JPS6436767A - Manufacture of zinc selenide - Google Patents

Manufacture of zinc selenide

Info

Publication number
JPS6436767A
JPS6436767A JP18895287A JP18895287A JPS6436767A JP S6436767 A JPS6436767 A JP S6436767A JP 18895287 A JP18895287 A JP 18895287A JP 18895287 A JP18895287 A JP 18895287A JP S6436767 A JPS6436767 A JP S6436767A
Authority
JP
Japan
Prior art keywords
zinc
selenide
zinc selenide
nozzle
vapor pressure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18895287A
Other languages
Japanese (ja)
Inventor
Hiroo Tsuchiya
Minoru Funaki
Masumi Funato
Nobuo Imazeki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Nippon Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mining Co Ltd filed Critical Nippon Mining Co Ltd
Priority to JP18895287A priority Critical patent/JPS6436767A/en
Publication of JPS6436767A publication Critical patent/JPS6436767A/en
Pending legal-status Critical Current

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  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE:To manufacture good-quality zinc selenide having high purity and free from pores, etc., by setting up the outlet temp. of a nozzle through which raw materials are introduced into a reaction zone at a value in a specific region in correlation with zinc vapor pressure. CONSTITUTION:Zinc selenide is prepared by allowing zinc vapor to react with hydrogen selenide gas or selenium vapor. At this time, the outlet temp. of a nozzle for introducing raw materials into a reaction zone is set up in a region below the zinc equilibrium vapor pressure line I obtained based on an empirical equation in a relational diagram between zinc vapor pressure PZn and temp. By this method, high-purity zinc selenide causing no deposition of zinc selenide at the raw-material nozzle at the time of synthesis, free from pores, and useful as material for laser optical parts and light emitting diode substrate can be stably manufactured.
JP18895287A 1987-07-30 1987-07-30 Manufacture of zinc selenide Pending JPS6436767A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18895287A JPS6436767A (en) 1987-07-30 1987-07-30 Manufacture of zinc selenide

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18895287A JPS6436767A (en) 1987-07-30 1987-07-30 Manufacture of zinc selenide

Publications (1)

Publication Number Publication Date
JPS6436767A true JPS6436767A (en) 1989-02-07

Family

ID=16232792

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18895287A Pending JPS6436767A (en) 1987-07-30 1987-07-30 Manufacture of zinc selenide

Country Status (1)

Country Link
JP (1) JPS6436767A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4939058B2 (en) * 2004-02-16 2012-05-23 株式会社カネカ Method for producing transparent conductive film and method for producing tandem-type thin film photoelectric conversion device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57118004A (en) * 1981-01-13 1982-07-22 Agency Of Ind Science & Technol Synthesizing method for znse compound in vapor phase
JPS61204377A (en) * 1985-01-22 1986-09-10 フエアチヤイルド セミコンダクタ コ−ポレ−シヨン Low pressure cvd method and apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57118004A (en) * 1981-01-13 1982-07-22 Agency Of Ind Science & Technol Synthesizing method for znse compound in vapor phase
JPS61204377A (en) * 1985-01-22 1986-09-10 フエアチヤイルド セミコンダクタ コ−ポレ−シヨン Low pressure cvd method and apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4939058B2 (en) * 2004-02-16 2012-05-23 株式会社カネカ Method for producing transparent conductive film and method for producing tandem-type thin film photoelectric conversion device

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