JPS6439726A - Contraction projecting aligner - Google Patents
Contraction projecting alignerInfo
- Publication number
- JPS6439726A JPS6439726A JP62196819A JP19681987A JPS6439726A JP S6439726 A JPS6439726 A JP S6439726A JP 62196819 A JP62196819 A JP 62196819A JP 19681987 A JP19681987 A JP 19681987A JP S6439726 A JPS6439726 A JP S6439726A
- Authority
- JP
- Japan
- Prior art keywords
- alignment mark
- projecting
- mark position
- image
- amount
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE:To provide a contraction projecting aligner for automatically correcting the coordinates of a projecting image to those of a designed value on the basis of an alignment mark position and the distortion of a lens. CONSTITUTION:An error amount Q is measured from an alignment mark position A on an ideal lattice image 11 to form a map, and stored in memory means 2a of a computer 2. When detecting means 1 detects the alignment mark position A of a mask image 3a, position data P is fed from the means 1 to correcting amount calculating means 2b in the computer 2. The means 2b reads out the amount Q from the map stored in the means 2a in response to the data P. Then, the means 2b automatically corrects the coordinates of an alignment mark position A1 on a projecting image 12 to output a correction amount R to projecting means 3b.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62196819A JPS6439726A (en) | 1987-08-05 | 1987-08-05 | Contraction projecting aligner |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62196819A JPS6439726A (en) | 1987-08-05 | 1987-08-05 | Contraction projecting aligner |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6439726A true JPS6439726A (en) | 1989-02-10 |
Family
ID=16364190
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62196819A Pending JPS6439726A (en) | 1987-08-05 | 1987-08-05 | Contraction projecting aligner |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6439726A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06245646A (en) * | 1993-02-26 | 1994-09-06 | Cosmo Plant Kk | Method for culturing mushrooms and device used therefor |
US6934004B2 (en) | 2002-03-18 | 2005-08-23 | Canon Kabushiki Kaisha | Exposure apparatus, semiconductor device manufacturing method, maintenance method of exposure apparatus, and semiconductor manufacturing factory |
JP2007165684A (en) * | 2005-12-15 | 2007-06-28 | Nikon Corp | Alignment method, design method of mask pattern, mask, device manufacturing method, alignment device, and exposure device |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6224624A (en) * | 1985-07-24 | 1987-02-02 | Nippon Kogaku Kk <Nikon> | Exposure method and exposure system |
JPS6235621A (en) * | 1985-08-09 | 1987-02-16 | Nec Kyushu Ltd | Reduction projection type exposure |
JPS6235619A (en) * | 1985-08-09 | 1987-02-16 | Canon Inc | Projection exposure device |
JPS62100725A (en) * | 1985-10-28 | 1987-05-11 | Canon Inc | Projection exposing device |
JPS62136821A (en) * | 1985-12-11 | 1987-06-19 | Nippon Kogaku Kk <Nikon> | Projection exposure device |
-
1987
- 1987-08-05 JP JP62196819A patent/JPS6439726A/en active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6224624A (en) * | 1985-07-24 | 1987-02-02 | Nippon Kogaku Kk <Nikon> | Exposure method and exposure system |
JPS6235621A (en) * | 1985-08-09 | 1987-02-16 | Nec Kyushu Ltd | Reduction projection type exposure |
JPS6235619A (en) * | 1985-08-09 | 1987-02-16 | Canon Inc | Projection exposure device |
JPS62100725A (en) * | 1985-10-28 | 1987-05-11 | Canon Inc | Projection exposing device |
JPS62136821A (en) * | 1985-12-11 | 1987-06-19 | Nippon Kogaku Kk <Nikon> | Projection exposure device |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06245646A (en) * | 1993-02-26 | 1994-09-06 | Cosmo Plant Kk | Method for culturing mushrooms and device used therefor |
US6934004B2 (en) | 2002-03-18 | 2005-08-23 | Canon Kabushiki Kaisha | Exposure apparatus, semiconductor device manufacturing method, maintenance method of exposure apparatus, and semiconductor manufacturing factory |
JP2007165684A (en) * | 2005-12-15 | 2007-06-28 | Nikon Corp | Alignment method, design method of mask pattern, mask, device manufacturing method, alignment device, and exposure device |
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