JPS6419660A - Ion beam irradiation device - Google Patents

Ion beam irradiation device

Info

Publication number
JPS6419660A
JPS6419660A JP17434187A JP17434187A JPS6419660A JP S6419660 A JPS6419660 A JP S6419660A JP 17434187 A JP17434187 A JP 17434187A JP 17434187 A JP17434187 A JP 17434187A JP S6419660 A JPS6419660 A JP S6419660A
Authority
JP
Japan
Prior art keywords
ion
ion beams
filament
enclose
extending
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17434187A
Other languages
Japanese (ja)
Inventor
Masayasu Nigami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissin Electric Co Ltd
Original Assignee
Nissin Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissin Electric Co Ltd filed Critical Nissin Electric Co Ltd
Priority to JP17434187A priority Critical patent/JPS6419660A/en
Publication of JPS6419660A publication Critical patent/JPS6419660A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To make it possible to uniform the space distribution of ion beams extending for a wide sphere by so arranging a filament for emitting thermoelectron as to enclose ion beams drawn out from the ion source ahead in the drawing out direction of the ion beams from the ion source. CONSTITUTION:Plural insulation poles 22 are so provided as to enclose the circumference of a drawing out electrode system 12 at the front of a housing 14 for the ion source 4, and a filament 24 for emitting thermoelectron is so arranged as to enclose ion beams 16 drawn out from the ion source 4 by mounting to this insulation poles 22. To this filament 24 is connected a filament power source 26 for heating it between both ends and an accelerating power source 28 for accelerating thermoelectrons emitted to one end and an earth. Hereby, space distribution of ion beams can be uniformed extending for a wide sphere, accordingly it becomes possible to irradiate ion beams uniformly to a substance to be irradiated extending for a wide sphere inside the face.
JP17434187A 1987-07-13 1987-07-13 Ion beam irradiation device Pending JPS6419660A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17434187A JPS6419660A (en) 1987-07-13 1987-07-13 Ion beam irradiation device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17434187A JPS6419660A (en) 1987-07-13 1987-07-13 Ion beam irradiation device

Publications (1)

Publication Number Publication Date
JPS6419660A true JPS6419660A (en) 1989-01-23

Family

ID=15976945

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17434187A Pending JPS6419660A (en) 1987-07-13 1987-07-13 Ion beam irradiation device

Country Status (1)

Country Link
JP (1) JPS6419660A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03291375A (en) * 1990-04-05 1991-12-20 Matsushita Electric Ind Co Ltd Ion source apparatus and production of continuous vapor deposition medium
JP2002518809A (en) * 1998-06-19 2002-06-25 スプリオン リミテッド Apparatus and method for charged particles

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03291375A (en) * 1990-04-05 1991-12-20 Matsushita Electric Ind Co Ltd Ion source apparatus and production of continuous vapor deposition medium
JP2002518809A (en) * 1998-06-19 2002-06-25 スプリオン リミテッド Apparatus and method for charged particles

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