JPS56128941A - Resin composition for positive type resist - Google Patents

Resin composition for positive type resist

Info

Publication number
JPS56128941A
JPS56128941A JP3242880A JP3242880A JPS56128941A JP S56128941 A JPS56128941 A JP S56128941A JP 3242880 A JP3242880 A JP 3242880A JP 3242880 A JP3242880 A JP 3242880A JP S56128941 A JPS56128941 A JP S56128941A
Authority
JP
Japan
Prior art keywords
polymer
temp
positive type
type resist
reactivity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3242880A
Other languages
Japanese (ja)
Inventor
Jun Nakauchi
Tomihiko Kawamura
Toshio Yoshihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Rayon Co Ltd
Original Assignee
Mitsubishi Rayon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Rayon Co Ltd filed Critical Mitsubishi Rayon Co Ltd
Priority to JP3242880A priority Critical patent/JPS56128941A/en
Publication of JPS56128941A publication Critical patent/JPS56128941A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Abstract

PURPOSE:To obtain a resist of high resolution and high sensitivity by mixing a polymer A which causes thermal crosslinking in a specific temp. range, and a polymer B which has good compatibility with the polymer A while having no reactivity at said temp. within a specific weight ratio range. CONSTITUTION:The polymer A of which the number average mol.wt. (MN) through polystyrene conversion by a gel permeation chromatography method is between 10,000-1,000,000 and which crosslinks at 100-250 deg.C is obtained as a copolymer with methacrylate, for example, glycidyl methacrylate. On the other hand, the composition prepd. by dissolving the polymer B or copolymer of polymethacrylate etc. which has no reactivity at the above-mentioned temp., has good compatibility with the polymer A and of which the MN by said method is 10,000- 1,000,000 and the polymer A in a good solvent at the ratios expressed by the formula is used as the positive type resist. This yields the composition having excellent adhesiveness to substrates, etching resistance, heat resistance, etc.
JP3242880A 1980-03-14 1980-03-14 Resin composition for positive type resist Pending JPS56128941A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3242880A JPS56128941A (en) 1980-03-14 1980-03-14 Resin composition for positive type resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3242880A JPS56128941A (en) 1980-03-14 1980-03-14 Resin composition for positive type resist

Publications (1)

Publication Number Publication Date
JPS56128941A true JPS56128941A (en) 1981-10-08

Family

ID=12358676

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3242880A Pending JPS56128941A (en) 1980-03-14 1980-03-14 Resin composition for positive type resist

Country Status (1)

Country Link
JP (1) JPS56128941A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58116532A (en) * 1981-12-29 1983-07-11 Fujitsu Ltd Pattern formation
JPS63165844A (en) * 1986-12-27 1988-07-09 Terumo Corp Resist material
JP2008095087A (en) * 2006-09-15 2008-04-24 Mitsubishi Rayon Co Ltd Polymer, method for producing the same, resist composition, and its application

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58116532A (en) * 1981-12-29 1983-07-11 Fujitsu Ltd Pattern formation
JPH0262859B2 (en) * 1981-12-29 1990-12-26 Fujitsu Ltd
JPS63165844A (en) * 1986-12-27 1988-07-09 Terumo Corp Resist material
JP2008095087A (en) * 2006-09-15 2008-04-24 Mitsubishi Rayon Co Ltd Polymer, method for producing the same, resist composition, and its application

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