JPS6431411A - Device for closing tube opening of heat treatment furnace - Google Patents

Device for closing tube opening of heat treatment furnace

Info

Publication number
JPS6431411A
JPS6431411A JP18654787A JP18654787A JPS6431411A JP S6431411 A JPS6431411 A JP S6431411A JP 18654787 A JP18654787 A JP 18654787A JP 18654787 A JP18654787 A JP 18654787A JP S6431411 A JPS6431411 A JP S6431411A
Authority
JP
Japan
Prior art keywords
core tube
seal holder
closing plate
gas
exhausted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18654787A
Other languages
Japanese (ja)
Other versions
JP2601830B2 (en
Inventor
Seiji Yoshida
Makoto Ota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP62186547A priority Critical patent/JP2601830B2/en
Publication of JPS6431411A publication Critical patent/JPS6431411A/en
Application granted granted Critical
Publication of JP2601830B2 publication Critical patent/JP2601830B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To eliminate the leakage of a gas due to deterioration of materials and facilitate mechanization as well as automation, by inserting a seal holder in the opening side end part of a core tube, thereby abutting a closing plate on this side face and also by making a connection part between the core tube and closing plate communicate with the exhaust side of a disposal gas. CONSTITUTION:After inserting a wafer into the inside of a core tube 2, the core tube 2 where its closing plate 4 comes closely into contact with the side face 10c of a seal holder 10 is hermetically sealed. After that, a gas is supplied from a gas inlet to the core tube 2 and is compulsorily exhausted from an opening through an exhaust port 10f of the seal holder 10, thereby passing through a connector 13, a hose 14, a pipe 15, and a duct 16 after treating the wafer of the inside. As a disposal gas is compulsorily exhausted, grooves 10b and 10d prepared at the seal holder 10 are always in a state of negative pressure. Then gases which are leaking out from gaps between seal holder 10 and a contact part of the core tube 2 as well as between the closing plate 4 and the contact part of the seal holder 10 are drawn in the grooves 10b and 10d and then are exhausted from the exhaust port 10f. Thus no leakage of them develops at all.
JP62186547A 1987-07-28 1987-07-28 Heat treatment equipment Expired - Fee Related JP2601830B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62186547A JP2601830B2 (en) 1987-07-28 1987-07-28 Heat treatment equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62186547A JP2601830B2 (en) 1987-07-28 1987-07-28 Heat treatment equipment

Publications (2)

Publication Number Publication Date
JPS6431411A true JPS6431411A (en) 1989-02-01
JP2601830B2 JP2601830B2 (en) 1997-04-16

Family

ID=16190417

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62186547A Expired - Fee Related JP2601830B2 (en) 1987-07-28 1987-07-28 Heat treatment equipment

Country Status (1)

Country Link
JP (1) JP2601830B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6446919A (en) * 1987-08-17 1989-02-21 Toshiba Corp Sealing mechanism of heat-resistant tube for heating wafer
EP0395404A2 (en) 1989-04-27 1990-10-31 Canon Kabushiki Kaisha Image processing apparatus
US5464468A (en) * 1993-06-03 1995-11-07 Taikisha Ltd. Rotary adsorption/desorption gas treating apparatus
JP2006005016A (en) * 2004-06-15 2006-01-05 Shin Etsu Handotai Co Ltd Horizontal heat treatment furnace, annealed wafer and manufacturing method thereof
KR100838505B1 (en) * 2000-12-23 2008-06-17 데구사 게엠베하 Multilayer composite based on polyamide/polyolefin

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62184735U (en) * 1986-05-16 1987-11-24
JPS63124736U (en) * 1987-02-05 1988-08-15

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62184735U (en) * 1986-05-16 1987-11-24
JPS63124736U (en) * 1987-02-05 1988-08-15

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6446919A (en) * 1987-08-17 1989-02-21 Toshiba Corp Sealing mechanism of heat-resistant tube for heating wafer
EP0395404A2 (en) 1989-04-27 1990-10-31 Canon Kabushiki Kaisha Image processing apparatus
US5464468A (en) * 1993-06-03 1995-11-07 Taikisha Ltd. Rotary adsorption/desorption gas treating apparatus
KR100838505B1 (en) * 2000-12-23 2008-06-17 데구사 게엠베하 Multilayer composite based on polyamide/polyolefin
JP2006005016A (en) * 2004-06-15 2006-01-05 Shin Etsu Handotai Co Ltd Horizontal heat treatment furnace, annealed wafer and manufacturing method thereof

Also Published As

Publication number Publication date
JP2601830B2 (en) 1997-04-16

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees