JPS6435897A - Induction plasma generator - Google Patents

Induction plasma generator

Info

Publication number
JPS6435897A
JPS6435897A JP62191148A JP19114887A JPS6435897A JP S6435897 A JPS6435897 A JP S6435897A JP 62191148 A JP62191148 A JP 62191148A JP 19114887 A JP19114887 A JP 19114887A JP S6435897 A JPS6435897 A JP S6435897A
Authority
JP
Japan
Prior art keywords
current
circuit
controlled
vacuum tube
output
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62191148A
Other languages
Japanese (ja)
Inventor
Takanobu Amano
Yoshiharu Hirakawa
Hisashi Komaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd filed Critical Jeol Ltd
Priority to JP62191148A priority Critical patent/JPS6435897A/en
Publication of JPS6435897A publication Critical patent/JPS6435897A/en
Pending legal-status Critical Current

Links

Landscapes

  • Plasma Technology (AREA)
  • Nozzles (AREA)

Abstract

PURPOSE:To avoid the breakage of a vacuum tube by invariably monitoring the balance state between the power source current or the vacuum tube plate current or the high-frequency current flowing in an RF coil and the vacuum tube plate voltage and stopping or squeezing the oscillator output when the balance is lost. CONSTITUTION:The three-phase AC input is controlled by a thyristor circuit 21 phase-controlled by the control signal from a current control circuit 13, the alternating current, with its amplitude partially cut, is transmitted to the secondary side via a transformer 2b and converted into the direct current by a succeeding rectifying circuit 2c. The direct current is then converted into the high-frequency alternating current by a reverse converting section 3 and fed to an RF coil 4, the circuit 13 is negative-feedback-controlled so that the power source current is invariably kept constant during this period, the voltage applied to a torch 5 is set to the preset level for the plasma ignition. In case of misfiring due to some causes in this constitution, a transistor 14b in a plasma misfiring detecting circuit 14 is turned on by the output D1 of a current detecting circuit 11 and the output D2 of a plate voltage detecting circuit 12, a relay 14 is operated, and the circuit 2a is turned off.
JP62191148A 1987-07-30 1987-07-30 Induction plasma generator Pending JPS6435897A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62191148A JPS6435897A (en) 1987-07-30 1987-07-30 Induction plasma generator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62191148A JPS6435897A (en) 1987-07-30 1987-07-30 Induction plasma generator

Publications (1)

Publication Number Publication Date
JPS6435897A true JPS6435897A (en) 1989-02-06

Family

ID=16269695

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62191148A Pending JPS6435897A (en) 1987-07-30 1987-07-30 Induction plasma generator

Country Status (1)

Country Link
JP (1) JPS6435897A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010508638A (en) * 2006-10-31 2010-03-18 エム ケー エス インストルメンツ インコーポレーテッド Method and apparatus for preventing instability in radio frequency plasma processing

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010508638A (en) * 2006-10-31 2010-03-18 エム ケー エス インストルメンツ インコーポレーテッド Method and apparatus for preventing instability in radio frequency plasma processing

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