JPS6387826U - - Google Patents

Info

Publication number
JPS6387826U
JPS6387826U JP18236786U JP18236786U JPS6387826U JP S6387826 U JPS6387826 U JP S6387826U JP 18236786 U JP18236786 U JP 18236786U JP 18236786 U JP18236786 U JP 18236786U JP S6387826 U JPS6387826 U JP S6387826U
Authority
JP
Japan
Prior art keywords
electrodes
power
sample
self
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18236786U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0513007Y2 (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1986182367U priority Critical patent/JPH0513007Y2/ja
Publication of JPS6387826U publication Critical patent/JPS6387826U/ja
Application granted granted Critical
Publication of JPH0513007Y2 publication Critical patent/JPH0513007Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Drying Of Semiconductors (AREA)
JP1986182367U 1986-11-26 1986-11-26 Expired - Lifetime JPH0513007Y2 (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1986182367U JPH0513007Y2 (enrdf_load_stackoverflow) 1986-11-26 1986-11-26

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1986182367U JPH0513007Y2 (enrdf_load_stackoverflow) 1986-11-26 1986-11-26

Publications (2)

Publication Number Publication Date
JPS6387826U true JPS6387826U (enrdf_load_stackoverflow) 1988-06-08
JPH0513007Y2 JPH0513007Y2 (enrdf_load_stackoverflow) 1993-04-06

Family

ID=31128100

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1986182367U Expired - Lifetime JPH0513007Y2 (enrdf_load_stackoverflow) 1986-11-26 1986-11-26

Country Status (1)

Country Link
JP (1) JPH0513007Y2 (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001077035A (ja) * 1999-09-07 2001-03-23 Nec Kyushu Ltd 半導体製造装置及び半導体製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55118637A (en) * 1979-03-06 1980-09-11 Chiyou Lsi Gijutsu Kenkyu Kumiai Plasma etching apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55118637A (en) * 1979-03-06 1980-09-11 Chiyou Lsi Gijutsu Kenkyu Kumiai Plasma etching apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001077035A (ja) * 1999-09-07 2001-03-23 Nec Kyushu Ltd 半導体製造装置及び半導体製造方法

Also Published As

Publication number Publication date
JPH0513007Y2 (enrdf_load_stackoverflow) 1993-04-06

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