JPS6374934A - Glass coated sintered silicon carbide and production thereof - Google Patents

Glass coated sintered silicon carbide and production thereof

Info

Publication number
JPS6374934A
JPS6374934A JP21808986A JP21808986A JPS6374934A JP S6374934 A JPS6374934 A JP S6374934A JP 21808986 A JP21808986 A JP 21808986A JP 21808986 A JP21808986 A JP 21808986A JP S6374934 A JPS6374934 A JP S6374934A
Authority
JP
Japan
Prior art keywords
glass
weight
silicon carbide
binder
glass powder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21808986A
Other languages
Japanese (ja)
Other versions
JPH07115977B2 (en
Inventor
Nobuo Takusagawa
田草川 信雄
Hitoshi Hayashi
均 林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Priority to JP21808986A priority Critical patent/JPH07115977B2/en
Publication of JPS6374934A publication Critical patent/JPS6374934A/en
Publication of JPH07115977B2 publication Critical patent/JPH07115977B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:To produce a glass coated sintered SiC having low dielectric constant, causing neither foams nor cracks, by coating the surface of a sintered SiC with paste of glass powder having a specific composition and an organic binder, calcining and repeating these processes. CONSTITUTION:The surface of sintered SiC is coated with paste consisting of glass powder containing 9-15wt.% Al2O3, 20-30wt.% B2O2, 40-60wt.% SiO2, 3-15wt.% CaO and, if necessary, <=3pts.wt. ZrO2 and an organic binder. The coated sintered SiC is heated to remove the binder, further heated at 1,100-1,500 deg.C and then cooled to form a primary calcined glass layer. Further the surface is coated with similar paste, heated to remove the binder, further heated to 850-1,100 deg.C and then cooled to form a secondary calcined glass layer. Consequently, uniform sintered SiC having a glass coat and high electrical resistance of surface causing neither foams nor cracks is obtained.

Description

【発明の詳細な説明】 (産業上の利用分野ン 炭化ケイ素焼結体は、高温における強度がすぐれており
、耐熱性材料として有用である。又熱伝導率が大きく集
積回路の基板としても有利である。然し体積固有抵抗が
102〜106Ω俤と小さいので電気絶縁性が低く、又
表面に径1〜2μm程度の多数の気孔が存在する。した
がって前述の使用目的に応じた性質を有するよう、該焼
結体を被覆して実用に供される。
Detailed Description of the Invention (Industrial Application Fields) Silicon carbide sintered bodies have excellent strength at high temperatures and are useful as heat-resistant materials. Also, due to their high thermal conductivity, they are useful as substrates for integrated circuits. However, since the volume resistivity is as low as 102 to 106 Ω, the electrical insulation is low, and there are many pores with a diameter of about 1 to 2 μm on the surface. The sintered body is coated and put into practical use.

(従来の技術] 炭化ケイ素焼結体の表面な平滑にし、しかも電気絶縁性
2大きくする方法としてガラス被覆法がある。従来、こ
のために使用されているガラスはpboを含む低融点ガ
ラスであり、誘電率が高いことが欠点である。さらにガ
ラス被覆を焼成により形成させる方法としてガラス粉末
と有機結合剤とを混合してペースト状として炭化ケイ素
焼結体表面に塗布し、ついで乾燥焼成する方法(塗布法
ンがある。この方法は、容易で工業的に便利であるが焼
成により形成されたガラス被膜中に気泡や亀裂が発生し
易いという欠点がある。
(Prior art) Glass coating is a method of smoothing the surface of a silicon carbide sintered body and increasing its electrical insulation. Conventionally, the glass used for this purpose is a low melting point glass containing PBO. The drawback is that it has a high dielectric constant.Another method for forming a glass coating by firing is to mix glass powder and an organic binder, apply it as a paste to the surface of the silicon carbide sintered body, and then dry and fire it. (There is a coating method. Although this method is easy and industrially convenient, it has the disadvantage that bubbles and cracks are likely to occur in the glass coating formed by firing.

(発明が解決しようとする問題点) 従来の炭化ケイ素焼結体上にもうけられたガラス被覆膜
のもつ欠点、即ち誘電率が高く、シかも気泡や亀裂が発
生し易いという性質を改良したガラス被覆炭化ケイ素焼
結体およびその製造方法を提供することを目的とする。
(Problems to be Solved by the Invention) The disadvantages of conventional glass coating films formed on silicon carbide sintered bodies, namely the high dielectric constant and the tendency for bubbles and cracks to occur, have been improved. An object of the present invention is to provide a glass-coated silicon carbide sintered body and a method for manufacturing the same.

(問題点を解決Tるための手段〉 前記目的を達成するための本発明は、At2039〜1
5重量%、Bo 20〜30重量%、510240〜6
0重量%、0003〜15重量%よりなるガラス被覆膜
および前記組成100重量部に対しざらにZrO25重
量部以下を含有するガラス被覆膜を有するガラス被覆炭
化ケイ素焼結体および前記ガラス被覆膜に相当する組成
3有するガラス粉末と、有機バインダーとよりなるペー
ストを炭化ケイ素焼結体の表面に塗布し、まず加熱して
バインダーを除去后、さらに1100 ℃〜1500C
の温度範囲に加熱し、ついで冷却して第一次焼成ガラス
層を形成させ、ざらに前記ガラス粉末の組成範囲内にあ
るガラス粉末と有機バインダーとよりなるペーストを塗
布し、加熱によりバインダーご除去后、さらに850℃
〜1100 Cの温度範囲に加熱し、ついで冷却して第
二次焼成ガラス層を形成させることを特徴とするガラス
被覆炭化ケイ素焼結体の製造方法に関する。
(Means for solving the problems) The present invention for achieving the above object is based on At2039-1
5% by weight, Bo 20-30% by weight, 510240-6
A glass-coated silicon carbide sintered body having a glass coating film consisting of 0% by weight, 0003-15% by weight and a glass coating film containing approximately 25 parts by weight or less of ZrO per 100 parts by weight of the composition, and the glass coating. A paste consisting of a glass powder having composition 3 corresponding to the film and an organic binder is applied to the surface of the silicon carbide sintered body, first heated to remove the binder, and then heated to 1100°C to 1500°C.
The first fired glass layer is formed by heating to a temperature range of After that, further 850℃
The present invention relates to a method for manufacturing a glass-coated silicon carbide sintered body, which comprises heating to a temperature range of ~1100 C and then cooling to form a second fired glass layer.

前記組成のガラスはアルカリ醗化物およびpboを含ま
ないので、熱膨張係数および誘導率は比較的小さい。然
し一般的にはこの系のガラスはガラス溶融温度が高いの
で、ガラスの製造およびガラス被膜の焼成温度が高くな
り、炭化ケイ素焼結体のガラス被覆には不利である。然
しなから本発明においては1450 C以下で溶融も可
能となり、1000C以下の温度の焼成でガラス被覆の
形成も可能となった。
Since the glass of said composition is free of alkali fluoride and pbo, its coefficient of thermal expansion and dielectric constant are relatively small. However, since this type of glass generally has a high glass melting temperature, the manufacturing temperature of the glass and the firing temperature of the glass coating become high, which is disadvantageous for coating silicon carbide sintered bodies with glass. However, in the present invention, it has become possible to melt at a temperature of 1450C or lower, and it has also become possible to form a glass coating by firing at a temperature of 1000C or lower.

ガラス組成についてさらに説明テる。Let's further explain the glass composition.

51o2  の含有量はガラスの熱膨張係数を炭化ケイ
素の熱膨張係数に近い値とするために40重1%以上の
とすることが、又ガラスの溶融温度k 1450 C以
下とするため60重1以下とすることが必要である。O
α0はガラス溶融時の融液の粘度な低下させ、均質なガ
ラスを製造するために不可欠であり、3重1%に達しな
い場合は粘度の低下が不充分であり、15ffiffi
%をこえる場合は、熱膨張係数が炭化珪素焼結体のそれ
より大きくなり、ガラス被膜の亀裂発生?おこす。
The content of 51o2 should be 40wt.1% or more to make the thermal expansion coefficient of the glass close to that of silicon carbide, and 60wt.1% to keep the melting temperature of the glass below 1450C. It is necessary to do the following. O
α0 is essential for reducing the viscosity of the melt during glass melting and producing homogeneous glass, and if it does not reach 1%, the viscosity is insufficiently reduced, and 15ffiffi
If it exceeds %, the coefficient of thermal expansion will be larger than that of the silicon carbide sintered body, and cracks will occur in the glass coating. cause

ZrO□は3重量部以下を含有させることによってガラ
ス被膜の焼成形成時のガラスの乳濁化をおこさせ、かつ
形成されたガラス被膜の化学的耐久性を向上させる効果
がある。然し3重量部をこえると均質なガラス溶融が固
着となる。2r02は必要により含有させる。
When ZrO□ is contained in an amount of 3 parts by weight or less, it has the effect of causing emulsification of the glass during firing and forming the glass coating and improving the chemical durability of the formed glass coating. However, if it exceeds 3 parts by weight, homogeneous glass melting will result in sticking. 2r02 is included if necessary.

At203の量は、9%未満では耐湿性が劣り、15%
ご越えると溶融温度が高くなる。B20゜含育量は、2
0%より少ないと溶融温度が高くなり丁ぎ、30%を越
えると、ガラスの化学的安定性が低下し、このましくな
い。
If the amount of At203 is less than 9%, the moisture resistance will be poor;
If the temperature is exceeded, the melting temperature will increase. The B20° content is 2
If it is less than 0%, the melting temperature will become too high, and if it exceeds 30%, the chemical stability of the glass will decrease, which is not desirable.

本発明のガラス被覆炭化ケイ素焼結体は、前記組成のガ
ラス粉末とバインダーとを混合して調整したペーストを
炭化ケイ素焼結体に塗布、焼成后冷却してガラス層を固
化させる一段階法で製造されるが、望ましくは焼成を二
段階で行なうことによりすぐれた性質のガラス被覆を炭
化ケイ素焼結体上に形成させることができる。
The glass-coated silicon carbide sintered body of the present invention is produced by a one-step method in which a paste prepared by mixing glass powder with the above composition and a binder is applied to a silicon carbide sintered body, and after firing, the glass layer is cooled to solidify the glass layer. A glass coating of excellent properties can be formed on the silicon carbide sintered body by preferably performing the firing in two stages.

まず一段階焼成による方法【のぺる。First, a one-step firing method [Noperu].

まず粒径50μm以下のAt2039〜15  重量%
3020〜30重量%、SiO240〜60重量%、C
α06〜15重量%よりなるガラス粉末あるいは、さら
に前記組成100重量部に対してZ rO2が3重量部
以下含有されているガラス粉末コ50〜60%重量%と
、バインダー40〜50重量%との混合物であるペース
トを炭化ケイ素焼結体、或は、1000〜1400 C
で表面酸化処理した炭化ケイ素焼結体の表面に塗付し、
次に90〜400Cの範囲に加熱してバインダーを除去
し、850〜1.100t:’の範囲内の一定温度に1
5分〜30分加熱し、ついで冷却して、均質なガラス被
膜を形成する。次に二段階焼成による方法を詳述する。
First, At2039-15% by weight with a particle size of 50 μm or less
3020-30% by weight, SiO240-60% by weight, C
A glass powder consisting of α06 to 15% by weight, or a glass powder containing 3 parts by weight or less of ZrO2 based on 100 parts by weight of the composition, 50 to 60% by weight, and 40 to 50% by weight of a binder. The paste which is a mixture is made of silicon carbide sintered body or 1000~1400C
It is applied to the surface of a silicon carbide sintered body whose surface has been oxidized with
Next, the binder is removed by heating in the range of 90 to 400C, and then heated to a constant temperature in the range of 850 to 1.100t:'.
Heat for 5 to 30 minutes and then cool to form a homogeneous glass coating. Next, the two-stage firing method will be described in detail.

まず粒径50μm以下のAt2039〜15重量%、B
o 20〜30重量%、SiO240〜60重量%、0
a03〜15重量%よりなるガラス粉末、あるいはざら
に前記組成100重量部に対してZ rO2が3重量部
以下含有されているガラス粉末(以后ガラス粉末とする
ンrr:10〜20重盪%含む該ガラス粉末とバインダ
ーとの混合物であるペーストご炭化ケイ素焼結体の表面
に塗布し、次に90〜400Cの範囲に加熱してバイン
ダーを除去し、1100〜15001:’で50分〜6
0分加熱し、ついで冷却して均質なガラス被膜を形成す
る。なおこの場合のガラス証はα5〜t 01n9/c
fflが望ましい。ガラス量がα5ダ/calに達しな
いときはガラス被膜が不均一となり、to+19/cm
をこえるときはガラス被膜中に気泡が残存する。
First, At2039-15% by weight with a particle size of 50 μm or less, B
o 20-30% by weight, SiO240-60% by weight, 0
Glass powder consisting of 3 to 15% by weight of a0, or glass powder containing 3 parts by weight or less of ZrO2 per 100 parts by weight of the composition (hereinafter referred to as glass powder) containing 10 to 20% by weight The paste, which is a mixture of the glass powder and the binder, is applied to the surface of the silicon carbide sintered body, then heated to a temperature in the range of 90 to 400 C to remove the binder, and heated at 1,100 to 15,000 C for 50 to 60 minutes.
Heat for 0 minutes and then cool to form a homogeneous glass coating. In addition, the glass certificate in this case is α5~t 01n9/c
ffl is preferred. When the amount of glass does not reach α5 da/cal, the glass coating becomes uneven and to+19/cm
When the temperature exceeds 100%, air bubbles remain in the glass coating.

又バインダーとして好ましいのはエチルセルロース、溶
剤可塑剤はテルピネオール、カルピトールアセテートで
ある。
Ethyl cellulose is preferred as the binder, and terpineol and carpitol acetate are preferred as the solvent plasticizer.

又ペースト中のガラス粉末を10〜20重量%とする理
由は10重量%に達しないときは、ガラス被膜が不均質
となる。20重量%企こえるときは、ガラス被膜が厚く
なり、気泡が残存する原因となる。
The reason for setting the glass powder content in the paste to 10 to 20% by weight is that if it does not reach 10% by weight, the glass coating will become non-uniform. When the amount exceeds 20% by weight, the glass coating becomes thicker and causes bubbles to remain.

なおガラス粉末の粒径は一般的に小さい程、生成ガラス
被膜はすぐれた性質を有するが実用的には44μm以下
、好ましくは10μm以下である。
In general, the smaller the particle size of the glass powder, the better the properties of the resulting glass film, but practically the particle size is 44 μm or less, preferably 10 μm or less.

このようにして製造された第一次焼成ガラス被膜は炭化
ケイ素焼結体の表面の空孔にも浸入形成され次にのべる
第2次焼成における気泡の発生を防止するっ 次に第1次焼成に用いられた組成範囲内にあるガラス粉
末を50〜60重量%含(該ガラス粉末とバインダーと
の混合物であるペーストを前記第一次焼成ガラス被膜面
に塗布し、90〜400Cの範囲に加熱してバインダー
を除去し850〜1100 t:’の範囲内の一定温度
に15分〜30分加熱し、最后に冷却して均質な第2次
焼成ガラス被膜を形成させる。この場合のガラス量は5
0〜60■/dであることがのぞましい。
The first fired glass film produced in this way penetrates into the pores on the surface of the silicon carbide sintered body to prevent the generation of bubbles in the next second firing. Containing 50 to 60% by weight of glass powder within the composition range used in The binder is removed, and the glass is heated to a constant temperature within the range of 850 to 1100 t:' for 15 to 30 minutes, and finally cooled to form a homogeneous secondary fired glass film.In this case, the amount of glass is 5
It is desirable that it is 0 to 60 .mu./d.

ペースト中のガラス粉末を50〜60重斂%とする理由
は、50重量%に達しないときは、必要な厚さのガラス
被膜を形成するために多数回の塗布が必要となる。60
重四%をこえるときはペーストを均一で必要な厚さに塗
布することが困難である。
The reason why the glass powder content in the paste is set to 50 to 60% by weight is that if it does not reach 50% by weight, multiple applications are required to form a glass coating of the required thickness. 60
When the weight exceeds 4%, it is difficult to apply the paste uniformly to the required thickness.

なおバインダーとして好ましいのはエチルセルロース、
溶剤、可塑剤等はテルピネオール、カルピトールアセテ
ートである。第2次焼成はガラス被膜の厚さが所要の厚
さになるまで繰返し行なう。
Preferable binders are ethyl cellulose,
Solvents, plasticizers, etc. are terpineol and carpitol acetate. The secondary firing is repeated until the thickness of the glass coating reaches the required thickness.

なお前記焼成において用いられるガラス粉末は通常の方
法でつくられたガラスを粉砕、必要により適宜の手段で
分級したものご用いる。ぺ−ストの塗布はスクリーン印
刷法、ドクターブレード法等により行なう。
Note that the glass powder used in the above-mentioned firing is obtained by crushing glass produced by a conventional method and, if necessary, classifying it by an appropriate means. The paste is applied by a screen printing method, a doctor blade method, or the like.

(効果) 本発明により製造された炭化ケイ素焼結体上のガラス被
覆は、均質なガラス相であり、気泡及び亀裂の生成につ
いても従来より改良されている。又ガラスの種類によっ
て被膜は無色透明または乳濁状に調gNすることができ
る。本発明によるガラス被覆炭化ケイ素焼結体はガラス
被覆によって炭化ケイ素焼結体の表面の電気抵抗が大き
くなり、各種集積回路用基板としてすぐまず参考例によ
り不発明に用いられるガラス粉末の製造例を示す。
(Effects) The glass coating on the silicon carbide sintered body produced according to the present invention has a homogeneous glass phase, and the formation of bubbles and cracks is also improved compared to the past. Depending on the type of glass, the coating can be made colorless and transparent or emulsified. The glass-coated silicon carbide sintered body according to the present invention has a large electrical resistance on the surface of the silicon carbide sintered body due to the glass coating, and is used as a substrate for various integrated circuits. show.

参考例 ガラス粉末の製造 第1表に示すガラス用の原料混合物を白金るつぼに入れ
、炭化ケイ素発熱体電気炉中で1450Cに加熱し、生
成せる融液を黒鉛板上に流しだし固化させて無色透明な
ガラスを調製した。次にこのガラスをアルミナ乳鉢を用
い325メ、シ1(44μm)以下に粉砕した。このガ
ラス粉末ヲエチルアルコールに懸濁させ、沈降速度の差
によって分級して粒径10μm以下のガラス粉末を調製
した。これらのガラス粉末をバインダーと混練してペー
ストとし、炭化ケイ素焼結体に塗布する。
Reference example Production of glass powder The raw material mixture for glass shown in Table 1 is placed in a platinum crucible and heated to 1450C in an electric furnace with a silicon carbide heating element.The resulting melt is poured onto a graphite plate and solidified to form a colorless product. A transparent glass was prepared. Next, this glass was ground to 325 mm and 1 mm (44 μm) or less using an alumina mortar. This glass powder was suspended in ethyl alcohol and classified based on the difference in sedimentation rate to prepare glass powder with a particle size of 10 μm or less. These glass powders are kneaded with a binder to form a paste, which is applied to a silicon carbide sintered body.

第  1  表 実施例1 第1表に示すtkl、m2、Nn5の粒径44μm以下
の粉末を有機バインダー等であるエチルセルロース、テ
ルピネオール、カルピトールアセテートと混合してガラ
ス粉末56重量%を含むペーストを製造し、炭化ケイ素
焼結体基板(以下基板と略記する)の表面に塗布し、1
20Cに加熱してバインダーを除去した後、750℃〜
1100 Cの間の一定温度で一定時間焼成した。
Table 1 Example 1 A paste containing 56% by weight of glass powder was produced by mixing powders of tkl, m2, and Nn5 shown in Table 1 with a particle size of 44 μm or less with organic binders such as ethyl cellulose, terpineol, and carpitol acetate. and coated on the surface of a silicon carbide sintered body substrate (hereinafter abbreviated as the substrate), and
After heating to 20C to remove the binder, 750℃~
It was fired at a constant temperature between 1100 C for a certain time.

得られたガラス被覆の気泡、亀裂、乳濁の状況を第2表
に示す。それぞれの程度をA −11で示す。Aは無し
、Bは微少量、0は少量、Dは多量、Eは極大量ある場
合を示す。階1においては亀裂を生じているが、Nn2
.3においては亀裂はない。又気泡は焼成温度が高い程
増加する傾向にある。なおガラス被覆は厚さが2Xであ
った。
Table 2 shows the conditions of bubbles, cracks, and emulsion in the obtained glass coating. The respective degree is indicated by A-11. A indicates none, B indicates a very small amount, 0 indicates a small amount, D indicates a large amount, and E indicates an extremely large amount. There are cracks on floor 1, but Nn2
.. In No. 3, there are no cracks. Furthermore, the number of bubbles tends to increase as the firing temperature increases. Note that the glass coating had a thickness of 2X.

第  2  表 実施例2 第1表に示すm2のガラス組成のものでガラス粉末粒径
10μm以下の場合と、10μm以下を分級分離した4
4μm以下の場合についてそれぞれ次の如〈実施した。
Table 2 Example 2 Glass powder with a glass composition of m2 shown in Table 1 with a particle size of 10 μm or less, and 4 with a glass powder particle size of 10 μm or less classified and separated.
The following procedures were carried out for each case of 4 μm or less.

即ちそれぞれのガラス粉末を有機バインダー等であるエ
チルセルロース、テルピネオール、カルピトールアセテ
ートと混合してガラス粉末含有量10重量%であるペー
ストを調整し、炭化ケイ素基板上にスクリーン印刷法に
より塗布し、400Cに加熱してバインダーを除去後、
1400Cで30分間加熱焼成してガラス被覆を形成さ
せた。粉末粒径、塗布量と生成ガラス被覆の性質(不均
質性、気泡の生成状況ンとの関連を第3図に示す。
That is, each glass powder was mixed with organic binders such as ethyl cellulose, terpineol, and carpitol acetate to prepare a paste with a glass powder content of 10% by weight, and the paste was coated on a silicon carbide substrate by screen printing and heated to 400C. After heating and removing the binder,
A glass coating was formed by baking at 1400C for 30 minutes. The relationship between the powder particle size, coating amount, and the properties of the resulting glass coating (heterogeneity, bubble formation, etc.) is shown in FIG.

第  3  表 不均質性についてムは無し、Dは多量あることを示す、
気泡は実施例1と同じ。
Table 3 Regarding heterogeneity, there is no mu and D indicates a large amount.
The bubbles are the same as in Example 1.

なお本実施例においては亀裂を生じなかった。Note that no cracks were generated in this example.

粒径10μm以下のガラス粉末を用い、かつガラス量を
α5〜toe/cmとしたときに、均質で気泡のないガ
ラス被覆かえられることをこの実施例は示している。
This example shows that a homogeneous, bubble-free glass coating can be obtained when glass powder with a particle size of 10 μm or less is used and the amount of glass is α5 to toe/cm.

実施例3 陽2のガラス組成のガラス粉末を用い二段階焼成法で炭
化ケイ素焼結体上にガラス被覆を焼成により形成させた
。まず基体表面に粒径10μm以下のガラス粉末と有機
バインダー等であるエチルセルロース、テルピネオール
、カルピトールアセテートとより調整されガラス粉末が
10重量%であるペーストをスクリーン印刷法により塗
布し、400Cに加熱してバインダーを除去した後14
00 t:’で30分間焼成し冷却してガラス被覆を形
成させた。次に粒径10μm以下のガラス粉末を除去し
た粒径44μm以下のガラス粉末と有機バインダーであ
るエチルセルロース、テルピネオール、カルピトールア
セテートとより調整されガラス粉末が56重量%である
ペーストを前記ガラス被覆面にスクリーン印刷法により
塗布し、120Cに加熱してバインダーを除去した後、
925〜10251:’の間の一定温度で15分間焼成
し冷却してガラス被覆を形成させた。その結果を第4表
に示T0 第  4  表 いずれの焼成温度の場合も亀裂は生ずることはなく二次
焼成温度975Cにおいて気泡も生じなかった。焼成温
度が高い程気泡が増加する傾向にある。
Example 3 A glass coating was formed on a silicon carbide sintered body by firing a glass powder having the glass composition of positive 2 using a two-step firing method. First, a paste containing 10% by weight of glass powder prepared by glass powder with a particle size of 10 μm or less and organic binders such as ethyl cellulose, terpineol, and carpitol acetate was applied to the surface of the substrate by screen printing, and heated to 400C. After removing the binder 14
00 t:' for 30 minutes and cooled to form a glass coating. Next, a paste containing 56% by weight of glass powder prepared by removing glass powder with a particle size of 10 μm or less and glass powder with a particle size of 44 μm or less and organic binders such as ethyl cellulose, terpineol, and carpitol acetate is applied to the glass-coated surface. After applying by screen printing method and heating to 120C to remove the binder,
A glass coating was formed by firing at a constant temperature between 925 and 10251:' for 15 minutes and cooling. The results are shown in Table 4. No cracks were formed at any of the firing temperatures, and no bubbles were formed at the secondary firing temperature of 975C. The higher the firing temperature, the more bubbles tend to increase.

又ガラス被覆の厚さは0.0811mであった。The thickness of the glass coating was 0.0811 m.

実施例4.5 N14、N15の組成のガラス粉末を用い、実施例3と
同様の条件で二段階焼成を実施した。いずれの場合も無
色透明で気泡及び亀裂が生じないガラス被覆を形成する
ことができた。
Example 4.5 Two-stage firing was carried out under the same conditions as in Example 3 using glass powders having compositions of N14 and N15. In either case, a colorless and transparent glass coating without bubbles or cracks could be formed.

Claims (4)

【特許請求の範囲】[Claims] (1)Al_2O_39〜15重量%、B_2O_32
0〜30重量%、SiO_240〜60重量%、CaO
3〜15重量%よりなるガラス被覆膜を有するガラス被
覆炭化ケイ素焼結体。
(1) Al_2O_39-15% by weight, B_2O_32
0-30% by weight, SiO_240-60% by weight, CaO
A glass-coated silicon carbide sintered body having a glass coating film consisting of 3 to 15% by weight.
(2)Al_2O_39〜15重量%、B_2O_32
0〜30重量%、SiO_240〜60重量%、CaO
3〜15重量%よりなり、さらに上記組成100重量部
に対してZrO_2を3重量部以下を含有するガラス被
覆膜を有するガラス被覆炭化ケイ素焼結体。
(2) Al_2O_39-15% by weight, B_2O_32
0-30% by weight, SiO_240-60% by weight, CaO
A glass-coated silicon carbide sintered body having a glass coating film consisting of 3 to 15% by weight and further containing 3 parts by weight or less of ZrO_2 based on 100 parts by weight of the above composition.
(3)炭化ケイ素焼結体の表面に、Al_2O_39〜
15重量%、B_2O_320〜30重量%、SiO_
240〜60重量%、CaO3〜15重量%よりなるガ
ラス粉末と、有機バインダーとよりなるペーストを塗布
し、まず加熱してバインダーを除去后、さらに1100
℃〜1500℃の温度範囲に加熱し、ついで冷却して第
一次焼成ガラス層を形成させ、さらに前記ガラス粉末の
組成範囲内にあるガラス粉末と有機バインダーとよりな
るペーストを塗布し、加熱によりバインダーを除去后、
さらに850℃〜1100℃の温度範囲に加熱し、つい
で冷却して第二次焼成ガラス層を形成させることを特徴
とするガラス被覆炭化ケイ素焼結体の製造方法。
(3) Al_2O_39~ on the surface of the silicon carbide sintered body
15% by weight, B_2O_320-30% by weight, SiO_
A paste consisting of glass powder consisting of 240 to 60% by weight and 3 to 15% by weight of CaO and an organic binder was applied, first heated to remove the binder, and then heated to 1100% by weight.
The glass powder is heated to a temperature range of 1500°C to 1500°C, then cooled to form a primary fired glass layer, and then a paste consisting of a glass powder within the composition range of the glass powder and an organic binder is applied, and heated to form a first fired glass layer. After removing the binder,
A method for producing a glass-coated silicon carbide sintered body, which further comprises heating to a temperature range of 850°C to 1100°C and then cooling to form a second fired glass layer.
(4)炭化ケイ素焼結体の表面にAl_2O_39〜1
5重量%、B_2O_320〜30重量%、SiO_2
40〜60重量%、CaO3〜15重量%よりなり、さ
らに上記組成100重量部に対しZrO_2を3重量部
以下含有するガラス粉末と、有機バインダーとよりなる
ガラス粉末ペーストを塗布し、まず加熱してバインダー
を除去后、さらに 1100℃〜1500℃の温度範囲に加熱し、ついで冷
却して第一次焼成ガラス層を形成させ、さらに前記ガラ
ス粉末の組成範囲内にあるガラス粉末と有機バインダー
とよりなる、ガラス粉末ペーストを塗布し、加熱により
バインダーを除去后、さらに850℃〜1100℃の温
度範囲に加熱し、ついで冷却して第二次焼成ガラス層を
形成させることを特徴とするガラス被覆炭化ケイ素焼結
体の製造方法。
(4) Al_2O_39-1 on the surface of the silicon carbide sintered body
5% by weight, B_2O_320-30% by weight, SiO_2
A glass powder paste consisting of a glass powder consisting of 40 to 60% by weight, 3 to 15% by weight of CaO, and further containing 3 parts by weight or less of ZrO_2 per 100 parts by weight of the above composition, and an organic binder is applied, and heated first. After removing the binder, it is further heated to a temperature range of 1100°C to 1500°C, and then cooled to form a first fired glass layer, which is further composed of a glass powder within the composition range of the glass powder and an organic binder. , glass-coated silicon carbide characterized by applying a glass powder paste, removing the binder by heating, further heating to a temperature range of 850°C to 1100°C, and then cooling to form a second fired glass layer. A method for producing a sintered body.
JP21808986A 1986-09-18 1986-09-18 Glass-coated silicon carbide sintered body and method for producing the same Expired - Lifetime JPH07115977B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21808986A JPH07115977B2 (en) 1986-09-18 1986-09-18 Glass-coated silicon carbide sintered body and method for producing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21808986A JPH07115977B2 (en) 1986-09-18 1986-09-18 Glass-coated silicon carbide sintered body and method for producing the same

Publications (2)

Publication Number Publication Date
JPS6374934A true JPS6374934A (en) 1988-04-05
JPH07115977B2 JPH07115977B2 (en) 1995-12-13

Family

ID=16714463

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JPH07115977B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01317134A (en) * 1987-09-16 1989-12-21 Showa Denko Kk Glass composition for bonding silicon carbide sintered form

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01317134A (en) * 1987-09-16 1989-12-21 Showa Denko Kk Glass composition for bonding silicon carbide sintered form

Also Published As

Publication number Publication date
JPH07115977B2 (en) 1995-12-13

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