JPS641895B2 - - Google Patents

Info

Publication number
JPS641895B2
JPS641895B2 JP13154080A JP13154080A JPS641895B2 JP S641895 B2 JPS641895 B2 JP S641895B2 JP 13154080 A JP13154080 A JP 13154080A JP 13154080 A JP13154080 A JP 13154080A JP S641895 B2 JPS641895 B2 JP S641895B2
Authority
JP
Japan
Prior art keywords
annealing
blackening
rust
mask
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP13154080A
Other languages
Japanese (ja)
Other versions
JPS5757448A (en
Inventor
Masaharu Kanto
Hisato Kihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP13154080A priority Critical patent/JPS5757448A/en
Publication of JPS5757448A publication Critical patent/JPS5757448A/en
Publication of JPS641895B2 publication Critical patent/JPS641895B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02Manufacture of electrodes or electrode systems
    • H01J9/14Manufacture of electrodes or electrode systems of non-emitting electrodes
    • H01J9/142Manufacture of electrodes or electrode systems of non-emitting electrodes of shadow-masks for colour television tubes
    • H01J9/146Surface treatment, e.g. blackening, coating

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)

Description

【発明の詳細な説明】 本発明はカラー受像管に装着されるシヤドウマ
スクの製造方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a shadow mask attached to a color picture tube.

カラーブラウン管は稼動時に陽極電圧として30
〜20KVと云う高電圧が印加されているため、管
内にダストが発生すればスパークが発生し、スク
リーン上の映像を乱すことになる。このダストを
シヤドウマスクに関して云えば黒化膜や錆の脱落
したものおよびシヤドウマスクをマスクフレーム
に溶接する場合に発生するスプラツシユなどがあ
る。
The color cathode ray tube has an anode voltage of 30 when in operation.
Since a high voltage of ~20KV is applied, if dust is generated inside the tube, sparks will be generated and the image on the screen will be disturbed. With respect to the shadow mask, this dust includes fallen blackened films and rust, and splash generated when the shadow mask is welded to the mask frame.

周知の通り、カラーブラウン管の製造工程には
スタビライズ工程、フイルムベーキング工程、封
着工程、排気工程など370〜460℃の加熱工程が数
回あり、この場合シヤドウマスクに黒化膜がなか
つたり、また黒化膜が薄かつたりすると、それら
熱工程を行なうことにより、0.1〜0.18厚の薄鉄
板からなるシヤドウマスクには錆が発生しやす
く、かつシヤドウマスクに小さな衝撃を与えても
比較的大きな振動となるため錆のような付着力の
弱いものは簡単に脱落してしまう。
As is well known, the manufacturing process for color cathode ray tubes involves several heating processes at temperatures of 370 to 460°C, including the stabilizing process, film baking process, sealing process, and exhaust process. When the film is thin and smooth, the shadow mask, which is made of a thin iron plate with a thickness of 0.1 to 0.18, is likely to rust due to these thermal processes, and even a small impact on the shadow mask will cause relatively large vibrations. Items with weak adhesion, such as rust, will easily fall off.

逆に黒化膜が厚過ぎると、マスクフレームとの
溶接時にスプラツシユが多発し、そのため溶接強
度も低下する欠点があるため通常シヤドウマスク
の黒化膜の厚さは1.5〜3μとすることが望ましい。
On the other hand, if the blackened film is too thick, splashes will occur frequently during welding with the mask frame, which will reduce the welding strength.

次にシヤドウマスクの製造工程について述べる
と、(1)長尺のシヤドウマスク部材をクリーニング
し両主面に感光樹脂被膜を形成する工程、(2)所定
のネガパターンマスクを使用して露光現像する工
程、(3)エツチングにより多数の電子ビーム通過孔
部及び抜き取りラインを形成する工程、(4)抜き取
りラインに沿つて抜き取りフラツトマスクを形成
する工程、(5)焼純レベリングプレス成形する工
程、(6)脱脂、黒化する工程が主な工程である。
Next, the manufacturing process of the shadow mask will be described: (1) a process of cleaning a long shadow mask member and forming a photosensitive resin film on both main surfaces; (2) a process of exposing and developing using a predetermined negative pattern mask; (3) Forming a large number of electron beam passage holes and extraction lines by etching, (4) Forming a extraction flat mask along the extraction lines, (5) Performing sintered leveling press molding, (6) Degreasing. The main process is blackening.

このうち(4)の工程で形成されたフラツトマスク
は(5)の工程を行なうまでの間、短かくて1週間、
長いと数ケ月の間、そのまま保存されるのが通常
であり、その間防錆紙などで包装しておかなけれ
ば錆の発生は避けられない。この場合次工程であ
る焼鈍は例えばH2=1:4の混合ガス中で600゜
〜950℃の還元性雰囲気で行なうので、錆自体は
還元できるが微細な電子ビーム通過孔部の部分に
表面より盛り上るように発生した錆は還元しても
形状はそのまま残り電子ビーム通過孔部の形状が
くずれ、スクリーンの露光、電子ビームの通過に
悪影響を与えることになり、最終的には良い再生
画面が得られないことになる。従つて焼鈍を還元
性雰囲気で行なう場合でもフラツトマスクは防錆
処置をして保存しておかなければならない。
The flat mask formed in step (4) will last for at least one week until step (5) is performed.
It is normal for items to be stored as is for several months at most, and if they are not wrapped in anti-rust paper during that time, rusting will be inevitable. In this case, the next step, annealing, is performed in a reducing atmosphere of 600° to 950°C in a mixed gas of H 2 = 1:4, for example, so the rust itself can be reduced, but the surface of the fine electron beam passage hole is Even if the rust that grows up is reduced, it will remain in the same shape and the shape of the electron beam passage hole will be distorted, which will have a negative effect on the exposure of the screen and the passage of the electron beam. will not be obtained. Therefore, even when annealing is performed in a reducing atmosphere, the flat mask must be preserved with anti-corrosion treatment.

また前述のようにフラツトマスクの焼鈍は還元
性の雰囲気で行なうが、その理由は焼鈍温度が
600〜950℃と高温であるため、これを酸化性の雰
囲気にすると表面がほとんど錆てしまい、この錆
の悪影響は前述した通りであり、その上、錆が発
生した状態でCO2:O2:N2=8〜13%:約0.2
%:残の混合ガス中で580〜620℃の雰囲気で黒化
しても黒化膜の付着力は通常の場合よりもはるか
に低く、その悪影響も明白である。また還元雰囲
気にするため多量の水素を使用しており、その爆
発を防止するため、炉には種々の安全策が必要と
なつている。更に昨今の資料事情によりガス、電
力などの価格の上昇はすさまじく、シヤドウマス
クの製造価格の上昇を招いている。その代表的な
ものは焼鈍工程での水素ガス、電力、黒化工程で
の都市ガス(これを燃焼させて黒化用ガスとす
る)電力である。
Also, as mentioned above, flat masks are annealed in a reducing atmosphere, and the reason for this is that the annealing temperature is
Since the temperature is 600 to 950℃, if it is placed in an oxidizing atmosphere, most of the surface will rust, and the negative effects of this rust are as described above.Furthermore, in the state where rust occurs, CO 2 : O 2 : N2 =8~13%: approx. 0.2
%: Even when blackened in an atmosphere of 580 to 620°C in the remaining mixed gas, the adhesion of the blackened film is much lower than in the normal case, and its negative effects are obvious. Additionally, a large amount of hydrogen is used to create a reducing atmosphere, and the furnace requires various safety measures to prevent explosions. Furthermore, due to the recent material situation, the prices of gas, electricity, etc. have risen dramatically, leading to an increase in the manufacturing price of shadow masks. Typical examples include hydrogen gas and electricity in the annealing process, and city gas (which is combusted to produce blackening gas) and electricity in the blackening process.

本発明は前述した従来の諸問題点に鑑みなされ
たものであり、良好な特性を有するシヤドウマス
クを省資源により製造することが可能なシヤドウ
マスクの製造方法を提供することを目的としてい
る。
The present invention has been made in view of the above-mentioned conventional problems, and an object of the present invention is to provide a method for manufacturing a shadow mask that can manufacture a shadow mask having good characteristics while saving resources.

発明者らは省資源の目的で前述した焼鈍と黒化
とを同時に行ない得る方法について種々実験した
結果、焼鈍をある種のガスで行なえばその目的を
達することを見出した。
The inventors conducted various experiments on methods of simultaneously performing the above-mentioned annealing and blackening for the purpose of resource saving, and found that the purpose could be achieved if annealing was performed using a certain type of gas.

次に本発明の第1の実施例を説明する。 Next, a first embodiment of the present invention will be described.

即ち露点−10〜40゜のウエツトN2で600〜950℃
の雰囲気中でフラツトマスクを焼鈍すると0.2〜
0.8μ厚の黒化膜が出来る。しかし、この膜厚は薄
いので、このままカラーブラウン管の製造工程に
流すと錆が発生し易いので、通常のCO2:O2
N2=8〜13%:約0.2%:残の混合ガス中で2度
目の黒化を行なうが、この時の黒化の温度は従来
よりも20〜30℃低下させ、560〜580℃で行なつて
も黒化の膜厚は1.5〜3μにすることが出来る。ま
た焼鈍炉に水素を使用しないので、水素の爆発に
対する安全策は全くなくなり、またエツチング工
程の乾燥部を延長してエツチングと焼鈍とを連続
して行なえるようになり、フラツトマスクは焼鈍
および軽度の黒化済のものとなるのでフラツトマ
スクで保存しておいても錆ることはほとんどなく
なり、またエツチング工程の乾燥部を延長してエ
ツチングと焼鈍とを連続して行なえるようにな
り、フラツトマスクは焼鈍および軽度の黒化済の
ものとなるのでフラツトマスクで保存しておいて
も錆ることはほとんどなりなり、防錆紙による包
装は不要となつた。また本実施例によつて製造さ
れたシヤドウマスクの機械的特性は従来品と差が
なく、プレス成形も全く問題なく行なうことが出
来た。
That is, 600 to 950 degrees Celsius at wet N2 with a dew point of -10 to 40 degrees.
When a flat mask is annealed in an atmosphere of 0.2~
A blackened film with a thickness of 0.8μ is formed. However, since this film is thin, it is easy to rust if it is sent to the color cathode ray tube manufacturing process.
N 2 = 8 to 13%: Approx. 0.2%: A second blackening is performed in the remaining mixed gas, but the blackening temperature at this time is lowered by 20 to 30 degrees Celsius than before, and is set at 560 to 580 degrees Celsius. Even if this is done, the thickness of the blackened film can be made 1.5 to 3μ. Also, since hydrogen is not used in the annealing furnace, there is no safety measure against hydrogen explosions, and the drying section of the etching process can be extended to allow etching and annealing to be performed continuously, making the flat mask suitable for annealing and mild etching. Since it is already blackened, it will hardly rust even if it is stored in a flat mask, and the drying part of the etching process can be extended so that etching and annealing can be performed continuously. And since it is slightly blackened, it will hardly rust even if it is stored in a flat mask, and there is no need to wrap it in anti-rust paper. Furthermore, the mechanical properties of the shadow mask manufactured according to this example were the same as those of conventional products, and press molding could be carried out without any problem.

本実施例に於て水蒸気量を更に増加させると黒
化膜をより厚く形成できるが、ガスライン配管や
炉の出入口で余分な水蒸気が水滴となつて凝縮
し、焼鈍中のフラツトマスク上に落下し錆を発生
させるしまた水蒸気量が少ない場合は黒化膜の膜
厚が薄く所望の効果が得られないことは明白であ
る。
In this example, if the amount of water vapor is further increased, the blackened film can be formed thicker, but the excess water vapor condenses into water droplets at the gas line piping and the entrance/exit of the furnace, and falls onto the flat mask during annealing. It is obvious that rust will occur and if the amount of water vapor is small, the thickness of the blackened film will be too thin and the desired effect will not be obtained.

次に本発明の第2の実施例を説明する。 Next, a second embodiment of the present invention will be described.

即ちCO2:O2:N2:0.5〜8%(温度に応じて
変える):微量:残の混合ガス中で600〜950℃の
雰囲気中で焼鈍させる。この混合ガスは従来の黒
化に使用する燃焼ガス(CO2)をそのまま用いる
わけであるが、焼鈍の温度は600〜950℃と高いの
で反応速度が早くなるため燃焼ガスを温度が高い
程、薄くする必要がある。例えば600℃で1のも
のを700では1/2、800℃では1/5〜6、900℃では
1/10〜12とし薄めるためには窒素ガスを使用する。
That is, annealing is carried out in an atmosphere of 600 to 950° C. in a mixed gas of CO 2 :O 2 :N 2 :0.5 to 8% (varies depending on temperature): trace amount: remainder. This mixed gas uses the combustion gas (CO 2 ) used in conventional blackening, but since the annealing temperature is high at 600 to 950°C, the reaction rate becomes faster, so the higher the temperature of the combustion gas, the more It needs to be thin. For example, nitrogen gas is used to dilute 1 at 600°C to 1/2 at 700, 1/5 to 6 at 800°C, and 1/10 to 12 at 900°C.

本実施例の場合も第1の実施例と同じく、水素
を使用しないので炉の爆発に対する安全策は不要
であり、エツチング工程の乾燥部を延長してエツ
チングと焼鈍とを連続して行なえるようになり、
フラツトマスクは焼鈍および黒化済のものとなる
のでフラツトマスクで保存しておいても錆ること
はほとんどなくなり防錆紙による包装は不要とな
つた。本実施例の場合焼鈍工程で1.5〜3μ厚の黒
化膜が形成されるのでプレス成形時に局部的に黒
化膜に割れが生じこの部分に錆を発生させる可能
性があるので成形後に露点−10〜40℃のウエツト
窒素中で20〜450℃の低温で軽度の黒化を行なう
ことが望ましい。
In the case of this embodiment, as in the first embodiment, since hydrogen is not used, there is no need for safety measures against furnace explosions, and the drying section of the etching process is extended so that etching and annealing can be performed continuously. become,
Since the flat mask has been annealed and blackened, it will hardly rust even if it is stored as a flat mask, and there is no need to wrap it in anti-rust paper. In the case of this example, a blackened film with a thickness of 1.5 to 3μ is formed during the annealing process, so cracks may occur locally in the blackened film during press molding, and rust may occur in these areas. It is desirable to carry out slight blackening at a low temperature of 20 to 450°C in wet nitrogen at 10 to 40°C.

本実施例より製造されたシヤドウマスクの機械
的特性は従来品と差がなく、プレス成形も全く問
題なく行なうことが出来た。
The mechanical properties of the shadow mask manufactured in this example were the same as those of conventional products, and press molding could be performed without any problems.

ただし脱炭焼鈍を行なう必要のある材質の場合
には雰囲気を露点0〜20℃のウエツトな状態にす
ることは勿論である。
However, if the material requires decarburization annealing, the atmosphere should of course be kept in a wet state with a dew point of 0 to 20°C.

上述のように本発明の補充的な黒化を必要と
し、含有量を比較的厳しくコントロールしなけれ
ばならないが、窒素中に種々の酸化性ガスを含有
させ焼鈍と黒化とを同時に行なうことができ、高
価な水素ガスの使用を無くし、補充的な黒化温度
も従来よりも低くすることができ、電力を節約す
ることが可能となり、またエツチング工程と焼鈍
工程とを連続させ、焼鈍と黒化かすみ放置してお
いても錆の発生のないフラツトマスクの供給が可
能となつた。
As mentioned above, the present invention requires supplementary blackening, and the content must be controlled relatively strictly, but it is possible to contain various oxidizing gases in nitrogen and perform annealing and blackening at the same time. This makes it possible to eliminate the use of expensive hydrogen gas, lower the supplementary blackening temperature than before, and save electricity.Also, by making the etching process and annealing process continuous, the annealing and blackening It is now possible to supply a flat mask that will not rust even if left undisturbed.

Claims (1)

【特許請求の範囲】[Claims] 1 電子ビームの通過孔部の穿孔されたフラツト
マスクを窒素ガスに少くとも水蒸気または炭酸ガ
スと微量の酸素とを含有させた雰囲気中で焼鈍と
黒化とを同時に行ない、プレス成形後に補充の黒
化を行なうようにしたことを特徴とするシヤドウ
マスクの製造方法。
1. Annealing and blackening are performed simultaneously on a flat mask with a perforated electron beam passage hole in an atmosphere containing nitrogen gas, at least water vapor or carbon dioxide gas, and a trace amount of oxygen, and replenishing blackening is performed after press forming. A method for manufacturing a shadow mask, characterized by performing the following steps.
JP13154080A 1980-09-24 1980-09-24 Production of shadow mask Granted JPS5757448A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13154080A JPS5757448A (en) 1980-09-24 1980-09-24 Production of shadow mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13154080A JPS5757448A (en) 1980-09-24 1980-09-24 Production of shadow mask

Publications (2)

Publication Number Publication Date
JPS5757448A JPS5757448A (en) 1982-04-06
JPS641895B2 true JPS641895B2 (en) 1989-01-13

Family

ID=15060459

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13154080A Granted JPS5757448A (en) 1980-09-24 1980-09-24 Production of shadow mask

Country Status (1)

Country Link
JP (1) JPS5757448A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59105243A (en) * 1982-12-07 1984-06-18 Toshiba Corp Manufacture of shadow mask
JPS61116734A (en) * 1984-11-12 1986-06-04 Mitsubishi Electric Corp Forming of blackened film of steel plate parts for color cathode-ray tube
JP2599489B2 (en) * 1990-07-09 1997-04-09 三菱電機株式会社 Metal oxide film forming method and metal oxide film forming furnace
KR100437332B1 (en) * 1997-08-20 2004-07-16 삼성에스디아이 주식회사 Method for improving vibration resistance of shadow mask, including steps of disposing shadow mask in closed vessel, introducing mixture gas of nitrogen and oxygen into closed vessel, and performing heat treatment

Also Published As

Publication number Publication date
JPS5757448A (en) 1982-04-06

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