JPS6413145A - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
JPS6413145A
JPS6413145A JP16944487A JP16944487A JPS6413145A JP S6413145 A JPS6413145 A JP S6413145A JP 16944487 A JP16944487 A JP 16944487A JP 16944487 A JP16944487 A JP 16944487A JP S6413145 A JPS6413145 A JP S6413145A
Authority
JP
Japan
Prior art keywords
compd
contg
pyrylium
meth
acrylate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16944487A
Other languages
Japanese (ja)
Inventor
Ryuji Ueda
Hirotake Marumichi
Yoshihiro Mori
Noriyoshi Iwamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Osaka Organic Chemical Industry Co Ltd
Toppan Inc
Original Assignee
Osaka Organic Chemical Industry Co Ltd
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Osaka Organic Chemical Industry Co Ltd, Toppan Printing Co Ltd filed Critical Osaka Organic Chemical Industry Co Ltd
Priority to JP16944487A priority Critical patent/JPS6413145A/en
Publication of JPS6413145A publication Critical patent/JPS6413145A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Abstract

PURPOSE:To obtain a photoset matter which has high transparency while having sensitivity up to a visible part by incorporating the copolymer of a specific acrylic acid system and at least either of a quinone compd. or pyrylium compd. into the titled compsn. CONSTITUTION:Certain kind of the quinone compd. or pyrylium compd. is added as a photosensitive agent to a monomer contg. a hydroxyl group as a reaction group to obtain a photoset image, nitrogen-contg. monomer having the structure of ternary amine or quaternary ammonium salt and the copolymer contg. these monomers. The hydroxyl group-contg. monomer which causes a photosetting reaction with the quinone compd. or pyrylium compd. as the photosensitive agent includes hydroxyethyl (meth)acrylate, epsilon-caprolactone addition product of the hydroxyethyl (meth)acrylate, hydroxybutyl (meth)acrylate, etc. These monomers are preferably used in 10-40wt.% ratio. The photosensitivity even to the visible light region is thereby obtd. and the transparency of the resultant cured resin film is improved.
JP16944487A 1987-07-07 1987-07-07 Photosensitive resin composition Pending JPS6413145A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16944487A JPS6413145A (en) 1987-07-07 1987-07-07 Photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16944487A JPS6413145A (en) 1987-07-07 1987-07-07 Photosensitive resin composition

Publications (1)

Publication Number Publication Date
JPS6413145A true JPS6413145A (en) 1989-01-18

Family

ID=15886717

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16944487A Pending JPS6413145A (en) 1987-07-07 1987-07-07 Photosensitive resin composition

Country Status (1)

Country Link
JP (1) JPS6413145A (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5489622A (en) * 1977-12-01 1979-07-16 Toyo Boseki Production of photosensitive resin plate
JPS58199342A (en) * 1982-05-17 1983-11-19 Sekisui Chem Co Ltd Photosetting resin composition
JPS59142205A (en) * 1983-02-02 1984-08-15 Nippon Oil & Fats Co Ltd Highly sensitive photoinitiator composition

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5489622A (en) * 1977-12-01 1979-07-16 Toyo Boseki Production of photosensitive resin plate
JPS58199342A (en) * 1982-05-17 1983-11-19 Sekisui Chem Co Ltd Photosetting resin composition
JPS59142205A (en) * 1983-02-02 1984-08-15 Nippon Oil & Fats Co Ltd Highly sensitive photoinitiator composition

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