-07-02 | 硬質炭素膜の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61155811A JPS6311671A (ja) | 1986-07-02 | 1986-07-02 | 硬質炭素膜の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6311671A JPS6311671A (ja) | 1988-01-19 |
| JPS644592B2 true JPS644592B2 (enrdf_load_stackoverflow) | 1989-01-26 |
Family
ID=15613984
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61155811A Granted JPS6311671A (ja) | 1986-07-02 | 1986-07-02 | 硬質炭素膜の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6311671A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2626170B2 (ja) * | 1990-05-23 | 1997-07-02 | 松下電器産業株式会社 | 電子写真感光体ならびにその表面保護層の製造方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6056793B2 (ja) * | 1978-12-27 | 1985-12-11 | 株式会社日立製作所 | プラズマ表面処理装置 |
-
1986
- 1986-07-02 JP JP61155811A patent/JPS6311671A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6311671A (ja) | 1988-01-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |