JPS6445357A - Novel sulfonium salt - Google Patents
Novel sulfonium saltInfo
- Publication number
- JPS6445357A JPS6445357A JP20112287A JP20112287A JPS6445357A JP S6445357 A JPS6445357 A JP S6445357A JP 20112287 A JP20112287 A JP 20112287A JP 20112287 A JP20112287 A JP 20112287A JP S6445357 A JPS6445357 A JP S6445357A
- Authority
- JP
- Japan
- Prior art keywords
- compound
- formula
- lewis acid
- solvent
- weak nucleophilic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Epoxy Resins (AREA)
Abstract
NEW MATERIAL:The compound of formula (R is biphenyl, 4-methylphenyl, 2,5-dimethoxyphenyl or beta-naphthyl; X<-> is Lewis acid residue having weak nucleophilic property) and a solvent addition product of said compound. EXAMPLE:Diphenyl-p-methylphenacyl sulfonium hexafluoroantimonate. USE:A cationic photo-polymerization initiator. It has high polymerization activity and exhibits excellent rapid curability when used in the hardening of an epoxy polymer, etc. It has excellent storage stability. PREPARATION:The compound of formula can be produced by reacting a diaryl sulfide with an omega-bromoacetophenone derivative in a solvent (e.g. dichloromethane or dichloroethane) in the presence of a silver salt or an alkali metal salt of a Lewis acid having weak nucleophilic property.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20112287A JPH0713057B2 (en) | 1987-08-12 | 1987-08-12 | Novel sulfonium salt |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20112287A JPH0713057B2 (en) | 1987-08-12 | 1987-08-12 | Novel sulfonium salt |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6445357A true JPS6445357A (en) | 1989-02-17 |
JPH0713057B2 JPH0713057B2 (en) | 1995-02-15 |
Family
ID=16435774
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20112287A Expired - Fee Related JPH0713057B2 (en) | 1987-08-12 | 1987-08-12 | Novel sulfonium salt |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0713057B2 (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2002092559A1 (en) * | 2001-05-11 | 2002-11-21 | Wako Pure Chemical Industries, Ltd. | Fluorinated triphenylsulfonium salts |
JP2004077811A (en) * | 2002-08-19 | 2004-03-11 | Fuji Photo Film Co Ltd | Negative type resist composition |
WO2011040531A1 (en) | 2009-10-01 | 2011-04-07 | 日立化成工業株式会社 | Material for organic electronics, organic electronic element, organic electroluminescent element, display element using organic electroluminescent element, illuminating device, and display device |
JP2011144277A (en) * | 2010-01-15 | 2011-07-28 | Kawasaki Kasei Chem Ltd | Cationically photopolymerizable composition |
WO2011132702A1 (en) | 2010-04-22 | 2011-10-27 | 日立化成工業株式会社 | Organic electronic material, polymerization initiator and thermal polymerization initiator, ink composition, organic thin film and production method for same, organic electronic element, organic electroluminescent element, lighting device, display element, and display device |
WO2014136900A1 (en) | 2013-03-08 | 2014-09-12 | 日立化成株式会社 | Ionic-compound-containing treatment solution, organic electronic element, and method for manufacturing organic electronic element |
WO2017115690A1 (en) | 2015-12-29 | 2017-07-06 | サンアプロ株式会社 | Photosensitive composition |
WO2021251035A1 (en) | 2020-06-12 | 2021-12-16 | サンアプロ株式会社 | Novel onium salt and photoacid generator |
WO2022130796A1 (en) | 2020-12-14 | 2022-06-23 | サンアプロ株式会社 | Photoacid generator, and photosensitive composition using same |
-
1987
- 1987-08-12 JP JP20112287A patent/JPH0713057B2/en not_active Expired - Fee Related
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2002092559A1 (en) * | 2001-05-11 | 2002-11-21 | Wako Pure Chemical Industries, Ltd. | Fluorinated triphenylsulfonium salts |
JP2004077811A (en) * | 2002-08-19 | 2004-03-11 | Fuji Photo Film Co Ltd | Negative type resist composition |
WO2011040531A1 (en) | 2009-10-01 | 2011-04-07 | 日立化成工業株式会社 | Material for organic electronics, organic electronic element, organic electroluminescent element, display element using organic electroluminescent element, illuminating device, and display device |
JP2011144277A (en) * | 2010-01-15 | 2011-07-28 | Kawasaki Kasei Chem Ltd | Cationically photopolymerizable composition |
WO2011132702A1 (en) | 2010-04-22 | 2011-10-27 | 日立化成工業株式会社 | Organic electronic material, polymerization initiator and thermal polymerization initiator, ink composition, organic thin film and production method for same, organic electronic element, organic electroluminescent element, lighting device, display element, and display device |
WO2014136900A1 (en) | 2013-03-08 | 2014-09-12 | 日立化成株式会社 | Ionic-compound-containing treatment solution, organic electronic element, and method for manufacturing organic electronic element |
WO2017115690A1 (en) | 2015-12-29 | 2017-07-06 | サンアプロ株式会社 | Photosensitive composition |
WO2021251035A1 (en) | 2020-06-12 | 2021-12-16 | サンアプロ株式会社 | Novel onium salt and photoacid generator |
WO2022130796A1 (en) | 2020-12-14 | 2022-06-23 | サンアプロ株式会社 | Photoacid generator, and photosensitive composition using same |
Also Published As
Publication number | Publication date |
---|---|
JPH0713057B2 (en) | 1995-02-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |