JPS642324A - Centrifugal drying device - Google Patents

Centrifugal drying device

Info

Publication number
JPS642324A
JPS642324A JP15691487A JP15691487A JPS642324A JP S642324 A JPS642324 A JP S642324A JP 15691487 A JP15691487 A JP 15691487A JP 15691487 A JP15691487 A JP 15691487A JP S642324 A JPS642324 A JP S642324A
Authority
JP
Japan
Prior art keywords
drying chamber
bearing part
gas
cover
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15691487A
Other languages
Japanese (ja)
Other versions
JPH012324A (en
Inventor
Atsuji Matsuwaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP15691487A priority Critical patent/JPS642324A/en
Publication of JPH012324A publication Critical patent/JPH012324A/en
Publication of JPS642324A publication Critical patent/JPS642324A/en
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Solid Materials (AREA)
  • Centrifugal Separators (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE: To prevent the adhesion to a substrate of the particles generated on a bearing part by a method wherein a cover which covers a bearing part is provided in the drying chamber of the bearing part, gas is introduced into the cover, and the inside of the cover is maintained at the pressure higher than that of the drying chamber.
CONSTITUTION: The housing case 2 of semiconductor substrate 1 is revolved by a driving power source 6, the moisture adhered to the substrate 1 is scattered by centrifugal force, and ti is discharged by the air stream 11 flowing from an air inlet 7 to an exhaust pipe 8. A cover 9, with which a bearing part 4 is covered, is provided inside a drying chamber 5, the gas pressure in the cover 9 is maintained higher than that of the outside drying chamber 5 by feeding particle-less gas from a gas piping 10, and a gas stream 12 going to outside the drying chamber 5 through a bearing part 4 is formed. The particles generated by the bearing part are discharged outside from the drying chamber 5 through an exhaust pipe 8 together with a part of the gas fed from the gas piping 10, and the particles can be prevented from adhering to the substrate.
COPYRIGHT: (C)1989,JPO&Japio
JP15691487A 1987-06-24 1987-06-24 Centrifugal drying device Pending JPS642324A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15691487A JPS642324A (en) 1987-06-24 1987-06-24 Centrifugal drying device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15691487A JPS642324A (en) 1987-06-24 1987-06-24 Centrifugal drying device

Publications (2)

Publication Number Publication Date
JPH012324A JPH012324A (en) 1989-01-06
JPS642324A true JPS642324A (en) 1989-01-06

Family

ID=15638138

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15691487A Pending JPS642324A (en) 1987-06-24 1987-06-24 Centrifugal drying device

Country Status (1)

Country Link
JP (1) JPS642324A (en)

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