JPS6444627U - - Google Patents
Info
- Publication number
- JPS6444627U JPS6444627U JP13912087U JP13912087U JPS6444627U JP S6444627 U JPS6444627 U JP S6444627U JP 13912087 U JP13912087 U JP 13912087U JP 13912087 U JP13912087 U JP 13912087U JP S6444627 U JPS6444627 U JP S6444627U
- Authority
- JP
- Japan
- Prior art keywords
- reaction tube
- ring
- gas
- reaction
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007789 gas Substances 0.000 claims description 5
- 239000012495 reaction gas Substances 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13912087U JPS6444627U (enExample) | 1987-09-11 | 1987-09-11 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13912087U JPS6444627U (enExample) | 1987-09-11 | 1987-09-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6444627U true JPS6444627U (enExample) | 1989-03-16 |
Family
ID=31402084
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13912087U Pending JPS6444627U (enExample) | 1987-09-11 | 1987-09-11 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6444627U (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01107517A (ja) * | 1987-10-20 | 1989-04-25 | Matsushita Electric Ind Co Ltd | 半導体基板の処理方法 |
| JP2020147833A (ja) * | 2019-03-15 | 2020-09-17 | 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ | 基板処理装置、半導体装置の製造方法およびプログラム |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59100517A (ja) * | 1982-12-01 | 1984-06-09 | Toshiba Corp | ウエハ拡散装置 |
| JPS6112229B2 (enExample) * | 1976-11-15 | 1986-04-07 | Seiko Denshi Kogyo Kk |
-
1987
- 1987-09-11 JP JP13912087U patent/JPS6444627U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6112229B2 (enExample) * | 1976-11-15 | 1986-04-07 | Seiko Denshi Kogyo Kk | |
| JPS59100517A (ja) * | 1982-12-01 | 1984-06-09 | Toshiba Corp | ウエハ拡散装置 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01107517A (ja) * | 1987-10-20 | 1989-04-25 | Matsushita Electric Ind Co Ltd | 半導体基板の処理方法 |
| JP2020147833A (ja) * | 2019-03-15 | 2020-09-17 | 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ | 基板処理装置、半導体装置の製造方法およびプログラム |