JPS6388794A - Plasma x-ray source - Google Patents
Plasma x-ray sourceInfo
- Publication number
- JPS6388794A JPS6388794A JP61231168A JP23116886A JPS6388794A JP S6388794 A JPS6388794 A JP S6388794A JP 61231168 A JP61231168 A JP 61231168A JP 23116886 A JP23116886 A JP 23116886A JP S6388794 A JPS6388794 A JP S6388794A
- Authority
- JP
- Japan
- Prior art keywords
- ceramic capacitor
- capacitor
- electrodes
- plasma
- ray
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003985 ceramic capacitor Substances 0.000 claims abstract description 19
- 239000003990 capacitor Substances 0.000 claims abstract description 18
- 239000000126 substance Substances 0.000 abstract description 6
- 230000010355 oscillation Effects 0.000 abstract 1
- 238000000605 extraction Methods 0.000 description 11
- 230000000694 effects Effects 0.000 description 6
- 238000011109 contamination Methods 0.000 description 5
- 239000002184 metal Substances 0.000 description 3
- 239000004020 conductor Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000001015 X-ray lithography Methods 0.000 description 1
- 230000002730 additional effect Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
Landscapes
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- X-Ray Techniques (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はLSI製造用X線リソグラフィ装置のxvA源
に係り、特にX線取り出し窓の汚損の低減を図ったプラ
ズマX M 源に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an xvA source for an X-ray lithography apparatus for LSI manufacturing, and more particularly to a plasma X M source that reduces contamination of an X-ray extraction window.
従来装置としては、特開昭60−151945号公報に
示されているようなものが知られている。これは第6図
に示すように、充電用電源1.充電用抵抗2、コンデン
サ3.放電スイッチ4.電路7.放電装置5から構成さ
れている。16は露光用マスク、17は露光ウェーハ、
19はアライナである。As a conventional device, the one shown in Japanese Unexamined Patent Publication No. 151945/1988 is known. As shown in FIG. 6, this is the charging power source 1. Charging resistor 2, capacitor 3. Discharge switch 4. Electrical line 7. It is composed of a discharge device 5. 16 is an exposure mask, 17 is an exposure wafer,
19 is an aligner.
放電装置5は1図示していない排気装置、真空容器18
.電I’!!11.12から構成されている。動作は、
先ず適当に制御された充電用電源1より充電用抵抗2を
介してコンデンサ3に電力を供給し、所定の電圧まで充
電する。その後、放電スイッチ4を図示しない外的要因
により閉じて1世路7を経由し、放電装置5の有する一
対の電極11゜12間に、上記電圧を印加して放電を起
こさせ、そしてプラズマを生成し、それ以後コンデンサ
に蓄えられたエネルギーを供給することによってプラズ
マピンチを生じさせ、強いX線14を放出させる。保護
抵抗6は放電袋vt5で、放電を生じなかった場合、コ
ンデンサ3のエネルギーを吸収するために設けたもので
ある。この1%14は、X線取り出し窓15とX線マス
ク16を通してレジストを塗布したウェーハ17に照射
され、露光する。このような、従来装置は、まだ研究の
段階であり、電源コンデンサには、一般に電力用に使用
されている油浸紙コンデンサや、油浸プラスチックフィ
ルムコンデンサなどが使用されている。The discharge device 5 includes an exhaust device and a vacuum vessel 18 (not shown).
.. Den I'! ! It consists of 11.12. The operation is
First, power is supplied to the capacitor 3 from an appropriately controlled charging power source 1 via a charging resistor 2, and the capacitor 3 is charged to a predetermined voltage. Thereafter, the discharge switch 4 is closed by an external factor (not shown), and the voltage is applied between the pair of electrodes 11 and 12 of the discharge device 5 to cause a discharge, and plasma is generated. By supplying the energy generated and then stored in the capacitor, a plasma pinch is created and intense X-rays 14 are emitted. The protective resistor 6 is a discharge bag VT5, which is provided to absorb the energy of the capacitor 3 when no discharge occurs. This 1% 14 is irradiated onto the resist-coated wafer 17 through the X-ray extraction window 15 and the X-ray mask 16, thereby exposing it. Such conventional devices are still in the research stage, and oil-immersed paper capacitors and oil-immersed plastic film capacitors, which are generally used for electric power, are used as power supply capacitors.
上記従来技術は、X線取り出し窓が電極よりの蒸発物質
により汚損することへの対策が考慮されていなかった。The above-mentioned conventional technology does not take into consideration measures against the X-ray extraction window being contaminated by evaporated substances from the electrodes.
すなわち、電極11.12間にて放電が行なわれると、
プラズマピンチが発生し、高エネルギーのイオンや電子
が生じる。又、電極からは電極材料が溶けて金属蒸気が
放出される。That is, when a discharge occurs between the electrodes 11 and 12,
A plasma pinch occurs, producing high-energy ions and electrons. Further, the electrode material melts and metal vapor is released from the electrode.
これらの高エネルギーのイオンや電子は、磁気的手段に
よりxI!取り出し窓へ飛来しないようにできるが、金
属蒸気は中性であるので、軌道を曲げることができずX
線取り出し窓の規損を防止することば困雅であった。These high-energy ions and electrons are transferred by magnetic means to xI! It is possible to prevent it from flying into the takeout window, but since metal vapor is neutral, the trajectory cannot be bent.
It was difficult to find a way to prevent damage to the wire outlet window.
本発明の目的は、上記した従来技術の欠点を除去し、X
線取り出し窓の汚損の低減を図ったプラズマX線源を提
供するにある6
〔問題点を解決するための手段〕
本発明では上記目的を達成するために、放電装置とコン
デンサを結ぶ電路に近い部分にセラミックコンデンサを
設ける。The purpose of the present invention is to eliminate the above-mentioned drawbacks of the prior art and to
To provide a plasma X-ray source with reduced contamination of the radiation extraction window A ceramic capacitor is installed in the section.
すなわち、セラミックコンデンサは一種の圧電素子であ
り、あらかじめ充電しておいて、急速な放電を行なわせ
ると歪が急速に消える結果、その過程で超音波振動を発
生する。この超音波振動は電路などの構成物体を介して
放電装置、さらにはXI!取り出し窓に伝播する。その
結果、X線取り出し窓にゆるく付着していた金属蒸気原
子は、再び空間に放出され、X線取り出し窓の汚損が低
減される。That is, a ceramic capacitor is a type of piezoelectric element, and when it is charged in advance and then rapidly discharged, the strain disappears rapidly, and in the process it generates ultrasonic vibrations. This ultrasonic vibration is transmitted to the discharge device through constituent objects such as electrical circuits, and further to the XI! Spreads to the extraction window. As a result, the metal vapor atoms that were loosely attached to the X-ray extraction window are released into space again, reducing the amount of contamination of the X-ray extraction window.
以下、第1図の実施例にて本発明の詳細な説明するにこ
で、第6図の実施例と同一の構成要素には同一の番号を
付けである。コンデンサ3と電路7の間には、セラミッ
クコンデンサ20が設けられている。セラミックコンデ
ンサ20は、充電された状態では、セラミックコンデン
サ2oの極間を縮める方向にストレスを受けている。放
電装[5の電極1i、12間で放電が生じると、セラミ
ックコンデンサ20の受けていたストレスはきわめて短
い時間のうちに放出される。その結果。Hereinafter, the present invention will be explained in detail using the embodiment shown in FIG. 1, and the same components as those in the embodiment shown in FIG. 6 are given the same numbers. A ceramic capacitor 20 is provided between the capacitor 3 and the electric circuit 7. In a charged state, the ceramic capacitor 20 is subjected to stress in a direction that reduces the distance between the electrodes of the ceramic capacitor 2o. When a discharge occurs between the electrodes 1i and 12 of the discharge device [5], the stress that the ceramic capacitor 20 has been under is released in a very short time. the result.
セラミックコンデンサ20は元の状態へ復旧し。The ceramic capacitor 20 is restored to its original state.
この時のセラミックコンデンサは超音波21を発生する
ことになる。この超音波は電路7を通って放電装置5へ
達し、X線取り出し窓]5へ達する。The ceramic capacitor at this time will generate ultrasonic waves 21. This ultrasonic wave passes through the electric path 7 and reaches the discharge device 5, and then reaches the X-ray extraction window]5.
一方この時点には、電極11.12よりの蒸発物質が、
温度がさめず熱いままゆるく付着した状態にある。その
結果、X線取り出し窓での付着物質は容易に超音波振動
により離脱してしまい、汚損の低減がもたらされる。On the other hand, at this point, the evaporated substances from electrodes 11 and 12 are
It remains hot and loosely attached. As a result, substances adhering to the X-ray extraction window are easily removed by ultrasonic vibration, resulting in a reduction in contamination.
第2図は本発明の他の実施例であり、放電スイッチ4が
設けられた回路に適用した例であり、これも′5S1図
と全く同様の効果を奏することができる。FIG. 2 shows another embodiment of the present invention, which is an example applied to a circuit provided with a discharge switch 4, and this can also achieve exactly the same effect as in FIG. '5S1.
第3図は本発明のさらに別の実施例であり、電源コンデ
ンサをすべてセラミックコンデンサにした例であり、こ
れも第1図と全く同様の効果を奏することができる。FIG. 3 shows yet another embodiment of the present invention, in which all the power supply capacitors are ceramic capacitors, and this can also achieve exactly the same effect as in FIG. 1.
第4図は本発明さらに又他の実施例である。これは電路
が導体板8,9に変えてケーブル22が使用されている
ものに適用した例であり、これも又、第1図の実施例と
全く同様の効果を達成できる。第5図は本発明のさらに
又別の実施例である。FIG. 4 shows yet another embodiment of the present invention. This is an example in which a cable 22 is used instead of the conductor plates 8 and 9 for the electric circuit, and this can also achieve exactly the same effect as the embodiment shown in FIG. FIG. 5 shows yet another embodiment of the invention.
これは電路の導体板8,9の間にセラミックコンデンサ
をサイドインチ状に配置した例である。この例では、第
1図の実施例と同様の効果の他に、コンデンサ回路のイ
ンダクタンスを非常に小さくでき、放電電流の立ち上り
が早くなり、その分だけ強力なX線を発生できる。This is an example in which ceramic capacitors are arranged in a side inch shape between the conductor plates 8 and 9 of the electric circuit. In this example, in addition to the same effects as the embodiment shown in FIG. 1, the inductance of the capacitor circuit can be made very small, the rise of the discharge current becomes faster, and X-rays that are stronger can be generated accordingly.
なお、第3図〜第5図の実施例ではコンデンサをすべて
セラミックコンデンサとしており、従来の油浸フィルム
を用いたコンデンサに比べて、2桁程度、充放電回数の
寿命が伸びるという付帯的な効果も奏することができる
。In addition, in the examples shown in Figures 3 to 5, all capacitors are ceramic capacitors, which has the additional effect of extending the life of the number of charge/discharge cycles by about two orders of magnitude compared to capacitors using conventional oil-immersed films. can also be played.
以上説明したように要するに本発明は、真空容器内に設
けられた少くとも一対の電極を有する放電装置と、パル
ス大電流を供給する電路とコンデンサパンクからなるプ
ラズマX線源において、少くとも該コンデンサバンクの
電路側にセラミックコンデンサを配したものであるから
、X線取り出し窓での付着物質は容易に超音波振動によ
り離脱してしまい、xi取り出し窓の汚損の低減がもた
らされる。As explained above, in summary, the present invention provides a plasma Since the ceramic capacitor is disposed on the electric circuit side of the bank, substances adhering to the X-ray extraction window are easily removed by ultrasonic vibration, resulting in a reduction in contamination of the xi extraction window.
第1図は本発明の一実施例、第2図は本発明の他の実施
例、第3図は本発明の別の実施例、第4図は本発明のさ
らに他の実施例、第5図は本発明のさらに別の実施例、
第6図は従来例を示す。
5・・・放電装置+ 11.12・・・電極、18・・
・真空容器、7・・・電路、3・・・コンデンサバンク
、20・・・セラミックコンデンサ。FIG. 1 shows one embodiment of the present invention, FIG. 2 shows another embodiment of the invention, FIG. 3 shows another embodiment of the invention, FIG. 4 shows yet another embodiment of the invention, and FIG. The figure shows yet another embodiment of the invention,
FIG. 6 shows a conventional example. 5...Discharge device + 11.12...Electrode, 18...
- Vacuum container, 7... Electric circuit, 3... Capacitor bank, 20... Ceramic capacitor.
Claims (1)
る放電装置と、該放電装置にパルス大電流を供給する電
路とコンデンサバンクからなるプラズマX線源において
、少くとも該コンデンサバンクの電路側にセラミックコ
ンデンサを配し接続した構成としたことを特徴とするプ
ラズマX線源。1. In a plasma X-ray source consisting of a discharge device provided in a vacuum container and having at least one pair of electrodes, an electric circuit for supplying a pulsed large current to the discharge device, and a capacitor bank, at least the electric circuit side of the capacitor bank A plasma X-ray source characterized by having a configuration in which a ceramic capacitor is arranged and connected to the.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61231168A JP2533502B2 (en) | 1986-10-01 | 1986-10-01 | Plasma x-ray source |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61231168A JP2533502B2 (en) | 1986-10-01 | 1986-10-01 | Plasma x-ray source |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6388794A true JPS6388794A (en) | 1988-04-19 |
JP2533502B2 JP2533502B2 (en) | 1996-09-11 |
Family
ID=16919378
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61231168A Expired - Lifetime JP2533502B2 (en) | 1986-10-01 | 1986-10-01 | Plasma x-ray source |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2533502B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2839556A1 (en) * | 2012-05-30 | 2015-02-25 | Siemens Aktiengesellschaft | Spark gap with a capacitive energy accumulator |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56117340U (en) * | 1980-02-10 | 1981-09-08 | ||
JPS61111000A (en) * | 1984-11-05 | 1986-05-29 | Hitachi Ltd | Control of plasma x-ray generation device |
-
1986
- 1986-10-01 JP JP61231168A patent/JP2533502B2/en not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56117340U (en) * | 1980-02-10 | 1981-09-08 | ||
JPS61111000A (en) * | 1984-11-05 | 1986-05-29 | Hitachi Ltd | Control of plasma x-ray generation device |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2839556A1 (en) * | 2012-05-30 | 2015-02-25 | Siemens Aktiengesellschaft | Spark gap with a capacitive energy accumulator |
JP2015525441A (en) * | 2012-05-30 | 2015-09-03 | シーメンス アクティエンゲゼルシャフト | Spark gap with capacitive energy storage device |
US9825434B2 (en) | 2012-05-30 | 2017-11-21 | Siemens Aktiengesellschaft | Spark gap comprising a capacitive energy store |
Also Published As
Publication number | Publication date |
---|---|
JP2533502B2 (en) | 1996-09-11 |
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