JPS6434728A - Forming method of lens array - Google Patents

Forming method of lens array

Info

Publication number
JPS6434728A
JPS6434728A JP62190423A JP19042387A JPS6434728A JP S6434728 A JPS6434728 A JP S6434728A JP 62190423 A JP62190423 A JP 62190423A JP 19042387 A JP19042387 A JP 19042387A JP S6434728 A JPS6434728 A JP S6434728A
Authority
JP
Japan
Prior art keywords
photosensitive resin
light
photosensitive
base plate
range
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62190423A
Other languages
Japanese (ja)
Inventor
Kinya Kato
Kazutake Kamihira
Tsutomu Wada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP62190423A priority Critical patent/JPS6434728A/en
Publication of JPS6434728A publication Critical patent/JPS6434728A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To form a lens array on a base plate without using mask or precise registration by a method in which the range of low transmittance to photosensitive wave length is provided on a base plate like a lattice or a stripe, and said range is coated with photosensitive resin, and then said photosensitive resin is exposed to light from its rear surface, and further the unexposed part to the light of the photosensitive resin is removed by developing treatment. CONSTITUTION:The base plate 10 in which a latticelike or stripelike light shielding range 11 is formed, is coated with the photosensitive resin 12 of negative type in which the part having received the radiation of light is to remain. The photosensitive resin 12 is exposed to the light including the photosensitive wave length of the photosensitive resin 12 from the rear surface opposite to the surface coated with the photosensitive resin 12. By means of developing treatment, the photosensitive resin having been unexposed to the light is removed by the latticelike or stripelike light shielding range 11, and at this state, when the lens shape with desired characteristics is not obtained, the photosensitive resin pattern 14 of a semispherical lens is formed by making the viscous fluidity at the temperature equal to the glass transition temperature of the photosensitive resin or higher.
JP62190423A 1987-07-31 1987-07-31 Forming method of lens array Pending JPS6434728A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62190423A JPS6434728A (en) 1987-07-31 1987-07-31 Forming method of lens array

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62190423A JPS6434728A (en) 1987-07-31 1987-07-31 Forming method of lens array

Publications (1)

Publication Number Publication Date
JPS6434728A true JPS6434728A (en) 1989-02-06

Family

ID=16257889

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62190423A Pending JPS6434728A (en) 1987-07-31 1987-07-31 Forming method of lens array

Country Status (1)

Country Link
JP (1) JPS6434728A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0461379A (en) * 1990-06-29 1992-02-27 Kuraray Co Ltd Image sensor and manufacture method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0461379A (en) * 1990-06-29 1992-02-27 Kuraray Co Ltd Image sensor and manufacture method

Similar Documents

Publication Publication Date Title
JPS57200042A (en) Exposure method for chemically machinable photosensitive glass
EP0379358A3 (en) A method for producing a diffraction grating in optical elements
GB1323349A (en) Coloured transparent photo-mask and a method for producing the same
JPS6434728A (en) Forming method of lens array
JPS5729016A (en) Large scale optical integrated circuit
SU592343A3 (en) Method of manufacturing articles of beam-guiding lens type
JPS572034A (en) Mask image forming material and formation of mask image
JPS56128946A (en) Photomask correcting method
EP0517923A4 (en) Method of forming minute resist pattern
JPS57106128A (en) Forming method for pattern
JPS5652751A (en) Photomask correcting method
JPS55134802A (en) Making method of optical fiber circuit
JPS5752056A (en) Photomask
JPS55128832A (en) Method of making minute pattern
JPS6472163A (en) Formation of thin film pattern
JPS56100417A (en) Forming method for resist pattern
JPS5632143A (en) Manufacture of photomask
JPS6451044A (en) Preparation of chocolate using photo-sensitive polymer
JPS5691256A (en) Copying apparatus
JPS57197505A (en) Thin film lens
JPS6452159A (en) Method for simultaneous exposure to solid surface
JPS56149042A (en) Manufacture of gravure cylinder made of synthetic resin
JPS57141850A (en) Color separation filter element for image pickup tube and its manufacture
JPS6421478A (en) Curved surface hologram
JPS557711A (en) Fiber with fine lense and forming method thereof