JPS6428377A - Production of silicon dioxide film - Google Patents

Production of silicon dioxide film

Info

Publication number
JPS6428377A
JPS6428377A JP18456987A JP18456987A JPS6428377A JP S6428377 A JPS6428377 A JP S6428377A JP 18456987 A JP18456987 A JP 18456987A JP 18456987 A JP18456987 A JP 18456987A JP S6428377 A JPS6428377 A JP S6428377A
Authority
JP
Japan
Prior art keywords
silicon dioxide
dioxide film
production
soln
base material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18456987A
Other languages
Japanese (ja)
Inventor
Takuji Aida
Hirotsugu Nagayama
Akimitsu Hishinuma
Hideo Kawahara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Sheet Glass Co Ltd
Original Assignee
Nippon Sheet Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Sheet Glass Co Ltd filed Critical Nippon Sheet Glass Co Ltd
Priority to JP18456987A priority Critical patent/JPS6428377A/en
Publication of JPS6428377A publication Critical patent/JPS6428377A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
  • Chemically Coating (AREA)

Abstract

PURPOSE:To obtain a dense film when a treating soln. contg. hydrosilicofluoric acid, etc., is brought into contact with a base material to deposit a silicon dioxide film on the surface, by heating the treating soln. to a prescribed temp. before the contact. CONSTITUTION:An aq. hydrosilicofluoric acid soln. contg. silicon dioxide in a supersatd. state is prepd. and heated to 60-70 deg.C to obtain a treating soln. This treating soln. is brought into contact with a base material to deposit a silicon dioxide film on the surface of the base material.
JP18456987A 1987-07-23 1987-07-23 Production of silicon dioxide film Pending JPS6428377A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18456987A JPS6428377A (en) 1987-07-23 1987-07-23 Production of silicon dioxide film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18456987A JPS6428377A (en) 1987-07-23 1987-07-23 Production of silicon dioxide film

Publications (1)

Publication Number Publication Date
JPS6428377A true JPS6428377A (en) 1989-01-30

Family

ID=16155500

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18456987A Pending JPS6428377A (en) 1987-07-23 1987-07-23 Production of silicon dioxide film

Country Status (1)

Country Link
JP (1) JPS6428377A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1992007793A1 (en) * 1990-10-25 1992-05-14 Nippon Sheet Glass Company, Limited Process for preparing silicon dioxide coating
US5153035A (en) * 1990-09-29 1992-10-06 Nippon Sheet Glass Co., Ltd. Process for forming silica films

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61281047A (en) * 1985-06-06 1986-12-11 Nippon Sheet Glass Co Ltd Production of silicon dioxide coating film

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61281047A (en) * 1985-06-06 1986-12-11 Nippon Sheet Glass Co Ltd Production of silicon dioxide coating film

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5153035A (en) * 1990-09-29 1992-10-06 Nippon Sheet Glass Co., Ltd. Process for forming silica films
WO1992007793A1 (en) * 1990-10-25 1992-05-14 Nippon Sheet Glass Company, Limited Process for preparing silicon dioxide coating
US5326720A (en) * 1990-10-25 1994-07-05 Nippon Sheet Glass Co., Ltd. Method for producing silicon dioxide film which prevents escape of Si component to the environment

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