JPS6428823A - Plasma processor - Google Patents
Plasma processorInfo
- Publication number
- JPS6428823A JPS6428823A JP18339687A JP18339687A JPS6428823A JP S6428823 A JPS6428823 A JP S6428823A JP 18339687 A JP18339687 A JP 18339687A JP 18339687 A JP18339687 A JP 18339687A JP S6428823 A JPS6428823 A JP S6428823A
- Authority
- JP
- Japan
- Prior art keywords
- window part
- temperature
- chamber
- plasma processing
- highly reliable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
PURPOSE:To enable highly reliable plasma processing to be performed by a method wherein a heating means to keep the inner wall surface of the transparent body in a chamber in a constant temperature state is provided to compensate the temperature of a part of the transparent body susceptible to temperature decline. CONSTITUTION:A window part 14 comprising quartz glass is made on one side of a chamber 2. The window part 14 is formed of two disc type quartz glass sheets 14a, 14b mutually abutted against. A hot wire layer 15 provided on one surface of the glass sheets 14a, 14b by evaporation of Al alloy etc., with electric resistance value thereof controlled. When the hot wire layer 15 is heated, the temperature of the window part 14 is prevented from declining to restrain a deposited film from growing on the window part 14. Within the window part 14, high phototransmission is kept on and wavelength is detected with excellent precision for a long time. Through these procedures, highly reliable plasma processing can be performed.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18339687A JPS6428823A (en) | 1987-07-24 | 1987-07-24 | Plasma processor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18339687A JPS6428823A (en) | 1987-07-24 | 1987-07-24 | Plasma processor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6428823A true JPS6428823A (en) | 1989-01-31 |
Family
ID=16135046
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18339687A Pending JPS6428823A (en) | 1987-07-24 | 1987-07-24 | Plasma processor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6428823A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02304920A (en) * | 1989-05-19 | 1990-12-18 | Hitachi Ltd | Plasma treater |
US5266154A (en) * | 1991-04-26 | 1993-11-30 | Sony Corporation | Dry etching method |
JP2013008755A (en) * | 2011-06-22 | 2013-01-10 | Ulvac Japan Ltd | Vacuum processing apparatus |
-
1987
- 1987-07-24 JP JP18339687A patent/JPS6428823A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02304920A (en) * | 1989-05-19 | 1990-12-18 | Hitachi Ltd | Plasma treater |
US5266154A (en) * | 1991-04-26 | 1993-11-30 | Sony Corporation | Dry etching method |
JP2013008755A (en) * | 2011-06-22 | 2013-01-10 | Ulvac Japan Ltd | Vacuum processing apparatus |
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