JPS6374139A - Optical recording medium - Google Patents

Optical recording medium

Info

Publication number
JPS6374139A
JPS6374139A JP61220833A JP22083386A JPS6374139A JP S6374139 A JPS6374139 A JP S6374139A JP 61220833 A JP61220833 A JP 61220833A JP 22083386 A JP22083386 A JP 22083386A JP S6374139 A JPS6374139 A JP S6374139A
Authority
JP
Japan
Prior art keywords
film
layer
recording
recording medium
optical recording
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61220833A
Other languages
Japanese (ja)
Other versions
JPH0474784B2 (en
Inventor
Toshihiko Yoshitomi
吉富 敏彦
Yoshimitsu Kobayashi
喜光 小林
Yoshiyuki Shirosaka
欣幸 城阪
Hidemi Yoshida
秀実 吉田
Michikazu Horie
通和 堀江
Takanori Tamura
田村 孝憲
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Kasei Corp
Original Assignee
Mitsubishi Kasei Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Kasei Corp filed Critical Mitsubishi Kasei Corp
Priority to JP61220833A priority Critical patent/JPS6374139A/en
Priority to DE8787301046T priority patent/DE3776386D1/en
Priority to KR1019870000966A priority patent/KR910009072B1/en
Priority to EP87301046A priority patent/EP0242942B1/en
Priority to CA000529093A priority patent/CA1258974A/en
Publication of JPS6374139A publication Critical patent/JPS6374139A/en
Publication of JPH0474784B2 publication Critical patent/JPH0474784B2/ja
Granted legal-status Critical Current

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  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)

Abstract

PURPOSE:To improve the quality and density of recording by specifying the atom ratio of carbon and fluorine on the surface, in contact with a recording layer, of an under coating layer consisting of a fluorocarbon film. CONSTITUTION:The thin film consisting of the polyfluorocarbon is deposited by a plasma polymn. method on a substrate 1 formed by coating a UV curing resin on plastic, glass or aluminum, etc., to form the under coating film 2. The recoding layer 3 consisting of Te-SeF6 type is formed on the film 2 and grooves 4 for a track servo are provided thereon. Good characteristics are obtd. and the quality and density are improved by controlling a gaseous monomer of tetrafluoroethylene or hexafluoropropylene which is the raw material and other conditions in such a manner that the atom ratio of the fluorine atoms and carbon atoms on the film 2 surface attains >=0.8-<1.4 fluorine to 1 carbon in the value measured by an ESCA method.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、高密度・高速記録が可能な光学的記録用媒体
に関する。詳しくは、基板上に形成した記録用薄膜にレ
ーザービームを照射して発生した熱により、該薄膜が蒸
発あるいは溶融除去されることを利用した光学的記録用
媒体に関するものである。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to an optical recording medium capable of high-density and high-speed recording. Specifically, the present invention relates to an optical recording medium that utilizes the fact that a thin recording film formed on a substrate is evaporated or melted away by heat generated by irradiating the thin film with a laser beam.

(従来の技術) 基板上に形成された薄膜にレーザービームを照射して穴
(ビット)を形成するようにした光学的記録用媒体とし
て、従来より、To、Biなどの金属薄膜が利用されて
いる。さらに、経時安定性を増すためにTe及びSeな
どからなるTe系合金薄膜や、これらの金属を含有する
プラズマ重合膜が利用されている。これらの材料は低融
点であるため記録に要するレーザー光のパワーが小さく
て済み、記録感度の点で有利である。
(Prior Art) Metal thin films such as To and Bi have traditionally been used as optical recording media in which holes (bits) are formed by irradiating a thin film formed on a substrate with a laser beam. There is. Furthermore, in order to increase stability over time, Te-based alloy thin films made of Te, Se, etc., and plasma polymerized films containing these metals are used. Since these materials have a low melting point, the power of the laser beam required for recording is small, which is advantageous in terms of recording sensitivity.

゛  一方、これらの記録媒体に用〜・る基板としては
、プラスチック、ガラス、金属ある〜・は、これらの基
板上に光硬化性樹脂膜等を形成したものが挙げられる。
On the other hand, the substrates used for these recording media include plastic, glass, metal, etc., and those on which a photocurable resin film or the like is formed are exemplified.

上記基板と薄膜記録媒体とからなる系にお(・てレーザ
ー光による薄膜の穿孔には、レーザー加熱によって浴融
した膜物質が基板との付着力にうちかつて分離すること
が必要である。このような目的のために記録層と基板と
の間にフルオロカーボン薄膜からなる下引き層を設ける
ことが検討されて(・る(特開昭!;9−902’ll
、号公報)。基板と膜物質との間の付着力を決める要因
は、記録層と接する基板表面及び記録層を形成する物質
の溶融時における表面張力や、基板表面層の分子量、架
橋度等である。記録層と基板との関係は、この両者の付
着力が小さければ。
In order to perforate a thin film using a laser beam in a system consisting of the above-mentioned substrate and a thin film recording medium, it is necessary that the film material melted in the bath by laser heating be separated by the adhesion force with the substrate. For such purposes, it has been considered to provide an undercoat layer made of a thin fluorocarbon film between the recording layer and the substrate (see Japanese Patent Publication No. 9-902'll).
, issue). Factors that determine the adhesion between the substrate and the film material include the surface tension of the substrate surface in contact with the recording layer and the material forming the recording layer during melting, the molecular weight of the substrate surface layer, the degree of crosslinking, and the like. The relationship between the recording layer and the substrate is that the adhesion force between the two is small.

より小さなレーザー元パワーで短時間にビットを形成す
ることができる。これは記録感度の向上を意味し、高速
処理のファイル記録及び安価な低出力半導体レーザーの
使用が可能となる。
Bits can be formed in a short time with lower laser source power. This means improved recording sensitivity, which enables high-speed file recording and the use of inexpensive low-power semiconductor lasers.

しかしながら、さらに高品質の記録を行うためには感度
の向上だけではなく、形成されたビット形状が明確な輪
郭を有し、かつ、−mであることが要求される。
However, in order to perform higher quality recording, it is required not only to improve the sensitivity, but also that the formed bit shape have a clear outline and be -m.

上記要求を満たすものとして、本発明者らは既に基板と
記録層との間にフルオロカーボンの下引き層を設け、か
つ、該下引き層の記録層に接する側の表面から10nm
以内の層の炭素とフッ素の原子数比をFXscA(軟X
線励起光電子分光法)法による測定値として炭素/に対
してフッ素/、9以上とする光学的記録用媒体を提案し
た。(特願乙0−29g/97) (発明が解決しようとする問題点) 一方、記録用媒体には、以上のような特性に肌えて、記
憶容量が大きいこと、すなわち、高密度記録が可能なこ
とが要求される。穴あけタイプの光学的記録用媒体の記
憶容量を向上させろためには、ビットの大きさをできる
だけ小さくすることが要求される。記録媒体の熱伝導率
が大きいために、レーザー光照射によって浴融除去され
る領域が太き(なってしまう場合や、記録層と下引き届
の間の付着力か弱過ぎて除去される物質の童が多くなっ
てしまう場合には。
In order to meet the above requirements, the present inventors have already provided a fluorocarbon undercoat layer between the substrate and the recording layer, and a 10 nm layer from the surface of the undercoat layer in contact with the recording layer.
The atomic ratio of carbon and fluorine in the layers within FXscA (soft
We proposed an optical recording medium in which the measured value by linear excitation photoelectron spectroscopy is 9 or more compared to carbon/fluorine/. (Patent Application Otsu 0-29g/97) (Problems to be Solved by the Invention) On the other hand, in addition to the above-mentioned characteristics, recording media have a large storage capacity, that is, high-density recording is possible. things are required. In order to improve the storage capacity of punch-type optical recording media, it is required to make the bit size as small as possible. Because the thermal conductivity of the recording medium is high, the area that is removed by bath melting by laser beam irradiation may become thick (or the adhesive force between the recording layer and the undercoat may be too weak and the material may be removed). If the number of children increases.

ビットサイズが大きくなりやすく高密度記録は不可能と
なる。また、上記のような媒体では、レーザー元ハワー
のわずかな変動によってもビットサイズが敏感に変動し
やすい傾向があり。
The bit size tends to increase, making high-density recording impossible. In addition, with the above-mentioned media, the bit size tends to fluctuate sensitively even with slight fluctuations in the laser source power.

安定で正確なディジタル信号の記録が困難となる。It becomes difficult to record stable and accurate digital signals.

さらに、上記ビット形状に関する問題点に加えて、短パ
ルス長のレーザー光で記録したり、ディスクを高速で回
転させる場合、特にディスクの外周にお〜・ては媒体面
上の単位面積当りに単位時間に照射されるレーザー光の
エネルギー密度が小さくなるために、穴あけに要するレ
ーザー光出力はより大きくなり、媒体に対する高感度化
の要求は一層厳しいものとなる。
Furthermore, in addition to the above-mentioned problems regarding the bit shape, when recording with a short pulse length laser beam or rotating a disk at high speed, especially at the outer periphery of the disk, the number of units per unit area on the medium surface Since the energy density of the laser light irradiated over time becomes smaller, the laser light output required for drilling becomes larger, and the demand for higher sensitivity of the medium becomes even more severe.

以上のような要求を満たすためには、記録層とその下地
(基板または下引層)との組合せが極めて重要な要素と
なる。すなわち、最短ピット長を短か(するためには、
付着力が大きいことが望ましく、一方で高感度化のため
には付着力は小さいことが望ましいと(・う−見、相矛
盾する要求を満たさねばならない。
In order to meet the above requirements, the combination of the recording layer and its underlayer (substrate or undercoat layer) is an extremely important element. In other words, shorten the shortest pit length (in order to
It is desirable that the adhesion force be large, but on the other hand, in order to achieve high sensitivity, it is desirable that the adhesion force be small.

(問題点を解決するための手段) 本発明者らは、フルオロカーボン薄膜の炭素とフッ素の
組成比及び構造を制御することによリ、フルオロカーボ
ン薄膜からなる下引き層と各種記録層との間の付着力を
制御し、これにより、最小ビットサイズを小さくする一
方で、高感度及びピット形状の改善をもたらす光学的記
録用媒体を得1本発明に到達した。
(Means for Solving the Problems) The present inventors have discovered that by controlling the composition ratio and structure of carbon and fluorine in the fluorocarbon thin film, the bonding layer between the undercoat layer made of the fluorocarbon thin film and various recording layers can be We have arrived at the present invention to obtain an optical recording medium that provides high sensitivity and improved pit shape while controlling the adhesion force and thereby reducing the minimum bit size.

すなわち1本発明の要旨は、基板上にフルオロカーボン
膜からなる下引き層を設は該下引き層上にTeを含む穴
あけタイプの記録層を配置した光学的記録用媒体におい
て、上記下引き層の記録層に接する側の表面から10n
m以内の層の炭素とフッ素の原子数比をESOA法によ
る測定値として、炭素lに対して、フッ素o、g以上へ
グ未満としたことを特徴とする光学的記録用媒体に存す
る。
That is, the gist of the present invention is to provide an optical recording medium in which an undercoat layer made of a fluorocarbon film is provided on a substrate and a perforation type recording layer containing Te is disposed on the undercoat layer. 10n from the surface in contact with the recording layer
The optical recording medium is characterized in that the atomic ratio of carbon to fluorine in a layer within m, as measured by the ESOA method, is at least o, g and less than heg of fluorine per l of carbon.

本発明に言5 ESOA法とは、軟X線励起元電子分元
法の略称であって、軟X線の照射によって試料化合物中
の原子からたたき出された光電子のエネルギースペクト
ルから試料の表面近傍の元素の種類及び化学結合状態を
分析する方法である。この方法では、上記光電子の透過
能が小さいため該薄膜の分析は、その表面から、10T
1m以内の極表層部の情報が相対的に強くスペクトロメ
ータ″XSAM−g00”型を用い導電性基板上に作成
したフルオロカーボン薄膜表面のフッ素IB軌道(F+
s)スペクトルと炭素l5(C!、B)軌道スペクトル
を測定した。 Fl[3スペクトルは、結合エネルギー
がA g t eV付近に中心を有する単一ピークから
なり、CI8スペクトルは、結合エネルギーが1.2ざ
5からコックev付近に中心を有する複数のピークから
構成される。炭素原子とフッ素原子の原子数比は上記F
1sピークの積分強度と、C1Sスペクトルの積分強度
との比から導出される。
5 ESOA method is an abbreviation for soft X-ray excited element electron fractionation method, which uses the energy spectrum of photoelectrons ejected from atoms in a sample compound by irradiation with soft X-rays to determine the area near the surface of the sample. This is a method of analyzing the types of elements and chemical bonding states of . In this method, since the above-mentioned photoelectron transmission ability is small, the thin film can be analyzed from the surface at 10T.
Fluorine IB orbit (F+
s) spectrum and carbon 15 (C!, B) orbital spectrum were measured. The Fl[3 spectrum consists of a single peak with a binding energy centered around A g t eV, and the CI8 spectrum consists of multiple peaks with binding energies centered around 1.2 to Cock ev. Ru. The atomic ratio of carbon atoms and fluorine atoms is F above.
It is derived from the ratio of the integrated intensity of the 1s peak and the integrated intensity of the C1S spectrum.

以下図面を参照して1本発明の詳細な説明する。第1図
は1本発明元学的記録用媒体の具体的構造の7例を示す
模式図であって、(1)は基板。
The present invention will be described in detail below with reference to the drawings. FIG. 1 is a schematic diagram showing seven examples of specific structures of a recording medium according to the present invention, and (1) is a substrate.

(2)は基板(1)上に配置したフルオロカーボンの下
引き膜、(3)は膜(2)上に形成した記録層、(4)
はトラックサーボ用の溝である。
(2) is a fluorocarbon subbing film disposed on substrate (1), (3) is a recording layer formed on film (2), and (4)
is the groove for the track servo.

本発明に係る記録媒体の基板(1)としては、アクリル
樹脂、ポリカーボネート樹脂等のプラスチック、ガラス
又はアルミニウム等に紫外線硬化樹脂を塗布したもの等
が挙げられる。
Examples of the substrate (1) of the recording medium according to the present invention include plastics such as acrylic resin and polycarbonate resin, glass, or aluminum coated with an ultraviolet curing resin.

本発明においては、この基板上にフルオロカーボンから
なる膜を設ける。具体的には、例えば、プラズマ重合法
によってポリフルオロカーボン薄膜を二〇〜10OOA
、好適には50〜300^堆積させて下引き層(2)を
形成し1種々の記録層(3)に対して下地との付着力を
最適化する。
In the present invention, a film made of fluorocarbon is provided on this substrate. Specifically, for example, a polyfluorocarbon thin film is formed at 20 to 10 OOA by plasma polymerization method.
, preferably 50 to 300^, to form an undercoat layer (2) and optimize adhesion to the undercoat for each recording layer (3).

プラズマ重合に用(・ろフルオロカーボンの七ツマ−と
しては、四フッ化エチレン、六フッ化プロピレンナトの
バー70ロアルケン、又ハハーフロロンクロヘキサン、
バー70口ベンゼン等、常温で気体ある〜・は液体であ
っても蒸気圧が十分筒<、真空容器に該フルオロカーボ
ンの蒸気を/ 0−3TOrr以上;1々たし、グロー
放電が可能となるものであって、フッ素の置換度が高い
ものであれば良−・。特に、四フッ化エチレント六フッ
化プロピレンは蒸気圧が高い1重合速度が速(・、安価
で取扱い易いなどの点で有利なモ/ −y −カ、Xで
ある。これらフルオロカーボン薄膜表面として容量式あ
るいは誘導式放電を用℃・ることによりプラズマ重合膜
を形成することができる。フルオロカーボン膜の他の形
成方法としては、ポi/テトラフルオロエチレン等のポ
リフルオロカーボンをスパッタリング等により形成する
方法がある。
Used for plasma polymerization (7mers of fluorocarbons include tetrafluoroethylene, hexafluoropropylene nato bar 70 alkene, and hahalffluorochlorone chlorohexane,
Bar 70 benzene, etc., which is a gas at room temperature, has a sufficient vapor pressure even if it is liquid, and the vapor of the fluorocarbon is placed in a vacuum container at 0-3 TOrr or more; however, glow discharge is possible. It is acceptable as long as it has a high degree of fluorine substitution. In particular, ethylene tetrafluoride and propylene hexafluoride are molecules with high vapor pressure, high polymerization rate, low cost, and easy handling. A plasma polymerized film can be formed by using a chemical or inductive discharge at °C.Another method for forming a fluorocarbon film is to form a polyfluorocarbon such as poly/tetrafluoroethylene by sputtering or the like. be.

第2図は、フルオロカーボンのプラズマ重合膜を作製し
た後、スパッタ法によって記録層を成膜する場合の装置
の一例を示す。
FIG. 2 shows an example of an apparatus for forming a recording layer by sputtering after producing a fluorocarbon plasma polymerized film.

図中(5)は真空容器であり、その内部はΩ室に区切ら
れている。第1室でプラズマ重合を行し・、その後第■
室において記録層を成膜する。第2図中、 (6)、 
(7)は高周波を印加する電極であり。
In the figure, (5) is a vacuum container, the interior of which is divided into Ω chambers. Perform plasma polymerization in the first chamber, and then
A recording layer is formed in a chamber. In Figure 2, (6),
(7) is an electrode for applying high frequency.

基本的には同一構造であるが、(7)がスパッタされる
べき材質からなるターゲットであるのに対し、(6)は
スパッタされにくい材5(ステンレス。
Although they basically have the same structure, (7) is a target made of a material to be sputtered, whereas (6) is a target made of a material 5 (stainless steel) that is difficult to sputter.

Taなど)が用いられる。(8)は基板(9)がセット
されたホルダーであり、■、■室の順に搬送することが
できる。C1、α◇は放電を生ぜしぬるためのガス導入
口であり、αOからはフルオロカーボンのモノマーガス
、αυからは、ArまたはArとフッ化セレンガス等の
反応性ガスとの混合ガスを導入する。ここで、1.■室
の間には、各室のガスの種類及び圧力を独立に制御する
ための差動排気室αつを設けている。また、C11は排
気口、α→はRF電源である。
Ta, etc.) are used. (8) is a holder in which the substrate (9) is set, and can be transported in the order of chambers (1) and (2). C1 and α◇ are gas inlet ports for generating discharge, fluorocarbon monomer gas is introduced from αO, and Ar or a mixed gas of Ar and a reactive gas such as selenium fluoride gas is introduced from αυ. Here, 1. (2) Between the chambers are provided α differential exhaust chambers for independently controlling the type and pressure of gas in each chamber. Further, C11 is an exhaust port, and α→ is an RF power source.

上記のような容量結合式のプラズマ重合装置にお(・て
得られるフルオロカーボン膜表面のフッ素原子と炭素原
子の組成比(原子数比)、Floは、原料となるモノマ
ーガス、装置形状。
The composition ratio (atomic number ratio) of fluorine atoms and carbon atoms on the surface of the fluorocarbon film obtained in the capacitively coupled plasma polymerization apparatus as described above, Flo is the monomer gas used as the raw material, and the shape of the apparatus.

放゛亀条件、特に放電パワー及びモノマーガス圧力に依
存するが、その値として、0.2から/、S程度の範囲
のものが容易に得られる。一方、ポリフルオロカーボン
のスパッタ膜では、ターゲットとして利用しうるポリフ
ルオロカーボン樹脂の耐熱性に関する制限のためFlo
としてi、iから1.7程度のものしか得られない。F
loが小さ〜・方がフッ素原子が少な(、炭素原子どう
しの架橋度が高℃・膜構造となっており、従って。
Although it depends on the discharge conditions, especially the discharge power and the monomer gas pressure, values in the range of about 0.2 to S/S can be easily obtained. On the other hand, in sputtering polyfluorocarbon films, due to limitations on the heat resistance of polyfluorocarbon resins that can be used as targets,
As for i, only about 1.7 can be obtained from i. F
The smaller lo is, the less fluorine atoms there are (the degree of cross-linking between carbon atoms is high, and the film structure is high).

記録層との間の付着力が増加する傾向がある。There is a tendency for the adhesion force with the recording layer to increase.

付着力の制御という点からは、プラズマ重合膜の方が幅
広し・制御が行える。本発明者らは、種々のTeを含む
金属薄膜からなる穴あけタイプの記録層に対し、上記フ
ルオロカーボンのプラズマ重合膜からなる下引き層を適
用し、感度、ビット形状及び最小ビットサイズのバラン
スのとれた改善を達成しうるよう、記録層と下引き層の
間の付着力の最適化を行った。この結果。
From the point of view of controlling adhesion force, plasma polymerized membranes have a wider range and can be controlled. The present inventors applied an undercoat layer made of the plasma-polymerized fluorocarbon film to a perforation-type recording layer made of a metal thin film containing various types of Te, and achieved a balance between sensitivity, bit shape, and minimum bit size. In order to achieve this improvement, we optimized the adhesion between the recording layer and the undercoat layer. As a result.

該下引き層の記録層に接する側の表面からlOnm以内
の層の炭素とフッ素の原子数比を炭素lに対してフッ素
o、g以上/、9未満、好ましくは0.9以上/、3以
下とした場合に最も良好な特性を有する記録媒体が得ら
れた。Floがo、gより小さい場合には、ポリカーボ
ネート樹脂等に直接記録層を成膜した場合に比して、感
度の改善効果が少な(、Floが/、!Iより大きい場
合にはビットサイズが太き(なりやすい傾向がある。
The atomic ratio of carbon to fluorine in the layer within 1 Onm from the surface of the undercoat layer in contact with the recording layer is 0, g or more of fluorine per carbon 1, less than 9, preferably 0.9 or more/, 3 A recording medium with the best characteristics was obtained when the following conditions were used. When Flo is smaller than o, g, the effect of improving sensitivity is smaller than when the recording layer is directly formed on polycarbonate resin etc. (If Flo is larger than /, !I, the bit size is Thick (it tends to become thick).

(実施例) (実施例/) 真空容器中に六フッ化プロピレンのモノマーガスを導入
し、圧力を/ X / 0−2TOrrとした。直径3
インチのステンレス製の円形陰極と、はぼ同程度の大き
さを有し1円板状のポリカーボネート樹脂基板を装着し
た陽極との間に、  / 、?、j AMH2の高周波
電圧を印加し。
(Example) (Example/) A monomer gas of propylene hexafluoride was introduced into a vacuum container, and the pressure was set to /X/0-2 TOrr. Diameter 3
Between an inch stainless steel circular cathode and an anode of about the same size and equipped with a disc-shaped polycarbonate resin substrate, there is a /,? , j AMH2 high frequency voltage is applied.

グロー放電を生ぜしめた。放電電力はSOWで、上記平
行平板電極間の間隔は100mNとした。上記条件のも
とで膜厚約2001のプラズマ重合膜を得、下引き層と
した。該六フッ化プロピレン・プラズマ重合膜のフッ素
と炭素の原子数比F/Cは炭素/に対してフッ素7.2
であった。
This produced a glow discharge. The discharge power was SOW, and the distance between the parallel plate electrodes was 100 mN. A plasma polymerized film with a thickness of about 200 mm was obtained under the above conditions and used as an undercoat layer. The fluorine to carbon atomic ratio F/C of the hexafluoropropylene plasma polymerized film is 7.2 fluorine to carbon/carbon.
Met.

上記下引き層上に、記録層として、TeをArとSeF
6混合ガス中でスパッタして得られる膜厚約1Ioo^
のTe−3eF6系媒体(特願1.0−291s!;2
0に開示したと同様の膜)を形成した。また、比較のた
め、 Floが/、5であるポリテトラフルオロエチレ
ンのスパッタ膜(膜厚約λθθ^)を下引き層とした場
合。
On the above-mentioned undercoat layer, as a recording layer, Te is mixed with Ar and SeF.
6 Film thickness obtained by sputtering in a mixed gas of about 1 Ioo^
Te-3eF6 type media (patent application 1.0-291s!; 2
A film similar to that disclosed in No. 0) was formed. For comparison, a sputtered film of polytetrafluoroethylene (film thickness approximately λθθ^) with Flo of /, 5 was used as an undercoat layer.

及び下引き層の無い場合について、同様にTe−8eF
、系記録層を成膜した。
Similarly, for the case without undercoat layer, Te-8eF
, a system recording layer was formed.

上記3種類の光学的記録用媒体に対し、以下のような条
件で記録再生特性の評価を行った。円板状基板は/ g
 00 rpmで回転させ、回転軸からの半径約JOm
、のトラックに対し、波長g 30 nmのGaAs半
導体v  !−テ記録−再生を行った。記録はJ、 A
 、? MHz、デユーティ−30%のパルス元にて行
った。
The recording and reproducing characteristics of the above three types of optical recording media were evaluated under the following conditions. The disc-shaped substrate is / g
Rotate at 00 rpm and have a radius of approximately JOm from the rotation axis.
, a GaAs semiconductor with wavelength g 30 nm v ! - Recorded - Played back. The record is J, A
,? The test was carried out using a pulse source of MHz and a duty of 30%.

第3図にC/N比(Carrier to noiee
 ratio )の記録パワー依存性を示す。図中(a
)はFlo =/、Sであるポリテトラフルオロエチレ
ンスパッタ膜を下引き層とした場合、(ロ)はFlo 
== /、 2である六フッ化プロピレンプラズマ重合
膜を下引き層とした場合、(C)は下引き層無しの場合
である。(ロ)は(C)よりも感度が改善される一方で
、(a)よりもO/Nが2〜3dB増加し。
Figure 3 shows the C/N ratio (Carrier to noise).
The dependence of ratio) on recording power is shown. In the figure (a
) is Flo = /, S When a polytetrafluoroethylene sputtered film is used as an undercoat layer, (b) is Flo
== /, When the hexafluoride propylene plasma polymerized film of 2 is used as an undercoat layer, (C) is the case without an undercoat layer. (B) has improved sensitivity compared to (C), but O/N increases by 2 to 3 dB compared to (a).

Cハ比の記録パワー依存性が少ない。これは。The dependence of the C ratio on the recording power is small. this is.

SEM観察の結果、(a)においては記録パワーを大き
くするにつれ、ビットサイズが急激に大きくなるのに対
し、■にお(・てはビットサイズの変動が少ないためで
あることがわかった。さらに、■においては(C)に比
べてビット内残留物が少なく、均一なリムが形成された
As a result of SEM observation, it was found that in (a), as the recording power was increased, the bit size increased rapidly, whereas in (), the bit size did not fluctuate much. In , ■, there was less residue in the bit than in (C), and a uniform rim was formed.

(実施例2) 実施例/において、モノマーガスを四7ツ化エチレンに
変えただけで他は全く同様にして、膜厚的200^のプ
ラズマ重合膜(F/C=/、/)を形成し、下引き層と
した。上記四フッ化エチレンプラズマ重合膜の他に、や
はり実施例1と同様に、ポリテトラフルオロエチレンの
スパッタ膜(F/C= /、 、lr )と、下引き無
しの場合の3種類の基板及び下引き層上に、窒素及びA
rとの混合ガス中で、70gg%、Sθ/、2%(原子
比)の合金ターゲットの反応性スパッタリングを行い、
Te及びSθを含む膜厚的qoθ^の薄膜(特願AO−
/!;/jtO!;に開示したと同様の膜)を形成し、
記録層とした。上記3種類の光学的記録用媒体に対し実
施例/と同様にして記録。
(Example 2) A plasma polymerized film (F/C=/, /) with a film thickness of 200^ was formed in the same manner as in Example/, except that the monomer gas was changed to ethylene tetra7ide. This was used as an undercoat layer. In addition to the above tetrafluoroethylene plasma polymerized film, similarly to Example 1, a polytetrafluoroethylene sputtered film (F/C=/, , lr), three types of substrates without undercoat, and On the undercoat layer, nitrogen and A
Reactive sputtering of an alloy target of 70gg%, Sθ/, 2% (atomic ratio) in a mixed gas with r,
A thin film containing Te and Sθ with a thickness of qoθ^ (patent application AO-
/! ;/jtO! forming a film similar to that disclosed in;
It was used as a recording layer. Recording was performed on the above three types of optical recording media in the same manner as in Example.

再生特性の評価を行った。The playback characteristics were evaluated.

ポリテトラフルオロエチレンのスパッタ膜を下引き層と
した場合、感度は極めて良いものの、付着力か弱過ぎる
ために、ビット形状が不ぞろ〜・で、大きな穴しか開か
ない。このため、C/Nの場所むら、記録パワー依存性
が大きく、正確なデジタル信号の記録・再生は不可能で
あった。
When a polytetrafluoroethylene sputtered film is used as an undercoat layer, the sensitivity is extremely good, but the adhesion is too weak, resulting in irregular bit shapes and only large holes. For this reason, the C/N ratio is highly dependent on location and recording power, making it impossible to accurately record and reproduce digital signals.

四フッ化エチレンのプラズマ重合膜を下引き層として用
(・た場合、及び下引き層無しの場合には、それぞれ、
第3図に)及び(C)と同様な特性を示し、該プラズマ
重合膜下引き層の場合に最も良好な特性が得られた。
When a plasma polymerized film of tetrafluoroethylene is used as an undercoat layer (and when there is no undercoat layer,
The properties shown in Figure 3) and (C) were similar, and the best properties were obtained with the plasma polymerized film undercoat layer.

(発明の効果) 本発明におけるフルオロカーボン膜の下引キ層は、単に
記録媒体の感度を向上させるだけでな(、記録・再生特
性のバランスのとれた改善を達成でき、特に、高密度な
光学的記録用媒体を実現できる。
(Effects of the Invention) The fluorocarbon film undercoat layer of the present invention not only improves the sensitivity of the recording medium (but also achieves a well-balanced improvement in the recording and reproducing characteristics, especially for high-density optical A digital recording medium can be realized.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は1本発明に係る記録用媒体の構造の一例を示し
、第2図は、記録層を成膜するだめのスパッター装置の
一例を示し、第3図は、実施例で得られた媒体のC7N
比の記録依存性を示す。 図中、(1)二基板、 (2) :下引き膜、 (3)
 :記録層晃3図 才8対記註八〇ワ−
FIG. 1 shows an example of the structure of a recording medium according to the present invention, FIG. 2 shows an example of a sputtering apparatus for forming a recording layer, and FIG. 3 shows an example of the structure of a recording medium according to the present invention. Media C7N
The recording dependence of the ratio is shown. In the figure, (1) two substrates, (2): undercoat film, (3)
:Record layer Akira 3 illustrations 8 pairs of notes 80 words

Claims (5)

【特許請求の範囲】[Claims] (1)基板上にフルオロカーボン膜からなる下引き層を
設け、該下引き層上にTeを含む薄膜からなる穴あけタ
イプの記録層を配置した光学的記録用媒体において、上
記下引き層の記録層に接する側の表面から10nm以内
の層の炭素とフッ素の原子数比をESCA法による測定
値として、炭素1に対してフッ素0.8以上1.4未満
としたことを特徴とする光学的記録用媒体。
(1) In an optical recording medium in which an undercoat layer made of a fluorocarbon film is provided on a substrate, and a perforation type recording layer made of a thin film containing Te is disposed on the undercoat layer, the recording layer of the undercoat layer is An optical recording characterized in that the atomic ratio of carbon to fluorine in a layer within 10 nm from the surface in contact with the surface is 0.8 or more and less than 1.4 for 1 carbon to 1 fluorine, as measured by the ESCA method. Medium for use.
(2)フルオロカーボン膜がフルオロカーボンのプラズ
マ重合膜であることを特徴とする特許請求の範囲第1項
に記載の光学的記録用媒体。
(2) The optical recording medium according to claim 1, wherein the fluorocarbon film is a fluorocarbon plasma polymerized film.
(3)上記フルオロカーボンのモノマーガスが四フッ化
エチレンまたは六フッ化プロピレンであることを特徴と
する特許請求の範囲第1項記載の光学的記録用媒体。
(3) The optical recording medium according to claim 1, wherein the fluorocarbon monomer gas is tetrafluoroethylene or hexafluoropropylene.
(4)上記穴あけタイプの記録層が、Teを含む金属を
ターゲット材として、フッ化セレンガスとArガスとの
混合ガス中において反応性スパッタリングすることによ
り形成した、Te及びSeを含む堆積膜であることを特
徴とする特許請求の範囲第1項記載の光学的記録用媒体
(4) The perforation type recording layer is a deposited film containing Te and Se formed by reactive sputtering in a mixed gas of selenium fluoride gas and Ar gas using a metal containing Te as a target material. An optical recording medium according to claim 1, characterized in that:
(5)上記穴あけタイプの記録層が、Te及びSeを含
む合金をターゲット材として窒素ガスとArガスとの混
合ガス中において反応性スパッタリングをすることによ
り形成した、Te及びSeを含む堆積膜であることを特
徴とする特許請求の範囲第1項記載の光学的記録用媒体
(5) The above-mentioned hole-type recording layer is a deposited film containing Te and Se formed by reactive sputtering in a mixed gas of nitrogen gas and Ar gas using an alloy containing Te and Se as a target material. An optical recording medium according to claim 1, characterized in that:
JP61220833A 1986-04-24 1986-09-18 Optical recording medium Granted JPS6374139A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP61220833A JPS6374139A (en) 1986-09-18 1986-09-18 Optical recording medium
DE8787301046T DE3776386D1 (en) 1986-04-24 1987-02-05 OPTICAL RECORDING MEDIUM AND METHOD FOR THE PRODUCTION THEREOF.
KR1019870000966A KR910009072B1 (en) 1986-04-24 1987-02-05 Optical recording carrier and manufacturing process therefor
EP87301046A EP0242942B1 (en) 1986-04-24 1987-02-05 Optical recording medium and process for producing the same
CA000529093A CA1258974A (en) 1986-04-24 1987-02-05 Optical recording medium and process for producing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61220833A JPS6374139A (en) 1986-09-18 1986-09-18 Optical recording medium

Publications (2)

Publication Number Publication Date
JPS6374139A true JPS6374139A (en) 1988-04-04
JPH0474784B2 JPH0474784B2 (en) 1992-11-27

Family

ID=16757258

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61220833A Granted JPS6374139A (en) 1986-04-24 1986-09-18 Optical recording medium

Country Status (1)

Country Link
JP (1) JPS6374139A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63177328A (en) * 1987-01-19 1988-07-21 Nec Corp Optical recording medium and its production
JPS647348A (en) * 1986-10-30 1989-01-11 Hitachi Maxell Optical information recording medium and its production

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61142167A (en) * 1984-12-17 1986-06-30 杉山 幹雄 Seasoning shaking-out vessel having mixing function

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61142167A (en) * 1984-12-17 1986-06-30 杉山 幹雄 Seasoning shaking-out vessel having mixing function

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS647348A (en) * 1986-10-30 1989-01-11 Hitachi Maxell Optical information recording medium and its production
JPS63177328A (en) * 1987-01-19 1988-07-21 Nec Corp Optical recording medium and its production

Also Published As

Publication number Publication date
JPH0474784B2 (en) 1992-11-27

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