JPS6418072A - Detecting apparatus for voltage - Google Patents
Detecting apparatus for voltageInfo
- Publication number
- JPS6418072A JPS6418072A JP62174535A JP17453587A JPS6418072A JP S6418072 A JPS6418072 A JP S6418072A JP 62174535 A JP62174535 A JP 62174535A JP 17453587 A JP17453587 A JP 17453587A JP S6418072 A JPS6418072 A JP S6418072A
- Authority
- JP
- Japan
- Prior art keywords
- substance
- voltages
- grid
- measured
- shaped
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Tests Of Electronic Circuits (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Measuring Instrument Details And Bridges, And Automatic Balancing Devices (AREA)
- Measurement Of Current Or Voltage (AREA)
Abstract
PURPOSE:To enable the simultaneous detection of voltages at a plurality of specified positions of a substance to be measured, by a method wherein a light beam from a light source is divided into a number of beams in a desired pattern and made to enter each specified part of an electrooptical material corresponding to a specified position of the substance to be measured. CONSTITUTION:The refractive indexes of the local parts of an electrooptical material 2 corresponding to voltages at a plurality of two-dimensional positions of a substance 3 to be measured are varied by these voltages. When a number of light beams divided in a grid-shaped pattern by a microlens array 5 proceed through a grid-shaped pattern in the material 2, accordingly, the polarized states of the beams are varied respectively by variations in a refractive index due to the voltages at the grid-shaped positions of the substance 3 located just below the material, and the polarized beams are outputted as emission lights from the material 2. These emission lights are given further to an analyzer 7 through a beam splitter 6. Since the intensity of each emission light is varied by the variation in the refractive index of the local part of the material 2 accompanying the variation in the voltage at each grid-shaped position of the substance 3 to be measured, only the voltages at the two-dimensional grid-shaped positions of the substance 3 can be detected simultaneously in a detector 9 on the basis of the variations in the intensities of the emission lights.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62174535A JPH0820470B2 (en) | 1987-07-13 | 1987-07-13 | Voltage detector |
EP88111142A EP0299432B1 (en) | 1987-07-13 | 1988-07-12 | A voltage detecting device |
US07/217,790 US4906922A (en) | 1987-07-13 | 1988-07-12 | Voltage mapping device having fast time resolution |
DE3889986T DE3889986T2 (en) | 1987-07-13 | 1988-07-12 | Arrangement of a voltage detector. |
US07/460,645 US5034683A (en) | 1987-07-13 | 1990-01-03 | Voltage detecting device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62174535A JPH0820470B2 (en) | 1987-07-13 | 1987-07-13 | Voltage detector |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6418072A true JPS6418072A (en) | 1989-01-20 |
JPH0820470B2 JPH0820470B2 (en) | 1996-03-04 |
Family
ID=15980232
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62174535A Expired - Fee Related JPH0820470B2 (en) | 1987-07-13 | 1987-07-13 | Voltage detector |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0820470B2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0427843A (en) * | 1989-08-02 | 1992-01-30 | Hamamatsu Photonics Kk | Low noise pulse light source using laser diode and voltage detector using the light source |
EP0701140A2 (en) | 1994-09-07 | 1996-03-13 | Hamamatsu Photonics K.K. | Checking apparatus for array electrode substrate |
JPH08146051A (en) * | 1994-11-21 | 1996-06-07 | Nec Corp | Eo probe |
JP2008177579A (en) * | 2007-01-22 | 2008-07-31 | Wafermasters Inc | Dynamic wafer stress management system |
-
1987
- 1987-07-13 JP JP62174535A patent/JPH0820470B2/en not_active Expired - Fee Related
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0427843A (en) * | 1989-08-02 | 1992-01-30 | Hamamatsu Photonics Kk | Low noise pulse light source using laser diode and voltage detector using the light source |
EP0701140A2 (en) | 1994-09-07 | 1996-03-13 | Hamamatsu Photonics K.K. | Checking apparatus for array electrode substrate |
US5621521A (en) * | 1994-09-07 | 1997-04-15 | Hamamatsu Photonics K.K. | Checking apparatus for array electrode substrate |
JPH08146051A (en) * | 1994-11-21 | 1996-06-07 | Nec Corp | Eo probe |
JP2008177579A (en) * | 2007-01-22 | 2008-07-31 | Wafermasters Inc | Dynamic wafer stress management system |
Also Published As
Publication number | Publication date |
---|---|
JPH0820470B2 (en) | 1996-03-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |