JPS6445357A - Novel sulfonium salt - Google Patents

Novel sulfonium salt

Info

Publication number
JPS6445357A
JPS6445357A JP20112287A JP20112287A JPS6445357A JP S6445357 A JPS6445357 A JP S6445357A JP 20112287 A JP20112287 A JP 20112287A JP 20112287 A JP20112287 A JP 20112287A JP S6445357 A JPS6445357 A JP S6445357A
Authority
JP
Japan
Prior art keywords
compound
formula
lewis acid
solvent
weak nucleophilic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20112287A
Other languages
Japanese (ja)
Other versions
JPH0713057B2 (en
Inventor
Mikio Hori
Sada Kataoka
Tsutomu Miyagawa
Hideo Takeuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Wako Pure Chemical Corp
Original Assignee
Wako Pure Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wako Pure Chemical Industries Ltd filed Critical Wako Pure Chemical Industries Ltd
Priority to JP20112287A priority Critical patent/JPH0713057B2/en
Publication of JPS6445357A publication Critical patent/JPS6445357A/en
Publication of JPH0713057B2 publication Critical patent/JPH0713057B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Epoxy Resins (AREA)

Abstract

NEW MATERIAL:The compound of formula (R is biphenyl, 4-methylphenyl, 2,5-dimethoxyphenyl or beta-naphthyl; X<-> is Lewis acid residue having weak nucleophilic property) and a solvent addition product of said compound. EXAMPLE:Diphenyl-p-methylphenacyl sulfonium hexafluoroantimonate. USE:A cationic photo-polymerization initiator. It has high polymerization activity and exhibits excellent rapid curability when used in the hardening of an epoxy polymer, etc. It has excellent storage stability. PREPARATION:The compound of formula can be produced by reacting a diaryl sulfide with an omega-bromoacetophenone derivative in a solvent (e.g. dichloromethane or dichloroethane) in the presence of a silver salt or an alkali metal salt of a Lewis acid having weak nucleophilic property.
JP20112287A 1987-08-12 1987-08-12 Novel sulfonium salt Expired - Fee Related JPH0713057B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20112287A JPH0713057B2 (en) 1987-08-12 1987-08-12 Novel sulfonium salt

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20112287A JPH0713057B2 (en) 1987-08-12 1987-08-12 Novel sulfonium salt

Publications (2)

Publication Number Publication Date
JPS6445357A true JPS6445357A (en) 1989-02-17
JPH0713057B2 JPH0713057B2 (en) 1995-02-15

Family

ID=16435774

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20112287A Expired - Fee Related JPH0713057B2 (en) 1987-08-12 1987-08-12 Novel sulfonium salt

Country Status (1)

Country Link
JP (1) JPH0713057B2 (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002092559A1 (en) * 2001-05-11 2002-11-21 Wako Pure Chemical Industries, Ltd. Fluorinated triphenylsulfonium salts
JP2004077811A (en) * 2002-08-19 2004-03-11 Fuji Photo Film Co Ltd Negative type resist composition
WO2011040531A1 (en) 2009-10-01 2011-04-07 日立化成工業株式会社 Material for organic electronics, organic electronic element, organic electroluminescent element, display element using organic electroluminescent element, illuminating device, and display device
JP2011144277A (en) * 2010-01-15 2011-07-28 Kawasaki Kasei Chem Ltd Cationically photopolymerizable composition
WO2011132702A1 (en) 2010-04-22 2011-10-27 日立化成工業株式会社 Organic electronic material, polymerization initiator and thermal polymerization initiator, ink composition, organic thin film and production method for same, organic electronic element, organic electroluminescent element, lighting device, display element, and display device
WO2014136900A1 (en) 2013-03-08 2014-09-12 日立化成株式会社 Ionic-compound-containing treatment solution, organic electronic element, and method for manufacturing organic electronic element
WO2017115690A1 (en) 2015-12-29 2017-07-06 サンアプロ株式会社 Photosensitive composition
WO2021251035A1 (en) 2020-06-12 2021-12-16 サンアプロ株式会社 Novel onium salt and photoacid generator
WO2022130796A1 (en) 2020-12-14 2022-06-23 サンアプロ株式会社 Photoacid generator, and photosensitive composition using same

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002092559A1 (en) * 2001-05-11 2002-11-21 Wako Pure Chemical Industries, Ltd. Fluorinated triphenylsulfonium salts
JP2004077811A (en) * 2002-08-19 2004-03-11 Fuji Photo Film Co Ltd Negative type resist composition
WO2011040531A1 (en) 2009-10-01 2011-04-07 日立化成工業株式会社 Material for organic electronics, organic electronic element, organic electroluminescent element, display element using organic electroluminescent element, illuminating device, and display device
JP2011144277A (en) * 2010-01-15 2011-07-28 Kawasaki Kasei Chem Ltd Cationically photopolymerizable composition
WO2011132702A1 (en) 2010-04-22 2011-10-27 日立化成工業株式会社 Organic electronic material, polymerization initiator and thermal polymerization initiator, ink composition, organic thin film and production method for same, organic electronic element, organic electroluminescent element, lighting device, display element, and display device
WO2014136900A1 (en) 2013-03-08 2014-09-12 日立化成株式会社 Ionic-compound-containing treatment solution, organic electronic element, and method for manufacturing organic electronic element
WO2017115690A1 (en) 2015-12-29 2017-07-06 サンアプロ株式会社 Photosensitive composition
WO2021251035A1 (en) 2020-06-12 2021-12-16 サンアプロ株式会社 Novel onium salt and photoacid generator
WO2022130796A1 (en) 2020-12-14 2022-06-23 サンアプロ株式会社 Photoacid generator, and photosensitive composition using same

Also Published As

Publication number Publication date
JPH0713057B2 (en) 1995-02-15

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Legal Events

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LAPS Cancellation because of no payment of annual fees