JPS6384937U - - Google Patents
Info
- Publication number
- JPS6384937U JPS6384937U JP17956286U JP17956286U JPS6384937U JP S6384937 U JPS6384937 U JP S6384937U JP 17956286 U JP17956286 U JP 17956286U JP 17956286 U JP17956286 U JP 17956286U JP S6384937 U JPS6384937 U JP S6384937U
- Authority
- JP
- Japan
- Prior art keywords
- rod
- jet nozzle
- holder
- vacuum processing
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17956286U JPS6384937U (sk) | 1986-11-21 | 1986-11-21 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17956286U JPS6384937U (sk) | 1986-11-21 | 1986-11-21 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6384937U true JPS6384937U (sk) | 1988-06-03 |
Family
ID=31122731
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17956286U Pending JPS6384937U (sk) | 1986-11-21 | 1986-11-21 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6384937U (sk) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5833828A (ja) * | 1981-08-24 | 1983-02-28 | Hitachi Ltd | 半導体表面処理装置 |
| JPS59145519A (ja) * | 1983-12-23 | 1984-08-21 | Hitachi Ltd | プラズマｃｖｄ装置 |
-
1986
- 1986-11-21 JP JP17956286U patent/JPS6384937U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5833828A (ja) * | 1981-08-24 | 1983-02-28 | Hitachi Ltd | 半導体表面処理装置 |
| JPS59145519A (ja) * | 1983-12-23 | 1984-08-21 | Hitachi Ltd | プラズマｃｖｄ装置 |