JPS6443808A - Thin film magnetic head - Google Patents

Thin film magnetic head

Info

Publication number
JPS6443808A
JPS6443808A JP19978687A JP19978687A JPS6443808A JP S6443808 A JPS6443808 A JP S6443808A JP 19978687 A JP19978687 A JP 19978687A JP 19978687 A JP19978687 A JP 19978687A JP S6443808 A JPS6443808 A JP S6443808A
Authority
JP
Japan
Prior art keywords
patterns
deciding
etching
pattern
insulating film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19978687A
Other languages
Japanese (ja)
Inventor
Eiji Ashida
Masanobu Hanazono
Masatoshi Tsuchiya
Tsuneo Yoshinari
Makoto Morijiri
Takashi Kawabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP19978687A priority Critical patent/JPS6443808A/en
Publication of JPS6443808A publication Critical patent/JPS6443808A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
    • G11B5/3166—Testing or indicating in relation thereto, e.g. before the fabrication is completed
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109—Details
    • G11B5/313—Disposition of layers
    • G11B5/3133—Disposition of layers including layers not usually being a part of the electromagnetic transducer structure and providing additional features, e.g. for improving heat radiation, reduction of power dissipation, adaptations for measurement or indication of gap depth or other properties of the structure

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Magnetic Heads (AREA)

Abstract

PURPOSE:To prevent defective voltage resistance and the degradation in head efficiency by providing patterns for deciding the end of insulating film etching to the lower part of an insulating film. CONSTITUTION:The patterns for deciding the end are formed by using the same material as a magnetic material at the time of forming the core pattern of a lower magnetic material. Two pieces of the patterns 8 for deciding the end are formed by each one piece on the right and left of the lower magnetic material 2. These patterns are formed in order to eliminate the fluctuation in the zero position of a magnetic gap position generated by the influence of the pattern deviation which rises when the photoresist pattern for taper etching of the insulating film is formed. The patterns are further formed to the slit patterns to facilitate the decision of the end and the prediction of the time when the etching ends while observing the progressing condition of the etching as shown in the magnified view of the pattern for deciding the end. The line and space of the slit is made to 2mum.
JP19978687A 1987-08-12 1987-08-12 Thin film magnetic head Pending JPS6443808A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19978687A JPS6443808A (en) 1987-08-12 1987-08-12 Thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19978687A JPS6443808A (en) 1987-08-12 1987-08-12 Thin film magnetic head

Publications (1)

Publication Number Publication Date
JPS6443808A true JPS6443808A (en) 1989-02-16

Family

ID=16413586

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19978687A Pending JPS6443808A (en) 1987-08-12 1987-08-12 Thin film magnetic head

Country Status (1)

Country Link
JP (1) JPS6443808A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03202440A (en) * 1989-12-29 1991-09-04 Nippon Steel Corp Method for adding low melting heavy metal to molten steel
KR100856284B1 (en) * 2006-12-26 2008-09-03 주식회사 포스코 Temperature control apparatus and method in hot strip mill

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03202440A (en) * 1989-12-29 1991-09-04 Nippon Steel Corp Method for adding low melting heavy metal to molten steel
KR100856284B1 (en) * 2006-12-26 2008-09-03 주식회사 포스코 Temperature control apparatus and method in hot strip mill

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