JPS6428823A - Plasma processor - Google Patents

Plasma processor

Info

Publication number
JPS6428823A
JPS6428823A JP18339687A JP18339687A JPS6428823A JP S6428823 A JPS6428823 A JP S6428823A JP 18339687 A JP18339687 A JP 18339687A JP 18339687 A JP18339687 A JP 18339687A JP S6428823 A JPS6428823 A JP S6428823A
Authority
JP
Japan
Prior art keywords
window part
temperature
chamber
plasma processing
highly reliable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18339687A
Other languages
Japanese (ja)
Inventor
Zenzo Torii
Yoshio Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Microcomputer System Ltd
Hitachi Ltd
Original Assignee
Hitachi Ltd
Hitachi Microcomputer Engineering Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Hitachi Microcomputer Engineering Ltd filed Critical Hitachi Ltd
Priority to JP18339687A priority Critical patent/JPS6428823A/en
Publication of JPS6428823A publication Critical patent/JPS6428823A/en
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

PURPOSE:To enable highly reliable plasma processing to be performed by a method wherein a heating means to keep the inner wall surface of the transparent body in a chamber in a constant temperature state is provided to compensate the temperature of a part of the transparent body susceptible to temperature decline. CONSTITUTION:A window part 14 comprising quartz glass is made on one side of a chamber 2. The window part 14 is formed of two disc type quartz glass sheets 14a, 14b mutually abutted against. A hot wire layer 15 provided on one surface of the glass sheets 14a, 14b by evaporation of Al alloy etc., with electric resistance value thereof controlled. When the hot wire layer 15 is heated, the temperature of the window part 14 is prevented from declining to restrain a deposited film from growing on the window part 14. Within the window part 14, high phototransmission is kept on and wavelength is detected with excellent precision for a long time. Through these procedures, highly reliable plasma processing can be performed.
JP18339687A 1987-07-24 1987-07-24 Plasma processor Pending JPS6428823A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18339687A JPS6428823A (en) 1987-07-24 1987-07-24 Plasma processor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18339687A JPS6428823A (en) 1987-07-24 1987-07-24 Plasma processor

Publications (1)

Publication Number Publication Date
JPS6428823A true JPS6428823A (en) 1989-01-31

Family

ID=16135046

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18339687A Pending JPS6428823A (en) 1987-07-24 1987-07-24 Plasma processor

Country Status (1)

Country Link
JP (1) JPS6428823A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02304920A (en) * 1989-05-19 1990-12-18 Hitachi Ltd Plasma treater
US5266154A (en) * 1991-04-26 1993-11-30 Sony Corporation Dry etching method
JP2013008755A (en) * 2011-06-22 2013-01-10 Ulvac Japan Ltd Vacuum processing apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02304920A (en) * 1989-05-19 1990-12-18 Hitachi Ltd Plasma treater
US5266154A (en) * 1991-04-26 1993-11-30 Sony Corporation Dry etching method
JP2013008755A (en) * 2011-06-22 2013-01-10 Ulvac Japan Ltd Vacuum processing apparatus

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