JPS6431411A - Device for closing tube opening of heat treatment furnace - Google Patents
Device for closing tube opening of heat treatment furnaceInfo
- Publication number
- JPS6431411A JPS6431411A JP18654787A JP18654787A JPS6431411A JP S6431411 A JPS6431411 A JP S6431411A JP 18654787 A JP18654787 A JP 18654787A JP 18654787 A JP18654787 A JP 18654787A JP S6431411 A JPS6431411 A JP S6431411A
- Authority
- JP
- Japan
- Prior art keywords
- core tube
- seal holder
- closing plate
- gas
- exhausted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE:To eliminate the leakage of a gas due to deterioration of materials and facilitate mechanization as well as automation, by inserting a seal holder in the opening side end part of a core tube, thereby abutting a closing plate on this side face and also by making a connection part between the core tube and closing plate communicate with the exhaust side of a disposal gas. CONSTITUTION:After inserting a wafer into the inside of a core tube 2, the core tube 2 where its closing plate 4 comes closely into contact with the side face 10c of a seal holder 10 is hermetically sealed. After that, a gas is supplied from a gas inlet to the core tube 2 and is compulsorily exhausted from an opening through an exhaust port 10f of the seal holder 10, thereby passing through a connector 13, a hose 14, a pipe 15, and a duct 16 after treating the wafer of the inside. As a disposal gas is compulsorily exhausted, grooves 10b and 10d prepared at the seal holder 10 are always in a state of negative pressure. Then gases which are leaking out from gaps between seal holder 10 and a contact part of the core tube 2 as well as between the closing plate 4 and the contact part of the seal holder 10 are drawn in the grooves 10b and 10d and then are exhausted from the exhaust port 10f. Thus no leakage of them develops at all.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62186547A JP2601830B2 (en) | 1987-07-28 | 1987-07-28 | Heat treatment equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62186547A JP2601830B2 (en) | 1987-07-28 | 1987-07-28 | Heat treatment equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6431411A true JPS6431411A (en) | 1989-02-01 |
JP2601830B2 JP2601830B2 (en) | 1997-04-16 |
Family
ID=16190417
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62186547A Expired - Fee Related JP2601830B2 (en) | 1987-07-28 | 1987-07-28 | Heat treatment equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2601830B2 (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6446919A (en) * | 1987-08-17 | 1989-02-21 | Toshiba Corp | Sealing mechanism of heat-resistant tube for heating wafer |
EP0395404A2 (en) | 1989-04-27 | 1990-10-31 | Canon Kabushiki Kaisha | Image processing apparatus |
US5464468A (en) * | 1993-06-03 | 1995-11-07 | Taikisha Ltd. | Rotary adsorption/desorption gas treating apparatus |
JP2006005016A (en) * | 2004-06-15 | 2006-01-05 | Shin Etsu Handotai Co Ltd | Horizontal heat treatment furnace, annealed wafer and manufacturing method thereof |
KR100838505B1 (en) * | 2000-12-23 | 2008-06-17 | 데구사 게엠베하 | Multilayer composite based on polyamide/polyolefin |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62184735U (en) * | 1986-05-16 | 1987-11-24 | ||
JPS63124736U (en) * | 1987-02-05 | 1988-08-15 |
-
1987
- 1987-07-28 JP JP62186547A patent/JP2601830B2/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62184735U (en) * | 1986-05-16 | 1987-11-24 | ||
JPS63124736U (en) * | 1987-02-05 | 1988-08-15 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6446919A (en) * | 1987-08-17 | 1989-02-21 | Toshiba Corp | Sealing mechanism of heat-resistant tube for heating wafer |
EP0395404A2 (en) | 1989-04-27 | 1990-10-31 | Canon Kabushiki Kaisha | Image processing apparatus |
US5464468A (en) * | 1993-06-03 | 1995-11-07 | Taikisha Ltd. | Rotary adsorption/desorption gas treating apparatus |
KR100838505B1 (en) * | 2000-12-23 | 2008-06-17 | 데구사 게엠베하 | Multilayer composite based on polyamide/polyolefin |
JP2006005016A (en) * | 2004-06-15 | 2006-01-05 | Shin Etsu Handotai Co Ltd | Horizontal heat treatment furnace, annealed wafer and manufacturing method thereof |
Also Published As
Publication number | Publication date |
---|---|
JP2601830B2 (en) | 1997-04-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |