JPS6410252B2 - - Google Patents
Info
- Publication number
- JPS6410252B2 JPS6410252B2 JP60241404A JP24140485A JPS6410252B2 JP S6410252 B2 JPS6410252 B2 JP S6410252B2 JP 60241404 A JP60241404 A JP 60241404A JP 24140485 A JP24140485 A JP 24140485A JP S6410252 B2 JPS6410252 B2 JP S6410252B2
- Authority
- JP
- Japan
- Prior art keywords
- adsorber
- valve
- temperature
- line
- adsorption device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 claims description 34
- 239000001307 helium Substances 0.000 claims description 16
- 229910052734 helium Inorganic materials 0.000 claims description 16
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 16
- 238000001179 sorption measurement Methods 0.000 claims description 14
- 238000005057 refrigeration Methods 0.000 claims description 9
- 230000008929 regeneration Effects 0.000 claims description 8
- 238000011069 regeneration method Methods 0.000 claims description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 20
- 239000007789 gas Substances 0.000 description 13
- 229910052757 nitrogen Inorganic materials 0.000 description 10
- 239000007788 liquid Substances 0.000 description 9
- 238000001816 cooling Methods 0.000 description 8
- 239000012535 impurity Substances 0.000 description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- 239000003463 adsorbent Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J1/00—Processes or apparatus for liquefying or solidifying gases or gaseous mixtures
- F25J1/003—Processes or apparatus for liquefying or solidifying gases or gaseous mixtures characterised by the kind of cold generation within the liquefaction unit for compensating heat leaks and liquid production
- F25J1/0047—Processes or apparatus for liquefying or solidifying gases or gaseous mixtures characterised by the kind of cold generation within the liquefaction unit for compensating heat leaks and liquid production using an "external" refrigerant stream in a closed vapor compression cycle
- F25J1/005—Processes or apparatus for liquefying or solidifying gases or gaseous mixtures characterised by the kind of cold generation within the liquefaction unit for compensating heat leaks and liquid production using an "external" refrigerant stream in a closed vapor compression cycle by expansion of a gaseous refrigerant stream with extraction of work
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J1/00—Processes or apparatus for liquefying or solidifying gases or gaseous mixtures
- F25J1/006—Processes or apparatus for liquefying or solidifying gases or gaseous mixtures characterised by the refrigerant fluid used
- F25J1/0062—Light or noble gases, mixtures thereof
- F25J1/0065—Helium
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J1/00—Processes or apparatus for liquefying or solidifying gases or gaseous mixtures
- F25J1/02—Processes or apparatus for liquefying or solidifying gases or gaseous mixtures requiring the use of refrigeration, e.g. of helium or hydrogen ; Details and kind of the refrigeration system used; Integration with other units or processes; Controlling aspects of the process
- F25J1/0243—Start-up or control of the process; Details of the apparatus used; Details of the refrigerant compression system used
- F25J1/0244—Operation; Control and regulation; Instrumentation
- F25J1/0245—Different modes, i.e. 'runs', of operation; Process control
- F25J1/0249—Controlling refrigerant inventory, i.e. composition or quantity
- F25J1/025—Details related to the refrigerant production or treatment, e.g. make-up supply from feed gas itself
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J1/00—Processes or apparatus for liquefying or solidifying gases or gaseous mixtures
- F25J1/02—Processes or apparatus for liquefying or solidifying gases or gaseous mixtures requiring the use of refrigeration, e.g. of helium or hydrogen ; Details and kind of the refrigeration system used; Integration with other units or processes; Controlling aspects of the process
- F25J1/0243—Start-up or control of the process; Details of the apparatus used; Details of the refrigerant compression system used
- F25J1/0257—Construction and layout of liquefaction equipments, e.g. valves, machines
- F25J1/0275—Construction and layout of liquefaction equipments, e.g. valves, machines adapted for special use of the liquefaction unit, e.g. portable or transportable devices
- F25J1/0276—Laboratory or other miniature devices
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2205/00—Processes or apparatus using other separation and/or other processing means
- F25J2205/60—Processes or apparatus using other separation and/or other processing means using adsorption on solid adsorbents, e.g. by temperature-swing adsorption [TSA] at the hot or cold end
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2270/00—Refrigeration techniques used
- F25J2270/14—External refrigeration with work-producing gas expansion loop
- F25J2270/16—External refrigeration with work-producing gas expansion loop with mutliple gas expansion loops of the same refrigerant
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2270/00—Refrigeration techniques used
- F25J2270/90—External refrigeration, e.g. conventional closed-loop mechanical refrigeration unit using Freon or NH3, unspecified external refrigeration
- F25J2270/912—Liquefaction cycle of a low-boiling (feed) gas in a cryocooler, i.e. in a closed-loop refrigerator
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Thermal Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Clinical Laboratory Science (AREA)
- Separation Of Gases By Adsorption (AREA)
- Separation By Low-Temperature Treatments (AREA)
Description
【発明の詳細な説明】
〔発明の利用分野〕
本発明は、吸着器切替え方法に係り、特にヘリ
ウム液化冷凍装置のプロセスラインに設けられた
吸着器の切替え方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a method for switching adsorbers, and particularly to a method for switching adsorbers provided in a process line of a helium liquefaction refrigeration system.
ヘリウム液化冷凍装置においては、系内に極低
温になる部位を有し不純物が存在すれば固化し、
装置の性能低下、機器の損傷を生じるため、不純
物の排除が重要である。不純物の排除には、活性
炭を吸着剤として吸着器に充填し液体窒素温度レ
ベルに吸着器を保持することにより吸着を促進す
る「活性炭低温吸着法」が一般に採用されてい
る。この方法によれば、ヘリウムガス中の不純物
の主成分の空気（窒素、酸素など）は、活性炭に
吸着され、高純度のヘリウムガスが得られる。不
純物を吸着した吸着器は、加温、減圧することに
より不純物を解放し再生される。再び、低温に保
持することにより、不純物の吸着が可能となる。
In helium liquefaction refrigeration equipment, there is a part in the system that becomes extremely low temperature, and if impurities are present, they will solidify.
It is important to eliminate impurities because they can cause deterioration in equipment performance and damage to equipment. To remove impurities, the "activated carbon low-temperature adsorption method" is generally used, which promotes adsorption by filling an adsorber with activated carbon as an adsorbent and maintaining the adsorber at a liquid nitrogen temperature level. According to this method, air (nitrogen, oxygen, etc.), which is the main component of impurities in helium gas, is adsorbed by activated carbon, and highly pure helium gas is obtained. The adsorber that has adsorbed impurities is regenerated by releasing the impurities by heating and reducing the pressure. Again, by maintaining the temperature at a low temperature, adsorption of impurities becomes possible.
吸着器をプロセスガスラインに設ける方式は、
内部吸着式と呼ばれ、閉サイクルで用いられるヘ
リウム液化冷凍装置においては有効な方式であ
る。液化冷凍運転中に、吸着器の再生を行なう必
要がある場合には、吸着器とバイパスするプロセ
スラインまたは他の吸着器を設け、切替えて運転
する。 The method of installing an adsorber in the process gas line is as follows:
This method is called an internal adsorption method and is effective in helium liquefaction refrigeration equipment used in closed cycles. If it is necessary to regenerate the adsorber during the liquefaction refrigeration operation, a process line or another adsorption device that bypasses the adsorption device is provided, and the adsorption device is operated by switching.
典型的なフローの一例を第２図に示す。 An example of a typical flow is shown in FIG.
第２図において、圧縮機１によつて圧縮された
ヘリウムガスは、熱交換器２において、液体窒素
及び低温のヘリウムガスと熱交換することにより
およそ液体窒素温度まで冷却される。冷却された
ヘリウムガスは、弁７を介して吸着器３に導か
れ、不純物を吸着除去した後、膨張機５，６及び
JT弁１０、被冷却体１２に流れ、熱交換器４，
２を経て圧縮機１の吸入側に戻る。 In FIG. 2, helium gas compressed by a compressor 1 is cooled to approximately the temperature of liquid nitrogen by exchanging heat with liquid nitrogen and low-temperature helium gas in a heat exchanger 2. The cooled helium gas is led to the adsorber 3 via the valve 7, and after adsorbing and removing impurities, it is passed through the expanders 5, 6 and
flows to the JT valve 10, the object to be cooled 12, the heat exchanger 4,
2 and returns to the suction side of the compressor 1.
ヘリウムガスの純度が十分良く、運転中に吸着
器３を再生する場合は、弁７、弁８を閉じる弁９
を開けバイパスラインを利用する。一方、弁１３
を開け常温のヘリウムガスを加温ライン１４に流
し、弁１６を開き真空ポンプ１７を運転すること
により、吸着器３を加温、減圧することができ吸
着剤は再生される。 If the purity of helium gas is sufficiently high and the adsorber 3 is regenerated during operation, valve 9 closes valve 7 and valve 8.
Open it and use the bypass line. On the other hand, valve 13
The adsorbent 3 can be heated and depressurized by opening the valve 16, allowing normal temperature helium gas to flow into the heating line 14, opening the valve 16, and operating the vacuum pump 17, and regenerating the adsorbent.
吸着器３を再びプロセスラインに組み込むに
は、弁１３、弁１６を閉じ弁２１を開けることに
より、液体窒素を冷却ライン１５に流し、吸着器
３を冷却する必要がある。吸着器３を十分に冷却
した後に、弁７、弁８を開け、弁９を閉じること
により、吸着器を再びプロセスラインに組み込む
ことができる。 In order to incorporate the adsorber 3 into the process line again, it is necessary to close the valves 13 and 16 and open the valve 21 to flow liquid nitrogen into the cooling line 15 to cool the adsorber 3. After the adsorber 3 has been sufficiently cooled, the adsorber can be incorporated into the process line again by opening valves 7 and 8 and closing valve 9.
このような装置においては、吸着器をプロセス
ラインから切り離し、液体窒素により冷却ライン
を用いて冷却するため、液体窒素温度まで冷却す
るのに時間を要し、再生時間が長くなつていた。
なお、ここでいう再生時間とは吸着器の冷却まで
を含めた一連の時間をいう。また、再生時の冷却
時間を縮め吸着器の温度が十分に下がらない間に
切り替えると、一時的にプロセスガスの温度が上
昇してプロセスのバランスをくずすことになり、
タービン入口弁、JT弁を調整する必要が生じる。 In such an apparatus, since the adsorber is separated from the process line and cooled with liquid nitrogen using a cooling line, it takes time to cool down to the liquid nitrogen temperature, resulting in a long regeneration time.
Note that the regeneration time here refers to a series of times including cooling of the adsorber. In addition, if the cooling time during regeneration is shortened and switched before the adsorber temperature has fallen sufficiently, the process gas temperature will temporarily rise and the process will become unbalanced.
It will be necessary to adjust the turbine inlet valve and JT valve.
吸着器の容量が小さい場合は、このような問題
は顕著でないが、容量が大きい場合は、顕著とな
る。 This problem is not noticeable when the capacity of the adsorber is small, but becomes noticeable when the capacity is large.
なお、この種の装置として関連するものには、
例えば、特開昭54−147174号公報がある。 Additionally, related devices of this type include:
For example, there is Japanese Patent Application Laid-Open No. 147174/1983.
本発明の目的は、ヘリウム液化冷凍装置のプロ
セスラインに設けられた吸着器の再生時間を短縮
できると共に、プロセスのバランスを乱さないで
吸着器の切替えを行うことができる吸着器切替え
方法を提供することにある。
An object of the present invention is to provide an adsorber switching method that can shorten the regeneration time of an adsorber installed in a process line of a helium liquefaction refrigeration system, and can switch adsorbers without disturbing the balance of the process. There is a particular thing.
本発明は、ヘリウム液化冷凍装置のプロセスラ
インに設けられた吸着器の切替え方法において、
前記吸着器より下流の前記プロセスラインの温度
を検出し、該検出された温度が一定の許容値に越
えないように吸着器切替え用の弁の開度を調節す
ることを特徴とするもので、プロセスのバランス
を乱さないようにすると共に、吸着器に液体窒素
だけでなくプロセスガスを徐々に増量しながら流
せるようにすることで吸着器再生時の冷却時間を
短縮し、これによつて吸着器の再生時間を短縮し
ようとするものである。
The present invention provides a method for switching adsorbers installed in a process line of a helium liquefaction refrigeration system, including:
It is characterized by detecting the temperature of the process line downstream from the adsorber, and adjusting the opening degree of the adsorber switching valve so that the detected temperature does not exceed a certain tolerance value, In addition to not disturbing the process balance, by gradually increasing the flow of not only liquid nitrogen but also process gas into the adsorber, the cooling time during adsorber regeneration can be shortened, and the adsorber can be regenerated. The aim is to shorten the playback time.
〔発明の実施例〕
ヒートバランスの本質的諸元の一つである温度
を吸着器より下流にプロセスラインで測定し、そ
の温度が、ある一定の許容値よりも上昇しないよ
うに、吸着器廻りの弁作動を調節することによ
り、プロセスのバランスを乱さないで、吸着器の
切替えが可能となる。一方、吸着器には、液体窒
素の冷却ラインだけでなく、プロセスガスも徐々
に増量しながら流せるので、冷却時間を縮めるこ
とが可能である。[Embodiment of the Invention] Temperature, which is one of the essential specifications of heat balance, is measured in the process line downstream of the adsorber, and measures are taken around the adsorber to prevent the temperature from rising above a certain allowable value. By adjusting the valve actuation of the adsorbers, adsorbers can be switched without disturbing the process balance. On the other hand, since not only the liquid nitrogen cooling line but also the process gas can be gradually increased in flow through the adsorber, the cooling time can be shortened.
以下、本発明の一実施例を第１図により説明す
る。 An embodiment of the present invention will be described below with reference to FIG.
第１図において、プロセスガスの流れ及び吸着
器３とバイパスラインを切替えて使用する点は第
２図と同様である。即ち、ヘリウムガスの純度が
十分良く、運転中に吸着器３を再生する場合は、
バイパスラインを使用し吸着器３を加温、減圧し
再生する。その後、液体窒素を冷却ライン１５に
流し吸着器３を冷却し必要に応じてバイパスライ
ンから吸着器３への切替えを行なう。 In FIG. 1, the flow of the process gas and the switching between the adsorber 3 and the bypass line are the same as in FIG. 2. That is, if the purity of helium gas is sufficiently high and the adsorber 3 is regenerated during operation,
Using the bypass line, the adsorber 3 is heated, depressurized, and regenerated. Thereafter, liquid nitrogen is flowed into the cooling line 15 to cool the adsorber 3, and the bypass line is switched to the adsorber 3 as necessary.
本実施例においては、吸着器３出口とバイパス
ラインとの合流点よりわずかに下流側の点に温度
測定点２３を設け、この温度が一定の許容値を越
えないように切替え時に弁７，８，９の開度を調
節する。具体的には、弁７または弁８の一方の開
度を全開にし、他方を測定点２３の温度が許容値
を越えないように、徐々に開けていく。弁７、弁
８が全開になつた後、弁９を測定点２３の温度が
許容値を越えないように徐々に閉めていく。弁９
が完全に閉まつた時点で切替えが完了する。 In this embodiment, a temperature measurement point 23 is provided at a point slightly downstream of the confluence point between the outlet of the adsorber 3 and the bypass line, and valves 7 and 8 are installed at the time of switching so that the temperature does not exceed a certain tolerance value. , 9 adjust the opening degree. Specifically, one of the valves 7 and 8 is fully opened, and the other is gradually opened so that the temperature at the measurement point 23 does not exceed the allowable value. After valves 7 and 8 are fully opened, valve 9 is gradually closed so that the temperature at measurement point 23 does not exceed the allowable value. Valve 9
Switching is completed when the door is completely closed.
弁７、弁８の開操作と、弁９の閉操作を同時に
行なつても良いし、測定点２３の圧力を検知する
ことにより、吸着器及びバイパスラインのどちら
か少なくとも一方が、十分に開いていることを確
認することにより、より確実な切替えが可能とな
る。 The opening operations of valves 7 and 8 and the closing operation of valve 9 may be performed simultaneously, or by detecting the pressure at the measurement point 23, at least one of the adsorber and the bypass line is sufficiently opened. By confirming that the
バイパスラインのかわりに、他の吸着器を設置
したシステムにおいても、同様の切替え方法は有
効である。 A similar switching method is also effective in a system in which another adsorber is installed in place of the bypass line.
また、制御機器として、マイクロコンピユータ
ー等の計算機、制御器を用いることは、より精密
な制御を行なうことができる点で有効である。 Further, it is effective to use a computer such as a microcomputer or a controller as the control device in that more precise control can be performed.
本実施例によれば、吸着器の再生時間を短縮し
プロセスのバランスを乱さないで、吸着器の切替
えを行なうことができる効果がある。 According to this embodiment, the regeneration time of the adsorber can be shortened and the adsorption device can be switched without disturbing the balance of the process.
本発明によれば、以上説明したように、吸着器
の再生時間を短縮し、プロセスのバランスを乱さ
ないで吸着器の切替えを行なうことができる効果
がある。
According to the present invention, as explained above, there is an effect that the regeneration time of the adsorber can be shortened and the adsorber can be switched without disturbing the balance of the process.
第１図は、本発明を実施したヘリウム液化冷凍
装置の一例を示すフロー図、第２図は、従来のヘ
リウム液化冷凍装置の一例を示すフロー図であ
る。
３…吸着器、７…吸着器入口弁、８…吸着器出
口弁、９…バイパス弁。
FIG. 1 is a flowchart showing an example of a helium liquefaction refrigeration system embodying the present invention, and FIG. 2 is a flowchart showing an example of a conventional helium liquefaction refrigeration system. 3...Adsorber, 7...Adsorber inlet valve, 8...Adsorber outlet valve, 9...Bypass valve.
Claims (1)
けられた吸着器の切り替え方法において、前記吸
着器の再生時に前記吸着器より下流の前記プロセ
スラインの温度を検出し、該検出された温度が一
定の許容値を越えないように、前記吸着器のライ
ンと前記吸着器に並列に設けられたラインとの切
り替え用の弁の開度を調節することを特徴とする
吸着器切替え方法。1. In a method for switching an adsorption device installed in a process line of a helium liquefaction refrigeration system, the temperature of the process line downstream of the adsorption device is detected during regeneration of the adsorption device, and the detected temperature is set to a certain allowable value. An adsorption device switching method characterized by adjusting the opening degree of a valve for switching between the adsorption device line and a line provided in parallel to the adsorption device so as not to exceed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60241404A JPS62102812A (en) | 1985-10-30 | 1985-10-30 | Changing-over method for adsorber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60241404A JPS62102812A (en) | 1985-10-30 | 1985-10-30 | Changing-over method for adsorber |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62102812A JPS62102812A (en) | 1987-05-13 |
| JPS6410252B2 true JPS6410252B2 (en) | 1989-02-21 |
Family
ID=17073776
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60241404A Granted JPS62102812A (en) | 1985-10-30 | 1985-10-30 | Changing-over method for adsorber |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62102812A (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS646655A (en) * | 1987-06-29 | 1989-01-11 | Hitachi Ltd | Cryogenic refrigerator |
| JPH0784961B2 (en) * | 1990-07-23 | 1995-09-13 | 株式会社日立製作所 | Helium liquefier |
| KR100343260B1 (en) * | 1999-08-11 | 2002-07-10 | 이후근 | The scrubber and its operating method for determining the time of changing the adsorbent using the heat of adsorption |
| KR20020034406A (en) * | 2000-11-01 | 2002-05-09 | 이후근 | The methods of residual lifetime identification of a gas scrubber and operation of dual type gas scrubber |
| FR2999693B1 (en) | 2012-12-18 | 2015-06-19 | Air Liquide | REFRIGERATION AND / OR LIQUEFACTION DEVICE AND CORRESPONDING METHOD |
| FR3000541B1 (en) | 2013-01-03 | 2015-01-23 | Air Liquide | REFRIGERATION AND / OR LIQUEFACTION DEVICE AND CORRESPONDING METHOD |
| CN107497243B (en) * | 2017-09-22 | 2020-09-22 | 清华大学 | Gas purification device |
-
1985
- 1985-10-30 JP JP60241404A patent/JPS62102812A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62102812A (en) | 1987-05-13 |
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